CN101604120B - Photosensitive composition - Google Patents
Photosensitive composition Download PDFInfo
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- CN101604120B CN101604120B CN200910159562.XA CN200910159562A CN101604120B CN 101604120 B CN101604120 B CN 101604120B CN 200910159562 A CN200910159562 A CN 200910159562A CN 101604120 B CN101604120 B CN 101604120B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Abstract
Photosensitive composition, it comprises pigment (A), adhesive resin (B), photopolymerizable compound (C), Photoepolymerizationinitiater initiater (D) and solvent (E), and pigment (A) is the pigment comprising C.I. paratonere 177, C.I. paratonere 242 and C.I. paratonere 254, in whole pigment, the content of C.I. paratonere 242 is less than 60 % by weight.
Description
Technical field
The present invention relates to photosensitive composition.
Background technology
The transparent painted fine pattern that the color filter used in colour liquid crystal display device, colour TV camera etc. normally forms 3 looks such as red (R), green (G) and blue (B) on the opaque substrate of transparency carrier or the silicon etc. such as glass manufactures.Transparent painted fine pattern comprises photosensitive composition, mixes colours according to the kind of pigment contained in photosensitive composition and content.
Such as, Patent Document 1 discloses containing C.I. paratonere 177 and C.I. paratonere 242, in whole pigment, the content of C.I. paratonere 242 is the photosensitive composition of 65 ~ 90 % by weight.
[patent documentation 1]: No. 3924872nd, Japanese Patent
Summary of the invention
The photosensitive composition of the red pixel and color filter that can manufacture high-contrast is expected.
The present invention is photosensitive composition, it comprises pigment (A), adhesive resin (B), photopolymerizable compound (C), Photoepolymerizationinitiater initiater (D) and solvent (E), and pigment (A) is the pigment comprising C.I. paratonere 177, C.I. paratonere 242 and C.I. paratonere 254, in whole pigment, the content of C.I. paratonere 242 is less than 60 % by weight.
In addition, above-mentioned photosensitive composition of the present invention, in whole pigment, the content of C.I. paratonere 242 is less than 50 % by weight.
In addition, above-mentioned photosensitive composition of the present invention, in whole pigment, the content of C.I. paratonere 242 is less than 35 % by weight.
In addition, above-mentioned photosensitive composition of the present invention, in whole pigment, the content of C.I. paratonere 254 is less than 80 % by weight.
In addition, above-mentioned photosensitive composition of the present invention, in whole pigment, the content of C.I. paratonere 254 is less than 50 % by weight.
In addition, the present invention is the pixel using above-mentioned photosensitive composition to be formed.
In addition, the present invention is the color filter containing above-mentioned pixel.
Embodiment
Photosensitive composition of the present invention comprises pigment (A), adhesive resin (B), photopolymerizable compound (C), Photoepolymerizationinitiater initiater (D) and solvent (E), and pigment (A) is the pigment comprising C.I. paratonere 177, C.I. paratonere 242 and C.I. paratonere 254, in whole pigment, the content of C.I. paratonere 242 is less than 60 % by weight.
The content of the C.I. paratonere 242 in whole pigment is preferably less than 50 % by weight, is more preferably less than 35 % by weight.In addition, be also preferably more than 5 % by weight, be more preferably more than 15 % by weight.As long as the C.I. above-mentioned scope of the content of paratonere 242, brightness and the high red pixel of colour purity just can be formed.
The content of the C.I. paratonere 177 in whole pigment is preferably more than 5 % by weight, is more preferably more than 10 % by weight.In addition, be also preferably less than 95 % by weight, be more preferably less than 85 % by weight.As long as the C.I. above-mentioned scope of the content of paratonere 177, brightness and the high red pixel of colour purity just can be formed.
The content of the C.I. paratonere 254 in whole pigment is preferably less than 80 % by weight, is more preferably less than 50 % by weight, and more preferably less than 40 % by weight.In addition, be also preferably more than 5 % by weight, be more preferably more than 20 % by weight.As long as the C.I. above-mentioned scope of the content of paratonere 254, the foreign matter that sweat effluent produces will tail off.
In addition, pigment (A) also can containing any pigment as toner pigment.
As red pigment, C.I. Pigment Red 9,97,105,122,123,144,149,166,168,176,180,192,209,215,216,224,255,264,265 etc. can be listed.These red pigments can individually use, and also can combine two or more and use.
As blue pigment, C.I. pigment blue 15 can be listed: 3,15:4,76 etc., preferably can list C.I. pigment blue 15: 3,15:4 and 76, more preferably can list C.I. pigment blue 15: 3.These blue pigments can individually use, and also can combine two or more and use.
As yellow uitramarine, C.I. pigment yellow 2,10,13,20,24,31,53,55,83,86,93,94,109,110,117,125,137,138,139,147,148,150,151,153,154,166,173,180 or 185 etc. can be listed, preferably can list C.I. pigment yellow 83,139,150.These yellow uitramarines can individually use, and also can combine two or more and use.
Further, as toning use, C.I. pigment green 36 or C.I. pigment Green 7 can also be added in these pigment.
The content of pigment (A) with the solid state component total amount in photosensitive composition for benchmark, be generally more than 10 % by weight, less than 60 % by weight, be preferably more than 10 % by weight, less than 55 % by weight, be more preferably more than 15 % by weight, less than 50 % by weight.If the content of pigment (A) is above-mentioned scope, then the color depth when making color filter is abundant, and can contain the binder polymer of necessary amount in the composition, therefore can form the sufficient pattern of physical strength.
Adhesive resin (B) preferably has alkali-solubility.In addition, adhesive resin (B) plays the effect of the dispersion medium of pigment (A).Aforementioned binder resin (B) preferably comprises the multipolymer of the structural unit derived from unsaturated carboxylic acid.
