CN101027707B - Methods for visually inspecting interferometric modulators for defects - Google Patents
Methods for visually inspecting interferometric modulators for defects Download PDFInfo
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- CN101027707B CN101027707B CN200580032120.9A CN200580032120A CN101027707B CN 101027707 B CN101027707 B CN 101027707B CN 200580032120 A CN200580032120 A CN 200580032120A CN 101027707 B CN101027707 B CN 101027707B
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Abstract
A method is provided for visual inspection of an array (60) of interferometric modulators in various driven states. This method may include driving multiple columns or rows of interferometric modulators via a single test pad or test lead, such as test pad (72), and then observing the array (60) for discrepancies between the expected optical output and the actual optical output of the array (60). This method may particularly include, for example, driving a set of non-adjacent rows or columns, such as columns (62), to a state different from the intervening rows or columns, such as columns (64), and then observing the optical output of the array (60).
Description
Technical field
The present invention relates to the test to microelectromechanicdevices devices, and in particular to the test based on the display of interferometric modulator.
Background technology
MEMS (micro electro mechanical system) (MEMS) comprises micromechanical component, activator appliance and electronic component.Micromechanical component can adopt deposition, etching or other some parts that can etch away substrate and/or institute's deposited material layer maybe can add some layers and make with the miromaching that forms electricity and electromechanical assembly.One type MEMS device is called as interferometric modulator.Term interferometric modulator used herein or interferometric light modulator refer to a kind ofly optionally absorb and/or catoptrical device with principle of optical interference.In certain embodiments, interferometric modulator can comprise the pair of conductive plate, and wherein one or both is all can be whole or in part transparent and/or be reflectivity, and can relative motion when applying suitable electric signal.In a particular embodiment, a plate can comprise the quiescent layer that is deposited on the substrate, and another plate can comprise the metallic film that separates by air gap and this quiescent layer.Be described in more detail such as this paper, one of them plate can change the optical interference that is incident in the light on the interferometric modulator with respect to the position of another plate.These devices are with a wide range of applications, and in affiliated field, utilize and/or revise the feature of these types of devices so that its characteristic can be used for improving existing product and makes at present still undeveloped new product will be rather useful.
Be desirable to provide for the sight check interferometric modulator array flawless effective ways are arranged.Particularly, be desirable to provide a kind of can detection arrays in the interferometric modulator visual inspection methods of various latent defect.It would also be desirable to provide a kind of making and carry out time and the minimized interferometric modulator array method of inspection of complexity that the array check is prepared.
Summary of the invention
In one embodiment, a kind of method of testing interferometric modulator array is provided, described method comprises: side by side more than first non-adjacent interferometric modulator row are applied first signal at least in part, so that the interferometric modulator in described more than first non-adjacent row is placed state of activation, and check described interferometric modulator array with the defective in the identification array, wherein said check is to implement after applying described first signal.
In another embodiment, a kind of method of testing interferometric modulator array is provided, it comprises: each in side by side capable to more than first non-adjacent interferometric modulators at least in part applies the first waveform, in side by side capable to more than second non-adjacent interferometric modulators at least in part each applies the second waveform, in side by side more than first non-adjacent interferometric modulators being listed as at least in part each applies the 3rd waveform, in side by side more than second non-adjacent interferometric modulators being listed as at least in part each applies the 4th waveform, and checks described interferometric modulator array with the defective in the identification array.
In another embodiment, a kind of method of checking interferometric modulator array is provided, it comprises: each modulator in the described interferometric modulator array is urged to the first known state, with a subset of described array internal interference formula modulator row from described the first known state-driven to the second state, wherein said the second state and described the first opposite states; And check described interferometric modulator array with the defective in the identification array.
In another embodiment, provide a kind of device, it comprises: substrate; More than first non-adjacent column electrodes by described substrate supports; More than second non-adjacent column electrodes by described substrate supports; The first bus, it is electrically connected with described more than first column electrode; The second bus, it is electrically connected with described more than second column electrode; More than first non-adjacent row electrode, itself and described substrate are separately; More than second non-adjacent row electrode, itself and described substrate are separately; Triple bus-bar, itself and described more than first row electrode electric connection; And the 4th bus, itself and described more than first row electrode electric connection.
In another embodiment, provide a kind of device, it comprises: the first conductive members, and it is used for more than first signal of conduction; Supporting member, it is used for supporting described the first conductive members be used to conducting a plurality of signals; The second conductive members, it is used for more than second signal of conduction; The first selectivity provides member, and it is used for optionally providing waveform for each first of described the first conductive members; The second selectivity provides member, and it is used for optionally providing waveform for each second portion of described the first conductive members; The 3rd selectivity provides member, and it is used for optionally providing waveform for each first of described the second conductive members; And the 4th selectivity provides member, and it is used for optionally providing waveform for each second portion of described the second conductive members; The the 3rd and the 4th conductive members, its through arranging so that the signal that is carried by described conductive members produces test pattern.
Description of drawings
Fig. 1 is first-class axle figure, it schematically illustrates the part of an embodiment of interferometric modulator display, wherein the removable reflection horizon of the first interferometric modulator is in slack position, and the removable reflection horizon of the second interferometric modulator is in active position.
Fig. 2 is a system block diagrams, and its demonstration comprises an embodiment of the electronic installation of 3x3 interferometric modulator display.
Fig. 3 by the removable mirror position of an exemplary embodiment of interferometric modulator shown in Figure 1 with executed alive graph of a relation.
Fig. 4 is one group of synoptic diagram that can be used for driving the row and column voltage of interferometric modulator display.
Fig. 5 A is presented at an exemplary display data frame in the 3x3 interferometric modulator display shown in Figure 2.
Fig. 5 B graphic extension can be used for writing the capable signal of frame shown in Fig. 5 A and an exemplary sequential chart of column signal.
Fig. 6 A and 6B are system block diagrams, and its graphic extension comprises the embodiment of the visual display unit of a plurality of interferometric modulators.
Fig. 7 A is the sectional view of device shown in Figure 1.
Fig. 7 B is the sectional view of the alternate embodiment of an interferometric modulator.
Fig. 7 C is the sectional view of another alternate embodiment of an interferometric modulator.
Fig. 7 D is the again sectional view of an alternate embodiment of an interferometric modulator.
Fig. 7 E is the sectional view of the another alternate embodiment of an interferometric modulator.
Fig. 8 schematically graphic extension one is configured to for the interferometric modulator array of testing.
Fig. 9 schematically disposes the substrate for the interferometric modulator array of test above the graphic extension.
Figure 10 is the sectional view of the embodiment of graphic extension one probe base schematically, and described probe base is used in test period and provides electrical connection for interferometric modulator array.
Figure 11 is a kind of system for the test interferometric modulator array of graphic extension schematically.
Figure 12 A and 12B graphic extension can apply with the exemplary waveform for generation of required display pattern in test period some part to interferometric modulator array.
Figure 13 A to 13F illustrates three exemplary interferometric modulator arrays that show with bright and dark two states, the defective that its graphic extension is potential.
Figure 14 graphic extension can apply with the alternate exemplary waveform for generation of required display pattern in test period some part to interferometric modulator array.
Figure 15 A to 15F illustrates three exemplary interferometric modulator arrays that show with bright and dark two states, the defective that its graphic extension is potential.
Figure 16 A, 16B, and the 16C graphic extension can apply with the alternate exemplary waveform for generation of required display pattern in test period some part to interferometric modulator array.
Figure 17 is a process flow diagram, a kind of exemplary methods for the test interferometric modulator array of its graphic extension.
Figure 18 A schematically illustrates one 4 * 4 interferometric modulator arrays, and wherein some modulator element is driven to dark state by checkerboard pattern.
Figure 18 B illustrate can to array shown in Figure 18 A apply with for generation of a series of waveforms of checkerboard pattern shown in Figure 18 A and in four exemplary pixel each formed pixel voltage in pixel place.
