CN101233260A - 光伏衬底沉积中的压力控制系统 - Google Patents
光伏衬底沉积中的压力控制系统 Download PDFInfo
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Abstract
本发明包括一种用于将薄层沉积在衬底上以用于生产光伏电池的设备,其中通过低压隔离区域使个别反应室彼此分离,所述低压隔离区域防止相邻反应室的交叉污染,并控制每一反应室中的压力水平,同时允许在没有任何机械障碍的情况下将衬底从一个反应室不间断地转移到下一反应室。
Description
相关申请案的交出参考
本申请案主张2004年11月10日申请的序列号为60/626,843的美国临时专利申请案的优先权。
技术领域
本发明涉及光伏电池的生产,且更明确地说,涉及用于将光伏工件从一个反应室不间断地转移到另一反应室的压力控制和隔离系统。
背景技术
光伏(PV)电池、模块和能源系统为全世界对电力日益膨胀的需求提供清洁、可靠、可更新的能量。遗憾的是,产品成本一直未能充分降低以在发展中世界打开关键市场,在发展中世界,对电力的需求驱使其使用会造成污染的、不可更新的来源,例如煤和石油。随着人口膨胀和人均能量消耗的增长,全世界正走向不和谐的未来,届时,能量需求和供应将不可逆转地产生分歧。
PV电池为不可更新的能量源提供了一种替代品。然而,虽然可在实验室里制造相对高效的PV电池,但已证明,难以将所述工艺发展成具有对于商业生存而言至关重要的一致重复性和效率的商业规模。由于缺乏高效的薄膜制造工艺,使得PV电池无法有效地取代市场上的代用能量源。
目前使用多步骤批处理来制造电池,其中在各反应步骤之间转移每一产品零件,且此类转移较为松散而且需要在室内循环进行反应。典型的过程由一系列个别的批处理室组成,每一处理室特别针对电池中各层的形成而设计。这种过程的一个缺点是,衬底被数次从真空转移到空气中再转移回到真空。替代的系统使用一系列个别的批处理室,其与卷式连续过程耦合以用于每一室。这一过程的主要缺点是系统的非连续性以及需要破坏真空。
PV电池制造设备的一个方面必须为:能在不损失真空的情况下使产品零件或衬底从一个反应室行进到另一反应室。同样,当使衬底能在两个反应室之间行进时,所述设备必须不允许一个反应室中的反应物污染另一反应室。这个问题并非无所谓,因为p型吸收体的化学成分与PV电池中的n型结的化学成分是如此相似,以致两个反应室之间非常低度的交叉污染都会对电池性能造成非常大的影响。因此,需要一种能够防止两个反应室之间的交叉污染的制造设备。
PV制造设备的另一方面是需要紧密控制给定反应室中的温度和压力。通常,给定层的形成取决于所述反应室中的温度和压力。因此,需要一种可调节反应室中的压力的系统。
1995年11月28日颁予Coleman的第5,470,784号美国专利揭示一种用于使用半导体材料涂覆衬底以用于生产PV电池的设备,其中具有通过一系列压力低于沉积间(deposition compartment)的“端口”分开的许多沉积室。然而,此专利并没有涵盖与差分抽吸配置相一致地使用纯气体来控制反应室中的压力。此外,此发明没有教示孔的构造,所述孔将限制气体从反应室流到隔离区域。Coleman也没有教示连续的制造过程。
Hardy的第5,343,012号美国专利揭示一种控制衬底的温度的方法,在所述衬底上将制造出薄膜结构。然而,此发明没有揭示将衬底从一个沉积室传输到第二沉积室。
Van Mast的第6,554,950号美国专利揭示一种在施加真空的情况下将表面污染物从衬底移除的方法和设备。然而,此发明没有揭示使用差分抽吸来控制反应室中的压力,也没有揭示使用差分抽吸来将衬底从一个反应室转移到第二反应室。
2001年8月7日颁予Mashburn的第6,270,861号美国专利揭示一种用于在沉积室中形成薄膜的设备,其中使用差分抽吸来防止两个不同气氛的相互作用。然而,此发明没有涵盖每一者的压力均高于屏障的两个反应室之间存在的真空屏障的概念。