As the aforementioned structural unit derived from unsaturated carboxylic acid, the structural unit of derived from propylene acid and the structural unit derived from methacrylic acid can be listed particularly.Acrylic acid and methacrylic acid can individually use, or combinationally use 2.In addition, except these acrylic acid and methacrylic acid, can also and with being selected from other unsaturated carboxylic acid and at least a kind of carboxylic acid of unsaturated carboxylic acid anhydrides such as crotonic acid, itaconic acid, maleic acid, fumaric acid.In addition, can also also with the monomer containing hydroxyl and carboxyl in same a part that α-(methylol) acrylic acid is such.
Aforementioned binder resin (B) preferably comprises the multipolymer of following structural unit, this structural unit comprises the above-mentioned structural unit derived from unsaturated carboxylic acid, and can with the structural unit of the above-mentioned structural unit copolymerization derived from unsaturated carboxylic acid.As can with the structural unit of the above-mentioned structural unit copolymerization derived from unsaturated carboxylic acid, preferably can list the structural unit derived from (methyl) acrylate.
Acrylate compounds can be listed as (methyl) acrylate, particularly, not replacing or substituted alkyl ester of the such unsaturated carboxylic acid of (methyl) methyl acrylate, (methyl) ethyl acrylate, (methyl) butyl acrylate, (methyl) benzyl acrylate, (methyl) HEA and (methyl) acrylic-amino ethyl ester can be listed;
(methyl) acrylic acid cyclopentyl ester, (methyl) cyclohexyl acrylate, (methyl) acrylic acid methylcyclohexyl ester, (methyl) acrylic acid suberyl ester, (methyl) acrylic acid ring octyl group ester, (methyl) acrylic acid
(menthyl) ester, (methyl) acrylic acid cyclopentenyl ester, (methyl) cyclohexenyl ester, (methyl) acrylic acid cycloheptenyl ester, (methyl) acrylic acid cyclooctene base ester, (methyl) acrylic acid
dialkylene ester, (methyl) isobornyl acrylate, (methyl) acrylic acid pinane base ester, (methyl) acrylic acid three ring decyl ester, (methyl) acrylic acid three ring oxygen in last of the ten Heavenly stems base ethyl ester, (methyl) acrylic acid adamantane esters, (methyl) acrylic acid norborene ester, (methyl) acrylic acid pinane alkenyl esters, the ester containing alicyclic group of (methyl) acrylic acid dicyclopentenyloxyethyl methacrylate and the such unsaturated carboxylic acid of (methyl) acrylic acid dicyclo amylene oxygen base ethyl ester,
The unsaturated carboxylic acid glycidyl esters that (methyl) glycidyl acrylate is such;
The unsaturated carboxylic acid oxetane that (methyl) acrylic acid oxetane is such;
Single saturated carboxylic acid ester etc. of the glycols that oligoethylene glycol monoalkyl (methyl) acrylate is such, preferably can list (methyl) acrylic acid methyl, (methyl) benzyl acrylate.Here, (methyl) acrylate represents acrylate or methacrylate.
Adhesive resin (B) can also further containing can with other structural unit of unsaturated carboxylic acid and acrylic ester copolymer.As can with other structural unit of unsaturated carboxylic acid and acrylic ester copolymer, the aromatic ethenyl compound that styrene, α-methyl styrene and vinyltoluene are such can be listed;
Vinyl acetate and the such vinyl carboxylates of propionate;
(methyl) vinyl cyanide and the such vinyl cyanide based compound of α-chloroacrylonitrile;
Derived from the structural unit etc. of the such imide compound of N-phenylmaleimide.
These compounds above-mentioned can individually use, and also can combine two or more and use.
As can with the structural unit of the structural unit copolymerization derived from unsaturated carboxylic acid, be preferably derived from the structural unit of (methyl) acrylate, particularly preferably do not replace or structural unit of substituted alkyl ester and (methyl) acrylic acid ester containing alicyclic hydrocarbon radical derived from (methyl) is acrylic acid.
In adhesive resin (B), derived from the structural unit of unsaturated carboxylic acid in the entire infrastructure unit of aforementioned copolymer, in mass fraction, usually exist for 10 ~ 50 quality %, be preferably 15 ~ 40 quality %.If be 10 ~ 50 quality % derived from the structural unit of unsaturated carboxylic acid with aforementioned benchmark, then abundant to the dissolubility of developer solution, therefore residue can not be produced on the substrate in unexposed portion, and during development, there is not the film loss of the pixel portion in exposure portion, pixel entirety is not peeled off, so preferably.
Copolymerization uses polymerization initiator to carry out in a solvent usually.As polymerization initiator, such as 2 can be listed, 2 '-azobis isobutyronitrile or 2, the azo-compound that 2 '-azo two (2 Methylpropionic acid methyl esters) is such.Benzoyl peroxide or the such superoxide etc. of tert-butyl peroxide.In addition, as long as solvent can dissolve each monomer, the diol alcohol esters etc. that such as ethylene glycol monomethyl ether acetic acid ester, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monoethyl acetic acid esters are such can be listed.Temperature of reaction can consider that the decomposition temperature of polymerization initiator or the boiling point etc. of solvent and monomer decide.In addition, the side chain apparatus of the multipolymer obtained like this there is the compound modified of photonasty group, also can form photosensitive adhesive resin (B).Now, the catalyzer for introducing photonasty group in resin can be added.As catalyzer, such as three-dimethylaminomethyl phenol can be listed.In addition, the adjuvant for preventing subsidiary reaction can also be added.Such as quinhydrones can be listed as adjuvant.