Embodiment
Hereinafter explanation is for some specific embodiment of the present invention.Yet the present invention can implement by the different mode of many kinds.In the present note, with reference to the accompanying drawings, in institute's drawings attached, identical parts all represent with identical numbering.Find out easily that according to following explanation the present invention can be configured to show image-no matter be dynamic image (for example video) or still image (for example rest image) arbitrary, no matter be character image or picture-device in implement.More specifically, the present invention can implement in inferior numerous kinds of electronic installations or is associated with these electronic installations for example (but being not limited to): mobile phone, wireless device, personal digital assistant (PDA), handheld computer or portable computer, gps receiver/omniselector, camera, the MP3 player, video camera, game machine, wrist-watch, clock, counter, TV monitor, flat-panel monitor, computer monitor, automotive displays (such as mileometer display etc.), driving cabin control device and/or display, camera scenery display (for example backsight video camera display of vehicle), electronic photo, electronics billboard or label, projector, building structure, packing and aesthetic structures (for example image display on jewelry).The MEMS device that has similar structures with MEMS device described herein also can be used for non-display application, for example is used for electronic switching device.
Sight check is that a kind of check interferometric modulator array has flawless special effective method.Specific display pattern can be provided in order, and can analyze output by the checker or by automated system (automated system that for example comprises the CCD camera).Particularly, optionally activate non-adjacent row or column and can be conducive to easily identification to defectives such as row open circuit or short circuit in the ranks.Use is positioned over the interim diffusing globe of institute above the hot-wire array and can be conducive to easily pair array and tests, and has avoided simultaneously using fringe cost and the odd word that diffusing globe brings at the array of being identified and being dropped subsequently.
A kind of interferometric modulator display embodiment that comprises interfere type MEMS display element of graphic extension in Fig. 1.In these devices, pixel is in bright or dark state.Under bright (" opening (on) " or " opening (open) ") state, display element reflexes to the user with most of incident visible light.Be in dark (" closing (off) " or " closing (closed) ") state lower time, display element reflects the incident visible light to the user hardly.Decide on different embodiment, can put upside down the light reflectance properties that " opening (on) " reaches " closing (off) " state.The MEMS pixel can be configured to mainly reflect with selected color, thereby also can realize except black and white colored the demonstration.
Fig. 1 is first-class axle figure, and it illustrates two adjacent pixels in a series of pixels of visual displays, and wherein each pixel comprises a MEMS interferometric modulator.In certain embodiments, interferometric modulator display comprises the row/column array that is made of these interferometric modulators.Each interferometric modulator includes a pair of reflection horizon, and this is positioned to each other to have at least one variable-sized resonant optical mode chamber at a distance of a variable and controlled distance with formation to the reflection horizon.In one embodiment, one of them reflection horizon can be moved between the two positions.Be referred to herein as on the primary importance of slack position, this removable reflection horizon is positioned apart from fixing local reflex layer distance relatively far away.Be called in this article on the second place of active position, removable reflection horizon is positioned to be close to more closely the local reflex layer.Decide position according to removable reflection horizon, from the incident light of this two layers reflection with mutually long or mutually the mode of disappearing interfere, thereby form mass reflex or the non-reflective state of each pixel.
The pixel array portion that shows in Fig. 1 comprises two adjacent interferometric modulator 12a and 12b.In the interferometric modulator 12a in left side, show that removable reflection horizon 14a is in slack position, this slack position is apart from the Optical stack 16a preset distance that comprises the local reflex layer.In the interferometric modulator 12b on right side, show that removable reflection horizon 14b is in the active position place of the stacking 16b of adjacent optical.
Optical stack 16a mentioned herein and 16b (being referred to as Optical stack 16) are made of the layer of several fusions usually, and this can comprise electrode layer (for example tin indium oxide (ITO)), local reflex layer (for example chromium), reach transparent dielectric.Therefore Optical stack 16 is electric conductivity, local transparent and local reflex, and can for example make by the one or more layers in above-mentioned each layer are deposited on the transparent substrates 20.In certain embodiments, described layer is patterned into parallel band, and can form the column electrode in the display device, as further specifying hereinafter.Removable reflection horizon 14a, 14b can form by the one or more depositing metal layers that are deposited on pillar 18 tops (and column electrode 16a, 16b quadrature) and be deposited on the series of parallel band that the middle expendable material between the pillar 18 consists of.After expendable material is etched, the air gap 19 that removable reflection horizon 14a, 14b and Optical stack 16a, 16b are separated by and are stipulated.Reflection horizon 14 can be used has high conductivity and reflexive material (for example aluminium), and these bands can form the row electrode in the display device.
When not applying voltage, cavity 19 remains between removable reflection horizon 14a and the Optical stack 16a, and wherein removable reflection horizon 14a is in the mechanical relaxation state, shown in the pixel 12a among Fig. 1.Yet after selected row and column was applied potential difference (PD), the capacitor that forms in the row and column electrode intersection at respective pixel place became charged state, and electrostatic force pulls to these electrodes together.If voltage is enough high, then removable reflection horizon 14 is understood distortion and is forced to compress Optical stack 16.Dielectric layer (not shown in the figure) in the Optical stack 16 can prevent the spacing distance between short circuit and key- course 14 and 16, shown in the pixel 12b on the right among Fig. 1.Regardless of the polarity of applying potential difference (PD), its behavior is all identical.This shows that row/row activation is similar in many aspects to used in traditional LCD and other display techniques with the row of non-reflective pixel status/row activation can to control reflection.
A kind of example process and system that in display application, uses array of interferometric modulators of Fig. 2 to Fig. 5 B graphic extension.
Fig. 2 is a system block diagrams, and its graphic extension one can comprise an embodiment of the electronic installation of various aspects of the present invention.In this exemplary embodiment, described electronic installation comprises processor 21-, and it can be any general purpose single-chip or multi-chip microprocessor, for example ARM,
, Pentium
, Pentium
, Pentium
Pro, 8051,
, Power
, or any special microprocessor, for example digital signal processor, microcontroller or programmable gate array.According to convention in the industry, processor 21 can be configured to carry out one or more software modules.Except carrying out an operating system, also this processor can be configured to carry out one or more software applications, comprise web browser, telephony application, e-mail program or any other software application.
In one embodiment, processor 21 also is configured to communicate with array driver 22.In one embodiment, array driver 22 comprises row driver circuits 24 and the column driver circuit 26 that signal is provided to panel or array of display (display) 30.The sectional view of array shown in Fig. 1 illustrates with line 1-1 in Fig. 2.For the MEMS interferometric modulator, described row/row activated protocol can be utilized the hysteresis property of these devices shown in Figure 3.It for example may need, and one 10 volts potential difference (PD) makes displaceable layers be deformed into state of activation from relaxed state.Yet, when voltage when this value reduces, when lower voltage is back to below 10 volts, this displaceable layers will keep its state.In exemplary embodiment shown in Figure 3, before below lower voltage to 2 volt, displaceable layers is not exclusively lax.Therefore, in example shown in Figure 3, exist to be approximately 3 to 7 volts voltage range, have one and apply voltage window in this voltage range, in this window, device is stabilized in lax or state of activation.Be referred to as in this article " lag windwo " or " stability window ".For the array of display with hysteresis characteristic shown in Figure 3, OK/the row activated protocol can be designed to be expert at during the gating, make and selectedly the pixel that is activated is born about 10 volts voltage difference in current, and make the pixel that is relaxed is born voltage difference near 0 volt.After gating, it is poor to make pixel bear about 5 volts steady state voltage, and gating makes its residing any state so that its maintenance is expert at.In this example, after being written into, each pixel is all born the potential difference (PD) that is in the 3-7 volt " stability window ".This characteristic makes Pixel Design shown in Figure 1 be stabilized in existing state of activation or relaxed state under identical the voltage conditions that applies.Because each pixel of interferometric modulator, no matter be in state of activation or relaxed state, in fact all are the capacitors that are made of fixed reflector and mobile reflection horizon, therefore, this steady state (SS) is kept under can the voltage in lag windwo and consumed power hardly.If the current potential that applies immobilizes, then there is not in fact electric current to flow into pixel.
In the typical case uses, can be by determining that according to one group of desired in the first row activation pixel described one group of row electrode forms display frame.After this, horizontal pulse is applied to the electrode of the 1st row, thereby activates the pixel corresponding with determined alignment.After this, determined one group of row electrode is become with the second row in desired one group to activate pixel corresponding.After this, pulse is applied to the electrode of the 2nd row, thereby activates respective pixel in the 2nd row according to the row electrode that obtains determining.The pixel of the 1st row is not subjected to the impact of the pulse of the 2nd row, and the state that keeps it to set at the impulse duration of the 1st row.Can repeat above-mentioned steps to the row of whole series by mode sequentially, to form described frame.
