CN100483549C - 电阻存储器件及其操作和形成方法及包含它的计算机系统 - Google Patents

电阻存储器件及其操作和形成方法及包含它的计算机系统 Download PDF

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CN100483549C
CN100483549C CNB028273702A CN02827370A CN100483549C CN 100483549 C CN100483549 C CN 100483549C CN B028273702 A CNB028273702 A CN B028273702A CN 02827370 A CN02827370 A CN 02827370A CN 100483549 C CN100483549 C CN 100483549C
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CN1672214A (zh
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G·哈斯
J·巴克
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Micron Technology Inc
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
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    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • G11C13/0011RRAM elements whose operation depends upon chemical change comprising conductive bridging RAM [CBRAM] or programming metallization cells [PMCs]
    • GPHYSICS
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    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
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    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
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    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/004Reading or sensing circuits or methods
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C17/00Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/06Sense amplifiers; Associated circuits, e.g. timing or triggering circuits
    • G11C7/062Differential amplifiers of non-latching type, e.g. comparators, long-tailed pairs
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
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    • G11C2013/0042Read using differential sensing, e.g. bit line [BL] and bit line bar [BLB]
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Abstract

公开了一种方法和设备,用于使用互补PCRAM元件来感测可编程导体随机存取存储器(PCRAM)的阻态,一个保持被感测的阻态和另一个保持互补阻态。感测放大器通过高和低电阻元件来检测电压释放,以确定被读取元件的阻态。

Description

电阻存储器件及其操作和形成方法及包含它的计算机系统
技术领域
本发明涉及一种用于感测可编程导体随机存取存储器(PCRAM)元件的电阻的方法和设备。
背景技术
PCRAM器件将二进制数据存储为两个不同的阻值,一个比另一个更高。该阻值代表特定的二进制值逻辑“0”或逻辑“1”。当感测PCRAM器件的阻值时,一般将经历读操作的存储单元电阻与参考单元电阻作比较来确定被读取单元的阻值,以及它的逻辑态。此方法在美国专利No.5,883,827中被公开。然而,此方法具有一些局限性。
如果参考单元有缺陷,并且阵列中的一列存储单元使用相同的缺陷参考单元,则整列存储单元将得到错误的阻值读取结果。另外,需要专用电路来将阻值写入参考单元,这样设置的感测放大器的电路将复杂而庞大。
典型地,PCRAM器件的感测方案还倾向于具有不同于一般使用在典型DRAM电路中的独特结构。尽管PCRAM与DRAM的不同之处在于它们在电阻性存储元件中存储二进制值而不是存储为电容器上的电荷,尽管PCRAM为非易失性的,其中DRAM中使用的电容器结构是易失性的,然而期望的是,如果两种器件的读取和写入电路尽可能的类似,这样现有的DRAM存储器件结构可以容易地适应于读取和写入PCRAM器件。
发明内容
本发明提供一种PCRAM存储器件和其操作方法,其利用了类似于一些DRAM存储器件中使用的读取结构。使用了包括第一和第二可编程导体存储元件的一对互补PCRAM存储单元,每个连接到相应的存取晶体管。写操作期间,第一和第二存储元件以互补二进制值写入,就是说:如果第一存储元件被写入高阻态,那么第二存储元件被写入低阻态;反之,如果第一存储元件被写入低阻态,则第二存储元件被写入较高的阻态。
例如在第一存储元件的读操作期间,感测放大器被连接使得其相应的输入被耦合以接收通过第一和第二存储元件释放的相应的预充电压。感测放大器读取通过两个存储元件的释放电压来确定哪一个是更大的电压,从而确定被读取存储单元的阻值(高或低)和逻辑态(高或低)。
附图说明
通过下面联系相应附图提供的本发明的典型实施例的详细描述,本发明的上述和其他特征与优点将变得更加明晰。附图中:
图1显示一种实例性的PCRAM器件;
图2为描述本发明一个方面的示意图。
图3为描述本发明另一方面的示意图。
图4为描述本发明另一方面的示意图。
图5显示了本发明使用的电容器的放电率特性曲线.
图6显示计算机系统中使用的本发明。
具体实施方式
本发明使用一种感测放大器结构,它与一些常规DRAM器件中使用的结构有些类似,用来感测PCRAM存储单元的阻态。在本发明中,二进制值在第一PCRAM单元中存储为阻值,同时其互补阻值存储在第二PCRAM单元中。在第一PCRAM单元读出期间,两个PCRAM单元均被使用以将预充电压释放到各自的感测放大器的输入,该感测放大器读取释放电压来确定阻值,从而确定经历读操作的第一PCRAM单元中存储的二进制值。
图1图示了一种提供在根据本发明构造的一部分PCRAM存储器件内部的示例性单元设置。图中的PCRAM存储元件102具有一个硫属化合物玻璃体和下方103和上方104导体。众所周知,可编程导体存储单元具有两个稳定的阻态:一个高阻和一个低阻。一般地,当闲置时存储器具有高阻态,但是可以在导体103和104上适当地施加偏置电压来将其编程为低阻态。典型地,PCRAM存储元件的低阻态其特征在于,在导体103和104之间穿过硫属化合物玻璃体或沿硫属化合物玻璃体表面的树枝晶生长。当没有这种树枝晶生长时高阻态存在。生长的树枝晶是相对不易失的,原因在于在除去偏置电压后树枝晶将保持在适当的位置持续相对长的时间,例如几天或几周。
图1进一步显示,PCRAM存储元件102通过导电栓塞101耦合到存取晶体管207上,此晶体管通过形成晶体管207的栅极结构的字线105驱动。存取晶体管通过导电栓塞101耦合到PCRAM存储元件的其中一个导体103上。PCRAM元件的另一个导体104通过一个公共单元板109连接到偏置电压上,其是对于存储器件中提供的其他PCRAM存储元件所共用的。