Bartolomei的第5,849,162号美国专利揭示一种用于更有效的溅镀工艺的装置和过程。虽然所述设备利用差分抽吸和多个台(其中衬底可具有沉积在上面的层),但此发明没有使用形成每一者均具有独立温度和压力的反应室所必需的隔离区域。
Scobey的第4,851,095号美国专利揭示一种用于通过多个反应台的连续衬底的沉积设备。然而,此发明没有涵盖每一反应室需要不同的压力和温度,而且没有涵盖所述反应室之间的真空隔离区域。
发明内容
本发明是一种用于生产光伏(PV)电池的设备,其具有至少一个提供与至少一个反应室连通的真空隔离区域的差分抽吸机构,且其中所述反应室含有用于控制纯气体到反应室的流量的机构。在一个实施例中,所述隔离区域被放置在两个连续的反应室之间,但这并不是本发明的必要条件。与差分抽吸机构一致动作的是一种仪器,其用于控制纯气体进入所连接的反应室的流量,进而维持所述反应室中的近似真空,但隔离区域中的压力始终低于反应室。与设备相关联的是位于隔离区域/反应室界面处的孔,其足够大以允许衬底在室之间传递,而不会中断过程,同时使得从反应室流入隔离区域中的气体最少。这些孔与行进穿过这些孔的托盘具有大致一样的大小,但虑及托盘放置的不精确性和潜在的热膨胀,这些孔会略大于托盘。
本发明进一步包括一种用于多个独立沉积和反应室中的压力控制的方法,其包括:控制进入反应室中的气体的流量;将衬底馈送通过反应室的入口和出口处的孔;建立邻近于且与反应室连通的具有较低压力的隔离区域;和移除离开反应室的气体以防止进入相邻反应室的交叉污染。
此设备的优点在于隔离反应室以防止交叉污染,同时其允许使衬底在室之间不间断地传递。在一个实施例中,一托盘或许多托盘可离开一个反应室并临时位于一隔离区域中,同时使得对衬底的负面影响最小化,且接着稍后进入下一后续的反应室。在另一实施例中,可以类似于串的方式将所述托盘组织起来,使得所有反应室可同时对不同的托盘操作。本发明还使得连续移动通过一系列反应室的连续或“卷式”衬底设计成为可能,其中每一反应室被压力受控的隔离区域分离。尽管许多参考揭示连续衬底的概念,但本发明使得光伏制造过程变得真正连续。
在一个实施例的操作中,一差分泵或一系列差分泵附接到隔离区域。此泵可连续运作或可循环运作以维持真空,同时向反应室添加惰性气体以使所述室的压力略大于完全真空,这对于反应是必要的。在一个实施例中,可通过传感器阵列来监视压力和温度,且通过例如计算机的控制装置进行分析,所述控制装置可自主地控制反应室的环境特征。
本发明的一个目标是提供一种压力隔离设备以用于允许衬底传递通过一系列反应室,每一反应室沉积用于生产光伏电池的较薄化学层,同时大体上维持每一反应室中必要的沉积和/或反应条件。
本发明的另一目标使得能将衬底从一个反应室转移到下一后续的室,或转移到外部大气,且不会使衬底在转移期间经受较大的温度和压力变化。
本发明的第三目标是将衬底从反应室转移到下一后续的反应室,而不允许两个反应室之间的交叉污染。
附图说明
通过参考结合附图的对本发明的若干实施例的以下描述,本发明的上述和其它特征和优点,以及获得这些特征和优点的方式将变得明了且容易理解,其中:
图1是两个反应室之间的单一隔离区域的示意图;
图1a是具有关联的收集设施的真空泵设备的图;
图2是展示隔离区域的可能形状的一个潜在实施例的透视图;
图3是单一隔离区域的示意图,其中真空泵设备安装在隔离区域的内部;
图4是连接到单一反应室的单一隔离区域和用于完成的衬底的移除区的示意图。
整个若干图式中相应的参考符号指示相应的部件。本文陈述的实例说明本发明的若干实施例,但不应理解为以任何方式限制本发明的范畴。
具体实施方式
图1中描绘本发明的一实施例,且包括附接到至少一个反应室102的封闭隔离区域100,但在大多数情况下,所述封闭隔离区域100附接在两个反应室102之间。隔离区域100的实体形状可以是任何形状,例如立方体或矩形,且可由托盘、工件或其它衬底传输装置104的尺寸确定。显然,可通过优化真空中的性能来驱动隔离区域100的形状,因此,为支持在区域中抽出10-7托的真空,如图2所描绘的圆柱体或球形形状可能是必需的。封闭隔离区域100的大小还可由光伏生产工艺的反应要求来确定。可能影响(例如)隔离区域100的长度的因素可能会是问题,例如相邻反应室的内部压力、反应室102中的工件104的滞留时间以及加工过程对反应室之间的交叉污染的敏感度。