The weight-average molecular weight of the polystyrene conversion of adhesive resin (B) is preferably 5,000 ~ 100,000, is more preferably 7,000 ~ 50,000.If the weight-average molecular weight of the polystyrene conversion of adhesive resin (B) is 5,000 ~ 100,000, be then difficult to when there is development film loss occurs, and the trend that during development, the removal of non-pixel portion is good, so preferably.
Adhesive resin (B), relative to the solid state component total amount in photosensitive composition, usually containing 5 ~ 90 quality %, is preferably 10 ~ 70 quality %.If the content of aforementioned binder resin (B) counts 5 ~ 90 quality % with aforementioned basic, then exist the dissolubility of developer solution abundant, the substrate of non-pixel portion is difficult to produce development residue, and during development, be difficult to the film loss of the pixel portion that exposure portion occurs, the trend that the removal of non-pixel portion is good, so preferably.
Photopolymerizable compound (C) contained in photosensitive composition of the present invention is the compound being caused polymerization by light and Photoepolymerizationinitiater initiater (D), such as, be the compound with carbon-to-carbon unsaturated bond.As foregoing photo-polymerization compound (C), monofunctional monomer, 2 functional monomers can be listed, other polyfunctional monomer.
As the object lesson of monofunctional monomer, nonyl phenyl carbitol acrylate, 2-hydroxyl-3-phenoxypropylacrylate, 2-ethylhexyl carbitol acrylate, HEA, NVP etc. can be listed.
In addition, as the object lesson of 2 functional monomers, two (acryloyl-oxyethyl) ether, 3-methyl pentanediol two (methyl) acrylate, Tricyclodecane Dimethanol two (methyl) acrylate etc. of 1,6-hexanediol two (methyl) acrylate, ethylene glycol bisthioglycolate (methyl) acrylate, neopentyl glycol two (methyl) acrylate, triethylene glycol two (methyl) acrylate, bisphenol-A can be listed.
As the object lesson of other polyfunctional monomer, trimethylolpropane tris (methyl) acrylate, pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate, three (methacryloxyethyl) chlorinated isocyanurates etc. can be listed.
As foregoing photo-polymerization compound (C), particularly preferably there is acryloyl group (CH
2=CHCO-), and the compound that the acryloyl group quantity of the compound of per unit weight is many, namely; represent with the grams of the compound of the acryloyl group of every 1 equivalent; the compound that acryloyl group equivalent is few, wherein, preferred acryloyl group equivalent is the compound of less than 100.If acryloyl group when quantitative change large, then when exposure or development, susceptibility is not enough, and the throughput rate sometimes involving color filter reduces.Be the monomer of less than 100 as acryloyl group equivalent; glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, dipentaerythritol acrylate etc. can be listed, preferably can list trimethylolpropane triacrylate, tetramethylol methane tetraacrylate or dipentaerythritol acrylate etc.In addition, as photopolymerizable compound (C), preferably 2 functional monomers, other polyfunctional monomer.
The content of photopolymerizable compound (C) relative to add up in photosensitive composition 100 mass parts adhesive resin (B) and photopolymerizable compound (C), be generally 1 ~ 60 mass parts, be preferably 5 ~ 50 mass parts.If the content of photopolymerizable compound (C) is aforementioned range, then the intensity in pixel portion, pattern form or flatness exist and become good trend, so preferably.
As optical polymerism initiating agent (D), the living radical producing living radical by irradiating light can be listed and produce agent, acidic acid producing agent.Produce agent as living radical, such as acetophenones Photoepolymerizationinitiater initiater, styrax class Photoepolymerizationinitiater initiater, triazines Photoepolymerizationinitiater initiater, benzophenone Photoepolymerizationinitiater initiater and oximes Photoepolymerizationinitiater initiater etc. can be listed.
As acetophenones Photoepolymerizationinitiater initiater, the oligomer etc. of such as 2-methyl-2-morpholino-1-(4-methylthiophenyi) third-1-ketone, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenyl third-1-ketone, benzyl dimethyl ketal, 2-hydroxy-2-methyl-1-[4-(2-hydroxyl-oxethyl) phenyl] the third-1-ketone, 1-hydroxycyclohexylphenylketone, 2-benzyl-2-dimethylamino-1-(4-morphlinophenyl) fourth-1-ketone, 2-hydroxy-2-methyl-1-[4-(1-methyl ethylene) phenyl]-propyl-1-ketone can be listed.
As styrax class Photoepolymerizationinitiater initiater, such as styrax, styrax methyl ether, styrax ethylether, benzoin isobutyl propyl group ether, benzoin isobutyl butyl ether etc. can be listed.
As triazines Photoepolymerizationinitiater initiater, such as 2 can be listed, two (the trichloromethyl)-6-(4-methoxyphenyl)-1 of 4-, 3, 5-triazine, 2, two (the trichloromethyl)-6-(4-methoxyl naphthyl)-1 of 4-, 3, 5-triazine, 2, two (the trichloromethyl)-6-piperonyl-1 of 4-, 3, 5-triazine, 2, two (the trichloromethyl)-6-(4-methoxyl-styrene)-1 of 4-, 3, 5-triazine, 2, two (trichloromethyl the base)-6-[2-(5-methylfuran-2-base) vinyl]-1 of 4-, 3, 5-triazine, 2, two (the trichloromethyl)-6-[2-(furans-2-base) vinyl]-1 of 4-, 3, 5-triazine, 2, two (trichloromethyl the base)-6-[2-(4-diethylamino-2-aminomethyl phenyl) vinyl]-1 of 4-, 3, 5-triazine, 2, two (trichloromethyl)-6-[2-(3 of 4-, 4-Dimethoxyphenyl) vinyl]-1, 3, 5-triazine etc.