图1图示了一个普通的PCRAM结构,其中两个相邻的存储单元207、211耦合到公共位线118上。这样,图1还显示了另一个通过字线107驱动的存取晶体管211,它通过导电栓塞99与另一个PCRAM存储元件104相连接,该PCRAM存储元件104还依次连接到公共单元板109。存取晶体管211还具有连接到位线118的一个端子。
图2显示一个使用图1描述的单元结构的存储器阵列的电路图方案。这样,图2的上面部分图示了耦合到相应的PCRAM存储元件102和106的晶体管207和211,该存取晶体管207和211将存储元件102和106耦合到位线118。
同样在图2中显示的,在存储阵列中还配置有互补位线D1*120,另一组存取晶体管连接到其上,其依次连接到其他PCRAM存储元件。为了简化讨论,一个单独互补PCRAM单元对表示为300。它包括晶体管207和关联的PCRAM存储元件102,其耦合到位线118(D1),还包括存取晶体管209和关联的PCRAM存储元件124,其耦合到位线120(D1*)。
写操作期间,耦合到晶体管207的行线105和耦合到晶体管209的行线113被启动,以使如果PCRAM存储元件102被写为高阻态,PCRAM元件124被写为低阻态,反之亦然。用这种方法,PCRAM存储元件102和124一起被存取并总是存储互补的电阻数字值。因而假设PCRAM存储元件102是被写入和读取的基本元件,耦合到位线118和120的感测放大器210将通过比较存储器读操作期间位线118上释放的预充电压与位线120上释放的预充电压来读取PCRAM存储元件102的值。
因而,存储器读取之前,预充电压通过预充电路301施加到互补位线118和120上。通过启动晶体管305的预充线上的逻辑电路来启动预充电路,以提供电压(例如Vcc/2)到两个位线118和120。
还可以提供平衡电路303,该平衡电路303是在预充电路启动后通过平衡信号而被启动的,以确保线118和120上的电压相同。线118和120上的电压通过线上的寄生电容保持。预充和平衡(如果存在的话)电路被启动之后,可以在互补单元对300上执行读操作。在图3中更详细地说明了此读操作,图3为感测放大器210输入通路的简化。
对于互补位线118和120的寄生电容表示为C1和C1*。相应的存取晶体管207和209如图示连接到它们各自的字线105和113。还示出了PCRAM存储元件102和124。正如注意到的,二进制值在例如存储器PCRAM存储元件102中被存储为阻值.它或为高阻值或为低阻值,而互补阻值将被存储在PCRAM存储元件124中。
在读操作期间,施加在互补位线118和120上的预充电压被允许通过存取晶体管207和209和通过存储元件102和124的相应阻值来释放。因为阻值不同,一个高一个低,因此位线D1和D1*(118,120)上的电压在读操作期间将分开。尽管初始施加在互补位线118和120上的电压为Vcc/2,但是在读操作期间此电压实际上会稍微高出大约.3mV,原因是位线118和120上的寄生电容C1和C1*的存在,以及晶体管207和209内部固有的栅-漏电容。
图5图示了读操作期间互补位线118和120上的电压。字线105和113的启动示出为脉冲信号,并且最初存在于两个位线D1和D1*上的Vcc/2+大约.3mV的电压开始衰减。因为一个PCRAM存储元件,如102,具有比另一个更高的电阻,与低电阻如124相关联的位线上的电压将比耦合到更高阻值的位线如D1上的电压衰减更快。这在图5中示出。
线D1和D1*上的两个电压的偏差逐渐增加。在字线105和113启动后预设时间处,感测放大器210被启动.感测放大器具有如图4所示DRAM排列中通常使用的结构。这样的感测放大器包括N感测放大器锁存器302和P感测放大器锁存器304。此结构如图4所示。
再回到图5,N感测放大器在t1时刻首先被启动。当N感测放大器启动时,具有较低电压的位线,在本例中如D1*,立即被拉到地。随后,P感测放大器在t2时刻被启动,其驱动较高电压线(如D1)到Vcc。因此在t2时刻,感测放大器210输出表示PCRAM存储元件102在高阻态的值Vcc。
尽管图5图示了当PCRAM存储元件102具有比存储元件104更高的电阻时产生的信号时序,但是显然,如果PCRAM存储元件102具有低阻态并且PCRAM存储元件124具有高阻态,则信号电平将颠倒.也就是说,图5中示出的信号图将使得位线D1*朝向Vcc而位线D1朝向地。
图5还说明了本发明的另一个方面。如图所示,对于读操作,行线105、113的电压从接近地电平升高到接近Vcc的正电平。此电压在感测放大器被使能之前(t1之前)回到接近地电平。结果,没有读PCRAM存储元件的重写。如果期望这种PCRAM单元的重写,那么在感测放大器210工作期间,具有被写到低阻态的存储元件的行线105、113上的电压可能处于接近Vcc的电压电平,这会自动地将读单元重写(刷新)到低阻态。
因为可编程导体存储元件为电阻性的而不是电容性的存储元件,可能它们会比DRAM中典型的电容性存储元件花费更长的时间将位线拉高到Vcc和到地。假如这是真实的,比最新一代DRAM感测放大器运行稍慢的老式DRAM感测放大器设计还可以用于PCRAM存储单元。这样做的好处在于,这些老式的DRAM感测放大器已经表明可以有效率地进行工作,并且它们的测试架构是已经证实的。因此,可以制作由使用DRAM感测放大器的PCRAM存储元件构成的混合存储器,这样既具有PCRAM技术的优点,还可以快速和廉价的生产。
尽管如图2所示,互补可编程接触存储元件102和106以及相关联的存取晶体管和位线D和D*被配置在同一存储阵列中,但是,互补存储单元、存取晶体管和位线还可以被配置在相应的不同存储阵列中.
图6为使用根据本发明一个实施例建立的PCRAM存储器件200的基于处理器的系统400的框图.基于处理器的系统400可以是计算机系统、处理控制系统或使用处理器和关联存储器的任意其他系统。系统400包括中央处理单元(CPU)402,例如,通过总线420与PCRAM存储器件408和I/O器件404进行通信的微处理器。需要注意总线420可以是通常用在基于处理器系统中的一系列总线和桥,但仅仅为方便起见,总线420表示为单一总线。第二I/O器件406也被表示出来,但并不是实现本发明所必须的.基于处理器的系统400还包括只读存储器(ROM)410,并可以包括如本领域公知的,通过总线420还与CPU402进行通信的外围设备,例如软驱412和光盘(CD)ROM驱动器414。
为了容易与总线420连接或断开,一个或更多的存储设备200可以配置在插入式的存储模块256上,如SIMM、DIMM或者其他插入式存储模块。虽然参考特定的典型实施例已经描述和说明本发明,但应该理解只要不脱离本发明的精神和范围,很多修正和替换都可以进行。因此,本发明并不受前述的限制,而仅受到附属的权利要求书的限定。

Claims (69)

1.一种操作可编程导体存储器件的方法,包括:
在第一和第二可编程导体存储元件中存储二进制值为相应的阻态,其中存储在第一可编程导体存储元件中的阻态与同时存储在第二可编程导体存储元件中的阻态互补;
通过经所述存储元件释放相应的电压并比较释放电压,确定存储在所述可编程导体存储元件之一中的二进制值;以及
重写仅在存储了低阻态的所述第一和第二可编程导体存储元件其中之一中存储的二进制值。
2.如权利要求1中的方法,其中所述释放包括:
将互补位线预充到一个电压值;和
通过所述第一和第二可编程导体存储元件来分别释放每个所述互补位线上的电压值。
3.如权利要求2中的方法,其中通过启用分别关联于每个所述存储元件的存取晶体管,所述互补位线上的所述预充电压值通过所述相应的第一和第二可编程导体存储元件释放。
4.如权利要求3中的方法,还包括在启用所述存取晶体管之前完成所述预充。
5.如权利要求4中的方法,还包括在启用所述存取晶体管之前平衡所述位线。
6.如权利要求3中的方法,其中所述比较包括:
确定与一个存储元件关联的释放电压是否是两个释放电压中的较高者或者较低者,如果与所述一个存储元件关联的释放电压为较高电压则输出第一二进制值,如果与所述一个存储元件关联的释放电压为较低电压则输出第二二进制值。
7.如权利要求6中的方法,还包括将具有较高释放电压的位线设定为第一预设电压态,并且将具有较低释放电压的位线设定为第二预设电压态。
8.如权利要求7中的方法,其中所述第一预设电压比所述第二预设电压更高。
9.如权利要求8中的方法,其中所述第二预设电压为地电压。
10.如权利要求7中的方法,还包括在所述位线被设为所述第一和第二预设电压态之前,禁用所述存取晶体管.
