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Publication numberCN101233260 A
Publication typeApplication
Application numberCN 200580043391
PCT numberPCT/US2005/040932
Publication date30 Jul 2008
Filing date10 Nov 2005
Priority date10 Nov 2004
Also published asCA2586965A1, CA2586966A1, CN101080511A, CN101087899A, CN101094726A, CN101410547A, CN101443929A, EP1809786A2, EP1810344A2, US7319190, US20060096635, US20060102230, WO2006053128A2, WO2006053128A3, WO2006053128A8, WO2006053129A2, WO2006053129A3
Publication number200580043391.4, CN 101233260 A, CN 101233260A, CN 200580043391, CN-A-101233260, CN101233260 A, CN101233260A, CN200580043391, CN200580043391.4, PCT/2005/40932, PCT/US/2005/040932, PCT/US/2005/40932, PCT/US/5/040932, PCT/US/5/40932, PCT/US2005/040932, PCT/US2005/40932, PCT/US2005040932, PCT/US200540932, PCT/US5/040932, PCT/US5/40932, PCT/US5040932, PCT/US540932
Export CitationBiBTeX, EndNote, RefMan
External Links: SIPO, Espacenet
Pressure control system in a photovoltaic substrate deposition
CN 101233260 A
Abstract  translated from Chinese
本发明包括一种用于将薄层沉积在衬底上以用于生产光伏电池的设备,其中通过低压隔离区域使个别反应室彼此分离,所述低压隔离区域防止相邻反应室的交叉污染,并控制每一反应室中的压力水平,同时允许在没有任何机械障碍的情况下将衬底从一个反应室不间断地转移到下一反应室。 The present invention comprises a method for depositing a thin layer on a substrate for the production of photovoltaic cell devices, wherein the isolation region by low pressure reaction chambers separated from each other so that the individual, the low pressure isolation region adjacent to prevent cross-contamination of the reaction chamber, and controlling each of the pressure level in the reaction chamber, while allowing in the case without any mechanical barriers continuously transferring the substrate from one reaction chamber to the next chamber.
Claims(17)  translated from Chinese
1. 一种用于生产光伏装置的设备,其包括: a.至少一个差分抽吸构件,其提供与至少一个反应室连通的一个或一个以上真空隔离区域;和b.所述反应室含有用于控制纯气体到所述反应室的流量的机构。 1. An apparatus for producing a photovoltaic device, comprising:. A difference of at least one suction member, which provides a reaction chamber in communication with at least one or more vacuum isolation region; and b with said reaction chamber comprises. pure gases to the control mechanism of the reaction chamber flow.
2. 根据权利要求l所述的设备,其中所述隔离区域中的压力低于所述反应室。 2. The apparatus according to claim l, wherein said isolation region is lower than the pressure in the reaction chamber.
3. 根据权利要求2所述的设备,其中所述反应室提供在2-10 E—s托的压力下进行的沉积,且所述抽吸构件在1E^托下操作。 3. The apparatus of claim 2, wherein said reaction chamber providing a deposition at 2-10 E-s torr pressure, and said suction means operate at 1E ^ torr.
4. 根据权利要求l所述的设备,其中经由所述隔离构件从所述反应室移除所述气体。 4. The apparatus according to claim l, wherein said gas is removed from the reaction chamber through the isolation member.
5. 根据权利要求4所述的设备,其中经由所述隔离构件从所述反应室中移除所述气体, 并将其引导到收集设施。 5. The apparatus according to claim 4, wherein the gas is removed from the reaction chamber via the partition member, and leads it to the collection facility.
6. 根据权利要求4所述的设备,其中在一个所述反应室与一个所述隔离区域之间的接合面处提供衬底可穿过的孔。 6. The apparatus according to claim 4, wherein one of said reaction chamber with said engagement surface at an isolation region provided between the substrate may be passed through the holes.
7. 根据权利要求6所述的设备,其中所述孔具有与所述衬底类似的厚度,以使从所述反应室到所述隔离区域的气流最小化。 7. The apparatus according to claim 6, wherein said aperture has a similar thickness of the substrate, so that the reaction chamber from the gas flow to the isolated area is minimized.
8. 根据权利要求6所述的设备,其中所述孔可循环地关闭。 8. The apparatus according to claim 6, wherein the aperture can be closed cyclically.
9. 根据权利要求1所述的设备,其中所述反应室含有监视装置以扫描所述反应室的温度和压力。 9. The apparatus according to claim 1, wherein said reaction chamber comprises means for scanning said monitored temperature and pressure of the reaction chamber.
10. 根据权利要求9所述的设备,其中所述监视机构可控制所述纯气体的输入速率。 10. The apparatus according to claim 9, wherein said monitoring means may control the input rate of the pure gas.
