CN101656250A - 具有立体匹配互连板的紧密封装半导体芯片 - Google Patents

具有立体匹配互连板的紧密封装半导体芯片 Download PDF

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CN101656250A
CN101656250A CN200910165254A CN200910165254A CN101656250A CN 101656250 A CN101656250 A CN 101656250A CN 200910165254 A CN200910165254 A CN 200910165254A CN 200910165254 A CN200910165254 A CN 200910165254A CN 101656250 A CN101656250 A CN 101656250A
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chip
interconnected plate
semiconductor packages
semiconductor
contact zone
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CN101656250B (zh
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刘凯
孙明
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Chongqing Wanguo Semiconductor Technology Co., Ltd.
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Alpha and Omega Semiconductor Inc
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Abstract

一个半导体封装,是对于一个电路基底上的两个相邻半导体芯片的封装。芯片在沿着它们的纵向边缘分开,并有一个内部芯片间距。一个立体匹配电连接连接第二芯片的顶部金属接触区和第一芯片的底部表面,立体匹配电连接适配表面之间的立体差,立体匹配电连接包括:a)一个L形电路路径,该路径是电路基底的一部分,从第一芯片的一条纵向边缘横向延伸并且将一个中间接触区靠近第二芯片的一条纵向边缘。b)一个互联板连接第二芯片的顶部金属接触区面积和中间接触区,适配两个接触面的立体高度差。因此,半导体封装减少了芯片横向边缘之间的直接横向电路路径的内部芯片间距。

Description

具有立体匹配互连板的紧密封装半导体芯片
技术领域
本发明涉及电子系统封装领域,特别涉及一种半导体芯片的物理级封装。
背景技术
本发明与以下专利申请有关:
由Lei Shi等人申请的美国专利申请号11/906,136“具有桥连接板互连接的半导体封装”,公开号US20080087992,此后以美国申请11/906136称呼;
由Ming Sun等人申请的美国专利申请号11/799,467“具有凹陷型互连板的半导体封装”,此后以美国申请11/799467称呼。
由于功率金属氧化物半导体场效应晶体(metal-oxide-semiconductorfield effect transistor,简称MOSFET)器件的高集成密度、极低的静态漏电流和不断改进的功率处理能力,它们被广泛的用在功率电子产品中,例如开关式电源和电源转换器,功率MOSFET器件的一个重要优势是其封装尺寸随着消费者的需求的驱使而不断减小,尤其体现在便携式电子设备中。
发明内容
本发明公开了一种半导体封装,其包括:
一个电路基底;
两个半导体芯片,其底部表面与电路基底的上面电连接,所述半导体芯片进一步包括:
第一芯片的边界为第一芯片第一纵向边缘和第一芯片第二纵向边缘,第一芯片第一横向边缘和第一芯片第二横向边缘;第二芯片的边界为第二芯片第一纵向边缘和第二芯片第二纵向边缘,第二芯片第一横向边缘和第二芯片第二横向边缘;第一芯片和第二芯片位置邻近并且是相互独立的,沿着它们各自第一芯片第二纵向边缘和第二芯片第一纵向边缘,设有内部芯片间距;