Usually, repeating continuously this process by the speed with a certain required frame number/second to show Refresh Data and/or upgrade these frames with new.Also have a variety of row and row electrodes for driving pel array well known with the agreement that forms display frame, and can use with the present invention.
A kind of possible activated protocol for form display frame at 3 * 3 arrays shown in Figure 2 of Fig. 4,5A and 5B graphic extension.One group of possible row of Fig. 4 graphic extension and row voltage level, it can be used for presenting the pixel of hysteresis curve shown in Figure 3.In the embodiment of Fig. 4, to pixel activate relate to accordingly row be set to-V
Bias voltage, and will go accordingly be set to+Δ V-its can correspond respectively to-5 volts and+5 volts.Making pixel lax then is to be set to+V by being listed as accordingly
Bias voltageAnd will go accordingly and be set to identical+Δ V and realize with the potential difference (PD) that forms 0 volt at the pixel two ends.In those row voltages remain 0 volt row, be to be in+V without discussing point by point
Bias voltageStill-V
Bias voltage, pixel all is stable at its initial residing any state.As shown in also in Fig. 4, should be appreciated that, also can use the voltage that has opposite polarity with top described voltage, for example, to pixel activate can relate to accordingly row be set to+V
Bias voltageAnd will go accordingly and be set to-Δ V.In this embodiment, discharging pixel is to be set to-V by being listed as accordingly
Bias voltageThereby and will go accordingly and be set to identical-Δ V forms 0 volt at the pixel two ends potential difference (PD) and realize.
Fig. 5 B is the sequential chart of a series of row of demonstration and column signal, and these signals are applied to 3 * 3 arrays shown in Figure 2, and it will form the demonstration shown in Fig. 5 A and arrange that it is nonreflective wherein activating pixel.Before writing the frame shown in Fig. 5 A, pixel can be in any state, and in this example, all row all are in 0 volt, and all row all be in+5 volts.Under these institute's voltages that apply, all pixels all are stable at its existing state of activation or relaxed state.
In the frame shown in Fig. 5 A, pixel (1,1), (1,2), (2,2), (3,2) and (3,3) are activated.For realizing this effect, during " the line time " of the 1st row, the 1st row and the 2nd row are set as-5 volts, and the 3rd row are set as+5 volts.This can not change the state of any pixel, because all pixels all remain in the stability window of 3-7 volt.After this, rise to 5 volts of pulses that then roll back down again 0 volt by one from 0 volt and come gating the 1st row.Activate thus pixel (1,1) and (1,2) and make pixel (1,3) lax.Other pixels in the array are all unaffected.For the 2nd row is set as desired state, the 2nd row is set as-5 volts, and the 1st row and the 3rd row are set as+5 volts.After this, the identical strobe pulse that is applied to the 2nd row will activate pixel (2,2) and make pixel (2,1) and (2,3) lax.Equally, other pixels in the array are all unaffected.Similarly, by the 2nd row and the 3rd row are set as-5 volts and be listed as the 1st be set as+5 volts set the 3rd row.The strobe pulse of the 3rd row is set the pixel of the 3rd row shown in Fig. 5 A.After writing incoming frame, the row current potential is 0, and the row current potential can remain on+5 or-5 volts, and after this demonstration will be stable at the layout shown in Fig. 5 A.Should be appreciated that, can use identical programs to the array that is consisted of by tens of or hundreds of row and columns.Should also be clear that for timing, order and the level of implementing the voltage that row and column activates and can in above-described General Principle, alter a great deal, and above-mentioned example only is exemplary, and any activation voltage method all can be used with system and method as herein described.
Fig. 6 A and 6B are the system block diagrams of the embodiment of graphic extension display device 40.Display device 40 for example can be cellular phone or mobile phone.Yet the same components of display device 40 and the form of slightly doing to change thereof also can be used as the illustration of the display device such as all kinds such as TV and portable electronic device.
The display 30 of exemplary display device 40 can be any in the numerous kinds of displays, comprises bi-stable display as herein described.In other embodiments, well-known such as the those skilled in the art, display 30 comprises flat-panel monitor, for example plasma scope mentioned above, EL, OLED, STN LCD or TFT LCD, or non-tablet display, for example CRT or other kinescope devices.Yet for ease of the explanation present embodiment, as described herein, display 30 comprises interferometric modulator display.
Fig. 6 B schematically shows the assembly among the embodiment of exemplary display device 40.Example illustrated display device 40 comprises shell 41, and can comprise that other are closed in assembly wherein at least in part.For example, in one embodiment, exemplary display device 40 comprises network interface 27, and network interface 27 comprises the antenna 43 that is coupled to transceiver 47.Transceiver 47 is connected to processor 21, and processor 21 is connected to again regulates hardware 52.Regulating hardware 52 can be configured to signal is regulated (for example signal being carried out filtering).Regulate software 52 and be connected to loudspeaker 45 and microphone 46.Processor 21 also is connected to input media 48 and driver controller 29.Driver controller 29 is coupled to frame buffer 28 and is coupled to array driver 22, and array driver 22 is coupled to again array of display 30.Power supply 50 requires to be all component power supply according to the designing institute of particular exemplary display device 40.
In an alternate embodiment, can use receiver to replace transceiver 47.In an alternate embodiment again, network interface 27 can be replaced by the image source that can store or produce the view data that will be sent to processor 21.For example, this image source can be the software module that hard disk drive or that digital video disk (DVD) or contains view data produces view data.
In one embodiment, processor 21 comprises microcontroller, CPU or is used for the logical block of the operation of control exemplary display device 40.Regulating hardware 52 generally includes for transmitting to loudspeaker 45 and receiving amplifier and the wave filter of signals from microphone 46.Adjusting hardware 52 can be the discrete component in the exemplary display device 40, perhaps can incorporate in processor 21 or other assemblies.
Usually, the self-driven device controllers 29 of array driver 22 receive the information after the format and video data are reformated into one group of parallel waveform, and the parallel waveform per second of this group many times is applied to from hundreds of of the x-y picture element matrix of display and thousands of lead-in wires sometimes.
In one embodiment, driver controller 29, array driver 22, and array of display 30 be applicable to the display of arbitrary type as herein described.For example, in one embodiment, driver controller 29 is traditional display controller or bistable display controllers (for example interferometric modulator controller).In another embodiment, array driver 22 is legacy drive or bistable display driver (for example interferometric modulator display).In one embodiment, driver controller 29 integrates with array driver 22.This embodiment is very common in the integrated system of for example cellular phone, wrist-watch and other small-area display equal altitudes.In another embodiment, array of display 30 is typical array of display or bistable array of display (display that for example comprises interferometric modulator array).
In certain embodiments, programmability is as indicated above resides in the driver controller in control, and this driver controller can be arranged on several positions of electronic display system.In some cases, the control programmability resides in the array driver 22.Those skilled in the art will realize that and in the hardware of any amount and/or component software and in different configurations, to implement above-mentioned optimization.
Details according to the structure of the interferometric modulator of above-mentioned principle work can be ever-changing.For example, five different embodiment of the removable reflection horizon 14 of Fig. 7 A-7E graphic extension and supporting construction thereof.Fig. 7 A is sectional view embodiment illustrated in fig. 1, wherein deposit metallic material band 14 on the support member 18 that quadrature extends.In Fig. 7 B, removable reflection horizon 14 only is in tethers 32 at corner and is attached to support member.In Fig. 7 C, removable reflection horizon 14 is suspended on the deformable layer 34, and deformable layer 34 can comprise a kind of flexible metal.Deformable layer 34 is connected on the substrate 20 around the periphery of deformable layer 34 directly or indirectly.These are connected to and are called support column herein.Embodiment shown in Fig. 7 D has support column embolism 42, and deformable layer 34 namely is positioned on the support column embolism 42.As shown in Fig. 7 A-7C, removable reflection horizon 14 keeps being suspended in above the cavity, but deformable layer 34 does not form support column by the hole of filling between deformable layer 34 and the Optical stack 16.But, form described support column by the smoothing material that is used to form support column embolism 42.Embodiment shown in Fig. 7 E is based on the embodiment shown in Fig. 7 D, but also can use through revising with other embodiment with the arbitrary embodiment shown in Fig. 7 A-7C and not demonstration.In the embodiment shown in Fig. 7 E, form bus structure 44 with extra layer of metal or other conductive materials.This makes the signal can be along the back side route of interferometric modulator, thereby has eliminated originally the some electrodes that may palpiform be formed on the substrate 20.