11.如权利要求7中的方法,还包括当所述位线被设为所述第一和第二预设电压态时,启用至少其中一个所述存取晶体管。
12.如权利要求1的方法,其中所述重写的操作包括:
在执行所述确定操作中所使用的传感放大器电路的操作期间,将耦合到所述一个可编程导体存储元件的行线的电压电平从地电平增大到系统电压电平。
13.一种可编程电阻存储器件,包括:
第一和第二位线;
与一对互补存储单元相关联的第一和第二可编程电阻存储元件,用于分别存储数据位的互补二进制数字值为不同的电阻值;
第一和第二存取器件,用于分别将所述第一和第二存储元件耦合到所述第一和第二位线;以及
传感放大器,具有分别耦合到所述第一和第二位线的输入端,用于读取在所述存储元件其中之一中存储为电阻值的所述数据位。
14.如权利要求13的器件,还包括预充电电路,用于在读操作之前将所述位线预充电到公共预充电电压。
15.如权利要求13的器件,还包括一对分别耦合到所述第一和第二存取器件的行线;以及
用于同时激活所述第一和第二行线、并因此激活所述第一和第二存取器件的电路。
16.如权利要求15的器件,其中所述第一和第二存取器件是存取晶体管。
17.如权利要求15的器件,其中当所述存取器件被激活时,所述位线上的所述预充电电压通过所述第一和第二可编程电阻存储元件的相应电阻来释放,所述传感放大器确定所述可编程电阻存储元件中所述的一个是否存储高阻态或是低阻态,并且输出对应于所存储阻态的二进制值。
18.如权利要求14的器件,其中所述位线具有存储了所述预充电电压的相关的寄生电容。
19.如权利要求18的器件,其中所述寄生电容存储了大于所述预充电电压的电压值。
20.如权利要求15的器件,其中以在读操作期间防止所述可编程电阻存储元件中的至少一个自动刷新的方式,来激活所述行线。
21.如权利要求13的器件,其中所述第一和第二可编程电阻存储元件位于不同的存储器阵列中。
22.如权利要求14的器件,还包括平衡电路,用于平衡所述位线上的电压。
23.一种存储器件,包括:
多个第一和第二可编程电阻存储单元对,每对存储单元包括:
与一对互补存储单元相关联的第一和第二可编程电阻存储元件,用于分别存储数据位的互补二进制数字值为不同的电阻值;
第一和第二存取器件,用于分别将所述第一和第二可编程电阻存储元件耦合到第一和第二位线;以及
传感放大器,具有分别耦合到所述第一和第二位线的输入端,用于读取在所述第一和第二可编程电阻存储元件其中之一中存储为电阻值的所述数据位。
24.如权利要求23的器件,还包括预充电电路,用于在读操作之前将所述位线预充电到公共预充电电压。
25.如权利要求23的器件,还包括一对分别耦合到所述第一和第二存取器件的行线;以及
用于同时激活所述第一和第二行线、并因此激活所述第一和第二存取器件的电路。
26.如权利要求25的器件,其中所述第一和第二存取器件是存取晶体管。
27.如权利要求25的器件,其中当所述存取器件被激活时,所述位线上的所述预充电电压通过所述第一和第二可编程电阻存储元件的相应电阻来释放,所述传感放大器确定所述第一和第二可编程电阻存储元件中所述的一个是否存储高阻态或是低阻态,并且输出对应于所存储阻态的二进制值。
28.如权利要求27的器件,其中所述位线具有存储了所述预充电电压的相关的寄生电容。
29.如权利要求28的器件,其中所述寄生电容存储了大于所述预充电电压的电压值。
30.如权利要求23的器件,其中所述第一和第二可编程电阻存储元件位于公共的存储器阵列中。
31.如权利要求23的器件,其中所述第一和第二可编程电阻存储元件位于不同的存储器阵列中。
32.如权利要求24的器件,还包括平衡电路,用于平衡所述位线上的预充电电压。
33.如权利要求23的器件,其中所述存储器件设置在存储器模块上.
34.如权利要求33的器件,其中所述存储器模块是插入式存储器模块。
35.一种计算机系统,包括:
处理器;
耦合到所述处理器的存储器系统,所述存储器系统包括:
第一和第二位线;
与一对互补存储单元相关联的第一和第二可编程电阻存储元件,用于分别存储数据位的互补二进制数字值为不同的电阻值;
第一和第二存取器件,用于分别将所述第一和第二可编程电阻存储元件耦合到所述第一和第二位线;以及
传感放大器,具有分别耦合到所述第一和第二位线的输入端,用于读取在所述第一和第二可编程电阻存储元件其中之一中存储为电阻值的所述数据位。
36.如权利要求35的系统,还包括预充电电路,用于在读操作之前将所述位线预充电到公共预充电电压。
37.如权利要求35的系统,还包括一对分别耦合到所述第一和第二存取器件的行线;以及
用于同时激活所述第一和第二行线、并因此激活所述第一和第二存取器件的电路。
38.如权利要求37的系统,其中所述第一和第二存取器件是存取晶体管。
39.如权利要求37的系统,其中当所述存取器件被激活时,所述位线上的所述预充电电压通过所述第一和第二可编程电阻存储元件的相应电阻来释放,所述传感放大器确定所述第一和第二可编程电阻存储元件中所述的一个是否存储高阻态或是低阻态,并且输出对应于所存储阻态的二进制值。
40.如权利要求36的系统,其中所述位线具有存储了所述预充电电压的相关的寄生电容。
41.如权利要求40的系统,其中所述寄生电容存储了大于所述预充电电压的电压值。
42.如权利要求35的系统,其中所述第一和第二可编程电阻存储元件位于公共的存储器阵列中。
43.如权利要求35的系统,其中所述第一和第二可编程电阻存储元件位于不同的存储器阵列中。
44.如权利要求35的系统,还包括平衡电路,用于平衡所述位线上的电压。
45.一种操作可编程电阻存储器件的方法,包括:
在第一和第二可编程电阻存储元件中存储二进制值为相应的阻态,其中存储在第一可编程电阻存储元件中的阻态与同时存储在第二可编程电阻存储元件中的阻态互补;
通过经所述可编程电阻存储元件释放相应的电压并比较释放电压,确定存储在所述可编程电阻存储元件之一中的二进制值;以及
在用于执行所述确定操作的传感放大器的激活期间,将耦合到所述第一和第二可编程电阻存储元件每一个的字线的电压电平维持在地电平。
46.一种操作可编程电阻存储器件的方法,包括:
在第一和第二可编程电阻存储元件中存储二进制值为相应的不同阻态,
通过经所述第一和第二可编程电阻存储元件释放相应的电压并比较释放电压,确定存储在所述存储元件之一中的二进制值。
47.如权利要求46的方法,其中所述释放包括:
预充电互补的位线,其分别可切换地耦合到所述第一和第二可编程电阻存储元件、耦合到公共电压值;以及
通过所述第一和第二可编程电阻存储元件中的每一个,分别释放所述互补位线每一个上的公共电压值。
48.如权利要求47的方法,其中通过启用分别与每个所述可编程电阻存储元件相关联的存取晶体管,将所述互补位线上的所述预充电电压值通过所述相应的可编程电阻存储元件而释放.
49.如权利要求48的方法,还包括在启用所述存取晶体管之前完成所述预充电。
50.如权利要求49的方法,还包括在启用所述存取晶体管之前平衡所述位线。
51.如权利要求48的方法,其中所述比较包括:
确定与一个存储元件关联的释放电压是否是两个释放电压中的较高者或者较低者,如果与所述一个存储元件关联的释放电压为较高电压则输出第一二进制值,如果与所述一个存储元件关联的释放电压为较低电压则输出第二二进制值。
52.如权利要求51中的方法,还包括将具有较高释放电压的位线设定为第一预设电压态,并且将具有较低释放电压的位线设定为第二预设电压态.
53.如权利要求52中的方法,其中所述第一预设电压比所述第二预设电压更高.