11. 一种在用于生产光伏装置的多个独立沉积和反应室中用于压力控制的方法,其包括:a. 控制进入所述CGS反应室的气体流量;b. 将衬底馈送通过所述反应室的入口和出口处的孔;c. 建立邻近于且与所述反应室的所述入口和出口连通的具有较低压力的隔离区域;禾口d. 将离开所述反应室的所述纯气体移除到所述隔离区域内,且将所述隔离区域中的压力维持在1E—4托。 11. A method for controlling a pressure of a plurality of independent production of the photovoltaic device and the deposition reaction chamber, comprising: a gas flow rate control enters the reaction chamber CGS; b will be fed through the substrate. hole inlet and outlet of said reaction chamber; c build adjacent to the isolation region of lower pressure and with the inlet and outlet of the reaction chamber in communication;.. He will leave the port d of the reaction chamber said pure gas is removed to the isolation region and the isolation region maintain the pressure in the 1E-4 Torr.
12. 根据权利要求11所述的方法,其中所述衬底是能够被连续馈送通过所述反应室的连续层。 12. The method according to claim 11, wherein said substrate is capable of being continuously fed by a continuous layer of said reaction chamber.
13. 根据权利要求12所述的方法,其中所述衬底被附着到托盘上,其中一个或一个以上所述托盘被放置在所述反应室中。 13. The method according to claim 12, wherein the substrate is attached to the pallet, wherein one or more of said tray is placed in the reaction chamber.
14. 根据权利要求13所述的方法,其中在插入所述托盘后可以关闭所述孔。 14. The method according to claim 13, wherein said tray is inserted after the hole can be closed.
15. 根据权利要求11所述的方法,其中经由所述隔离区域移除离开所述反应室的所述气体。 15. The method of claim 11, wherein said isolation region is removed via the gas away from the reaction chamber.
16. 根据权利要求15所述的方法,其中将所述气体转移到收集设施。 16. The method of claim 15, wherein the gas is transferred to a collection facility.
17. 根据权利要求11所述的方法,其中所述隔离区域是一个所述隔离区域的出口与相邻的所述隔离区域的入口之间的接合处。 17. The method according to claim 11, wherein said isolation region is one of the inlet and outlet junction isolation region and adjacent to the isolation region between.
Description  translated from Chinese

光伏衬底沉积中的压力控制系统相关申请案的交出参者本申请案主张2004年11月10日申请的序列号为60/626,843的美国临时专利申请案的优先权。 PV substrate deposition pressure control system of surrender RELATED APPLICATIONS This application claims the Senate by November 10, 2004 Application Serial No. U.S. Provisional Patent Application 60 / 626,843 filed. 技术领域本发明涉及光伏电池的生产,且更明确地说,涉及用于将光伏工件从一个反应室不间断地转移到另一反应室的压力控制和隔离系统。 The present invention relates to production of photovoltaic cells, and more particularly, relates to the ongoing transfer of photovoltaic artifacts from one reaction chamber to another reaction chamber pressure control and isolation systems. 背景技术光伏(PV)电池、模块和能源系统为全世界对电力日益膨胀的需求提供清洁、可靠、 可更新的能量。 BACKGROUND Photovoltaic (PV) cells, modules and energy systems to power the expanding worldwide demand for clean, reliable, renewable energy. 遗憾的是,产品成本一直未能充分降低以在发展中世界打开关键市场, 在发展中世界,对电力的需求驱使其使用会造成污染的、不可更新的来源,例如煤和石油。 Unfortunately, the product has not been able to sufficiently reduce the cost to open key markets in the developing world, in the developing world, demand for electricity driven by its use can cause pollution, non-renewable sources, such as coal and oil. 随着人口膨胀和人均能量消耗的增长,全世界正走向不和谐的未来,届时,能量需求和供应将不可逆转地产生分歧。 With population growth and per capita energy consumption growth, the world is moving toward the future discord, then, the energy demand and supply will be irreversibly divided. PV电池为不可更新的能量源提供了一种替代品。 PV battery nonrenewable energy source provides an alternative. 然而,虽然可在实验室里制造相对高效的PV电池,但已证明,难以将所述工艺发展成具有对于商业生存而言至关重要的一致重复性和效率的商业规模。 However, although relatively efficient to manufacture PV cells in the laboratory, but has proven difficult to develop the technology into a commercial scale is critical for business survival consistent repeatability and efficiency. 由于缺乏高效的薄膜制造工艺,使得PV电池无法有效地取代市场上的代用能量源。 Due to the lack of efficient film manufacturing process such that PV cells can not effectively replace alternative energy sources on the market. 目前使用多步骤批处理来制造电池,其中在各反应步骤之间转移每一产品零件,且此类转移较为松散而且需要在室内循环进行反应。 Currently manufactured using a multi-step batch cell in which the reaction step between the transfer of each product part, and such transfer is more loose and need to react in indoor cycling. 