一个立体匹配电连接,连接第二芯片表面上的顶部金属接触区和第一芯片底部表面,用来适配表面之间的高度差异,所述立体匹配电连接进一步包括:
a)一个电路路径,该路径是电路基底的一部分,作为第一芯片的底部表面到电路基底上的中间接触区的电路径,所述的电路径进一步包括L形路径,该路径从第一芯片第二横向边缘靠近第一芯片第二纵向边缘的位置横向延伸,将中间接触区靠近第二芯片第二横向边缘;
b)一个互联板连接第二芯片顶部金属接触区和中间接触区,所述中间接触为三维的,用来适配接触区之间的立体高度差;
因而,半导体封装减少了第一芯片第二纵向边缘和第二芯片第一纵向边缘之间的横向电路路径的内部芯片间距。
作为上述的半导体封装的一个优选实施方式,所述互联板还包括一个桥部分,设置在桥部分两边的谷部分,设置在谷部分、桥部分或平面之间连接部分两边的平面部分。
作为上述的半导体封装的一个优选实施方式,所述互联板还包括用来与第二芯片顶部金属接触区接触的凹点。
作为上述的半导体封装的另一个优选实施方式,至少有一个所述第一芯片和第二芯片还包括至少一个额外的顶部金属接触区,相应地,半导体封装还包括一个额外的互联板连接额外顶部金属接触区和电路基底,该互联板是三维的用来适配他们之间存在的立体高度差。
作为上述的半导体封装的另一个优选实施方式,还包括一个桥部分,设置在桥部分两边的谷部分,设置在谷部分、桥部分或平面之间连接部分两边的平面部分,裸露在模塑料外的互联板的顶部表面为桥部分,用来散热。
作为上述的半导体封装的一个优选实施方式,所述电路基底设有第一芯片垫和第二芯片垫分别用来定位和连接第一芯片和第二芯片,相应地,L形路径是从第一芯片垫和第一芯片的上表面的顶部金属接触区的延伸,通过一个互联板与引线框引脚连接。
作为上述的半导体封装的另一个优选实施方式,大部分用模塑料封装,仅暴露顶部表面的互联板用来散热。
作为上述的半导体封装的另一个优选实施方式,所述电路基底是绝缘衬底,该绝缘衬底设有一个第一导电表面和一个第二导电表面分别用来定位和连接所述第一芯片和所述第二芯片,相应地,所述L形路径是从第一导电表面延伸出来的导电电路路径。
作为上述的半导体封装的一个更加优选实施方式,所述的第一芯片和第二芯片都是MOSFET器件,它们的底表面分别漏接触,他们的顶部表面分别为金属源接触和金属栅接触,以立体匹配电连接方式连接第二芯片的金属源接触区和第一芯片的漏接触区,不需要倒装晶片工艺。MOSFET的栅通过互联线或互联板连接电路基底。
本发明还提供了一种有效连接多个、独立和三维互联板的方法,每个都是设定好尺寸设置在具有一对连接半导体顶部的匹配电路基底上,该方法包括:
a)制作一个多板载体框,具有多个互联板完整的支撑和多个临时支撑成分;
b)通过破坏临时支撑成分将独立的互联板从多个载体框中分离出来;
c)将每个互联板设置在设配电路基底上;每个互联板进一步包括一个从半导体芯片顶部到中间接触区的互联板,其中的中间接触区包括从其他半导体芯片底部延伸出来的L形电路路径。
作为上述的制作方法的一个改进实施方式,制作多板载体边框进一步包括用一个样板刀三维制作互联板。
作为上述的制作方法的一个优选实施方式,分开多板载体边框还包括用冲孔工具将其分开。
作为上述的制作方法的一个优选实施方式,分开多板载体框还包括分开每个电路基底上的相互独立的互联板,于此同时将独立互联板从多板载体边框中分开。
作为上述的制作方法的一个优选实施方式,将每个互联板设置到匹配电路基底上的同时用多个顶部支撑板。
作为上述方法的一个优选实施方式,进一步包括封装至少电路基底的一部分,多个半导体芯片和互联板。
本发明的这些方面、他们的很多实施例以及本发明描述的其他部分将给本领域技术人员做进一步说明。
本发明的半导体封装减少了芯片横向边缘之间的直接横向电路路径的内部芯片间距。
附图说明
参考所附附图,以更加充分的描述本发明的实施例。然而,所附附图仅用于说明和阐述,并不构成对本发明范围的限制。
图1是一组相连的低压(low-side,LS)和高压(high-side,HS)功率MOSFET电路结构图;