54.如权利要求53中的方法,其中所述第二预设电压为地电压。
55.如权利要求52中的方法,还包括在所述位线被设为所述第一和第二预设电压态之前,禁用所述存取晶体管。
56.如权利要求52中的方法,还包括在当所述位线被设为所述第一和第二预设电压态的时间期间,启用至少其中一个所述存取晶体管。
57.一种制造可编程电阻存储器件的方法,所述方法包括:
形成第一和第二位线;
形成与一对互补存储单元相关联的第一和第二可编程电阻存储元件,用于分别存储数据位的互补二进制数字值为不同的电阻值;
形成第一和第二存取晶体管,用于分别将所述第一和第二存储元件耦合到所述第一和第二位线;
形成预充电电路,用于将所述第一和第二位线预充电到第一电压;
形成相应的行线,用于操作所述存取晶体管以将所述存储元件耦合到相应的位线;以及
形成传感放大器,其具有分别耦合到所述位线的输入端。
58.如权利要求57的方法,还包括形成行解码器,用于解码行地址信号,并且选择性地且同时地启用所述字线。
59.如权利要求57的方法,其中所述可编程电阻存储元件是制作在公共的存储器阵列中的。
60.如权利要求57的方法,其中所述可编程电阻存储元件是制作在不同的存储器阵列中的。
61.如权利要求57的方法,还包括形成用于平衡所述位线的平衡电路。
62.一种操作可编程电阻存储器件的方法,该方法包括:
在与一对互补存储单元相关联的第一和第二可编程电阻存储元件中,分别存储数据位的互补二进制数字值为不同的电阻值;以及
读取在所述存储元件其中之一中存储为电阻值的所述数据位。
63.如权利要求62的方法,还包括:
在所述读操作之前,将可切换地耦合到所述第一和第二可编程电阻存储元件的相应位线预充电到公共预充电电压。
64.如权利要求63的方法,还包括:
通过所述第一和第二可编程电阻存储元件的相应电阻,来释放所述位线上的所述预充电电压;
确定所述其中一个存储元件是否存储高阻态或是低阻态;以及
输出对应于所存储阻态的二进制值。
65.如权利要求63的方法,其中所述预充电的操作还包括:
以与所述位线相关联的寄生电容来存储所述预充电压。
66.如权利要求63的方法,还包括:
平衡所述位线上的所述预充电压。
67.一种形成存储器件的方法,该方法包括:
形成存储单元阵列,其中所述形成操作还包括:
形成第一和第二位线;
形成与一对互补存储单元相关联的第一和第二可编程电阻存储元件,用于分别存储数据位的互补二进制数字值为不同的电阻值;
形成第一和第二存取晶体管,用于分别将所述第一和第二存储元件耦合到所述第一和第二位线;
形成预充电电路,用于将所述第一和第二位线预充电到第一电压;
形成相应的行线,用于操作所述存取晶体管以将所述存储元件耦合到相应的位线;以及
形成传感放大器,其具有分别耦合到所述位线的输入端。
68.如权利要求67的方法,其中所述第一形成操作还包括形成行解码器,用于解码行地址信号,并且选择性地且同时地启用所述字线。
69.如权利要求67的方法,其中所述第一形成操作还包括形成用于平衡所述位线的平衡电路。
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Families Citing this family (213)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4742429B2 (ja) * 2001-02-19 2011-08-10 住友電気工業株式会社 ガラス微粒子堆積体の製造方法
US6734455B2 (en) * 2001-03-15 2004-05-11 Micron Technology, Inc. Agglomeration elimination for metal sputter deposition of chalcogenides
US7102150B2 (en) * 2001-05-11 2006-09-05 Harshfield Steven T PCRAM memory cell and method of making same
US6951805B2 (en) * 2001-08-01 2005-10-04 Micron Technology, Inc. Method of forming integrated circuitry, method of forming memory circuitry, and method of forming random access memory circuitry
US6784018B2 (en) * 2001-08-29 2004-08-31 Micron Technology, Inc. Method of forming chalcogenide comprising devices and method of forming a programmable memory cell of memory circuitry
US6881623B2 (en) * 2001-08-29 2005-04-19 Micron Technology, Inc. Method of forming chalcogenide comprising devices, method of forming a programmable memory cell of memory circuitry, and a chalcogenide comprising device
US6955940B2 (en) * 2001-08-29 2005-10-18 Micron Technology, Inc. Method of forming chalcogenide comprising devices
US6709958B2 (en) * 2001-08-30 2004-03-23 Micron Technology, Inc. Integrated circuit device and fabrication using metal-doped chalcogenide materials
US6646902B2 (en) 2001-08-30 2003-11-11 Micron Technology, Inc. Method of retaining memory state in a programmable conductor RAM
US6560155B1 (en) * 2001-10-24 2003-05-06 Micron Technology, Inc. System and method for power saving memory refresh for dynamic random access memory devices after an extended interval
US6815818B2 (en) * 2001-11-19 2004-11-09 Micron Technology, Inc. Electrode structure for use in an integrated circuit
US6791859B2 (en) * 2001-11-20 2004-09-14 Micron Technology, Inc. Complementary bit PCRAM sense amplifier and method of operation
US6909656B2 (en) * 2002-01-04 2005-06-21 Micron Technology, Inc. PCRAM rewrite prevention
US7116593B2 (en) * 2002-02-01 2006-10-03 Hitachi, Ltd. Storage device
US6867064B2 (en) * 2002-02-15 2005-03-15 Micron Technology, Inc. Method to alter chalcogenide glass for improved switching characteristics
US6791885B2 (en) * 2002-02-19 2004-09-14 Micron Technology, Inc. Programmable conductor random access memory and method for sensing same
US6847535B2 (en) 2002-02-20 2005-01-25 Micron Technology, Inc. Removable programmable conductor memory card and associated read/write device and method of operation
US6809362B2 (en) * 2002-02-20 2004-10-26 Micron Technology, Inc. Multiple data state memory cell
US7087919B2 (en) * 2002-02-20 2006-08-08 Micron Technology, Inc. Layered resistance variable memory device and method of fabrication
US7151273B2 (en) * 2002-02-20 2006-12-19 Micron Technology, Inc. Silver-selenide/chalcogenide glass stack for resistance variable memory
US6937528B2 (en) * 2002-03-05 2005-08-30 Micron Technology, Inc. Variable resistance memory and method for sensing same
US6849868B2 (en) 2002-03-14 2005-02-01 Micron Technology, Inc. Methods and apparatus for resistance variable material cells
US6855975B2 (en) * 2002-04-10 2005-02-15 Micron Technology, Inc. Thin film diode integrated with chalcogenide memory cell
US6858482B2 (en) * 2002-04-10 2005-02-22 Micron Technology, Inc. Method of manufacture of programmable switching circuits and memory cells employing a glass layer
US6864500B2 (en) * 2002-04-10 2005-03-08 Micron Technology, Inc. Programmable conductor memory cell structure
US6731528B2 (en) * 2002-05-03 2004-05-04 Micron Technology, Inc. Dual write cycle programmable conductor memory system and method of operation
US6825135B2 (en) 2002-06-06 2004-11-30 Micron Technology, Inc. Elimination of dendrite formation during metal/chalcogenide glass deposition
US6890790B2 (en) * 2002-06-06 2005-05-10 Micron Technology, Inc. Co-sputter deposition of metal-doped chalcogenides
US7209378B2 (en) * 2002-08-08 2007-04-24 Micron Technology, Inc. Columnar 1T-N memory cell structure
US7018863B2 (en) * 2002-08-22 2006-03-28 Micron Technology, Inc. Method of manufacture of a resistance variable memory cell
US6864521B2 (en) * 2002-08-29 2005-03-08 Micron Technology, Inc. Method to control silver concentration in a resistance variable memory element
US7364644B2 (en) * 2002-08-29 2008-04-29 Micron Technology, Inc. Silver selenide film stoichiometry and morphology control in sputter deposition
US7010644B2 (en) * 2002-08-29 2006-03-07 Micron Technology, Inc. Software refreshed memory device and method
US6867114B2 (en) * 2002-08-29 2005-03-15 Micron Technology Inc. Methods to form a memory cell with metal-rich metal chalcogenide
US6831019B1 (en) * 2002-08-29 2004-12-14 Micron Technology, Inc. Plasma etching methods and methods of forming memory devices comprising a chalcogenide comprising layer received operably proximate conductive electrodes
US7800932B2 (en) * 2005-09-28 2010-09-21 Sandisk 3D Llc Memory cell comprising switchable semiconductor memory element with trimmable resistance
US7022579B2 (en) * 2003-03-14 2006-04-04 Micron Technology, Inc. Method for filling via with metal
EP1609154B1 (en) 2003-03-18 2013-12-25 Kabushiki Kaisha Toshiba Phase change memory device
KR100504700B1 (ko) * 2003-06-04 2005-08-03 삼성전자주식회사 고집적 상변환 램
US6987688B2 (en) * 2003-06-11 2006-01-17 Ovonyx, Inc. Die customization using programmable resistance memory elements
US7061004B2 (en) * 2003-07-21 2006-06-13 Micron Technology, Inc. Resistance variable memory elements and methods of formation
JP4356542B2 (ja) * 2003-08-27 2009-11-04 日本電気株式会社 半導体装置
US6903361B2 (en) * 2003-09-17 2005-06-07 Micron Technology, Inc. Non-volatile memory structure