典型的过程由一系列个别的批处理室组成,每一处理室特别针对电池中各层的形成而设计。 A typical process consists of a series of individual batch processing chambers, each processing chamber especially for the layers forming the battery design. 这种过程的一个缺点是,衬底被数次从真空转移到空气中再转移回到真空。 A disadvantage of this process is that the substrate is transferred from the vacuum several times and then transferred back to the air vacuum. 替代的系统使用一系列个别的批处理室,其与巻式连续过程耦合以用于每一室。 Alternative systems use a series of individual batch chamber, which coupled with Volume continuous process for each chamber. 这一过程的主要缺点是系统的非连续性以及需要破坏真空。 The main disadvantage of this process is non-continuous system and the need for breaking vacuum. PV电池制造设备的一个方面必须为:能在不损失真空的情况下使产品零件或衬底从一个反应室行进到另一反应室。 One aspect of the PV cell manufacturing equipment must be: to make the product part or substrate without loss of vacuum travels from one reaction chamber to another reaction chamber. 同样,当使衬底能在两个反应室之间行进时,所述设备必须不允许一个反应室中的反应物污染另一反应室。 Similarly, when the substrate is able to travel between the two reaction chambers when the device is not allowed to be a reaction in a reaction chamber to another reaction chamber contamination. 这个问题并非无所谓,因为p型吸收体的化学成分与PV电池中的n型结的化学成分是如此相似,以致两个反应室之间非常低度的交叉污染都会对电池性能造成非常大的影响。 This issue is not does not matter, because the chemical composition of the p-type absorber PV cells in the chemical composition of n-type junctions are so similar that a very low degree of cross-contamination can cause a very big impact on battery performance between the two reaction chambers . 因此,需要一种能够防止两个反应室之间的交叉污染的制造设备。 Thus, a need for a cross-contamination can be prevented between the two reaction chambers manufacturing equipment. PV制造设备的另一方面是需要紧密控制给定反应室中的温度和压力。 PV manufacturing equipment on the other hand is the need to tightly control the reaction chamber in a given temperature and pressure. 通常,给定层的形成取决于所述反应室中的温度和压力。 Typically, depending on the reaction chamber to form the temperature and pressure given layer. 因此,需要一种可调节反应室中的压力的系统。 Thus, a need exists to adjust the pressure of the reaction chamber system. 1995年11月28日颁予Coleman的第5,470,784号美国专利揭示一种用于使用半导体材料涂覆衬底以用于生产PV电池的设备,其中具有通过一系列压力低于沉积间(exposition compartment)的"端口"分开的许多沉积室。 November 28, 1995 Coleman awarded US Patent No. 5,470,784 discloses a method for coating a substrate using a semiconductor material for the production of PV battery-powered devices, including a series of pressure below the deposition room (exposition compartment) "port" of many separate deposition chamber. 然而,此专利并没有涵盖与差分抽吸配置相一致地使用纯气体来控制反应室中的压力。 However, this patent does not cover the differential pumping configuration with consistent use of pure gases to control the pressure in the reaction chamber. 此外,此发明没有教示孔的构造,所述孔将限制气体从反应室流到隔离区域。 Additionally, this invention is not taught well structure, the hole will restrict gas flow from the reaction chamber isolation region. Coleman也没有教示连续的制造过程。 Coleman has not taught a continuous manufacturing process. Hardy的第5,343,012号美国专利揭示一种控制衬底的温度的方法,在所述衬底上将制造出薄膜结构。 Hardy, U.S. Patent No. 5,343,012 discloses a method for controlling the temperature of the substrate, the substrate will be manufactured in thin film structures. 然而,此发明没有揭示将衬底从一个沉积室传输到第二沉积室。 However, this invention does not disclose transporting the substrate from one deposition chamber to the second deposition chamber. Van Mast的第6,554,950号美国专利揭示一种在施加真空的情况下将表面污染物从衬底移除的方法和设备。 No. 6,554,950 Van Mast U.S. patent discloses a method and apparatus for applying a vacuum in the case of surface contaminants removed from the substrate. 然而,此发明没有揭示使用差分抽吸来控制反应室中的压力,也没有揭示使用差分抽吸来将衬底从一个反应室转移到第二反应室。 However, this invention does not disclose the use of differential pumping to control the pressure in the reaction chamber, also does not disclose the use of differential pumping to the substrate from one reaction chamber to the second reaction chamber. 2001年8月7日颁予Mashburn的第6,270,861号美国专利揭示一种用于在沉积室中形成薄膜的设备,其中使用差分抽吸来防止两个不同气氛的相互作用。 