For example in those embodiment shown in Figure 7, interferometric modulator is as the direct-viewing type device, and wherein the front side of self-induced transparency substrate 20 (side relative with the top side that is furnished with modulator) watches image.In these embodiments, reflection horizon 14 optically shields some part on the reflection horizon side relative with substrate 20 of being positioned at of interferometric modulator, comprises deformable layer 34 and bus structure 44.This makes it possible to configuration and operation conductively-closed zone, and can not adversely affect image quality.The separable modulator architecture of this kind make to the dynamo-electric aspect of modulator used with the optics aspect of modulator used structural design and material can be selected and be played a role independently of each other.And the embodiment shown in Fig. 7 C-7E has the additional advantages that obtains from its mechanical property solution coupling (this is implemented by deformable layer 34) because of the optical property with reflection horizon 14.This can be optimized the structural design in reflection horizon 14 and material therefor aspect optical property, and the structural design of deformable layer 34 and material therefor certain be optimized aspect the desired engineering properties.
The defective that in interferometric modulator array (for example array shown in Figure 2), can have several types.Although can use many kinds of diverse ways that these arrays are tested, yet a kind of method for the check interferometric modulator array comprises that some part of pair array applies the optics output of specific waveforms and inspecting array.This kind check can be undertaken by visual type, perhaps can automatically carry out by the CCD camera that for example is connected to processor, and described processor is configured to analyze the image from camera.Used term " sight check " is intended to refer to the check undertaken by the technician or by being configured to catch the image of array optical output and the Automated inspection that the system that this image is analyzed is carried out described array optical output herein.
Fig. 8 is graphic extension one interferometric modulator (for example at the interferometric modulator shown in Fig. 1 and the 7A-7E) array 60 that is configured to carry out sight check schematically.As seen from the figure, array 60 comprises a plurality of column electrodes 62,64 and a plurality of row electrode 66,68.The first row testing cushion 72 is connected with first group of column electrode 62 by bus 70, and the second row testing cushion 74 is connected with second group of column electrode by another bus 70.Row testing cushion 72,74 and bus 70 make it possible to by wall scroll lead-in wire individual signals is applied to each column electrode in one group of column electrode.Preferably, as shown in the figure, each column electrode that is connected to set testing cushion does not all adjoin mutually, and therefore, column electrode 62 comprises the one group of electrode that contains each the second column electrode, and similarly, column electrode 64 comprises remaining electrode.Similarly, row testing cushion 76 is connected to a group of row electrode 66 by bus 70, and secondary series testing cushion 78 is connected to the second group of row electrode 68.In one embodiment, column electrode (for example comprises the electrode that is deposited on the substrate that underlies, as for example assembly in the Optical stack 16 shown in Fig. 7 A), and the row electrode comprises and the be separated by electrode (for example, as for example assembly in the removable reflection horizon 14 shown in Fig. 7 A) of an interferometric cavity of substrate.Therefore, although row electrode 66,68 covers column electrode 62,64, yet it is not electrically connected mutually.Should also be clear that and each layer can be deposited between the column electrode 62,64, thus make column electrode not Direct precipitation on substrate, but by substrate supports but contact with one or more middle layers.
In the embodiment shown, testing cushion comprises one deck and is deposited on the substrate and the conductive material that is connected with bus 70.Preferably, these testing cushion and described bus and column electrode and row electrode form simultaneously and from same material, yet these assemblies can be formed in the different groups.For being conducive in testing cushion also can to make testing cushion obviously greater than bus and column electrode and row electrode with other testing apparatuss, especially be connected between the signal generator.Yet in alternate embodiment, the thickness of testing cushion can be similar to remaining electrode.In other embodiment, testing cushion is not provided, and for example directly carries out and being connected of bus.In alternate embodiment, can survey each row and each row respectively, and can carry out from the outside any required bus connection.
Should be appreciated that, in certain embodiments, can have the extra testing cushion that is connected to other group electrodes, particularly, among the embodiment that will be described in more detail hereinafter, provide the 3rd row testing cushion with the 3rd group of row electrode electric connection.In one embodiment, each is organized the row electrode and comprises each the 3rd row electrode.These three groups of row electrodes can be advantageously corresponding to the interferometric modulator row that are configured to reflect different colours (for example redness, green and blue column).Should also be clear that, although term " column electrode " is mainly used to refer to the electrode that is arranged in Optical stack 16 in this article, and " row electrode " in this article term is mainly used to refer to those electrodes (for example referring to Fig. 7 A) that for example are positioned at removable reflection horizon 14, yet, the appellation of row and row is arbitrarily, and can put upside down.
In certain embodiments, as shown in FIG. 9, can make a plurality of interferometric modulator arrays 60 at single substrate 84.Can before isolating each array 60, carry out sight check to these arrays substrate being carried out scribing, in order to identify defective array.And, as shown in FIG. 9, can between some testing cushion, carry out other and connect, in order to be reduced to every an array is applied desired signal and the number of probes of needs.For example, each row testing cushion of every an array 60 will receive among the embodiment of same signal therein, two the shared testing cushion 86,88 (testing cushion 86 that for example, is communicated with each testing cushion 72 and another testing cushion 88 that is communicated with each testing cushion 74) that are communicated with testing cushion in every an array can be provided.Can be in application to by these shared testing cushion arbitrarily required degree of commonality is provided between each signal of every an array.
In one embodiment, provide probe base 90 (Figure 10), be beneficial to being connected between signal generator and the array.Figure 10 illustrates the schematic cross sectional view of probe base 90.The substrate 84 that the above has been manufactured with one or more interferometric modulator arrays 60 is positioned in the probe base 90 also fastening by anchor clamps 92.Substrate 84 through directed so that above be furnished with array 60 and testing cushion (for example testing cushion 72 and 74) processing side 94 down and watch side 96 (can see array 60 by it) up.Can be undertaken by spring-loaded pin 98 (being also referred to as spring needle pin (pogo pin)) with being connected of testing cushion on the substrate (for example filling up 72,74), spring-loaded pin 98 substrate 84 biasings that reclined have required quality of connection in order to guarantee.Also can other positions in probe base carry out being connected between pin 98 and the signal generator (not shown).
Figure 11 schematically illustrates a kind of system for carry out sight check for the formula modulator array of relating to.As described in reference Figure 10, the substrate that will comprise one or more interferometric modulator arrays is positioned in the probe base 90, and probe base 90 can be placed on the supporting surface 102.It sends the light of the continuous spectrum-arrays in the probe base 90 are thrown light in certain embodiments light source 104-.Operator 106 (it can be the technician) or automated system (for example comprising the CCD camera) are analyzed the optics output of array, so that the defective in the identification array.In other embodiment, can place diffusing layer 108 in beholder's side 96 of substrate 84.Use diffusing layer 108 to be conducive to interferometric modulator array is carried out sight check, because the direct reflection that occurs from transparent substrates from light source 104 or other light sources can be disturbed the detection of the medium and small defective of pair array.Preferably, after finishing the check of following array 60, just diffusing layer 108 is fastened on the substrate 84, can increases cost of manufacture because permanently use diffusing layer 102, and if find array 60 defectiveness, then might dispose array 60.Although illustrate diffusing layer 108 contact substrates 84 among the figure, yet can make diffusing layer and substrate slightly spaced apart, as long as diffusing layer adjoins described array and is close to and is enough to produce till the required optical effect.
Still referring to Figure 11, signal generator-it produces the signal that will be applied to each testing cushion for control computing machine 110-in the present embodiment.The switch enclosure 112 that communicates with control computing machine 110 and probe base 90 can switch to another testing cushion with applying signal from a testing cushion as required.