US7123530B2 (en) * 2003-10-09 2006-10-17 Micron Technology, Inc. AC sensing for a resistive memory
TW200527656A (en) * 2004-02-05 2005-08-16 Renesas Tech Corp Semiconductor device
KR100733147B1 (ko) * 2004-02-25 2007-06-27 삼성전자주식회사 상변화 메모리 장치 및 그 제조 방법
US7098068B2 (en) * 2004-03-10 2006-08-29 Micron Technology, Inc. Method of forming a chalcogenide material containing device
US7583551B2 (en) * 2004-03-10 2009-09-01 Micron Technology, Inc. Power management control and controlling memory refresh operations
US7145795B2 (en) 2004-04-13 2006-12-05 Micron Technology, Inc. Multi-cell resistive memory array architecture with select transistor
WO2005106955A1 (ja) * 2004-04-27 2005-11-10 Matsushita Electric Industrial Co., Ltd. 記憶素子
CN101834198A (zh) * 2004-05-14 2010-09-15 瑞萨电子株式会社 半导体存储器件
WO2005117118A1 (ja) * 2004-05-25 2005-12-08 Renesas Technology Corp. 半導体装置
KR100567067B1 (ko) * 2004-06-30 2006-04-04 주식회사 하이닉스반도체 상변화 기억 소자 및 그 제조방법
US7190048B2 (en) * 2004-07-19 2007-03-13 Micron Technology, Inc. Resistance variable memory device and method of fabrication
KR100610008B1 (ko) * 2004-07-19 2006-08-08 삼성전자주식회사 버스트 리드동작에 적합한 상변화 메모리 장치 및 그에따른 데이터 리딩방법
US7354793B2 (en) 2004-08-12 2008-04-08 Micron Technology, Inc. Method of forming a PCRAM device incorporating a resistance-variable chalocogenide element
US7326950B2 (en) 2004-07-19 2008-02-05 Micron Technology, Inc. Memory device with switching glass layer
US7365411B2 (en) 2004-08-12 2008-04-29 Micron Technology, Inc. Resistance variable memory with temperature tolerant materials
US7151688B2 (en) * 2004-09-01 2006-12-19 Micron Technology, Inc. Sensing of resistance variable memory devices
DE102004045219B4 (de) * 2004-09-17 2011-07-28 Qimonda AG, 81739 Anordnung und Verfahren zum Auslesen von Widerstandsspeicherzellen
US7423897B2 (en) * 2004-10-01 2008-09-09 Ovonyx, Inc. Method of operating a programmable resistance memory array
KR100695419B1 (ko) * 2004-11-04 2007-03-15 주식회사 하이닉스반도체 내부전원 발생장치
US7374174B2 (en) * 2004-12-22 2008-05-20 Micron Technology, Inc. Small electrode for resistance variable devices
US20060131555A1 (en) * 2004-12-22 2006-06-22 Micron Technology, Inc. Resistance variable devices with controllable channels
US7317200B2 (en) 2005-02-23 2008-01-08 Micron Technology, Inc. SnSe-based limited reprogrammable cell
JP2006303150A (ja) * 2005-04-20 2006-11-02 Nippon Telegr & Teleph Corp <Ntt> メモリ装置
US7427770B2 (en) * 2005-04-22 2008-09-23 Micron Technology, Inc. Memory array for increased bit density
US7709289B2 (en) * 2005-04-22 2010-05-04 Micron Technology, Inc. Memory elements having patterned electrodes and method of forming the same
US7269079B2 (en) * 2005-05-16 2007-09-11 Micron Technology, Inc. Power circuits for reducing a number of power supply voltage taps required for sensing a resistive memory
KR100650735B1 (ko) * 2005-05-26 2006-11-27 주식회사 하이닉스반도체 상변환 기억 소자 및 그의 제조방법
US7233520B2 (en) * 2005-07-08 2007-06-19 Micron Technology, Inc. Process for erasing chalcogenide variable resistance memory bits
US7274034B2 (en) * 2005-08-01 2007-09-25 Micron Technology, Inc. Resistance variable memory device with sputtered metal-chalcogenide region and method of fabrication
US7332735B2 (en) * 2005-08-02 2008-02-19 Micron Technology, Inc. Phase change memory cell and method of formation
US7317567B2 (en) * 2005-08-02 2008-01-08 Micron Technology, Inc. Method and apparatus for providing color changing thin film material
US20070037316A1 (en) * 2005-08-09 2007-02-15 Micron Technology, Inc. Memory cell contact using spacers
US7579615B2 (en) 2005-08-09 2009-08-25 Micron Technology, Inc. Access transistor for memory device
US7843900B2 (en) * 2005-08-10 2010-11-30 Kineto Wireless, Inc. Mechanisms to extend UMA or GAN to inter-work with UMTS core network
US7304368B2 (en) * 2005-08-11 2007-12-04 Micron Technology, Inc. Chalcogenide-based electrokinetic memory element and method of forming the same
US7251154B2 (en) * 2005-08-15 2007-07-31 Micron Technology, Inc. Method and apparatus providing a cross-point memory array using a variable resistance memory cell and capacitance
US7277313B2 (en) * 2005-08-31 2007-10-02 Micron Technology, Inc. Resistance variable memory element with threshold device and method of forming the same
US7212458B1 (en) * 2005-10-25 2007-05-01 Sigmatel, Inc. Memory, processing system and methods for use therewith
US7635855B2 (en) 2005-11-15 2009-12-22 Macronix International Co., Ltd. I-shaped phase change memory cell
US7786460B2 (en) 2005-11-15 2010-08-31 Macronix International Co., Ltd. Phase change memory device and manufacturing method
US7414258B2 (en) 2005-11-16 2008-08-19 Macronix International Co., Ltd. Spacer electrode small pin phase change memory RAM and manufacturing method
US7449710B2 (en) 2005-11-21 2008-11-11 Macronix International Co., Ltd. Vacuum jacket for phase change memory element
US7688619B2 (en) * 2005-11-28 2010-03-30 Macronix International Co., Ltd. Phase change memory cell and manufacturing method
US7459717B2 (en) 2005-11-28 2008-12-02 Macronix International Co., Ltd. Phase change memory cell and manufacturing method
US7531825B2 (en) * 2005-12-27 2009-05-12 Macronix International Co., Ltd. Method for forming self-aligned thermal isolation cell for a variable resistance memory array
US8062833B2 (en) 2005-12-30 2011-11-22 Macronix International Co., Ltd. Chalcogenide layer etching method
US7741636B2 (en) 2006-01-09 2010-06-22 Macronix International Co., Ltd. Programmable resistive RAM and manufacturing method
US7560337B2 (en) * 2006-01-09 2009-07-14 Macronix International Co., Ltd. Programmable resistive RAM and manufacturing method
US7956358B2 (en) * 2006-02-07 2011-06-07 Macronix International Co., Ltd. I-shaped phase change memory cell with thermal isolation
US7785920B2 (en) 2006-07-12 2010-08-31 Macronix International Co., Ltd. Method for making a pillar-type phase change memory element
US7499355B2 (en) * 2006-07-31 2009-03-03 Sandisk 3D Llc High bandwidth one time field-programmable memory
US7522448B2 (en) * 2006-07-31 2009-04-21 Sandisk 3D Llc Controlled pulse operations in non-volatile memory
US20080025069A1 (en) * 2006-07-31 2008-01-31 Scheuerlein Roy E Mixed-use memory array with different data states
US7450414B2 (en) * 2006-07-31 2008-11-11 Sandisk 3D Llc Method for using a mixed-use memory array
US7492630B2 (en) * 2006-07-31 2009-02-17 Sandisk 3D Llc Systems for reverse bias trim operations in non-volatile memory
US7499304B2 (en) * 2006-07-31 2009-03-03 Sandisk 3D Llc Systems for high bandwidth one time field-programmable memory
US7719874B2 (en) * 2006-07-31 2010-05-18 Sandisk 3D Llc Systems for controlled pulse operations in non-volatile memory
US7486537B2 (en) * 2006-07-31 2009-02-03 Sandisk 3D Llc Method for using a mixed-use memory array with different data states
US7495947B2 (en) * 2006-07-31 2009-02-24 Sandisk 3D Llc Reverse bias trim operations in non-volatile memory