图2是现有技术同封装半导体芯片引线框,本发明中的LS和HS功率MOSFET的互联键合线与之对应;
图3A是本发明在引线框中的同封装半导体芯片,用立体匹配互联板进行LS和HS功率MOSFET互联;
图3B是图3A的透视图;
图4是本发明同封装半导体芯片在引线框中对应的LS和HS功率MOSFET用立体匹配互联板进行全封装互联。
图5和图3B相同,除了每个立体匹配互联板还包括微凹形用来连接对应的顶部金属接触区;
图6A与图3A相同,但是去掉了立体连接板和互联线,更清楚的看到L形路线和引线框的中间接触区;
图6B是多板载体框架用来有效的将多个、分离的和三维成型立体连接板连接到上面有连接的半导体芯片的适配电路基底上。
图6C是顶视图,用来说明用图6B中多板载体边框连接立体互联板;
图6D是图6C的透视图,使半导体芯片和立体互联板浮在上面,露出引线框,半导体芯片和立体匹配互联板。
具体实施方式
上述和下述之说明以及附图仅仅用于集中描述本发明的一个或多个实施例以及若干可选功能和/或可选实施例。这些描述和附图仅做阐述之用而非限制本发明。因此,本领域的技术人员可以轻易的对本发明作出修改、变形和替换。然而这些修改、变形和替换应该认为仍落在本发明的范围之内。
图1是一组相连的低压(low-side,LS)和高压(high-side,HS)功率MOSFET电路结构图。低压(LS)的源1a接地,一般情况下,高压(HS)的漏极2c直接或间接的与电源正极相连。低压(LS)漏极1c与高压(HS)源极2c连接。本领域的技术人员知道,通常选择性的给低压(LS)的栅极1b和高压(HS)的栅极2b加高压使低压(LS)MOSFET1和高压(HS)MOSFET2导通,这样的拓扑结构存在于很多整流器和调节器中。
低压(LS)MOSFET 1和高压(HS)MOSFET 2制造简单并且成本低,与之对应的相关制造半导体芯片,器件的漏极接触通常位于底部衬底表面,其源极接触通常占据衬底顶部表面,其栅极接触占据衬底顶部表面的一小部分。这样,没有复杂昂贵的倒装芯片工艺,图2描述了已有技术中,对于低压(LS)MOSFET 1和高压(HS)MOSFET 2的半导体封装5的顶视图,如图,分别为低压(LS)芯片10和高压(HS)芯片20、引线框8,因此,LS芯片10设有一个LS芯片顶部金属源极接触区10a,一个LS芯片顶部金属栅极接触区10b和一个LS芯片底部金属漏极接触区10c,类似的,HS芯片设有一个HS芯片顶部金属源极接触区20a,一个HS芯片顶部金属栅极接触区20b和一个HS芯片底部金属漏极接触区20c。注意LS芯片10的边缘分别为第一LS芯片纵向边缘11,第二LS芯片纵向边缘13,第一LS芯片横向边缘12和第二LS芯片横向边缘14,类似的,HS芯片20的边缘分别为第一HS芯片纵向边缘21,第二HS芯片纵向边缘23,第一HS芯片横向边缘22和第二HS芯片横向边缘24。引线框8包括大量的物理和电学上分离的引线部分8a,8b(进一步包括8f),8c,8d和8e。引线部分8a-8e可能但不是必需是共面。底部表面,例如,LS芯片10和HS芯片20的漏极接触区分别电连接到引线部分8a和引线部分8b。LS芯片顶部金属源极接触区10a通过横向LS终端连接线16连接引线部分8e,LS芯片顶部金属栅极接触区10b通过横向连接线9a连接引线部分8c。HS芯片顶部金属栅极接触区20b通过纵向连接线9b连接引线部分8d。LS芯片底部金属漏极接触区10c电连接到引线部分8a的顶部表面,横向LS-HS互联线18,连接引线部分8a和HS芯片顶部金属源极接触区20a,从而是实现LS芯片底部金属漏极接触区10c和HS芯片顶部金属源极接触区20a之间所需的连接,最后用密封材料6封装部分或整个的LS芯片10和HS芯片20,仅露出引线部分8ah8f外围部分用于外部的连接。
和封装有关的一个重要参数为内部芯片间距IDA,它是指第二LS芯片纵向边缘13和第一LS芯片横向边缘12。内部芯片间距IDA制约了已有技术中半导体封装5的横向方向的最小封装尺寸。对于给定的封装尺寸,内部芯片间距IDA限制了芯片的尺寸,因而增加了器件的导通电阻。下面已有的基本参数限定了内部芯片间距IDA的对应的基本最小值:
