CN101052624A - 生产封端型异氰酸酯化合物的方法 - Google Patents
生产封端型异氰酸酯化合物的方法 Download PDFInfo
- Publication number
- CN101052624A CN101052624A CNA2005800374066A CN200580037406A CN101052624A CN 101052624 A CN101052624 A CN 101052624A CN A2005800374066 A CNA2005800374066 A CN A2005800374066A CN 200580037406 A CN200580037406 A CN 200580037406A CN 101052624 A CN101052624 A CN 101052624A
- Authority
- CN
- China
- Prior art keywords
- isocyanate compound
- compound
- blocked isocyanate
- iii
- ethylenically unsaturated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D231/28—Two oxygen or sulfur atoms
- C07D231/30—Two oxygen or sulfur atoms attached in positions 3 and 5
- C07D231/32—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/12—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
Abstract
Description
Claims (16)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004316577 | 2004-10-29 | ||
JP316577/2004 | 2004-10-29 | ||
PCT/JP2005/020151 WO2006046758A1 (en) | 2004-10-29 | 2005-10-27 | Process for producing blocked isocyanate compound |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101052624A true CN101052624A (zh) | 2007-10-10 |
CN101052624B CN101052624B (zh) | 2010-05-12 |
Family
ID=38190917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005800374066A Active CN101052624B (zh) | 2004-10-29 | 2005-10-27 | 生产封端型异氰酸酯化合物的方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7504518B2 (zh) |
EP (1) | EP1812402B1 (zh) |
JP (1) | JP4879557B2 (zh) |
KR (1) | KR100891790B1 (zh) |
CN (1) | CN101052624B (zh) |
TW (1) | TW200626529A (zh) |
WO (1) | WO2006046758A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102844297A (zh) * | 2010-04-14 | 2012-12-26 | 3M创新有限公司 | 制备异氰酸酯的方法 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5685839B2 (ja) * | 2010-06-23 | 2015-03-18 | 日油株式会社 | 防曇塗料組成物 |
CA2869973C (en) | 2012-04-09 | 2017-06-06 | M-I L.L.C. | Triggered heating of wellbore fluids by carbon nanomaterials |
CN108707092A (zh) * | 2012-07-30 | 2018-10-26 | 昭和电工株式会社 | 封闭异氰酸酯化合物的制造方法 |
WO2015016330A1 (ja) * | 2013-08-02 | 2015-02-05 | ダイキン工業株式会社 | 不飽和基を有する新規化合物及びこの化合物を含む組成物 |
CN105431490B (zh) | 2013-08-02 | 2017-09-01 | 大金工业株式会社 | 包含含有选自由聚合性官能团和交联性官能团组成的组中的至少一种基团的含氟聚合物的组成物和涂装物品 |
KR101957476B1 (ko) | 2017-03-24 | 2019-03-12 | 한국화학연구원 | 이중 경화가 가능한 저온가교형 블록이소시아네이트 및 이를 포함하는 조성물 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2612783C3 (de) | 1976-03-25 | 1981-11-05 | Hoechst Ag, 6000 Frankfurt | Biurete, Verfahren zu ihrer Herstellung und deren Verwendung |
DE3046409A1 (de) | 1980-12-10 | 1982-07-15 | Bayer Ag, 5090 Leverkusen | Beschichtungsmittel und ein verfahren zur herstellung von ueberzuegen |
US5246557A (en) * | 1984-02-29 | 1993-09-21 | The Baxenden Chemical Co. | Blocked isocyanates |
JPH0749462B2 (ja) | 1989-06-14 | 1995-05-31 | 日本ポリウレタン工業株式会社 | ブロックイソシアネート化合物、並びにこれを含有する低温硬化性組成物、塗料組成物及び接着剤組成物 |
US5395721A (en) * | 1992-03-02 | 1995-03-07 | Fuji Photo Film Co., Ltd. | Electrophotographic material for color proofing |
JP3276440B2 (ja) | 1992-03-02 | 2002-04-22 | 富士写真フイルム株式会社 | 電子写真式色校正用原版 |
US5626996A (en) | 1992-06-04 | 1997-05-06 | Fuji Photo Film Co., Ltd. | Electrophotographic material for color proofing |
FR2717178B1 (fr) | 1994-03-14 | 1997-01-31 | Hoechst France | Résines acrylate-styrène réticulée par un polyisocyanate bloqué, préparation et applications comme peinture et/ou vernis. |
DE4416750A1 (de) | 1994-05-13 | 1995-11-16 | Bayer Ag | Mischblockierte Polyisocyanate |
DE4441418A1 (de) | 1994-11-22 | 1996-05-23 | Bayer Ag | Verfahren zur Herstellung von 3,5-Dimethylpyrazol-blockierten Polyisocyanaten |
JP3781862B2 (ja) | 1997-05-19 | 2006-05-31 | 昭和電工株式会社 | 硬化性組成物 |
-
2005
- 2005-10-27 US US11/666,696 patent/US7504518B2/en not_active Expired - Fee Related
- 2005-10-27 EP EP05800038.1A patent/EP1812402B1/en active Active
- 2005-10-27 CN CN2005800374066A patent/CN101052624B/zh active Active
- 2005-10-27 WO PCT/JP2005/020151 patent/WO2006046758A1/en active Application Filing
- 2005-10-27 KR KR1020077011948A patent/KR100891790B1/ko active IP Right Grant
- 2005-10-28 TW TW094137933A patent/TW200626529A/zh unknown
- 2005-10-31 JP JP2005316071A patent/JP4879557B2/ja active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102844297A (zh) * | 2010-04-14 | 2012-12-26 | 3M创新有限公司 | 制备异氰酸酯的方法 |
CN102844297B (zh) * | 2010-04-14 | 2014-12-10 | 3M创新有限公司 | 制备异氰酸酯的方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101052624B (zh) | 2010-05-12 |
WO2006046758A1 (en) | 2006-05-04 |
KR20070073940A (ko) | 2007-07-10 |
EP1812402B1 (en) | 2013-07-17 |
KR100891790B1 (ko) | 2009-04-07 |
TW200626529A (en) | 2006-08-01 |
EP1812402A1 (en) | 2007-08-01 |
JP2006151967A (ja) | 2006-06-15 |
US20070265454A1 (en) | 2007-11-15 |
US7504518B2 (en) | 2009-03-17 |
JP4879557B2 (ja) | 2012-02-22 |
TWI308562B (zh) | 2009-04-11 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CI01 | Publication of corrected invention patent application |
Correction item: Inventor Correct: Miyada Hideo|Murakami Jungmin|Ono Seungjun False: Miyada Hideo|Murakami Masami|Ono Seungjun Number: 19 Volume: 26 |
|
CI03 | Correction of invention patent |
Correction item: Inventor Correct: Miyata Hideo|Murakami Jungmin|Ono Seungjun False: Miyata Hideo|Murakami Masami|Ono Seungjun Number: 19 Page: The title page Volume: 26 |
|
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: Lishennoco Co.,Ltd. Address before: Tokyo, Japan Patentee before: Showa electrical materials Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230525 Address after: Tokyo, Japan Patentee after: Showa electrical materials Co.,Ltd. Address before: Tokyo, Japan Patentee before: SHOWA DENKO Kabushiki Kaisha |