When a kind of method of hot-wire array 60 comprised when switch continuously each independent modulator element between state of activation and unactivated state in each, pair array 60 was observed.With reference to array 60 shown in Figure 8 this kind embodiment is described.In this embodiment, this can realize by going testing cushion 72,74 ground connection.Then, row testing cushion 76,78 is applied signal, this signal alternately changes each interferometric modulator element between activating and not activating.Figure 12 A illustrates can be to row testing cushion 76,78 the two exemplary waveform 120 that apply for obtaining required display pattern.Because it is identical and synchronous with the waveform that is applied to row testing cushion 78 to be applied to the waveform of row testing cushion 76, thereby each modulator element will be mobile between state of activation and unactivated state simultaneously.
Still referring to Figure 12 A, as seen from the figure, waveform 120 has several characterisitic parameters.The initial voltage that applies between reaching before crest 122 and trough 124 can be in the lag windwo of the interferometric modulator element that will activate, in order to can not cause the variation of interferometric modulator state within the time 126 (being called the retention time).Particularly, described initial voltage is higher than release voltage 121, but is lower than activation voltage 123.It is crest and trough form-together be called in this article signal in the present embodiment pulse 122 and 124-, although should be appreciated that, the shape of these signals need not as shown in this exemplary waveform.This retention time 126 determines the speed that display glimmers between dark state and bright state.The height 130 of crest can be enough to make the voltage that applies surpass the lag windwo of modulator element, thereby with element drives to state of activation.Similarly, the height 132 of trough can be enough to apply the voltage that is lower than lag windwo, thereby makes interferometric modulator element lax.Pulse 124 and 122 length 128 can be longer than the response time of interferometric modulator, in order to be enough to make the state of interferometric modulator element to change.Therefore, in state 136, the voltage that applies not in the pair array 60 state of each element exert an influence.In state 138, after the first pulse 124, all modulators all are placed in the unactivated state.In state 140, after the second pulse 122, all modulators all are placed in the state of activation.
Because the exemplary interferometric modulator element will keep its show state, thereby can apply signals such as pulse 122 and 124 between column electrode and row electrode, in order to modulator element is placed required state.Yet as seen, these signals do not need to keep the duration that reaches checkout procedure in the waveform shown in Figure 14 A and 14B.The response time of modulator element (its control wave 122 and 124 length 128) can be in the 100 μ s orders of magnitude, although should be appreciated that, and the design of this response time visible modulated device element and altering a great deal.Yet the retention time 126 can be the required length of inspecting array.In certain embodiments, can come applying of next signal in the control waveform by the operator, after current state being tested, the operator just can make array advance to NextState (for example by pressing the button on the control computing machine).Since be unlike in other displays of test when (for example LCD) desired like that need to be during applying signal the image of record array, thereby the variable-length of retention time 126 also helps pair array and carries out Automated inspection.But, can apply one group of arbitrary moment document image after the signal that array can be placed required state.
Figure 12 B illustrates an alternative wave that can be used for providing identical display pattern.As seen from the figure, although institute's voltage that applies on the occasion of and negative value between alternately change, yet, except pulse 124 and 122 places, its absolute value still remains in the lag windwo, at pulse 124 and 122 places, the time that voltage remains in outside the lag windwo is longer than the activationary time of modulator, thereby causes the variation of modulator state.Can utilize at particular modulator element place various other waveforms to produce required voltage (for example activation voltage or release voltage).Should be appreciated that for the purpose of embodiment described herein, any meeting produces required voltage at particular modulator element place signal all is regarded as equivalence and is in the scope of embodiment described herein.In addition, should be appreciated that exemplary waveform not drawn on scale shown in this article.For example, the retention time 126 can obviously be longer than signal length 128.In this retention time long embodiment, the quantity of the square-wave pulse among waveform 120 ' (Figure 12 B) between pulse 124 and pulse 122 can be much larger than the quantity shown in Figure 12 B.
In certain embodiments, in the polychrome interferometric modulator array, be not that all interferometric modulators all will have identical activation voltage particularly.In this kind embodiment, 1/3rd row can comprise red interferometric modulator element, and 1/3rd row can comprise green interferometric modulator element, and last 1/3rd row can comprise the blue interferometric modulators element.Can provide three testing cushion, to connect respectively all red column, all green column and all blue column.Because the color that reflects of modulator element depends on the height of interferometric cavity 19 (referring to Fig. 1), thereby the activation voltage of interferometric modulator also can be dependent on the height of cavity 19, and the modulator of reflection different colours will have different activation voltages usually.
In this embodiment, if between the lag windwo of all three kinds of elements, exist overlappingly, then can apply single waveform of planting in these three row testing cushion each, activate simultaneously and discharge thus the interferometric modulator element of all three types.Yet, goodly can apply different waveforms in these three row testing cushion each.These waveforms can have identical retention time 126 and identical burst length 128, and difference only is initial voltage and pulse height.In alternate embodiment, can make the slightly stagger arrangement of each signal, particularly when the time 126 between each pulse is longer with respect to the burst length.
Figure 13 A-13F illustrates three different arrays that are in un-activation and activate two states (corresponding respectively to the state 138 and 140 among Figure 12 A).
Figure 13 A illustrates an example array 60 and is in bright (in this example for un-activation) state-corresponding to the state 138 among Figure 12 A.Figure 13 B illustrates with an array 60 and is in secretly (in this example for activate) state-corresponding to state 140.As in these two figure as seen, all there is not visible defective in array 60 in this two states.
Figure 13 C illustrates the second array 144 and is in bright state-corresponding to state 138.Figure 13 D illustrates with an array 144 and is in dark state one corresponding to state 140.As in these two figure as seen, the pixel of the darkness of some part of row 146 and row 148 around being different from, this show in row 146 and the row 148 modulator element not with surrounding pixel one coactivation/un-activation.Defectives such as row 146 and 148 can be indicated the existing interior or interior open circuit of row, and this means incessantly continuity in whole row or column of conductive path.As in these two figure as seen, the pixel of the darkness of whole row 150 around being different from.This kind full line defective can be indicated existing-Lie short circuit, and this can cause whole row or column to lose efficacy.
Figure 13 E illustrates the 3rd array 154 and is in bright state one corresponding to state 138.Figure 13 F illustrates array 154 and is in dark state-corresponding to state 140.As in these two figure as seen, can see that brightness is different from the point 156 of surrounding pixel, this show in array exist " brightness irregularities (mura) " defective (for example optics output form contrast shown in unsetting zone).If in array, can see any defective, row or column defective 146,158,150 or brightness irregularities defective 156 for example, just this array can be designated defectiveness, and it is abandoned or otherwise disposes.
Owing to be the optics output of analyzing interferometric modulator array in the method and alternative method hereinafter described, thereby should be appreciated that, not only can easily identify the array that those have this kind defective, and can identify the position of these defectives.If some defective appears in same position place in array continually, then this kind can provide valuable information about the existing problem of manufacturing process about the information of defective locations and form.
Another kind of method of testing relates to a part of row or column that only activates selectively and do not activate in the array, and the optics output of observation array.In one embodiment, this relates to all elements that make in the modulator array and places known state (for example bright state or dark state), and subsequently some parts of these modulators is placed inverse state.Then, these modulators are all placed original known state, and the another part in these modulators is placed inverse state.
Figure 14 A and 14B illustrate and are used in the exemplary waveform that forms required display pattern in the array 60 shown in Figure 8.In one embodiment, can with row testing cushion 72,74 ground connection, row testing cushion 76 be applied the first waveform 160 (Figure 14 A), and row testing cushion 78 is applied the second waveform 162 (Figure 14 B).These two waveforms 160,162 all comprise pulse 164 at the section start of waveform, are 100% bright state in this example in order to all modulators are placed unactivated state 161-.Then, waveform 160 comprises pulse 168, and its row 66 with this group place state of activation or dark state.Do not apply corresponding pulse by Second Wave shape 162, and therefore each row 68 still remain in bright state.Thus array is placed local dark state 163.Then, these two waveforms all comprise pulse 164, and it makes modulator be back to complete bright state 165.At last, waveform 162 comprises pulse 168, and it places dark state with each row 68, and each row 66 still remain in bright state.Thus, array is placed local dark state 167.