August 7, 2001 Mashburn awarded US Patent No. 6,270,861 discloses an apparatus for forming a thin film deposition chamber for which the differential pumping to prevent the interaction of two different atmospheres. 然而,此发明没有涵盖每一者的压力均高于屏障的两个反应室之间存在的真空屏障的概念。 However, this invention does not cover each of the pressure is higher than the conceptual barrier exists between the two reaction chambers of the vacuum barrier. Bartolomei的第5,849,162号美国专利揭示一种用于更有效的溅镀工艺的装置和过程。 Bartolomei U.S. Patent No. 5,849,162 discloses a method for more efficient sputtering apparatus and process technology. 虽然所述设备利用差分抽吸和多个台(其中衬底可具有沉积在上面的层),但此发明没有使用形成每一者均具有独立温度和压力的反应室所必需的隔离区域。 Although the use of differential pumping device and a plurality of stations (including substrate may have deposited on top of the layer), but this invention does not use a reaction chamber each caught with independent temperature and pressure necessary for the formation of the isolation region. Scobey的第4,851,095号美国专利揭示一种用于通过多个反应台的连续衬底的沉积设备。 Scobey U.S. Patent No. 4,851,095 discloses a device for the continuous substrate by depositing a plurality of reaction units. 然而,此发明没有涵盖每一反应室需要不同的压力和温度,而且没有涵盖所述反应室之间的真空隔离区域。 However, this invention does not cover the different needs of each reaction chamber pressure and temperature, and do not cover the vacuum isolation region of the reaction chamber. 发明内容本发明是一种用于生产光伏(PV)电池的设备,其具有至少一个提供与至少一个反应室连通的真空隔离区域的差分抽吸机构,且其中所述反应室含有用于控制纯气体到反应室的流量的机构。 The present invention is a method for producing a photovoltaic (PV) cells apparatus for providing a vacuum having at least one isolation region communicating with at least one reaction chamber of the differential pumping mechanism, and wherein the reaction chamber for controlling containing pure gas into the mechanism of the reaction chamber flow. 在一个实施例中,所述隔离区域被放置在两个连续的反应室之间, 但这并不是本发明的必要条件。 In one embodiment, the isolation region is disposed between two successive reaction chambers, but this is not a requirement of the present invention. 与差分抽吸机构一致动作的是一种仪器,其用于控制纯气体进入所连接的反应室的流量,进而维持所述反应室中的近似真空,但隔离区域中的压力始终低于反应室。 Consistent with the operation of the differential pumping mechanism is an instrument for controlling the flow of pure gas into the reaction chamber is connected, thereby maintaining the reaction chamber is approximately a vacuum, but the isolation region is always lower than the pressure in the reaction chamber . 与设备相关联的是位于隔离区域/反应室界面处的孔,其足够大以允许衬底在室之间传递,而不会中断过程,同时使得从反应室流入隔离区域中的气体最少。 Associated with the device isolation region is located holes / reaction chamber at the interface, which is large enough to allow the substrate to pass between rooms, without interrupting the process, while allowing the gas flow into the isolated region least from the reaction chamber. 这些孔与行进穿过这些孔的托盘具有大致一样的大小,但虑及托盘放置的不精确性和潜在的热膨胀,这些孔会略大于托盘。 These holes travel through these holes having substantially the same size as the tray, but the tray is placed into account inaccuracies and potential thermal expansion, which will be slightly larger than the tray hole. 本发明进一步包括一种用于多个独立沉积和反应室中的压力控制的方法,其包括-控制进入反应室中的气体的流量;将衬底馈送通过反应室的入口和出口处的孔;建立邻近于且与反应室连通的具有较低压力的隔离区域;和移除离开反应室的气体以防止进入相邻反应室的交叉污染。 The present invention further includes a method of depositing a plurality of independent reaction chamber pressure control, comprising - control traffic entering the reaction chamber gas; the substrate is fed through a hole inlet and outlet of the reaction chamber; established adjacent to and in communication with the reaction chamber having a lower pressure isolation region; and removing the gases leaving the reaction chamber to prevent cross-contamination of adjacent entering the reaction chamber. 此设备的优点在于隔离反应室以防止交叉污染,同时其允许使衬底在室之间不间断地传递。 The advantage of this device is that the isolation chamber to prevent cross-contamination, while it allows the substrate to pass uninterrupted between chambers. 在一个实施例中, 一托盘或许多托盘可离开一个反应室并临时位于一隔离区域中,同时使得对衬底的负面影响最小化,且接着稍后进入下一后续的反应室。 In one embodiment, a tray or a tray to leave a lot of the reaction chamber and temporarily located in an isolation region, while such a negative impact on the substrate is minimized, and then later into the next subsequent reaction chamber. 