As benzophenone Photoepolymerizationinitiater initiater; such as benzophenone, o-benzoyl methyl benzoate, 4-phenyl benzophenone, 4-benzoyl-4 can be listed '-dimethyl diphenyl sulfide, 3; 3 '; 4; 4 '-four (tert-butyl hydroperoxide carbonyl) benzophenone, 2; 4,6-tri-methyl benzophenone etc.
As oxime compound, such as O-acyl group oxime compound can be listed, as the example that it is concrete, 1-(4-phenyl sulfonyl-phenyl)-Ding-1 can be listed, 2-diketone 2-oxime-O-benzoic ether, 1-(4-phenyl sulfonyl-phenyl)-Xin-1, 2-diketone 2-oxime-O-benzoic ether, 1-[9-ethyl-6-(2-methyl benzoyl)-9H-carbazole-3-base] ethane 1-O-acetic acid esters, 1-[9-ethyl-6-(2-methyl-4-(3, 3-dimethyl-2, 4-dioxolyl methyl oxygen base) benzoyl)-9H-carbazole-3-base] ethane 1-O-acetic acid esters etc.
Agent is produced as the living radical beyond previous example; such as 2 can be listed; 4; 6-trimethyl benzoyl diphenyl base phosphine oxide, 2,2 '-bis-(o-chlorophenyl)-4,4 '; 5; 5 '-tetraphenyl-1,2 '-bisglyoxaline, 10-butyl-2-chloro acridone, 2-EAQ, dibenzoyl, 9,10-phenanthrenequione, camphorquinone, phenylglyoxalates methyl esters, two cyclopentadiene titanium compounds etc.
As acid producing agent, salt or nitrobenzyl tosylate class, the styrax toluenesulfonic acid salts etc. such as the such as p-toluene sulfonate of 4-hydroxy phenyl dimethyl sulfonium, 4-hydroxy phenyl dimethyl sulfonium antimony hexafluoride hydrochlorate, 4-acetoxyl group phenyl dimethyl sulfonium tosilate, 4-acetoxyl group phenyl-Methyl-benzvl sulfonium hexafluoro antimonate, triphenylsulfonium tosilate, triphenylsulfonium antimony hexafluoride hydrochlorate, diphenyl iodine tosilate, diphenyl iodine hexafluoro antimonate can be listed.
In addition, produce in the above-claimed cpd of agent as living radical, can be the compound simultaneously producing living radical and acid, such as, triazines Photoepolymerizationinitiater initiater isoreactivity free-radical generating agent also can use as acid producing agent.
These Photoepolymerizationinitiater initiaters (D) can individually use, and also can combine two or more and use.
Photoepolymerizationinitiater initiater (D) also combined light polymerization can cause auxiliary agent use.Auxiliary agent is caused, preferred amines compound, containing the compound of mercapto and carboxylic acid compound, in addition, as amines more preferably aromatic amines compound as foregoing photo-polymerization.
As amines, the aliphatic amine compound such as triethanolamine, methyldiethanolamine, triisopropanolamine can be listed; 4-dimethylaminobenzoic acid methyl esters, EDMAB, 4-dimethylaminobenzoic acid isopentyl ester, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethyl aminoethyl ester, N, N-dimethyl-p-toluidine, 4, the aromatic amines compounds such as 4 '-bis-(dimethylamino) benzophenone (so-called michaelis ketone (Michler ' sketone)), 4,4 '-bis-(diethylamino) benzophenone.
Compound containing mercapto is the compound in the molecule with mercapto, as the mercaptan compound containing 1 mercapto, can list 2-mercaptobenzothiazole, 2-mercaptobenzoxazole etc.; As the aliphatics multi-functional thiol compound in aliphatic group with multiple mercapto, can list ethanthiol, the last of the ten Heavenly stems two mercaptan, Isosorbide-5-Nitrae-dimethyl sulfydryl benzene, the two thiopropionate of butylene glycol, the two thiacetate of butylene glycol, ethylene glycol bis thiacetate, trimethylolpropane tris thiacetate, butylene glycol two thiopropionate, trimethylolpropane tris thiopropionate, trimethylolpropane tris thiacetate, pentaerythrite tetrathio propionic ester, pentaerythrite tetrathio acetic acid esters, trihydroxyethyl three thiopropionates etc.
As carboxylic acid compound, phenyl acetic acid, aminomethyl phenyl thioacetic acid, ethylphenyl thioacetic acid, Methylethyl phenyl thioacetic acid, 3,5-dimethylphenyl thioacetic acid, methoxyphenylthio acetic acid, dimethoxyphenylthio acetic acid, chlorophenyl thioacetic acid, dichloro-phenyl thioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthio acetic acid, N-naphthyl glycocoll, naphthoxy acetic acid can be listed.
In addition, aside from them, the thioglycolic acid esters and thiopropionate etc. of multi-hydroxy compound can also be listed, as the thiopropionate of preferred multi-hydroxy compound, trimethylolpropane tris thiopropionate, trimethylolpropane tris thioglycolic acid esters and pentaerythrite tetrathio propionic ester can be listed.
Relative to total amount 100 mass parts of adhesive resin (B) and photopolymerizable compound (C), the content of Photoepolymerizationinitiater initiater (D) is generally 0.1 ~ 40 mass parts, is preferably 1 ~ 30 mass parts.Relative to total amount 100 mass parts of adhesive resin (B) and photopolymerizable compound (C), the content that photopolymerization causes auxiliary agent is generally 0.1 ~ 50 mass parts, is preferably 1 ~ 40 mass parts.