Therefore, in one embodiment, provide a kind of following method: whole array is urged to bright state, certain part of array is urged to dark state, whole array is urged to bright state, and subsequently a certain second portion is urged to dark state.In a particular embodiment, the first that is driven to dark state in the array comprises the row every, and second portion comprises remaining row.In alternate embodiment, array can be urged to dark state, and can selectively some part be urged to bright state subsequently.Should be appreciated that, although discuss above-mentioned waveform with reference to each row is carried out selective activation, however also can be by with row testing cushion 76,78 ground connection and row testing cushion 72 and 74 is applied respectively waveform 160,162 a kind of method that row are alternately changed is provided.
Figure 15 A-15F illustrates the interferometric modulator array that is in the different states of activation.In Figure 15 A, illustrate array 60 and be in complete bright state, for example state 161 or state 165.In Figure 15 B, illustrate array 60 and be in the state that certain part in a kind of wherein each row or column has been driven to dark state (for example state 163 or state 167).As in Figure 15 A and 15B as seen, in this two states, all can't see defective.
Figure 15 C illustrates array 172 and is in the half dark state 163 that some row (for example row 62) wherein have been driven to dark state.Figure 15 D illustrates with an array 172 and is in half dark state 167, and the row that wherein before had been in dark state have been driven to bright state, and all the other row (for example row 64) are driven to dark state.As in this two states as seen, the row of the brightness of column region 174 around being different from.Drive therein among the embodiment of row alternately, the defective in the zone 174 can show and has Lie-Lie short circuit.Figure 15 E illustrates array 176 and is in the half dark state 163 that some row (for example row 66) wherein has been driven to dark state, and Figure 15 F illustrates with an array 176 and is in the half dark state 167 that remaining row (for example row 68) wherein has been driven to dark state.As in the drawings as seen, the pixel around the brightness in row zone 178 is different from, this shows and exists such as row-defectives such as row short circuit.
In other embodiment, the method can be suitable for driving respectively more than two groups of column or row.For example, in another embodiment, can have three row groups, wherein each group all comprises the non-adjacent interferometric modulator row of the light that reflects particular color.Can at first whole array be urged to known state (being in this example bright state).Next, a group in these three groups is urged to inverse state, and makes subsequently whole array be back to known state.Repeat this process to all the other two groups.
Figure 16 illustrates as optionally driving three groups of spendable exemplary waveforms of row in the interferometric modulator display.In a certain embodiment, a group is corresponding to blue column, and second group corresponding to green column, and the 3rd group corresponding to red column.For each group provides corresponding testing cushion.In this embodiment, will go testing cushion ground connection, blue testing cushion will be applied waveform 182, and green testing cushion be applied waveform 184, and the red test pad is applied waveform 186.As seen from the figure, each waveform all comprises pulse 164, and it can place bright position (it can be white states 161) with whole array.Then, waveform 182 and 184 comprises pulse 168, and it is urged to dark state with blue column and green column, in order to only make redness classify bright state as, thereby array is placed red status 181.As described in the array among reference Figure 15, get final product now existence and the position that pair array tests to determine Zhu Ru Lie-defectives such as Lie short circuit.Then, all waveforms all comprise pulse 164, and it is reset to bright state 161 with whole array, are the pulse 168 in blue waveform 182 and the red waveform 186 subsequently, its those row are urged to dark state so that only green classify bright state as, thereby array is placed green state 183.Next pulse 164 is reset to bright state 161 with array, and the pulse 168 in green waveform 184 and the red waveform 186 is urged to dark state with those row, so that only blueness is classified bright state as, thereby array is placed blue color states 185.
Another is chosen as, and the polychrome array can be urged in proper order the state of classifying bright state as that wherein makes multiple color.For example, for RGB array mentioned above, be not that array is urged to red status, green state and blue color states, but array can be urged to for example cyan state, yellow state and magenta state.In one embodiment, this can be by being urged to array bright state, and optionally only a kind of row of color being urged to dark state subsequently and realizing.Then, other colors are repeated this process.This kind display pattern is applicable to the position of identification specific defects.In addition, can as indicated above all colours be urged to black state.
In another embodiment, a kind of method 190 for test interferometric modulator array (for example array 60 of Fig. 8) comprises two kinds of methods mentioned above, so that pair array 60 is thoroughly checked.In Figure 17, illustrate the exemplary flow chart of this kind of graphic extension method 190.Yet, should be appreciated that, decide according to embodiment, also can add extra step, remove other steps, and can rearrange the order of each step.In step 192, between array 60 and one or more signal generators, be connected.For example, can carry out these connections by array 60 being positioned in the probe base (for example probe base 90 shown in Figure 10).Then can as shown in Figure 11, probe base 90 be connected to switch enclosure 112 and control computing machine 110.In step 194, can checker's (perhaps in certain embodiments for CCD camera) with above be placed with placement diffuser layers 108 between the substrate 84 of array 60.In a certain moment before pair array is tested (in this process flow diagram, not illustrating), can be provided for the light source that pair array throws light on.
In step 196, array is urged to known state, be complete bright state in the present embodiment.This moment, the Observable array had zero defect.Carry out this kind check after can changing each time at the state of interferometric modulator, but should be appreciated that, need to after each step, all not test, especially array is urged to complete bright state repeatedly after.In step 198, array is urged to complete dark state.Therefore, step 196 and 198 comprises the part of the display pattern that is produced by the waveform among Figure 12 A and the 12B.The better array that carries out is at this moment checked.
Then, in step 200, array is driven the complete bright state that is back to.Next, in step 202, with each row ground connection, and the first subset of described row (for example one group of staggered row) is urged to dark state, and better again inspecting array.In step 204, array driven be back to complete bright state, and in step 206, second subset (for example those are not driven to the staggered row of dark state in step 202) of described row is urged to dark state, and better pair array is tested.
In step 208, again array is driven its bright state that is back to.Then, in step 210, with each row ground connection, the first subset of described row (for example one group of staggered row) is urged to complete dark state, and pair array is tested.In step 212, array driven be back to complete bright state, and in step 214, the second subset of described row is urged to dark state (for example those are not driven to the staggered row of dark state in step 202), and better again pair array is tested.
In step 216, make about in process 190, whether identifying the judgement of any defective.If exist, then this process moves to state 218, in this state array 60 is designated defectiveness, and it is abandoned or otherwise disposes (for example putting aside further to test).And if unidentifiedly go out defective, then this process moves to state 220, pair array 60 is approved in this state.
Should be appreciated that some part of this process can be undertaken by any order, and be not in this process all be essential in steps.In one embodiment, can array be identified as defectiveness at the initial stage (for example in state 196 or 198) of this process.In this embodiment, this process moves to state 218 immediately, in this state array is identified as defectiveness.In another embodiment, can be before making about the judgement that whether has defective the step 196-216 of process 190 be repeated more than once.The also less part of repetitive process 190 at any time.The embodiment that therein a plurality of arrays 60 that are arranged on the substrate 84 is tested simultaneously, this advantageously makes people test to an array when other arrays travel through this display pattern.Simultaneously a plurality of arrays being tested to be conducive to identify defective in these arrays, compares because can be easy to.
As indicated above, discuss method shown in Figure 17 190 although be with reference to bright state and dark state, yet in alternate embodiment, bright state and dark state can be put upside down, thereby make array between each time test, be urged to generally dark state and optionally some row or column is activated extremely bright state.As long as at first array placed known state, and then selectively array activated subsequently to inverse state (for example from bright to secretly, otherwise perhaps), method 190 just can be conducive to defect recognition.In some embodiment of interferometric modulator, state of activation and unactivated state all are not dark state.For example, state of activation is reflect white in fact, but not is dark state.Even in this embodiment, method 190 also will be conducive to defect recognition, because still can identify the difference with surrounding pixel.Similarly, waveform among Figure 12 A, the 12B, 14 and 16 is optionally at first placing array bright state before the extremely dark state of some part activation with array, but should be appreciated that, can be to its correct, before optionally activating some part of display, array placed alternative known state (for example dark state).
Also can will incorporate in the process 190 in other methods of inspection described in the application's case, and can make amendment to arbitrary step.Particularly, in check during color array, hope is optionally activated the three subsetss corresponding to the third color of column or row, and pair array is tested at this moment.