最小横向芯片-引线框边缘A1,是指第二LS芯片纵向边缘13和其最近的引线框部分8a纵向边缘之间的横向间距。
最小横向芯片-引线框边缘A2,是指第一HS芯片纵向边缘21和其最近的引线框部分8b纵向边缘之间的横向间距。
最小横向引线框-引线框间距A3,是指引线框部分8a和引线框部分8b之间的横向间距。
关系:
IDA~A1+A+A3,
横向LS-HS互连线18的实施使得横向芯片-引线框边缘A1和横向引线框-引线框间距A3大于他们各自的基本最小值,因为产品设备的互连线对于地互连端规定了更高的横向芯片-引线框边缘A1,对于最小需要的互联环支撑物规定了更大的横向引线框-引线框间距A3。
为了减小内部芯片间距IDA,从而相应减小现有技术中半导体封装5沿横向方向的尺寸,图3A和其透视图图3B描述了本发明带有一个内部芯片间距IDB的半导体封装50。图2所示的横向LS-HS互联线18被一个立体匹配电连接所取代,该电连接用来连接HS芯片顶部金属源极20a和LS芯片底部金属漏极10c,这样方便适应20a和10c表面之间的立体差。具体来说,立体匹配电连接包含如下:
一个L形引线框路径54是引线部分8a的一部分,因为电路径是从LS芯片底部金属漏极接触区10c到引线框部分8a上面的裸露的中间接触区52。L形引线框路径54从靠近第二LS芯片横向边缘14的第二LS芯片纵向边缘13横向延伸出来,使中间接触区52靠近第二HS芯片横向边缘24。
一个立体互联板56以中间接触区52连接HS芯片顶部金属源极20a,立体互联板56进一步三维结构连接从而适应20a和52表面立体差。
下面是规定内部芯片间距IDB基本最小值的基本参数:
最小横向芯片-引线框边缘B1,是指第二LS芯片纵向边缘13和其最近的引线部分8a的纵向边缘之间的间距。
最小横向芯片-引线框边缘B2,是指第一HS芯片纵向边缘21和其最近的引线部分8a的纵向边缘之间的间距。
最小横向引线边框-引线边框之间的间距B3,是指引线边框部分8a和引线边框部分8b之间的横向间距。
其关系为:
IDB=B1+B2+B3,
L形引线框路径54和立体互联板56不再需要横向芯片-引线框边缘B1和横向引线框-引线框B3间距大于他们各自的基本最小值,因而本发明有效的减小了内部芯片间距,如下:
IDB<IDA
减小的内部芯片间距IDB使元件包装尺寸减小,二者取其一,对于相同的封装尺寸,LS芯片10和HS芯片20可以做大,从而减小导通电阻。
进一步注意到,将中间接触区52靠近HS芯片横向边缘24,引线框8a的L形引线框路径54起重要的作用,由于本发明减小了内部芯片间距和相应的第二LS芯片纵向边缘13和第一HS芯片纵向边缘21之间的横向电路路径的半导体封装尺寸。同样的,已有半导体封装技术中的横向LS终端连线16也被本发明半导体封装50中的立体互联板58所代替,具有减小寄生阻抗的优点,所述的代替不是本发明减小内部芯片的主要部分。用互联板56取代图2中的连线18减小了高压芯片20和低压芯片10之间的感应系数。
图4描述了本发明半导体封装50的另一个实施例,除了立体板56和58,其余的封装互联也是用立体互联板来完成。具体来讲,一个立体互联板60用来连接LS芯片顶部金属栅极接触区10b和引线框8c,一个立体互联板62用来连接HS芯片顶部金属栅极接触区20b到引线框8d。本领域的技术人员现在应该更清楚的知道,立体互联板56和立体互联板58还包括一个桥部分,桥部分任何一侧的谷部分,谷部分、桥部分或平面之间连接部分的任何一侧平面部分,US Application 11、906,136中有进一步详述。本发明的半导体封装50可以大部分封装于密封材料6中,仅留下互联板的桥部分用来散热。同样的,如图5所描述的,立体互联板56和58其中一个或者都可以进一步包括接触凹点70和72用来分别连接LS芯片顶部金属源接触区10a和HS芯片顶部金属源接触区20a,US Application 11/799,467有进一步的描述。
图6A和图3A相同,只是移去了立体互联板56、58和连线9a、9b,从而更清楚的显示L型引线框路径54和引线框8a中间接触区52,为了避免多余模糊的细节,这里没有显示引线框8a和8b上的用于设置连接LS芯片10和HS芯片20的大量的芯片垫。