在另一实施例中,可以类似于串的方式将所述托盘组织起来,使得所有反应室可同时对不同的托盘操作。 In another embodiment, the string may be similar to the tray organized manner, such that all the reaction chambers can operate simultaneously on different trays. 本发明还使得连续移动通过一系列反应室的连续或"巻式"衬底设计成为可能, 其中每一反应室被压力受控的隔离区域分离。 The present invention also enables a continuous or continuous movement through the "Volume" type substrate, the reaction chamber design possible series, wherein each reaction chamber is separated in a pressure-controlled isolation region. 尽管许多参考揭示连续衬底的概念,但本发明使得光伏制造过程变得真正连续。 Although many concepts disclosed with reference to a continuous substrate, but the present invention is such that PV manufacturing process becomes truly continuous. 在一个实施例的操作中, 一差分泵或一系列差分泵附接到隔离区域。 In operation of one embodiment of a differential pump or pump attached to a series of differential isolation region. 此泵可连续运作或可循环运作以维持真空,同时向反应室添加惰性气体以使所述室的压力略大于完全真空,这对于反应是必要的。 This pump can be operated continuously or can be recycled in order to maintain the operating vacuum, while adding an inert gas to the reaction chamber so that the pressure chamber is slightly larger than the full vacuum, it is necessary for the reaction. 在一个实施例中,可通过传感器阵列来监视压力和温度, 且通过例如计算机的控制装置进行分析,所述控制装置可自主地控制反应室的环境特征。 In one embodiment, the sensor array can be monitored by pressure and temperature, and analyzed by a computer such as a control device, the control device can be autonomously controlled environmental characteristics of the reaction chamber. 本发明的一个目标是提供一种压力隔离设备以用于允许衬底传递通过一系列反应室,每一反应室沉积用于生产光伏电池的较薄化学层,同时大体上维持每一反应室中必要的沉积和/或反应条件。 An object of the present invention is to provide a pressure isolation device for allowing the substrate to pass through a series of reaction chambers, each reaction chamber for the production of photovoltaic cells deposited thin chemical layer, while substantially maintaining each reactor chamber necessary deposition and / or reaction conditions. 本发明的另一目标使得能将衬底从一个反应室转移到下一后续的室,或转移到外部大气,且不会使衬底在转移期间经受较大的温度和压力变化。 Another object of the present invention allows the substrate can be transferred from one chamber to the next follow-up of the reaction chamber, or transferred to the outside atmosphere, without causing the substrate is subjected to during the transfer of large temperature and pressure variations. 本发明的第三目标是将衬底从反应室转移到下一后续的反应室,而不允许两个反应室之间的交叉污染。 The third object of the present invention is to transfer the substrate from the reaction chamber to the next subsequent reaction chamber, and do not allow cross-contamination between the two reaction chambers. 附图说明通过参考结合附图的对本发明的若干实施例的以下描述,本发明的上述和其它特征和优点,以及获得这些特征和优点的方式将变得明了且容易理解,其中: 图1是两个反应室之间的单一隔离区域的示意图;图la是具有关联的收集设施的真空泵设备的图;图2是展示隔离区域的可能形状的一个潜在实施例的透视图;图3是单一隔离区域的示意图,其中真空泵设备安装在隔离区域的内部;图4是连接到单一反应室的单一隔离区域和用于完成的衬底的移除区的示意图。 BRIEF illustrated by reference to the following description of several of the present invention embodiment of the figure, the above and other features and advantages of the present invention, as well as way to get such features and advantages will become apparent and easy to understand, in which: Figure 1 is between the two reaction chambers schematic single isolation region; Fig la is a diagram of a collection facility has an associated vacuum equipment; Fig. 2 is likely to form the isolation region a perspective view of a potential embodiment; Figure 3 is a single isolated schematic diagram of the area, which is mounted inside the vacuum pump device isolation region; Figure 4 is a schematic diagram of a single reaction chamber connected to a single isolation area and a complete removal of the substrate region. 整个若干图式中相应的参考符号指示相应的部件。 Total number of drawings in which corresponding reference symbols indicate corresponding parts. 本文陈述的实例说明本发明的若干实施例,但不应理解为以任何方式限制本发明的范畴。 Examples forth herein illustrate several embodiments of the present invention, but should not be construed as in any way limiting the scope of the present invention. 具体实施方式图1中描绘本发明的一实施例,且包括附接到至少一个反应室102的封闭隔离区域100,但在大多数情况下,所述封闭隔离区域100附接在两个反应室102之间。 