US7560723B2 (en) 2006-08-29 2009-07-14 Micron Technology, Inc. Enhanced memory density resistance variable memory cells, arrays, devices and systems including the same, and methods of fabrication
US7772581B2 (en) 2006-09-11 2010-08-10 Macronix International Co., Ltd. Memory device having wide area phase change element and small electrode contact area
KR101258983B1 (ko) 2006-09-19 2013-04-29 삼성전자주식회사 가변저항 소자를 이용한 반도체 메모리 장치 및 그 동작방법
KR100819099B1 (ko) * 2006-10-02 2008-04-03 삼성전자주식회사 가변저항 반도체 메모리 장치
US7504653B2 (en) 2006-10-04 2009-03-17 Macronix International Co., Ltd. Memory cell device with circumferentially-extending memory element
US7505348B2 (en) * 2006-10-06 2009-03-17 International Business Machines Corporation Balanced and bi-directional bit line paths for memory arrays with programmable memory cells
US7863655B2 (en) 2006-10-24 2011-01-04 Macronix International Co., Ltd. Phase change memory cells with dual access devices
US7476587B2 (en) 2006-12-06 2009-01-13 Macronix International Co., Ltd. Method for making a self-converged memory material element for memory cell
US7903447B2 (en) 2006-12-13 2011-03-08 Macronix International Co., Ltd. Method, apparatus and computer program product for read before programming process on programmable resistive memory cell
US7718989B2 (en) 2006-12-28 2010-05-18 Macronix International Co., Ltd. Resistor random access memory cell device
US7619311B2 (en) * 2007-02-02 2009-11-17 Macronix International Co., Ltd. Memory cell device with coplanar electrode surface and method
US7884343B2 (en) 2007-02-14 2011-02-08 Macronix International Co., Ltd. Phase change memory cell with filled sidewall memory element and method for fabricating the same
US7956344B2 (en) 2007-02-27 2011-06-07 Macronix International Co., Ltd. Memory cell with memory element contacting ring-shaped upper end of bottom electrode
US7786461B2 (en) 2007-04-03 2010-08-31 Macronix International Co., Ltd. Memory structure with reduced-size memory element between memory material portions
US7569844B2 (en) * 2007-04-17 2009-08-04 Macronix International Co., Ltd. Memory cell sidewall contacting side electrode
US7818638B2 (en) * 2007-06-15 2010-10-19 Micron Technology, Inc. Systems and devices including memory with built-in self test and methods of making and using the same
US7817073B2 (en) * 2007-06-15 2010-10-19 Micron Technology, Inc. Integrators for delta-sigma modulators
US7667632B2 (en) * 2007-06-15 2010-02-23 Micron Technology, Inc. Quantizing circuits for semiconductor devices
US7733262B2 (en) * 2007-06-15 2010-06-08 Micron Technology, Inc. Quantizing circuits with variable reference signals
US7969783B2 (en) * 2007-06-15 2011-06-28 Micron Technology, Inc. Memory with correlated resistance
US7839703B2 (en) 2007-06-15 2010-11-23 Micron Technology, Inc. Subtraction circuits and digital-to-analog converters for semiconductor devices
US7830729B2 (en) 2007-06-15 2010-11-09 Micron Technology, Inc. Digital filters with memory
US7768868B2 (en) * 2007-06-15 2010-08-03 Micron Technology, Inc. Digital filters for semiconductor devices
US9135962B2 (en) 2007-06-15 2015-09-15 Micron Technology, Inc. Comparators for delta-sigma modulators
US7538702B2 (en) * 2007-06-15 2009-05-26 Micron Technology, Inc. Quantizing circuits with variable parameters
US8117520B2 (en) 2007-06-15 2012-02-14 Micron Technology, Inc. Error detection for multi-bit memory
US8068367B2 (en) 2007-06-15 2011-11-29 Micron Technology, Inc. Reference current sources
US7813167B2 (en) 2008-03-21 2010-10-12 Micron Technology, Inc. Memory cell
TWI334604B (en) * 2007-06-25 2010-12-11 Ind Tech Res Inst Sensing circuits of phase change memory
US7777215B2 (en) 2007-07-20 2010-08-17 Macronix International Co., Ltd. Resistive memory structure with buffer layer
US7729161B2 (en) 2007-08-02 2010-06-01 Macronix International Co., Ltd. Phase change memory with dual word lines and source lines and method of operating same
US7642125B2 (en) 2007-09-14 2010-01-05 Macronix International Co., Ltd. Phase change memory cell in via array with self-aligned, self-converged bottom electrode and method for manufacturing
US8178386B2 (en) 2007-09-14 2012-05-15 Macronix International Co., Ltd. Phase change memory cell array with self-converged bottom electrode and method for manufacturing
US7919766B2 (en) * 2007-10-22 2011-04-05 Macronix International Co., Ltd. Method for making self aligning pillar memory cell device
US7890892B2 (en) 2007-11-15 2011-02-15 International Business Machines Corporation Balanced and bi-directional bit line paths for memory arrays with programmable memory cells
US7646631B2 (en) * 2007-12-07 2010-01-12 Macronix International Co., Ltd. Phase change memory cell having interface structures with essentially equal thermal impedances and manufacturing methods
US7879643B2 (en) 2008-01-18 2011-02-01 Macronix International Co., Ltd. Memory cell with memory element contacting an inverted T-shaped bottom electrode
US7879645B2 (en) * 2008-01-28 2011-02-01 Macronix International Co., Ltd. Fill-in etching free pore device
US8158965B2 (en) 2008-02-05 2012-04-17 Macronix International Co., Ltd. Heating center PCRAM structure and methods for making
US7985960B2 (en) * 2008-02-14 2011-07-26 4D-S Pty Ltd. Voltage excited piezoelectric resistance memory cell system
US8084842B2 (en) * 2008-03-25 2011-12-27 Macronix International Co., Ltd. Thermally stabilized electrode structure
US8030634B2 (en) * 2008-03-31 2011-10-04 Macronix International Co., Ltd. Memory array with diode driver and method for fabricating the same
US7825398B2 (en) * 2008-04-07 2010-11-02 Macronix International Co., Ltd. Memory cell having improved mechanical stability
US7881100B2 (en) * 2008-04-08 2011-02-01 Micron Technology, Inc. State machine sensing of memory cells
US7791057B2 (en) * 2008-04-22 2010-09-07 Macronix International Co., Ltd. Memory cell having a buried phase change region and method for fabricating the same
US8077505B2 (en) 2008-05-07 2011-12-13 Macronix International Co., Ltd. Bipolar switching of phase change device
US7701750B2 (en) 2008-05-08 2010-04-20 Macronix International Co., Ltd. Phase change device having two or more substantial amorphous regions in high resistance state
US8415651B2 (en) * 2008-06-12 2013-04-09 Macronix International Co., Ltd. Phase change memory cell having top and bottom sidewall contacts
US8134857B2 (en) 2008-06-27 2012-03-13 Macronix International Co., Ltd. Methods for high speed reading operation of phase change memory and device employing same
US7864609B2 (en) * 2008-06-30 2011-01-04 Micron Technology, Inc. Methods for determining resistance of phase change memory elements
US20100019215A1 (en) * 2008-07-22 2010-01-28 Macronix International Co., Ltd. Mushroom type memory cell having self-aligned bottom electrode and diode access device