现在本技术领域的技术人员应该知道,一般而言,引线框8可以在本发明半导体封装范围内被大量其他种类的电路基底所取代,例如,印刷电路板可以取代引线框8。印刷电路板可以包括一个绝缘衬底,一个导电表面和一个导电表面分别用于设置和连接LS芯片10和HS芯片20。相应地,L型引线框路径54由导电表面延伸出来的一个导电电路路径构成。
图6B到图6D描述了一个多板载体边框73和与此相关的有效连接多个,单个和三维的立体互联板56、58、60和62到上面有半导体芯片的匹配电路基底上。这样,匹配电路基底为引线框8,设置在上面的半导体芯片为LS芯片10和HS芯片20。
如图6B所示,一个多板载体边框73由多个互联板56、58、60和62、大量集成连接杆74和76构成,更为细化,互联板可进一步与其他连接棒相互连接,制作多板载体边框73进一步包括上面的三维成形互联板,接着,用插枝连接杆74和76将独立的互联板56、58、60和62从多板载体边框73中隔离。可以通过冲压工具将其分开,然后每个互联板可以用真空工具将其定位在适配电路基底上,细化工艺步骤,互联板可独立和同时附着在匹配电路基底上。另外一个工艺细化,每个电路基底上的独立互联板可以左置放置在一起分开多板载体边框,然后将每个互联板设置到适配的电路基底后,每个电路基底上的单个互联板相互分开。最后,匹配电路基底和其封装半导体芯片、互联板用模塑料封装。
在本发明的内容中,每个互联板进一步包括半导体芯片顶部到中间接触区的互联板连接部分,中间接触区包括L形由从其他半导体芯片下面延伸出来的电路路径。图6c是顶视图描述用图6B的多板载体边框连接的多个立体互联板56、58、60和62,图6D是图6C的透视图,将半导体芯片10,20和立体互联板56,58,60和62向上浮动进一步露出边框8、半导体芯片、L形边框路径54和立体互联板。
现在本领域的技术人员应该了解,所描述的许多实例通过简单的修改也可用到其他具体应用上,虽然上面的描述了很多特征,但是其特征并不构成对本发明范围的限制。仅仅是提供本发明相关实例的说明。例如,本发明半导体封装系统预期用到各种各样的半导体芯片上,而不仅仅是本发明所描述的金属氧化物半导体(MOSFET)芯片中。
在描述和图形中,参照具体的结构给出了大量的实施例。本技术领域的技术人员应该知道本发明可以应用到其他实施方式上,并且其他实施方式的实施不需要再经过试验。本专利文献的目的在于本发明的范围不仅仅限于上述描述的具体实施例,而是为了说明以下权利要求,在权利要求范围内,对等值含义和范围做出的部分或全部修改,都被认为包含在本发明的精神和范围内。

Claims (23)

1、一种半导体封装,其特征在于,包括:
一个电路基底;
多个半导体芯片,所述半导体芯片的底部表面与上面的电路基底是电连接,所述半导体芯片进一步包括:
第一芯片的边界为第一芯片第一纵向边缘和第一芯片第二纵向边缘,另外加上第一芯片第一横向边缘和第一芯片第二横向边缘;
第二芯片的边界为第二芯片第一纵向边缘和第二芯片第二纵向边缘,另外加上第二芯片第一横向边缘和第二芯片第二横向边缘;
所述第一芯片和第二芯片位置邻近并且是独立的,沿着它们各自第一芯片第二纵向边缘和第一芯片第一纵向边缘,设有内部芯片间距;
一个立体匹配电连接,连接第二芯片表面上的顶部金属接触区和第二芯片底部表面,用来适配表面之间的差异,所述立体匹配电连接进一步包括:
a)一个电路路径方式,该路径是电路基底的一部分,作为第一芯片的底部表面到电路基底上的中间接触区的电路径,所述的电路径方式由L形路径从第一芯片第二横向边缘靠近第一芯片第二纵向边缘的位置横向延伸,将中间接触区靠近第二芯片第二横向边缘;
b)一个互联板连接第二芯片顶部金属接触区和中间接触区,所述中间接触为三维的,用来适配接触区之间的立体高度差;
因而,半导体封装减少了第一芯片第二纵向边缘和第二芯片第一纵向边缘之间的横向电路路径的内部芯片间距。
2、根据权利要求1所述的半导体封装,其特征在于,所述互联板还包括一个桥部分,设置在桥部分两边的谷部分,设置在谷部分、桥部分或平面之间连接部分两边的平面部分。
3、根据权利要求1所述的半导体封装,其特征在于,所述互联板还包括用来与顶部金属接触区接触的凹点。