DETAILED DESCRIPTION Figure 1 depicts an embodiment of the present invention, and includes at least one attached to the reaction chamber 102 enclosed isolation region 100, but in most cases, the isolation region 100 enclosed is attached to two reaction chambers 102.. 隔离区域100的实体形状可以是任何形状,例如立方体或矩形,且可由托盘、工件或其它衬底传输装置104的尺寸确定。 Entity shape isolation region 100 can be any shape such as a cube or a rectangle, and may be a tray, the size of the workpiece or other substrate transport apparatus 104 is determined. 显然,可通过优化真空中的性能来驱动隔离区域100的形状, 因此,为支持在区域中抽出10—7托的真空,如图2所描绘的圆柱体或球形形状可能是必需的。 Obviously, to drive the isolation region 100 by optimizing the shape of the vacuum in the performance, therefore, to support the extraction 10-7 torr vacuum in the region, as depicted in Figure 2, cylindrical or spherical shapes may be necessary. 封闭隔离区域100的大小还可由光伏生产工艺的反应要求来确定。 Size of the area enclosed isolation 100 may also be determined by the response of photovoltaic production process requirements. 可能影响(例如)隔离区域100的长度的因素可能会是问题,例如相邻反应室的内部压力、反应室102 中的工件104的滞留时间以及加工过程对反应室之间的交叉污染的敏感度。 May affect (e.g.) factor of the length of the isolation region 100 may be a problem, for example, the internal pressure of the reaction chamber adjacent to, and residence time sensitive process in the reaction chamber 102 of the workpiece 104 on the cross-contamination between the reaction chamber . 在隔离区域的至少一端上的是反应室102,其包含用于将化学物或合金沉积在衬底上的设备106。 In the isolation region of the reaction chamber 102 is on at least one end, comprising a device 106 for chemicals or alloy deposited on the substrate. 用于沉积的一般方法包含蒸镀、溅镀以及所属领域的技术人员己知的其它技术。 General procedure for depositing comprises evaporation, sputtering, and those skilled in the art of other known techniques. 不管沉积方法是什么,期望反应室中的压力将非常低,通常在10《10-3托的范围内。 Whatever the deposition method is desirable in the reaction chamber pressure will be very low, generally in the range of 10 "10-3 Torr. 为了维持将防止相邻反应室102之间的交叉污染的隔离区域100,隔离区域100 伴有泵108,借此,此泵的吸入端IIO通过连接装置112附接到隔离区域壁111,或可永久地附接到隔离区域壁111,其将使得隔离区域的压力能持续小于相邻反应室102的压力(约为10-7托)。 In order to maintain cross-contamination of the reaction chamber 102 between the isolation region 100 adjacent to prevent, isolation region 100 associated with pump 108, whereby the IIO suction side of the pump 112 through a connecting means attached to the wall of the isolation region 111, or permanently attached to the wall of isolation region 111, which will make the pressure isolation region sustained pressure of the reaction chamber 102 is smaller than the adjacent (about 10-7 torr). 在另一实施例中,如图3中所描绘,泵108可安装在隔离区域100的内部,且泵排出口114从内部连接到隔离区域壁111。 In another embodiment, as depicted in FIG. 3, the pump 108 may be installed inside the isolation region 100, and the pump discharge outlet 114 is connected from the interior wall 111 to the isolation region. 还预期可能有必要使用串联的许多泵108来实现充分的真空。 It is also contemplated it may be necessary to use a number of pump 108 in series to achieve sufficient vacuum. 本发明并不排除使用单个差分泵来用于多个隔离区域;然而, 这很可能导致每一反应室/隔离区域界面116上不同的AP,这可能是不良的。 The present invention does not exclude the use of a single pump for multiple differential isolation region; however, this is likely to result in each of the reaction chambers / interface 116 on the isolation region different AP, which may be undesirable. 为了使得衬底104能从反应室102传递通过隔离区域100并进入下一反应室103, 一孔被放置在反应室/隔离区域界面115、 116处隔离区域100的入口117和出口118上。 From 102 to 104 so that the substrate passes through the reaction chamber isolation region 100 and into the next reaction chamber 103, a hole is placed in the reaction chamber / isolation area of the interface 115, the inlet 117 and outlet 118 116 100 isolation region. 所属领域的技术人员将易于了解,在存在孔117、 118的情况下,如果不予控制,那么差分泵108会将隔离区域100以及反应室102、 103排空到同样低的真空。 Those skilled in the art will readily appreciate, in the presence of 117, 118 of the hole, if not control, then the difference will pump 108 isolation region 100 and a reaction chamber 102, 103 evacuated to the same low vacuum. 