Solvent (E) can use in this field the various solvents used.As its object lesson, the ethylene glycol monoalkyl ether class that ethylene glycol monomethyl ether, ethylene glycol monomethyl ether, ethylene glycol list propyl ether and ethylene glycol monobutyl ether are such can be listed;
The diglycol dialkyl ether that diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diglycol dipropyl ether and diethylene glycol dibutyl ether are such;
Methylcellosolve acetate and the such ethylene glycol alkylether acetates class of ethyl cellosolve acetate;
The aklylene glycol alkylether acetates class that propylene glycol monomethyl ether, propylene glycol monoethyl acetic acid esters, propylene glycol monopropyl ether acetic acid esters, methoxybutyl acetic acid esters and methoxypentyl acetic acid esters are such;
The aromatic hydrocarbons that benzene,toluene,xylene, sym-trimethyl benzene are such;
The ketone that MEK, acetone, methyl amyl ketone, methyl isobutyl ketone and cyclohexanone are such;
The such alcohols of ethanol, propyl alcohol, butanols, hexanol, cyclohexanol, ethylene glycol and glycerine;
3-ethoxyl ethyl propionate and the such ester class of 3-methoxy methyl propionate;
The cyclic ester class etc. that gamma-butyrolacton is such.
These solvents (E) can individually use, and also can combine two or more and use.
Overall relative to photosensitive composition, the content of solvent (E), in mass fraction, is generally 60 ~ 90 quality %, is preferably 70 ~ 85 quality %.If the content of aforementioned solvents (E) is aforementioned range, then there is the trend that coating becomes good, so preferably.
In photosensitive composition of the present invention, the adjuvants (F) such as filling agent, pigment dispersing agent, adhesion promoter, antioxidant, ultraviolet light absorber, anti-coacervation material, surfactant, other macromolecular compound can be contained further.
As filling agent, glass, silica, aluminium oxide etc. can be listed particularly.
As pigment dispersing agent, commercially available pigment dispersing agent can be used, the surfactants etc. such as such as silicone, fluorine class, ester class, cationic, anionic species, nonionic class, both sexes can be listed, can individually use, also can combine two or more and use.As the example of aforementioned surfactants, polyoxyethylene alkyl ether class can be listed, polyoxyethylene alkyl phenyl ether class, polyethylene glycol di class, sorbitan aliphatic ester class, fatty acid modified polyesters, tertiary-amine modified polyurethanes, polyethyleneimine: amine etc., and commodity are called KP (Shin-Etsu Chemial Co., Ltd's manufacture), Port リ Off ロ mono-(manufacture of common prosperity KCC), ェ Off ト ッ プ (manufacture of ト mono-ケ system プ ロ ダ Network ッ company), メ ガ Off ァ ッ Network ス (Dainippon Ink. & Chemicals Inc's manufacture), Off ロ ラ mono-ト (manufacture of Sumitomo 3M Co., Ltd.), ァ サ ヒ ガ mono-De, サ mono-Off ロ Application (more than, Asahi Glass Co., Ltd manufactures), ソ Le ス パ mono-ス (manufacture of ァ ピ シ ァ Co., Ltd.), EFKA (manufacture of EFKACHEMICALS company), PB821 (manufacture of monosodium glutamate Co., Ltd.) etc.
As adhesion promoter, vinyltrimethoxy silane can be listed particularly, vinyltriethoxysilane, vinyl three (2-methoxy ethoxy) silane, N-(2-amino-ethyl)-3-amino propyl methyl dimethoxysilane, N-(2-amino-ethyl)-3-TSL 8330, APTES, 3-glycidoxypropyltrimewasxysilane, 3-glycidoxypropyl dimethoxysilane, 2-(3, 4-epoxycyclohexyl) ethyl trimethoxy silane, 3-chloro hydroxypropyl methyl dimethoxysilane, 3-chloropropyltrimethoxy silane, 3-methacryloxypropyl trimethoxy silane, 3-mercaptopropyi trimethoxy silane etc.
As antioxidant, can 2 be listed particularly, 2 '-thiobis (4-methyl-6-tert-butylphenol), 2,6-di-tert-butyl-4-methy phenols etc.
As ultraviolet light absorber, 2-(the 3-tert-butyl group-2-hydroxy-5-methyl base phenyl)-5-chlorinated benzotriazole, alkoxy benzophenone etc. can be listed particularly.
In addition, as anti-polycoagulant, sodium polyacrylate etc. can be listed particularly.
As surfactant, preferably there is the surfactant of fluorine atom or silicon atom.Particularly, can list and be selected from silicone surfactant, fluorine class surfactant and at least a kind of having in the silicone surfactant of fluorine atom.
As aforementioned silicone surfactant, the surfactant etc. with siloxane bond can be listed.ト mono-レ シ リ コ mono-Application DC3PA can be listed particularly, ト mono-レ シ リ コ mono-Application SH7PA, ト mono-レ シ リ コ mono-Application DC11PA, ト mono-レ シ リ コ mono-Application SH21PA, ト mono-レ シ リ コ mono-Application SH28PA, ト mono-レ シ リ コ mono-Application 29SHPA, ト mono-レ シ リ コ mono-Application SH30PA, polyether modified silicon oil SH8400 (trade name, ト mono-レ シ リ コ mono-Application Co., Ltd. manufactures), KP321, KP322, KP323, KP324, KP326, KP340, KP341 (SHIN-ETSU HANTOTAI Silicone manufactures), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446, TSF4452, TSF4460 (manufacture of モ メ Application チ ィ Block パ Off ォ mono-マ Application ス マ テ リ ァ Le ズ ジ ャ パ Application affiliated company) etc.