In another embodiment, array is urged to bright state, and will be listed as subsequently with the two a certain subset of row and be urged to dark state.In can be applicable to a specific embodiment of array 60 shown in Figure 8, at first with each element drives to bright state, and subsequently with checkerboard pattern with half element drives to dark state.Then these element drives are back to bright state, and be urged to dark state with the pattern opposite with the checkerboard pattern of front with other elements in the array (those elements that for example still keep bright state when other elements are driven to dark state) this moment.Any variation in the expection checkerboard pattern all can be indicated and be had defective in the array, particularly may be because leaking the defective that causes between adjacent elements or the adjacent lines.If array is being urged in two kinds of situations of described checkerboard pattern and its opposite pattern, the equal sustainable existence of defective, then described defective can be indicated and be had the adjacent lines defective.
Figure 18 A illustrates a set form 4 * 4 interferometric modulator arrays 230, and it can for example be a segmentation of array 60 shown in Figure 8.As in the drawings as seen, testing cushion 232 is connected to first group of row 234, and testing cushion 236 is connected to second group of row 238.Testing cushion 242 is connected to first group of row 244, and testing cushion 246 is connected to second group of row 248.When applying waveform by testing cushion, should be appreciated that the modulator in the array will be driven to a kind of state that wherein repeats single 2 * 2 patterns in whole array.This kind 2 * 2 patterns will be corresponding to exemplary interferometric modulator element 252,254,256 and 258 state.
But Figure 18 B illustrates the testing cushion 232,236,242 and 246 of pair array 230 and applies to be used for producing at array 230 a series of waveforms of checkerboard pattern.In one embodiment, testing cushion 232 is applied waveform 262, testing cushion 236 is applied waveform 264, testing cushion 242 is applied waveform 266, and testing cushion 246 is applied waveform 268.Applying these waveforms can make specific voltage be applied on each interferometric modulator element.In one embodiment, curve map 272 illustrates the voltage at exemplary elements 252 places, and curve map 274 illustrates the voltage at exemplary elements 256 places, and curve map 278 illustrates the voltage at exemplary elements 258 places.
Can see that in Figure 18 B waveform 262 is at+V
Bias voltageWith-V
Bias voltageValue between switch V wherein
Bias voltageThe activation voltage 123 of modulator element and certain magnitude of voltage between the release voltage 121.Similarly, waveform 264 is at-V
Bias voltageWith+V
Bias voltageBetween switch.Waveform 266 (it is 0 in the major part of this waveform) comprises pulse 267, and at pulse 267 places, voltage is increased to+V
Bias voltageSimilarly, waveform 268 comprises pulse 269.
The voltage 272 that is applied to exemplary elements 252 is be applied to the counter electrode waveform 262 that is listed as and the waveform 266 that is applied to column electrode poor.When beginning, pixel voltage 272 is in-V
Bias voltage, between the release voltage 121 and activation voltage 123 of element, as indicated above.Can see, when in waveform 266, pulse signal 267 occurring, voltage difference (for example-2V
Bias voltage) be enough to surpass the activation voltage 123 of modulator element, thus element 252 is placed state of activation.This voltage is the value of being back to-V subsequently
Bias voltage, and the value of switching to+V subsequently
Bias voltage, but when voltage switched, modulator element did not change its state because polarity between transfer period release voltage be not applied to and reach any effective time cycle.Similarly, voltage curve 278 represents the poor of waveform 262 and waveform 268, and its demonstration is expert at during the pulse signal 269 in the waveform 268, and pixel voltage is low to moderate to be enough to element 258 is placed state of activation.Because during the remainder of waveform, element 258 keeps not being subjected to this voltage influence, thereby pixel voltage is in lag windwo+V
Bias voltageOr-V
Bias voltage
Similarly, it illustrates voltage difference between waveform 262 and the waveform 268-be presented at pulse 269 places of waveform 268 voltage curve 274-, voltage difference between the waveform 262 and 268 is brought down below the level of release voltage 121, thereby element 254 is urged to unactivated state or release conditions.Similarly, as shown in the voltage curve 276, when pulse signal 267 occurring in waveform 266, the voltage difference between the waveform 264 and 266 is brought down below the level of the release voltage 121 of element 276, thereby element 256 is placed release conditions.
Therefore, in the state 280 after the pulse 267 of waveform 266, element 252 has been placed in state of activation, and element 256 has been placed in unactivated state.Element 254 and 158 remains in its residing unknown state before pulse 267 occurs, because it is not still remained in the lag windwo by the impact of this pulse and pixel voltage.Then, in the state 282 after the pulse 269 of waveform 268, element 254 has been placed in unactivated state, and element 258 has been placed in state of activation.Because the pixel voltage at element 252 and 256 places is in the lag windwo, thereby these elements still remain in respectively state of activation and unactivated state.
Should be appreciated that this series waveform can revise to form the version of chessboard display pattern.For example, by switch line waveform 266 and 268, can obtain an opposite pattern of above-mentioned display pattern.In the alternative wave for generation of required display pattern, waveform 266 and 268 pulse 267,269 can have identical length with the wide cycle of constant voltage in waveform 262 and 264, perhaps can utilize other versions, its restrictive condition is the response time that voltage surpasses activation voltage or the time below the release voltage of being down to is longer than element.As indicated above, can utilize and can form other waveforms of required voltage at the particular element two ends as the waveform of equal value of above-mentioned waveform.
In another embodiment, can be configured to the output gray level colour code to some interferometric modulator array.In a particular embodiment, the output gray level colour code is included in and uses a plurality of elements that can activate respectively in the pixel.For example, a gray scale pixel can comprise a large element and a little element, and the output of wherein less element is less than the output (for example being 50% in certain embodiments) of larger element.The monochrome display that comprises these pixels can be exported 2 gray scales, because by optionally activating modulator element, can show full bright pixel, full dark pixel or two medium tones.
Should be appreciated that the front can't obviously be revised with reference to the described method of testing of monochromatic array and just be can be used in the monochromatic array of 2 gray scales.In one embodiment, be about to only less modulator element be carried out addressing every one for first group, and second group is about to only larger modulator element be carried out addressing every one.Therefore, when with the first group selection when being urged to dark state, array will be brighter gray scale, and when being urged to dark state with second group, array will be darker gray scale.Can be by identifying various defectives with various display patterns hereinafter described.
In other embodiment, can provide extra gray scale level.In one embodiment, monochrome display can have 3 gray scale.In this embodiment, single pixel comprises and has different brightness a plurality of interferometric modulator element of (for example having different visibility region sizes) equally.Can carry out addressing by each assembly in two column electrodes and two the single pixels of row electrode pair.Yet, as before, can utilize display pattern mentioned above optionally to activate each row and each row interferometric modulator.Yet because these row can comprise the interferometric modulator element with different sizes, thereby the activation voltage of the element in the single row or column can be different.Therefore, may in each row and each row, optionally activate interferometric modulator element like each category.
In one embodiment, first row comprises the interferometric modulator element of two kinds of different sizes, but these different interferometric modulator element do not interconnect by column electrode.Therefore, one group of staggered row can be combined with the first row electrode be used for these row in both the modulator of sizing carry out addressing, and second group of row that interlocks can be combined with the secondary series electrode and carry out addressing for another big or small modulator in to these row.Similarly, the second adjacent column can comprise the interferometric modulator element of two kinds of different sizes.In this embodiment, can in the following way single row be urged to known state: at first by these row and first group of column electrode are applied suitable waveform the first set of pieces in these row is urged to known state, and is urged to known state by these row and second group of electrode are applied suitable waveform the second set of pieces that these row are interior subsequently.If row staggered in the array are urged to known state, then array can apply same waveform to each row in these row.For example, this can be undertaken by the testing cushion that links to each other via bus, and described bus is electrically connected with one group of each of interlocking in being listed as.
Can have the more array of dark gray colour code ability by further modification method mentioned above and waveform or by providing the waveform of equal value that can form at some element two ends required voltage test.For example, can provide a kind of polychrome device that can have gray scale, each the row element that wherein is configured to reflect particular color all comprises two kinds of different pixel sizes arranging with interlace mode.Can be according to optionally driving these row with reference to 3 described modes of gray scale array.Therefore, for example, can by each row in the red column being applied the first waveform, also subsequently the first group of staggered row that is used for the larger pixel of activation being applied signal and apply signal to being used for activation than second group of small pixel staggered row, red column be urged to dark state.