在隔离区域的至少一端上的是反应室102,其包含用于将化学物或合金沉积在衬底上的设备106。用于沉积的一般方法包含蒸镀、溅镀以及所属领域的技术人员已知的其它技术。不管沉积方法是什么,期望反应室中的压力将非常低,通常在10-6-10-3托的范围内。为了维持将防止相邻反应室102之间的交叉污染的隔离区域100,隔离区域100伴有泵108,借此,此泵的吸入端110通过连接装置112附接到隔离区域壁111,或可永久地附接到隔离区域壁111,其将使得隔离区域的压力能持续小于相邻反应室102的压力(约为10-7托)。在另一实施例中,如图3中所描绘,泵108可安装在隔离区域100的内部,且泵排出口114从内部连接到隔离区域壁111。还预期可能有必要使用串联的许多泵108来实现充分的真空。本发明并不排除使用单个差分泵来用于多个隔离区域;然而,这很可能导致每一反应室/隔离区域界面116上不同的ΔP,这可能是不良的。
为了使得衬底104能从反应室102传递通过隔离区域100并进入下一反应室103,一孔被放置在反应室/隔离区域界面115、116处隔离区域100的入口117和出口118上。所属领域的技术人员将易于了解,在存在孔117、118的情况下,如果不予控制,那么差分泵108会将隔离区域100以及反应室102、103排空到同样低的真空。因为反应室102、103中的压力大于隔离区域100的压力以便防止两个反应室之间的交叉污染是比较重要的,所以必须通过外部压力源对反应室102、103进行“加压”,以抵抗泵108的真空处理效应。在一个实施例中,这是通过经由气体入口134、135将纯气体125、126(例如氩气、氮气或氧气)引入反应室102、103中来实现的。
可经由类似于将真空泵的吸入端连接到隔离区域壁112的装置的连接装置121、122将这些入口134、135附接到反应室壁。图1显示附接到每一气体入口134、135的纯气体存储罐123、124。此实施例反映出两个不同反应室中发生的过程可能需要一个反应室125中的纯气体不同于另一反应室中的纯气体126以得到最佳的光伏结果的可能性。然而,本发明不排除使用单个纯气体罐来用于所有反应室。另外,其它气体也可用于压力控制,但此可取决于以下因素:例如反应室中的过程,污染衬底的可能性,以及过程所需的压力和温度。参看图1a,在纯气体供应不足的情况下,或气体释放可能是环境污染物的情况下,可将收集罐150附接到泵114的出口,以收集纯气体用于随后使用或合适安置。
为了维持反应室102、103中的大于隔离区域100的压力,孔117、118必须能限制反应室102、103中的纯气体125、126因隔离区域/反应室边界115、116上的差压而损失到隔离区域100。因此,孔的大小和配置必须经限制以限制此损失。图1仅表示可为大型沉积设备的一段,孔119还附接到每一反应室的入口和出口。优选的情况是,孔仅在一定程度上大于衬底104本身。
在所述实施例中,孔在“卷式”过程中的操作将最为有效,因为衬底本身将持续抑制气体从反应室向外流到隔离区域。在另一实施例中,具体说在个别“托盘”衬底的情况下,孔117、118仅在托盘104进入或离开反应室时打开,以便完全防止气体的损失和随后的减压。
在此实施例中,温度和压力传感器127、128被放置在反应室中,且如虚线132所表示,与可为计算机的控制装置130电连通,且连续地监视反应室温度和压力。控制130装置将这些值与也由传感器129测量的隔离区域100的温度和压力进行比较,所述传感器129如虚线136所表示与控制装置130电连通。为了维持反应室/隔离区域界面上的合适的ΔP,控制装置130可通过电磁阀或节流阀131、133的电控制来控制纯气体125、126任一者进入反应室的流动速率,所述电磁阀或节流阀位于纯气体入口134、135与纯气体存储罐123、124之间。在另一实施例中,可通过控制真空泵108而不是纯气体流动速率来控制ΔP,或通过泵与纯气体流动速率控制的某一组合来进行控制。