As aforementioned fluorine class surfactant, the surfactant etc. having and fluoridize carbochain can be listed.Particularly, Off ロ ラ mono-De (trade name) FC430 can be listed, Off ロ ラ mono-De FC431 (manufacture of Sumitomo 3M Co., Ltd.), メ ガ Off ァ ッ Network (trade name) F142D, メ ガ Off ァ ッ Network F171, メ ガ Off ァ ッ Network F172, メ ガ Off ァ ッ Network F173, メ ガ Off ァ ッ Network F177, メ ガ Off ァ ッ Network F183, メ ガ Off ァ ッ Network F489, メ ガ Off ァ ッ Network F554, メ ガ Off ァ ッ Network R30 (Dainippon Ink Chemicals's manufacture), ェ Off ト ッ プ (trade name) EF301, ェ Off ト ッ プ EF303, ェ Off ト ッ プ EF351, ェ Off ト ッ プ EF352 (new autumn fields changes into Co., Ltd. and manufactures), サ mono-Off ロ Application (trade name) S381, サ mono-Off ロ S382, サ mono-Off ロ SC101, サ mono-Off ロ SC105 (Asahi Glass Co., Ltd's manufacture), E5844 (ダ ィ キ Application Off ァ ィ Application ケ ミ カ Le research institute (Co., Ltd.) manufacture), BM-1000, BM-1100 (be all trade name, BMChemie company manufactures) etc.
As the aforementioned silicone surfactant with fluorine atom, the surfactant etc. that there is siloxane bond He fluoridize carbochain can be listed.Particularly, メ ガ Off ァ ッ Network (login trade mark) R08, メ ガ Off ァ ッ Network BL20, メ ガ Off ァ ッ Network F475, メ ガ Off ァ ッ Network F477, メ ガ Off ァ ッ Network F443 (Dainippon Ink Chemicals's manufacture) etc. can be listed.
These surfactants, can be used alone, and also can combine two or more and use.
As other macromolecular compound, the thermoplastic resins such as the heat-curing resins such as epoxy resin, polyester, polyurethane, polyvinyl alcohol (PVA), polyacrylic acid, polyalkylene glycol monoalkyl ether, polyacrylic acid fluoroalkyl ester etc. can be used particularly.
Photosensitive composition of the present invention such as can be prepared as follows.Namely, pigment (A) is mixed with solvent (E) in advance, uses the dispersions such as ball mill, until the mean grain size of pigment is the degree of less than 0.2 μm.Now, sometimes also use pigment dispersing agent as required, then coordinate the adhesive resin (B) of part or all.Remaining adhesive resin (B), photopolymerizable compound (C) and Photoepolymerizationinitiater initiater (D), is as required added in the dispersion liquid (grinding matrix) of gained, add other composition used, and the solvent added as required, to reach the concentration of regulation, obtain the photosensitive composition of target.
The photosensitive composition of such preparation, can such as be applied on base material as follows, carry out photocuring and development, make colored pixels.First, said composition being spun on substrate (normally glass), by carrying out heat drying (prebake), except desolventizing, obtaining level and smooth film.Coating thickness is now approximately the degree of 1 ~ 3 μm.On the film obtained like this via negative mask irradiation ultraviolet radiation to form target image.Now, preferably use the devices such as mask aligner, to make parallel rays irradiate in exposure portion on the whole equably, and mask and substrate are overlapped in correct position.And then the film after making solidification terminate afterwards is again contacted with dilute alkaline aqueous solution, makes non-exposed portion dissolve, develops, obtain target image thus.After development, as required, at 150 ~ 230 DEG C, the Post RDBMS (curing afterwards) of 10 ~ 60 minutes can also be carried out.
The developer solution used during development after pattern exposure, the aqueous solution normally containing alkali compounds and surfactant.
As alkali compounds, inorganic and organic alkali compounds can be listed.As the object lesson of inorganic alkaline compound, NaOH, potassium hydroxide, sodium hydrogen phosphate, sodium dihydrogen phosphate, diammonium hydrogen phosphate, ammonium dihydrogen phosphate (ADP), potassium dihydrogen phosphate, sodium silicate, potassium silicate, sodium carbonate, sal tartari, sodium bicarbonate, saleratus, sodium borate, potassium borate, ammonia etc. can be listed.
In addition, as the object lesson of organic basic compound, tetramethyl ammonium hydroxide, hydroxide 2-hydroxyethyl trimethyl ammonium, monomethyl amine, dimethyl amine, Trimethylamine, MEA, diethylamide, triethylamine, single isopropylamine, diisopropylamine, monoethanolamine etc. can be listed.These inorganic and organic basic compounds can individually use, and also can combine two or more and use.The preferred concentration of the alkali compounds in alkaline developer is 0.01 ~ 10 quality %, is more preferably 0.03 ~ 5 quality %.
In addition, the surfactant in alkaline developer can list nonionic surfactant, anionic surfactant or cationic surfactant.
As nonionic surfactant, polyoxyethylene alkyl ether, polyoxyethylene aryl ether, polyoxyethylene alkylaryl ether, other polyoxyethylene deriv, ethylene oxide/propylene oxide segmented copolymer, sorbitan aliphatic ester, Polyoxyethylene Sorbitan acid esters, polyoxyethylene sorbitol fatty acid ester, fatty acid glyceride, polyoxyethylene fatty acid ester, polyoxyethylene alkyl amine etc. can be listed.
As the object lesson of anionic surfactant, lauryl alcohol sodium sulfovinate or the such alkyl aryl sulfonate class etc. of such alkylsurfuric acid salt, neopelex or the dodecyl sodium naphthalene sulfonate of such higher alcohol sulfate salt, NaLS or the Texapon Special of oleyl sulfate sodium can be listed.
As the object lesson of cationic surfactant, octadecyl amine hydrochloride or the such amine salt or quaternary ammonium salt etc. of Trimethyllaurylammonium chloride can be listed.