4、根据权利要求1所述的半导体封装,其特征在于,至少有一个所述第一芯片和第二芯片还包括至少一个额外的顶部金属接触区,相应地,半导体封装还包括一个额外的互联板连接额外顶部金属接触区和电路基底,该互联板是三维的用来适配他们之间存在的立体高度差。
5、根据权利要求1所述的半导体封装,其特征在于,所述电路基底是一个引线框,该引线框还包括第一芯片垫和第二芯片垫用来分别定位和连接所述的第一芯片和所述的第二芯片,相对应的,所述L形路径是所述第一芯片垫的延伸。
6、根据权利要求5所述的半导体封装,其特征在于,用互联板将第一芯片上表面的顶部金属接触区与引线框引脚电连接。
7、根据权利要求6所述的半导体封装,其特征在于,还包括一个模塑料,所述半导体封装大部分封装在模塑料中,第一芯片上面的互联板顶部表面露出模塑料用来散热。
8、根据权利要求7所述的半导体封装,其特征在于,第一芯片上面的互联板还包括一个桥部分,设置在桥部分两边的谷部分,设置在谷部分、桥部分或平面之间连接部分两边的平面部分,互联板裸露的顶部表面为桥部分一个部分。
9、根据权利要求7所述的半导体封装,其特征在于,所述电路基底是印刷电路板,还包括绝缘衬底,第一导电表面和第一导电表面2分别用来定位和连接所述第一芯片和所述第二芯片,相应地,所述L形路径是从第一导电表面延伸出来的导电电路路径。
10、根据权利要求1所述的半导体封装,其特征在于,所述的第一芯片和第二芯片都是MOSFET器件,它们的底表面分别漏接触,他们的顶部表面分别为金属源接触和金属栅接触,立体匹配电连接连接第二芯片的金属源接触区和第一芯片的漏接触区,不需要倒装晶片工艺。
11、根据权利要求10所述的半导体封装,其特征在于,所述第一芯片是低压金属氧化物半导体场效应晶体管(MOSFET)器件,所述第二芯片是高压金属氧化物半导体场效应晶体管(MOSFET)器件
12、根据权利要求10所述的半导体封装,其特征在于,所述MOSFET的栅通过互联线连接电路基底。
13、根据权利要求10所述的半导体封装,其特征在于,所述MOSFET的栅通过互联板连接电路基底。
14、根据权利要求1所述的半导体封装,其特征在于,所述第一芯片表面上的顶部金属接触区通过互联板连接电路基底。
15、根据权利要求1所述的半导体封装,其特征在于,还包括一个模塑料覆盖至少电路基底的一个部分,多种半导体芯片和立体匹配电连接。
16、一种有效连接多个、独立和三维互联板的方法,每个都是设定好尺寸设置在具有一对连接半导体顶部的匹配电路基底上,该方法包括:
a)制作一个多板载体框,具有多个互联板完整的支撑和多个临时支撑成分;
b)通过破坏临时支撑成分将独立的互联板从多个载体框中分离出来;
c)将每个互联板设置在设配电路基底上;其特征在于,
每个互联板进一步包括一个从半导体芯片顶部到中间接触区的互联板,其中的中间接触区包括从其他半导体芯片底部延伸出来的L形电路路径。
17、根据权利要求16所述的方法,其特征在于,制作多板载体边框还包括用至少一个集成临时支撑成分连接至少一对相互连接的互联板。
18、根据权利要求16所述的方法,其特征在于,在连接每个互联板中还包括同时连接所有互联板。
19、根据权利要求16所述的方法,其特征在于,分开多个引线边框包括使每个连接在一起的电路基底独立;进一步包括,步骤c),d)之后分开每个电路基底的独立的互联板。
20、根据权利要求16所述的方法,其特征在于,分开多板载体框还包括分开每个电路基底上的相互独立的互联板。
21、根据权利要求16所述的方法,其特征在于,制作多板载体边框进一步包括用一个样板刀三维制作互联板。
22、根据权利要求16所述的方法,其特征在于,分开多板载体边框还包括用冲孔工具将其分开。
23、根据权利要求16所述的方法,其特征在于,还包括:
e)封装至少电路基底的一部分,多个半导体芯片和互联板。
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CN112992819B (zh) * 2021-04-26 2022-03-18 佛山市国星光电股份有限公司 一种封装器件及其制作方法

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