如先前所述,隔离区域不需要仅存在于两个反应室之间。在另一实施例中,隔离区域可仅与一个反应室连通,以便防止反应室与外部大气之间的污染,如图4中描绘。在此实施例中,隔离区域100充当目的地,其中衬底104是完成好的,或必须被转移到另一设备以进一步开发。如图4中所见,提供存取点401以供移除衬底104。诸如此类的隔离室对于防止空气中的杂质进入反应室来说是理想的,所述反应室将可能处于或接近真空水平。然而,此隔离区域上的ΔP远大于任何反应室/隔离区域界面上的ΔP。
在正常条件并使用所属领域的技术人员已知的沉积方法的情况下,大气与隔离区域之间的ΔP可能比隔离区域与反应室之间的ΔP大1000倍。因为此较大的ΔP,所以隔离区域与外部大气之间的简单的存取点401可能是不够的。因此,所述存取点可能不像其它孔一样能连续打开。
虽然已参考特定实施例描述了本发明,但所属领域的技术人员将了解,在不脱离本发明的范畴的情况下,可作出各种改变,且等效物可取代其元件。另外,在不脱离本发明的范畴的情况下,可进行许多修改来使特定情形或材料适合于本发明的教示。
因此,期望本发明不限于所揭示的用最佳模式来实行本发明的特定实施例,而且期望本发明将包含处于附加权利要求书的范畴和精神内的所有实施例。
Claims (17)
1.一种用于生产光伏装置的设备,其包括:
a.至少一个差分抽吸构件,其提供与至少一个反应室连通的一个或一个以上真空隔离区域;和
b.所述反应室含有用于控制纯气体到所述反应室的流量的机构。
2.根据权利要求1所述的设备,其中所述隔离区域中的压力低于所述反应室。
3.根据权利要求2所述的设备,其中所述反应室提供在2-10 E-3托的压力下进行的沉积,且所述抽吸构件在1 E-4托下操作。
4.根据权利要求1所述的设备,其中经由所述隔离构件从所述反应室移除所述气体。
5.根据权利要求4所述的设备,其中经由所述隔离构件从所述反应室中移除所述气体,并将其引导到收集设施。
6.根据权利要求4所述的设备,其中在一个所述反应室与一个所述隔离区域之间的接合面处提供衬底可穿过的孔。
7.根据权利要求6所述的设备,其中所述孔具有与所述衬底类似的厚度,以使从所述反应室到所述隔离区域的气流最小化。
8.根据权利要求6所述的设备,其中所述孔可循环地关闭。
9.根据权利要求1所述的设备,其中所述反应室含有监视装置以扫描所述反应室的温度和压力。
10.根据权利要求9所述的设备,其中所述监视机构可控制所述纯气体的输入速率。
11.一种在用于生产光伏装置的多个独立沉积和反应室中用于压力控制的方法,其包括:
a.控制进入所述CGS反应室的气体流量;
b.将衬底馈送通过所述反应室的入口和出口处的孔;
c.建立邻近于且与所述反应室的所述入口和出口连通的具有较低压力的隔离区域;和
d.将离开所述反应室的所述纯气体移除到所述隔离区域内,且将所述隔离区域中的压力维持在1 E-4托。
12.根据权利要求11所述的方法,其中所述衬底是能够被连续馈送通过所述反应室的连续层。
13.根据权利要求12所述的方法,其中所述衬底被附着到托盘上,其中一个或一个以上所述托盘被放置在所述反应室中。
14.根据权利要求13所述的方法,其中在插入所述托盘后可以关闭所述孔。
15.根据权利要求11所述的方法,其中经由所述隔离区域移除离开所述反应室的所述气体。
16.根据权利要求15所述的方法,其中将所述气体转移到收集设施。
17.根据权利要求11所述的方法,其中所述隔离区域是一个所述隔离区域的出口与相邻的所述隔离区域的入口之间的接合处。
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JP2008538450A (ja) | 2008-10-23 |
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US20060096635A1 (en) | 2006-05-11 |
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