因为反应室102、 103中的压力大于隔离区域100的压力以便防止两个反应室之间的交叉污染是比较重要的,所以必须通过外部压力源对反应室102、 103进行"加压",以抵抗泵108的真空处理效应。 Because of the reaction chamber 102, a pressure greater than 103 pressure isolation region 100 in order to prevent cross-contamination between the two reaction chambers is more important, it must be by an external pressure source to the reaction chamber 102, 103 "pressure" to Resistance vacuum pump 108 treatment effect. 在一个实施例中,这是通过经由气体入口134、 135将纯气体125、 126 (例如氩气、氮气或氧气)引入反应室102、 103中来实现的。 In one embodiment, this is via a gas inlet 134, the pure gas 135 125, 126 (e.g., argon, nitrogen or oxygen) introduced into the reaction chamber 102, 103 to achieve. 可经由类似于将真空泵的吸入端连接到隔离区域壁112的装置的连接装置121、 122 将这些入口134、 135附接到反应室壁。 Is similar to the vacuum pump via the suction side wall is connected to the connecting device isolation region 121 means 112, 122 of these inlet 134, 135 attached to the reaction chamber wall. 图1显示附接到每一气体入口134、 135的纯气体存储罐123、 124。 Figure 1 shows a gas inlet 134 is attached to each, 135 of pure gas storage tanks 123, 124. 此实施例反映出两个不同反应室中发生的过程可能需要一个反应室125中的纯气体不同于另一反应室中的纯气体126以得到最佳的光伏结果的可能性。 This embodiment reflects the process takes place in two different reaction chambers may require a reaction chamber 125 is different from another in the pure gas in the pure gas in the reaction chamber 126 to obtain a possibility of the best photovoltaic results. 然而,本发明不排除使用单个纯气体罐来用于所有反应室。 However, the present invention does not exclude the use of a single pure gas canister is used for all the reaction chambers. 另外,其它气体也可用于压力控制,但此可取决于以下因素:例如反应室中的过程,污染衬底的可能性,以及过程所需的压力和温度。 Further, other gases may also be used to control the pressure, but this may depend on the following factors: e.g., the reaction chamber process, the possibility of contamination of the substrate, and the desired process pressure and temperature. 参看图la,在纯气体供应不足的情况下,或气体释放可能是环境污染物的情况下,可将收集罐150附接到泵114的出口,以收集纯气体用于随后使用或合适安置。 Referring to Figure la, in the absence of sufficient supply of pure gas, or gas release could be the case of environmental contaminants may be collecting tank 150 is attached to the outlet of the pump 114 to collect pure gas or a suitable place for later use. 为了维持反应室102、 103中的大于隔离区域100的压力,孔117、 118必须能限制反应室102、 103中的纯气体125、 126因隔离区域/反应室边界115、 116上的差压而损失到隔离区域100。 In order to maintain the reaction chamber 102, 103 is greater than the pressure of the isolation region 100, holes 117, 118 must be able to limit the reaction chamber 102, 103 pure gas 125, 126 due to the isolation area / reaction chamber borders 115, 116 and the differential pressure loss to the isolated region 100. 因此,孔的大小和配置必须经限制以限制此损失。 Thus, pore size and configuration must be approved by restrictions to limit this damage. 图1仅表示可为大型沉积设备的一段,孔119还附接到每一反应室的入口和出口。 Figure 1 shows only for a period of large deposit device, hole 119 is also attached to the inlet and outlet of each reaction chamber. 优选的情况是,孔仅在一定程度上大于衬底104本身。 Preferred is that the hole is larger than a certain extent, only substrate 104 itself. 在所述实施例中,孔在"巻式"过程中的操作将最为有效,因为衬底本身将持续抑制气体从反应室向外流到隔离区域。 In the illustrated embodiment, the hole in the "Volume" type during operation is most effective, because the substrate itself will continue to inhibit the flow of gas from the reaction chamber outwardly isolation region. 在另一实施例中,具体说在个别"托盘"衬底的情况下,孔117、 118仅在托盘104进入或离开反应室时打开,以便完全防止气体的损失和随后的减压。 In another embodiment, specifically in individual cases "tray" substrate hole 117, 118 only when the tray 104 entering or leaving the reaction chamber is opened in order to fully prevent the loss of gas and the subsequent decompression. 在此实施例中,温度和压力传感器127、 128被放置在反应室中,且如虚线132所表示,与可为计算机的控制装置130电连通,且连续地监视反应室温度和压力。 In this embodiment, the temperature and pressure sensors 127, 128 are placed in the reaction chamber, and the dotted line 132 as indicated, and may be a computer control device 130 electrically communicates, and continuously monitors the temperature and pressure of the reaction chamber. 控制130 装置将这些值与也由传感器129测量的隔离区域100的温度和压力进行比较,所述传感器129如虚线136所表示与控制装置130电连通。 