These surfactants can individually use, and also can combine two or more and use.
The concentration of the surfactant in alkaline developer, normally 0.01 ~ 10 quality %, be preferably 0.05 ~ 8 quality %, be more preferably 0.1 ~ 5 quality %.
Through the coating of photosensitive composition, drying, pattern exposure to gained dry coating, each operation that development is afterwards such, the pixel of the color of the coloring components be equivalent in photosensitive composition can be obtained, then, repeat these operations of the quantity of the necessary color of color filter, can color filter be obtained.Namely, color filter can configure red, green and blue three primary colors pixel usually on substrate.
Photosensitive composition of the present invention is used to form red pixel.X, y coordinate values in the preferred CIE chromaticity diagram of this red pixel is 0.500 < x < 0.690,0.280 < y < 0.340, is more preferably 0.520 < x < 0.680,0.290 < y < 0.340.
According to the present invention, red pixel and the color filter of high-contrast can be manufactured.
Color filter containing the pixel using photosensitive composition of the present invention to obtain, can be suitable for various display device, the liquid crystal indicators etc. such as such as monitor or television.
Embodiment
Below, by embodiment, the present invention is further illustrated." % " and " part " in example, if there is no particular limitation, is % by weight and weight portion.
The synthesis > of < adhesive resin (B1)
In the flask of 1L possessing stirrer, thermometer, reflux condensing tube, tap funnel and wireway, import 133g propylene glycol monomethyl ether.Then, by wireway, nitrogen is imported in flask, make the atmosphere gas in flask be replaced as nitrogen.Afterwards, by the solution warms in flask to 100 DEG C, use tap funnel, through 2 hours, 22.0g (0.10mol) methacrylic acid dicyclo pentyl ester (FA-513M will be comprised, Hitachi Chemical Co., Ltd. manufacture), 82.8g (0.47mol) benzyl methacrylate, 37.0g (0.43mol) methacrylic acid, 3.6g 2, the potpourri of 2 '-azobis isobutyronitrile and 164g propylene glycol monomethyl ether is added drop-wise in flask, after dripping, then stir 5 hours at 100 DEG C.
After stirring terminates, pass through wireway, air is imported in flask, after the atmosphere gas in air displacement flask, 21.5g (0.15mol) glycidyl methacrylate, 0.9g tri--dimethylaminomethyl phenol and 0.145g quinhydrones are dropped in flask, at 110 DEG C, continue reaction 6 hours, obtain the adhesive resin (B1) of solid state component 37.8 quality %, acid number 97mgKOH/g.
Here, acid number is the value with 1g carboxylic acid etc. in measuring with the amount (mg) of the necessary potassium hydroxide of polymkeric substance of acidic group, and usually, the potassium hydroxide aqueous solution titration known by working concentration is tried to achieve.
The weight-average molecular weight of the polystyrene conversion that the adhesive resin (B1) of gained is measured by the GPC method of following condition is 9,000.
Device: HLC-8120GPC (eastern ソ mono-Co., Ltd. manufactures)
Post: TSK-GELG2000HXL
Column temperature: 40 DEG C
Solvent: THF
Flow velocity: 1.0mL/min
The solid component concentration of tested liquid: 0.001 ~ 0.01 quality %
Injection rate IR: 50 μ L
Detecting device: RI
Correction standard substance: TSKSTANDARDPOLYSTYRENEF-40, F-4, F-1, A-2500, A-500 (eastern ソ mono-Co., Ltd. manufactures)
Other composition used in the present embodiment is as shown in table 1.
[table 1]
| Pigment | (A1) | C.I. paratonere 177 |
| (A2) | C.I. paratonere 242 | |
| (A3) | C.I. paratonere 254 | |
| Photopolymerizable compound | (C) | Dipentaerythritol acrylate |
| Photoepolymerizationinitiater initiater | (D1) | OXE-01 (oxime compound, チ バ ス ペ シ ャ Le テ ィ ケ ミ カ Le ズ Co., Ltd. manufactures) |
| (D2) | Two (the trichloromethyl)-6-piperonyl-1,3,5-triazines of 2,4-, | |
| (D3) | 2-benzyl-2-dimethylamino-1-(4-morphlinophenyl) fourth-1-ketone | |
| Solvent | (E1) | Propylene glycol monomethyl ether |
| (E2) | Propylene glycol monomethyl ether | |
| (E3) | 3-ethoxyl ethyl propionate | |
| Surfactant | (F) | メ ガ Off ァ ッ Network F475 (manufacture of large Japanese ink (ィ Application キ) chemical industry Co., Ltd.) |
(embodiment 1)
Mix each composition to become composition shown in table 2, obtain photosensitive composition 1.Use the photosensitive composition 1 of gained, evaluate film by the following method.
The manufacture > of < evaluation film
It is dry after the glass substrate (#1737: コ mono-ニ Application ダ company manufactures) of 2 inch square is cleaned with neutral lotion, water and alcohol successively.
On this glass substrate, by spin-coating method coating photosensitive composition 1, then in clean baking oven, prebake 3 minutes at 100 DEG C.
After cooling, use exposure machine (TME-150RSK; ト プ コ Application Co., Ltd. manufactures), under atmosphere, with 150mJ/cm
2exposure (365nm) carry out illumination and penetrate, heat 20 minutes at 220 DEG C, manufacture evaluation film.
The evaluation > of < film
Use film thickness gauge (DEKTAK, Veeco company makes), the thickness of evaluation of measuring film, uses micro-spectral light measurer (OSP-SP200, OLYMPUS company manufactures), measure colourity (x, y) and brightness (Y).In addition, use contrast analyzer (manufacture of CT-1, Hu Ban Motor Corporation), with blank value for 10000, measure contrast value.Result is as shown in table 3.