US7932506B2 (en) 2008-07-22 2011-04-26 Macronix International Co., Ltd. Fully self-aligned pore-type memory cell having diode access device
US8467236B2 (en) * 2008-08-01 2013-06-18 Boise State University Continuously variable resistor
US7825479B2 (en) 2008-08-06 2010-11-02 International Business Machines Corporation Electrical antifuse having a multi-thickness dielectric layer
US7903457B2 (en) 2008-08-19 2011-03-08 Macronix International Co., Ltd. Multiple phase change materials in an integrated circuit for system on a chip application
US8325542B2 (en) * 2008-08-25 2012-12-04 Halo Lsi Inc. Complementary reference method for high reliability trap-type non-volatile memory
US7719913B2 (en) * 2008-09-12 2010-05-18 Macronix International Co., Ltd. Sensing circuit for PCRAM applications
JP2010067332A (ja) * 2008-09-12 2010-03-25 Elpida Memory Inc 相補型相変化メモリセル及びメモリ回路
US8324605B2 (en) * 2008-10-02 2012-12-04 Macronix International Co., Ltd. Dielectric mesh isolated phase change structure for phase change memory
US7897954B2 (en) 2008-10-10 2011-03-01 Macronix International Co., Ltd. Dielectric-sandwiched pillar memory device
US8036014B2 (en) * 2008-11-06 2011-10-11 Macronix International Co., Ltd. Phase change memory program method without over-reset
US8907316B2 (en) * 2008-11-07 2014-12-09 Macronix International Co., Ltd. Memory cell access device having a pn-junction with polycrystalline and single crystal semiconductor regions
US8664689B2 (en) * 2008-11-07 2014-03-04 Macronix International Co., Ltd. Memory cell access device having a pn-junction with polycrystalline plug and single-crystal semiconductor regions
US7869270B2 (en) 2008-12-29 2011-01-11 Macronix International Co., Ltd. Set algorithm for phase change memory cell
US8089137B2 (en) * 2009-01-07 2012-01-03 Macronix International Co., Ltd. Integrated circuit memory with single crystal silicon on silicide driver and manufacturing method
US8107283B2 (en) 2009-01-12 2012-01-31 Macronix International Co., Ltd. Method for setting PCRAM devices
US8030635B2 (en) 2009-01-13 2011-10-04 Macronix International Co., Ltd. Polysilicon plug bipolar transistor for phase change memory
US8064247B2 (en) 2009-01-14 2011-11-22 Macronix International Co., Ltd. Rewritable memory device based on segregation/re-absorption
US8933536B2 (en) * 2009-01-22 2015-01-13 Macronix International Co., Ltd. Polysilicon pillar bipolar transistor with self-aligned memory element
US8084760B2 (en) * 2009-04-20 2011-12-27 Macronix International Co., Ltd. Ring-shaped electrode and manufacturing method for same
US8173987B2 (en) 2009-04-27 2012-05-08 Macronix International Co., Ltd. Integrated circuit 3D phase change memory array and manufacturing method
US8097871B2 (en) 2009-04-30 2012-01-17 Macronix International Co., Ltd. Low operational current phase change memory structures
US7933139B2 (en) 2009-05-15 2011-04-26 Macronix International Co., Ltd. One-transistor, one-resistor, one-capacitor phase change memory
US8350316B2 (en) * 2009-05-22 2013-01-08 Macronix International Co., Ltd. Phase change memory cells having vertical channel access transistor and memory plane
US7968876B2 (en) 2009-05-22 2011-06-28 Macronix International Co., Ltd. Phase change memory cell having vertical channel access transistor
US8809829B2 (en) 2009-06-15 2014-08-19 Macronix International Co., Ltd. Phase change memory having stabilized microstructure and manufacturing method
US8406033B2 (en) 2009-06-22 2013-03-26 Macronix International Co., Ltd. Memory device and method for sensing and fixing margin cells
US8363463B2 (en) 2009-06-25 2013-01-29 Macronix International Co., Ltd. Phase change memory having one or more non-constant doping profiles
US8238149B2 (en) 2009-06-25 2012-08-07 Macronix International Co., Ltd. Methods and apparatus for reducing defect bits in phase change memory
US8110822B2 (en) 2009-07-15 2012-02-07 Macronix International Co., Ltd. Thermal protect PCRAM structure and methods for making
US7894254B2 (en) 2009-07-15 2011-02-22 Macronix International Co., Ltd. Refresh circuitry for phase change memory
US8198619B2 (en) 2009-07-15 2012-06-12 Macronix International Co., Ltd. Phase change memory cell structure
US8064248B2 (en) 2009-09-17 2011-11-22 Macronix International Co., Ltd. 2T2R-1T1R mix mode phase change memory array
US8178387B2 (en) 2009-10-23 2012-05-15 Macronix International Co., Ltd. Methods for reducing recrystallization time for a phase change material
JP5359798B2 (ja) 2009-11-10 2013-12-04 ソニー株式会社 メモリデバイスおよびその読み出し方法
JP5521612B2 (ja) 2010-02-15 2014-06-18 ソニー株式会社 不揮発性半導体メモリデバイス
US8729521B2 (en) 2010-05-12 2014-05-20 Macronix International Co., Ltd. Self aligned fin-type programmable memory cell
US8310864B2 (en) 2010-06-15 2012-11-13 Macronix International Co., Ltd. Self-aligned bit line under word line memory array
KR101201858B1 (ko) 2010-08-27 2012-11-15 에스케이하이닉스 주식회사 반도체 메모리 장치
US8395935B2 (en) 2010-10-06 2013-03-12 Macronix International Co., Ltd. Cross-point self-aligned reduced cell size phase change memory
US8497705B2 (en) 2010-11-09 2013-07-30 Macronix International Co., Ltd. Phase change device for interconnection of programmable logic device
US8467238B2 (en) 2010-11-15 2013-06-18 Macronix International Co., Ltd. Dynamic pulse operation for phase change memory
US8482962B2 (en) * 2011-04-27 2013-07-09 Robert Newton Rountree Low noise memory array
WO2012178114A2 (en) 2011-06-24 2012-12-27 Rambus Inc. Resistance memory cell
US8987700B2 (en) 2011-12-02 2015-03-24 Macronix International Co., Ltd. Thermally confined electrode for programmable resistance memory
WO2013153786A1 (ja) * 2012-04-09 2013-10-17 パナソニック株式会社 不揮発性記憶装置、およびそのフォーミング方法
US8964458B2 (en) * 2012-04-13 2015-02-24 Taiwan Semiconductor Manufacturing Co., Ltd. Differential MRAM structure with relatively reversed magnetic tunnel junction elements enabling writing using same polarity current
US8885386B2 (en) * 2012-10-24 2014-11-11 Samsung Electronics Co., Ltd. Write driver in sense amplifier for resistive type memory
US9019743B2 (en) 2012-11-29 2015-04-28 Taiwan Semiconductor Manufacturing Company, Ltd. Method and structure for resistive switching random access memory with high reliable and high density
KR20140078849A (ko) * 2012-12-18 2014-06-26 삼성전자주식회사 저항성 메모리 장치, 이를 포함하는 시스템 및 데이터 리드 방법
US9343147B2 (en) * 2013-03-08 2016-05-17 Microship Technology Incorporated Resistive random access memory (ReRAM) and conductive bridging random access memory (CBRAM) cross coupled fuse and read method and system
JP5731624B1 (ja) * 2013-12-04 2015-06-10 ウィンボンド エレクトロニクス コーポレーション 半導体記憶装置
US9336879B2 (en) 2014-01-24 2016-05-10 Macronix International Co., Ltd. Multiple phase change materials in an integrated circuit for system on a chip application
CN103839585A (zh) * 2014-03-03 2014-06-04 山东华芯半导体有限公司 一种具有读取自参考功能的 2-1t1r rram 存储单元
US9559113B2 (en) 2014-05-01 2017-01-31 Macronix International Co., Ltd. SSL/GSL gate oxide in 3D vertical channel NAND