These control means 130 are values measured by the isolation region 129 of the sensor 100 of the temperature and pressure are compared, the sensor 129 indicated as dashed lines 136 in communication with the control circuit means 130. 为了维持反应室/隔离区域界面上的合适的AP,控制装置130可通过电磁阀或节流阀131、 133的电控制来控制纯气体125、 126 任一者进入反应室的流动速率,所述电磁阀或节流阀位于纯气体入口134、 135与纯气体存储罐123、 124之间。 In order to maintain an appropriate reaction chamber AP / isolation region interface, the control device 130 can control the pure gas solenoid valve or throttle 125 through 131, electrical control 133, 126 either to enter the flow rate of the reaction chamber, the solenoid valve or throttle valve located in the pure gas inlet 134, 135 and 123 pure gas storage tank, between 124. 在另一实施例中,可通过控制真空泵108而不是纯气体流动速率来控制AP,或通过泵与纯气体流动速率控制的某一组合来进行控制。 In another embodiment, the vacuum pump 108 may be controlled instead by a pure gas flow rate control AP, or by a combination of a pump with a pure gas flow rate control to control. 如先前所述,隔离区域不需要仅存在于两个反应室之间。 As previously described, it does not need to exist only in the isolation region between the two reaction chambers. 在另一实施例中,隔离区域可仅与一个反应室连通,以便防止反应室与外部大气之间的污染,如图4中描绘。 In another embodiment, the isolation region may be in communication with only one reaction chamber, in order to prevent contamination between the reaction chamber and the external atmosphere, as depicted in FIG. 4. 在此实施例中,隔离区域100充当目的地,其中衬底104是完成好的,或必须被转移到另一设备以进一步开发。 In this embodiment, the isolation region 100 acts as a destination, wherein the substrate 104 is completed well, or to be transferred to another device for further development. 如图4中所见,提供存取点401以供移除衬底104。 Seen in Figure 4, the access point 401 provides for the removal of the substrate 104. 诸如此类的隔离室对于防止空气中的杂质进入反应室来说是理想的,所述反应室将可能处于或接近真空水平。 Like isolation room to prevent impurities in the air into the reaction chamber is ideal, the reaction chamber may be at or near the vacuum level. 然而,此隔离区域上的AP远大于任何反应室/隔离区域界面上的AP。 However, AP this isolated area is much larger than any of the reaction chamber AP / isolation region interface. 在正常条件并使用所属领域的技术人员已知的沉积方法的情况下,大气与隔离区域之间的AP可能比隔离区域与反应室之间的AP大IOOO倍。 Under normal conditions and in case of skilled in the art using known deposition methods, AP between the atmosphere and the isolation region than the isolation region may be the reaction chamber between the AP and the large IOOO times. 因为此较大的AP,所以隔离区域与外部大气之间的简单的存取点401可能是不够的。 Because this larger AP, so a simple access point between the isolation region 401 and the external atmosphere may be insufficient. 因此,所述存取点可能不像其它孔一样能连续打开。 Thus, the access point may be as unlike other holes can be continuously open. 虽然已参考特定实施例描述了本发明,但所属领域的技术人员将了解,在不脱离本发明的范畴的情况下,可作出各种改变,且等效物可取代其元件。 While there has been described with reference to particular embodiments of the present invention, those skilled in the art will appreciate that, without departing from the scope of the present invention, the various changes may be made and equivalents may be substituted for elements thereof. 另外,在不脱离本发明的范畴的情况下,可进行许多修改来使特定情形或材料适合于本发明的教示。 In addition, without departing from the scope of the present invention case, many modifications to adapt a particular situation or material to the teachings of the present invention. 因此,期望本发明不限于所揭示的用最佳模式来实行本发明的特定实施例,而且期望本发明将包含处于附加权利要求书的范畴和精神内的所有实施例。 Therefore, it intended that the invention is not limited to the disclosed with the best mode to carry out a particular embodiment of the present invention, and intended that the invention will include in the scope of the appended claims and all embodiments within the spirit.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
CN102869810A *1 Feb 20119 Jan 2013美国迅力光能公司Isolation chamber and method of using isolation chamber to make solar cell material
International ClassificationC23C16/00
Cooperative ClassificationH01L31/072, C23C14/568, Y02E10/541, H01L31/1876, H01L31/0749, H01L31/0322, Y02P70/521
European ClassificationH01L31/0749, H01L31/032C, H01L31/072, H01L31/18H, C23C14/56F
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