[table 2]
(unit: %)
[table 3]
| Thickness (μm) | x | y | Y | Contrast | ||
| Embodiment 1 | Composition 1 | 2.40 | 0.658 | 0.335 | 20.0 | 3875 |
(embodiment 2 ~ 6)
According to the composition shown in table 4, and embodiment 1 similarly, obtains photosensitive composition.Similarly evaluate with embodiment 1, result is as shown in table 5.
[table 4]
(unit: %)
[table 5]
| Thickness (μm) | x | y | Y | Contrast | ||
| Embodiment 2 | Composition 2 | 2.58 | 0.658 | 0.326 | 18.3 | 5574 |
| Embodiment 3 | Composition 3 | 2.54 | 0.658 | 0.326 | 18.4 | 5027 |
| Embodiment 4 | Composition 4 | 2.50 | 0.658 | 0.337 | 20.5 | 3727 |
| Embodiment 5 | Composition 5 | 2.39 | 0.658 | 0.337 | 20.4 | 4293 |
| Embodiment 6 | Composition 6 | 2.49 | 0.658 | 0.339 | 20.5 | 4936 |
Industrial applicability
According to the present invention, red pixel and the color filter of high-contrast can be manufactured.
Claims (4)
1. photosensitive composition, it comprises pigment (A), adhesive resin (B), photopolymerizable compound (C), Photoepolymerizationinitiater initiater (D) and solvent (E), and pigment (A) comprises C.I. paratonere 177, C.I. the pigment of paratonere 242 and C.I. paratonere 254, in whole pigment, C.I. the content of paratonere 242 is more than 15 % by weight, less than 35 % by weight, C.I. the content of paratonere 254 is more than 20 % by weight, less than 80 % by weight, C.I. the content of paratonere 177 is more than 10 % by weight, less than 85 % by weight, C.I. paratonere 242, C.I. the total content of paratonere 254 and C.I. paratonere 177 is less than 100 % by weight.
2. photosensitive composition according to claim 1, in whole pigment, the content of C.I. paratonere 254 is less than 50 % by weight.
3. pixel, it uses the photosensitive composition described in claim 1 or 2 to be formed.
4. color filter, it contains pixel according to claim 3.
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| JP2008132911 | 2008-05-21 | ||
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| JP (1) | JP2010002886A (en) |
| KR (1) | KR20090121217A (en) |
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| JP5402158B2 (en) * | 2008-06-06 | 2014-01-29 | Ｊｓｒ株式会社 | Color composition for forming red pixel, color filter, and color liquid crystal display element |
| KR101981373B1 (en) * | 2015-09-24 | 2019-05-22 | 동우 화인켐 주식회사 | A green photosensitive resin composition, color filter and display device comprising the same |
| KR20190087173A (en) * | 2018-01-16 | 2019-07-24 | 동우 화인켐 주식회사 | Negative-type Photosensitive Resin Composition |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5968688A (en) * | 1996-09-30 | 1999-10-19 | Nippon Shokubai Co., Ltd. | Color filter grade photosensitive resin coloring composition and color filter using the same |
| CN1612042A (en) * | 2003-10-27 | 2005-05-04 | 住友化学株式会社 | Colouring photosensitive resin composition |
| CN1758077A (en) * | 2004-07-15 | 2006-04-12 | Jsr株式会社 | Radiation sensitive composition and method for the preparation of the same |
| CN1782748A (en) * | 2004-08-04 | 2006-06-07 | Jsr株式会社 | Radiation sensitive composition for color filters, method for the preparation of the same and color liquid crystal display device |
| CN1818780A (en) * | 2005-02-09 | 2006-08-16 | 太阳油墨股份有限公司 | Photosensitive resin composition, its condensate and display panel used interval element formed therewith |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP4428880B2 (en) * | 2001-04-11 | 2010-03-10 | 富士フイルム株式会社 | Coloring composition and photosensitive coloring composition |
| JP2002372618A (en) * | 2001-06-14 | 2002-12-26 | Fujifilm Arch Co Ltd | Red hardening composition for color filter and color filter using the same |
| WO2007142293A1 (en) * | 2006-06-08 | 2007-12-13 | Sakata Inx Corp. | Red coloring composition for color filter |
-
2009
- 2009-05-11 JP JP2009114228A patent/JP2010002886A/en active Pending
- 2009-05-15 TW TW098116113A patent/TW201003147A/en unknown
- 2009-05-18 KR KR1020090042938A patent/KR20090121217A/en not_active Application Discontinuation
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5968688A (en) * | 1996-09-30 | 1999-10-19 | Nippon Shokubai Co., Ltd. | Color filter grade photosensitive resin coloring composition and color filter using the same |
| CN1612042A (en) * | 2003-10-27 | 2005-05-04 | 住友化学株式会社 | Colouring photosensitive resin composition |
| CN1758077A (en) * | 2004-07-15 | 2006-04-12 | Jsr株式会社 | Radiation sensitive composition and method for the preparation of the same |
| CN1782748A (en) * | 2004-08-04 | 2006-06-07 | Jsr株式会社 | Radiation sensitive composition for color filters, method for the preparation of the same and color liquid crystal display device |
| CN1818780A (en) * | 2005-02-09 | 2006-08-16 | 太阳油墨股份有限公司 | Photosensitive resin composition, its condensate and display panel used interval element formed therewith |
Also Published As
| Publication number | Publication date |
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| JP2010002886A (en) | 2010-01-07 |
| CN101604120A (en) | 2009-12-16 |
| TW201003147A (en) | 2010-01-16 |
| KR20090121217A (en) | 2009-11-25 |
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