CN100543538C - 具有平面图形的基板及利用该基板的显示装置 - Google Patents
具有平面图形的基板及利用该基板的显示装置 Download PDFInfo
- Publication number
- CN100543538C CN100543538C CNB2005100999469A CN200510099946A CN100543538C CN 100543538 C CN100543538 C CN 100543538C CN B2005100999469 A CNB2005100999469 A CN B2005100999469A CN 200510099946 A CN200510099946 A CN 200510099946A CN 100543538 C CN100543538 C CN 100543538C
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- China
- Prior art keywords
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- mentioned
- planar graph
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/901—Printed circuit
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Abstract
Description
Claims (17)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004264917A JP4399337B2 (ja) | 2004-09-13 | 2004-09-13 | 平面パターンを有する基板およびそれを用いた表示装置 |
JP2004264917 | 2004-09-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1758100A CN1758100A (zh) | 2006-04-12 |
CN100543538C true CN100543538C (zh) | 2009-09-23 |
Family
ID=36034348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100999469A Expired - Fee Related CN100543538C (zh) | 2004-09-13 | 2005-09-13 | 具有平面图形的基板及利用该基板的显示装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7892626B2 (zh) |
JP (1) | JP4399337B2 (zh) |
KR (1) | KR100900617B1 (zh) |
CN (1) | CN100543538C (zh) |
TW (1) | TWI345434B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4235921B2 (ja) * | 2006-09-21 | 2009-03-11 | 株式会社フューチャービジョン | 液晶表示パネルの製造方法および液晶表示パネル |
KR100931184B1 (ko) * | 2007-01-09 | 2009-12-10 | 주식회사 엘지화학 | 다중 노즐 헤드를 이용한 라인 패턴 형성 방법 및 이방법에 의하여 제조된 디스플레이 기판 |
CN102640200B (zh) * | 2009-12-03 | 2014-10-29 | 夏普株式会社 | 图像显示装置、面板和面板的制造方法 |
CN101924173A (zh) * | 2010-05-28 | 2010-12-22 | 孙文红 | 高光效图形衬底及其制造方法 |
TWI515573B (zh) * | 2010-05-31 | 2016-01-01 | 緯創資通股份有限公司 | 伺服器系統 |
US11901379B2 (en) | 2018-12-12 | 2024-02-13 | Hamamatsu Photonics K.K. | Photodetector |
WO2020121851A1 (ja) * | 2018-12-12 | 2020-06-18 | 浜松ホトニクス株式会社 | 光検出装置 |
US11513002B2 (en) | 2018-12-12 | 2022-11-29 | Hamamatsu Photonics K.K. | Light detection device having temperature compensated gain in avalanche photodiode |
JP7454917B2 (ja) * | 2018-12-12 | 2024-03-25 | 浜松ホトニクス株式会社 | 光検出装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020151161A1 (en) * | 2000-06-30 | 2002-10-17 | Masahiro Furusawa | Method for forming conductive film pattern, and electro-optical device and electronic apparatus |
CN1439517A (zh) * | 2002-02-22 | 2003-09-03 | 精工爱普生株式会社 | 薄膜形成装置和方法、液晶装置的制造装置和方法 |
JP2004089878A (ja) * | 2002-08-30 | 2004-03-25 | Sharp Corp | パターン形成基材およびパターン形成方法 |
CN1501436A (zh) * | 2002-09-30 | 2004-06-02 | ������������ʽ���� | 膜图案的形成方法、薄膜制造装置、导电膜布线 |
CN1574207A (zh) * | 2003-05-28 | 2005-02-02 | 精工爱普生株式会社 | 图案形成方法、器件及制造方法、电光学装置和电子仪器 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3331991A (en) * | 1966-03-25 | 1967-07-18 | Amp Inc | Switching matrix |
US3659083A (en) * | 1970-09-03 | 1972-04-25 | Cutler Hammer Inc | Binary coded readout device |
US4099098A (en) * | 1975-11-28 | 1978-07-04 | Burroughs Corporation | Display panel |
US4837050A (en) * | 1986-09-30 | 1989-06-06 | Asahi Chemical Research Laboratory Co., Ltd. | Method for producing electrically conductive circuits on a base board |
JPH0717162Y2 (ja) * | 1988-05-13 | 1995-04-19 | ミノルタ株式会社 | フレキシブルプリント基板 |
US5253010A (en) * | 1988-05-13 | 1993-10-12 | Minolta Camera Kabushiki Kaisha | Printed circuit board |
US5132248A (en) * | 1988-05-31 | 1992-07-21 | The United States Of America As Represented By The United States Department Of Energy | Direct write with microelectronic circuit fabrication |
US5506607A (en) * | 1991-01-25 | 1996-04-09 | Sanders Prototypes Inc. | 3-D model maker |