In other embodiment, may wish by only element drives to the known state of specific size or brightness being tested the gray scale array.This kind display pattern can be by revising method mentioned above, for example by being applied the first waveform and first group of row applied the second waveform, first group of row easily obtain, wherein the second waveform comprises the signal for some element that activates those row, and this is similar to meeting among Figure 16 B so that form the waveform of checkerboard pattern.
Will be appreciated that, decide on embodiment, the step of any method as herein described or event all can sequentially be implemented by other, can augment, merge or save fully (for example be not institute in steps or event all be that to implement these methods necessary), unless have in addition clearly herein and regulation clearly.
Although above detailed description is to show, illustrate and point out the novel feature that is applicable to various embodiment of the present invention, yet should be appreciated that, the those skilled in the art can make various omissions, substitute and change shown device or technique on form and details, and this does not deviate from spirit of the present invention.Should know, because some feature can or try out with the uses of other feature independence ground, thereby can in a kind of form that all features as herein described and advantage be not provided, implement the present invention.
Claims (16)
1. method of checking interferometric modulator array, it comprises:
Each modulator in the described interferometric modulator array is urged to first a known state;
Apply a pulse to a subset of the row of described interferometric modulator array with the described interferometric modulator in the described row of described array from described known the first state-driven to the second state, wherein said the second state is the inverse state of described the first state; And
After applying described pulse, check described interferometric modulator array to identify the defective in the described array.
2. the method for claim 1, wherein said the first known state is a bright state, and wherein said the second state is a dark state.
3. the method for claim 1, it comprises in addition:
Each modulator in the described array is driven described the first known state of getting back to; And
With one second subset of described array internal interference formula modulator row from described the first known state-driven to described the second state.
4. method as claimed in claim 3, it comprises in addition:
Each modulator in the described array is driven described the first known state of getting back to; And
With three subsetss of described array internal interference formula modulator row from described the first known state-driven to described the second state.
5. the method for claim 1, it comprises in addition:
Each modulator in the described array is urged to a known third state; And
The capable subset of described array internal interference formula modulator is urged to one the 4th state, and wherein said the 4th state is the inverse state of the described third state.
6. method as claimed in claim 5, the wherein said known third state is a bright state, and wherein said the 4th state is a dark state.
7. method as claimed in claim 5, it comprises in addition:
The described known third state is got back in each modulator driving in the described array; And
One second subset that interferometric modulator in the described array is capable is urged to described the 4th known state.
8. the method for claim 1, it comprises in addition:
In the modulator in the described array each is urged to the 5th a known state; And
In the modulator in the described array each is urged to one the 6th state, and wherein said the 6th state is the inverse state of described known the 5th state.
9. method as claimed in claim 8, wherein said the 5th known state is that a bright state and wherein said the 6th state are a dark state.
10. the method for claim 1, wherein said matrix-like are formed in to be had beholder's side and and processes on the substrate of side, and described matrix-like is formed on the processing side of described substrate.
11. method as claimed in claim 10, it comprises in addition that the beholder that a diffuser layers is adjoined described substrate is sidelong and puts.
12. method as claimed in claim 10, it is positioned over described substrate in one probe base before being included in addition and driving described array.
13. the method for claim 1, it comprises in addition based on the defective of identifying determines open circuit in the row.
14. the method for claim 1, it comprises in addition based on the defective of identifying determines row-Lie short circuit.
15. the method for claim 1, the subset of wherein said row comprise two non-adjacent row.
16. a system that checks interferometric modulator array, it comprises:
Each modulator in the described interferometric modulator array is urged to the device of known first state;
Apply a pulse to a subset of the row of described interferometric modulator array with the device of the described interferometric modulator in the described row of described array from described known the first state-driven to the second state, wherein said the second state is the inverse state of described the first state; And
After applying described pulse, check described interferometric modulator array to identify the device of the defective in the described array.
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| US61353704P | 2004-09-27 | 2004-09-27 | |
| US60/613,537 | 2004-09-27 | ||
| US11/217,580 | 2005-09-01 | ||
| US11/217,580 US7415186B2 (en) | 2004-09-27 | 2005-09-01 | Methods for visually inspecting interferometric modulators for defects |
| PCT/US2005/034464 WO2006036903A1 (en) | 2004-09-27 | 2005-09-23 | Methods for visually inspecting interferometric modulators for defects |
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| CN101027707B true CN101027707B (en) | 2013-02-13 |
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| CN200580031983A Expired - Fee Related CN100595626C (en) | 2004-09-27 | 2005-08-25 | Systems and methods for measuring color and contrast in specular reflective devices |
| CN 200510102600 Pending CN1811520A (en) | 2004-09-27 | 2005-09-12 | Electro-optical measurement of hysteresis in interferometric modulators |
| CN 200510102801 Pending CN1847915A (en) | 2004-09-27 | 2005-09-12 | Electrical characterization of interferometric modulators |
| CN2007101086705A Expired - Fee Related CN101063747B (en) | 2004-09-27 | 2005-09-16 | Process control monitors for interferometric modulators |
| CN 200580032672 Pending CN101027597A (en) | 2004-09-27 | 2005-09-16 | Process control monitors for interferometric modulators |
| CN2007101086866A Expired - Fee Related CN101071200B (en) | 2004-09-27 | 2005-09-16 | Process control monitor of interferometric modulators |
| CN 200710108685 Pending CN101071199A (en) | 2004-09-27 | 2005-09-16 | Electrical characterization of interferometric modulators |
| CN2007101086724A Expired - Fee Related CN101071061B (en) | 2004-09-27 | 2005-09-16 | Process control monitor of interferometric modulators |
| CN200580032120.9A Expired - Fee Related CN101027707B (en) | 2004-09-27 | 2005-09-23 | Methods for visually inspecting interferometric modulators for defects |
| CNB2005800326429A Expired - Fee Related CN100538800C (en) | 2004-09-27 | 2005-09-23 | Test method, system and the equipment of a plurality of interferometric modulators and make the method for this system |
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| CN 200580027723 Pending CN101006491A (en) | 2004-09-27 | 2005-08-22 | Measuring and modeling power consumption in displays |
| CN200580031983A Expired - Fee Related CN100595626C (en) | 2004-09-27 | 2005-08-25 | Systems and methods for measuring color and contrast in specular reflective devices |
| CN 200510102600 Pending CN1811520A (en) | 2004-09-27 | 2005-09-12 | Electro-optical measurement of hysteresis in interferometric modulators |
| CN 200510102801 Pending CN1847915A (en) | 2004-09-27 | 2005-09-12 | Electrical characterization of interferometric modulators |
| CN2007101086705A Expired - Fee Related CN101063747B (en) | 2004-09-27 | 2005-09-16 | Process control monitors for interferometric modulators |
| CN 200580032672 Pending CN101027597A (en) | 2004-09-27 | 2005-09-16 | Process control monitors for interferometric modulators |
| CN2007101086866A Expired - Fee Related CN101071200B (en) | 2004-09-27 | 2005-09-16 | Process control monitor of interferometric modulators |
| CN 200710108685 Pending CN101071199A (en) | 2004-09-27 | 2005-09-16 | Electrical characterization of interferometric modulators |
| CN2007101086724A Expired - Fee Related CN101071061B (en) | 2004-09-27 | 2005-09-16 | Process control monitor of interferometric modulators |
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| US20090201282A1 (en) * | 2008-02-11 | 2009-08-13 | Qualcomm Mems Technologies, Inc | Methods of tuning interferometric modulator displays |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN101006491A (en) | 2007-07-25 |
| CN101027589A (en) | 2007-08-29 |
| CN1811520A (en) | 2006-08-02 |
| CN1847915A (en) | 2006-10-18 |
| CN101027707A (en) | 2007-08-29 |
| CN101071061A (en) | 2007-11-14 |
| CN101027597A (en) | 2007-08-29 |
| CN101071199A (en) | 2007-11-14 |
| CN101071200A (en) | 2007-11-14 |
| CN101063747B (en) | 2012-06-20 |
| CN101071061B (en) | 2010-08-04 |
| CN100595626C (en) | 2010-03-24 |
| CN101071200B (en) | 2010-11-17 |
| CN101063747A (en) | 2007-10-31 |
| CN101027712A (en) | 2007-08-29 |
| CN100538800C (en) | 2009-09-09 |
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