CA2131424C (en) * | 1993-09-30 | 2000-01-18 | Masami Ikeda | Image forming method, process for producing decorative aluminum plate, apparatus for carrying out the process, decorative aluminum plate, and recording medium |
JPH10207438A (ja) * | 1996-11-21 | 1998-08-07 | Seiko Instr Inc | 液晶装置 |
JP3528484B2 (ja) * | 1996-12-27 | 2004-05-17 | モレックス インコーポレーテッド | 擬似ツイストペア平型柔軟ケーブル |
JPH1126733A (ja) * | 1997-07-03 | 1999-01-29 | Seiko Epson Corp | 薄膜デバイスの転写方法、薄膜デバイス、薄膜集積回路装置,アクティブマトリクス基板、液晶表示装置および電子機器 |
JP3780700B2 (ja) * | 1998-05-26 | 2006-05-31 | セイコーエプソン株式会社 | パターン形成方法、パターン形成装置、パターン形成用版、パターン形成用版の製造方法、カラーフィルタの製造方法、導電膜の製造方法及び液晶パネルの製造方法 |
JP2000035394A (ja) | 1998-07-17 | 2000-02-02 | Shimadzu Corp | 走査型プローブ顕微鏡 |
TW554405B (en) * | 2000-12-22 | 2003-09-21 | Seiko Epson Corp | Pattern generation method and apparatus |
JP2003080694A (ja) * | 2001-06-26 | 2003-03-19 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体 |
JP4149161B2 (ja) * | 2001-12-06 | 2008-09-10 | 大日本印刷株式会社 | パターン形成体の製造方法およびパターン製造装置 |
JP3922177B2 (ja) * | 2002-02-12 | 2007-05-30 | セイコーエプソン株式会社 | 成膜方法、成膜装置、液滴吐出装置、カラーフィルタの製造方法、表示装置の製造方法 |
JP2003265997A (ja) | 2002-03-14 | 2003-09-24 | Seiko Epson Corp | 薄膜形成装置と薄膜形成方法、回路パターンの製造装置と電子機器の製造方法と電子機器、及びレジストパターンの製造装置とレジストパターンの製造方法 |
JP2004006700A (ja) * | 2002-03-27 | 2004-01-08 | Seiko Epson Corp | 表面処理方法、表面処理基板、膜パターンの形成方法、電気光学装置の製造方法、電気光学装置、及び電子機器 |
JP2003318514A (ja) | 2002-04-19 | 2003-11-07 | Seiko Epson Corp | 膜パターンの形成方法、膜パターンの形成装置及び電子機器 |
JP2004006645A (ja) * | 2002-04-19 | 2004-01-08 | Seiko Epson Corp | 圧電体素子の製造方法、圧電体素子並びに液滴吐出式記録ヘッド |
JP4098039B2 (ja) | 2002-08-30 | 2008-06-11 | シャープ株式会社 | パターン形成基材およびパターン形成方法 |
JP2004177788A (ja) * | 2002-11-28 | 2004-06-24 | Hitachi Displays Ltd | 液晶表示装置 |
JP4151420B2 (ja) * | 2003-01-23 | 2008-09-17 | セイコーエプソン株式会社 | デバイスの製造方法 |
JP4133786B2 (ja) * | 2003-12-16 | 2008-08-13 | 日東電工株式会社 | 配線回路基板 |
-
2004
- 2004-09-13 JP JP2004264917A patent/JP4399337B2/ja not_active Expired - Fee Related
-
2005
- 2005-09-08 US US11/220,742 patent/US7892626B2/en active Active
- 2005-09-12 KR KR1020050084809A patent/KR100900617B1/ko active IP Right Grant
- 2005-09-13 CN CNB2005100999469A patent/CN100543538C/zh not_active Expired - Fee Related
- 2005-09-13 TW TW094131504A patent/TWI345434B/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020151161A1 (en) * | 2000-06-30 | 2002-10-17 | Masahiro Furusawa | Method for forming conductive film pattern, and electro-optical device and electronic apparatus |
CN1439517A (zh) * | 2002-02-22 | 2003-09-03 | 精工爱普生株式会社 | 薄膜形成装置和方法、液晶装置的制造装置和方法 |
JP2004089878A (ja) * | 2002-08-30 | 2004-03-25 | Sharp Corp | パターン形成基材およびパターン形成方法 |
CN1501436A (zh) * | 2002-09-30 | 2004-06-02 | ������������ʽ���� | 膜图案的形成方法、薄膜制造装置、导电膜布线 |
CN1574207A (zh) * | 2003-05-28 | 2005-02-02 | 精工爱普生株式会社 | 图案形成方法、器件及制造方法、电光学装置和电子仪器 |
Also Published As
Publication number | Publication date |
---|---|
JP4399337B2 (ja) | 2010-01-13 |
CN1758100A (zh) | 2006-04-12 |
US20060057338A1 (en) | 2006-03-16 |
KR100900617B1 (ko) | 2009-06-02 |
KR20060051218A (ko) | 2006-05-19 |
US7892626B2 (en) | 2011-02-22 |
TW200622381A (en) | 2006-07-01 |
JP2006080416A (ja) | 2006-03-23 |
TWI345434B (en) | 2011-07-11 |
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Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEIKO EPSON CORP. Free format text: FORMER OWNER: FUTURE VISION KK Effective date: 20110609 Owner name: SHARP KABUSHIKI KAISHA |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20110609 Address after: Tokyo, Japan, Japan Co-patentee after: Sharp Corporation Patentee after: Seiko Epson Corp. Address before: Tokyo, Japan, Japan Patentee before: Future Vision KK |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090923 Termination date: 20200913 |