CN105448332A (zh) * 2014-09-16 2016-03-30 复旦大学 一种电阻型随机读取存储器及其写操作方法
US9672906B2 (en) 2015-06-19 2017-06-06 Macronix International Co., Ltd. Phase change memory with inter-granular switching
US11361215B2 (en) * 2017-11-29 2022-06-14 Anaflash Inc. Neural network circuits having non-volatile synapse arrays
US10573372B2 (en) 2018-05-31 2020-02-25 Micron Technology, Inc. Sensing operations in memory by comparing inputs in a sense amplifier
CN112014414A (zh) * 2020-08-14 2020-12-01 西安电子科技大学 一种手机玻璃盖板缺陷检测系统及方法
IT202100024365A1 (it) * 2021-09-22 2023-03-22 St Microelectronics Srl Procedimento per accedere a celle di memoria, corrispondenti circuito e dispositivo di memorizzazione dati

Family Cites Families (223)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US190350A (en) * 1877-05-01 Improvement in faucets
US72188A (en) * 1867-12-17 Elliott p
US27416A (en) * 1860-03-13 Improvement in lubricating journals
US127886A (en) * 1872-06-11 Improvement in portable billiard-tables
US123248A (en) * 1872-01-30 Improvement in gin-gearings
US35315A (en) * 1862-05-20 Imijrovement in harvesters
US163828A (en) * 1875-05-25 Improvement in apparatus for variegating soap
US35314A (en) * 1862-05-20 Improvement in glass-furnaces
US1229A (en) * 1839-07-10 Endless-chain horse-power for driving machinery
US106849A (en) * 1870-08-30 Improvement in combined lock-nuts and splice-bars
US168820A (en) * 1875-10-11 Improvement in violins
US123169A (en) * 1872-01-30 Improvement in pressure-accumulators for hydraulic presses
US107105A (en) * 1870-09-06 Improvement in apparatus for lighting gas by electricity
US123170A (en) * 1872-01-30 Improvement in tailors measures
US3271591A (en) 1963-09-20 1966-09-06 Energy Conversion Devices Inc Symmetrical current controlling device
US3622319A (en) * 1966-10-20 1971-11-23 Western Electric Co Nonreflecting photomasks and methods of making same
US3868651A (en) 1970-08-13 1975-02-25 Energy Conversion Devices Inc Method and apparatus for storing and reading data in a memory having catalytic material to initiate amorphous to crystalline change in memory structure
US3743847A (en) * 1971-06-01 1973-07-03 Motorola Inc Amorphous silicon film as a uv filter
US4267261A (en) 1971-07-15 1981-05-12 Energy Conversion Devices, Inc. Method for full format imaging
US3961314A (en) 1974-03-05 1976-06-01 Energy Conversion Devices, Inc. Structure and method for producing an image
US3966317A (en) 1974-04-08 1976-06-29 Energy Conversion Devices, Inc. Dry process production of archival microform records from hard copy
DE2712735B1 (de) * 1977-03-23 1978-09-14 Ibm Deutschland Lese-/Schreibzugriffschaltung zu Speicherzellen eines Speichers und Verfahren zu ihrem Betrieb
US4177474A (en) 1977-05-18 1979-12-04 Energy Conversion Devices, Inc. High temperature amorphous semiconductor member and method of making the same
JPS5565365A (en) * 1978-11-07 1980-05-16 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
DE2901303C2 (de) * 1979-01-15 1984-04-19 Max Planck Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Festes Ionenleitermaterial, seine Verwendung und Verfahren zu dessen Herstellung
US4312938A (en) * 1979-07-06 1982-01-26 Drexler Technology Corporation Method for making a broadband reflective laser recording and data storage medium with absorptive underlayer
US4269935A (en) * 1979-07-13 1981-05-26 Ionomet Company, Inc. Process of doping silver image in chalcogenide layer
US4316946A (en) * 1979-12-03 1982-02-23 Ionomet Company, Inc. Surface sensitized chalcogenide product and process for making and using the same
US4499557A (en) * 1980-10-28 1985-02-12 Energy Conversion Devices, Inc. Programmable cell for use in programmable electronic arrays
US4405710A (en) * 1981-06-22 1983-09-20 Cornell Research Foundation, Inc. Ion beam exposure of (g-Gex -Se1-x) inorganic resists
US4737379A (en) 1982-09-24 1988-04-12 Energy Conversion Devices, Inc. Plasma deposited coatings, and low temperature plasma method of making same
US4545111A (en) 1983-01-18 1985-10-08 Energy Conversion Devices, Inc. Method for making, parallel preprogramming or field programming of electronic matrix arrays
US4608296A (en) 1983-12-06 1986-08-26 Energy Conversion Devices, Inc. Superconducting films and devices exhibiting AC to DC conversion
US4795657A (en) * 1984-04-13 1989-01-03 Energy Conversion Devices, Inc. Method of fabricating a programmable array
US4670763A (en) 1984-05-14 1987-06-02 Energy Conversion Devices, Inc. Thin film field effect transistor
US4843443A (en) 1984-05-14 1989-06-27 Energy Conversion Devices, Inc. Thin film field effect transistor and method of making same
US4668968A (en) 1984-05-14 1987-05-26 Energy Conversion Devices, Inc. Integrated circuit compatible thin film field effect transistor and method of making same
US4769338A (en) 1984-05-14 1988-09-06 Energy Conversion Devices, Inc. Thin film field effect transistor and method of making same
US4673957A (en) 1984-05-14 1987-06-16 Energy Conversion Devices, Inc. Integrated circuit compatible thin film field effect transistor and method of making same
US4678679A (en) 1984-06-25 1987-07-07 Energy Conversion Devices, Inc. Continuous deposition of activated process gases
US4646266A (en) 1984-09-28 1987-02-24 Energy Conversion Devices, Inc. Programmable semiconductor structures and methods for using the same
US4637895A (en) 1985-04-01 1987-01-20 Energy Conversion Devices, Inc. Gas mixtures for the vapor deposition of semiconductor material
US4664939A (en) 1985-04-01 1987-05-12 Energy Conversion Devices, Inc. Vertical semiconductor processor
US4710899A (en) 1985-06-10 1987-12-01 Energy Conversion Devices, Inc. Data storage medium incorporating a transition metal for increased switching speed
US4671618A (en) * 1986-05-22 1987-06-09 Wu Bao Gang Liquid crystalline-plastic material having submillisecond switch times and extended memory
US4766471A (en) 1986-01-23 1988-08-23 Energy Conversion Devices, Inc. Thin film electro-optical devices
US4818717A (en) 1986-06-27 1989-04-04 Energy Conversion Devices, Inc. Method for making electronic matrix arrays
US4728406A (en) 1986-08-18 1988-03-01 Energy Conversion Devices, Inc. Method for plasma - coating a semiconductor body
US4809044A (en) 1986-08-22 1989-02-28 Energy Conversion Devices, Inc. Thin film overvoltage protection devices
US4845533A (en) 1986-08-22 1989-07-04 Energy Conversion Devices, Inc. Thin film electrical devices with amorphous carbon electrodes and method of making same
US4788594A (en) 1986-10-15 1988-11-29 Energy Conversion Devices, Inc. Solid state electronic camera including thin film matrix of photosensors
US4853785A (en) 1986-10-15 1989-08-01 Energy Conversion Devices, Inc. Electronic camera including electronic signal storage cartridge
US4847674A (en) * 1987-03-10 1989-07-11 Advanced Micro Devices, Inc. High speed interconnect system with refractory non-dogbone contacts and an active electromigration suppression mechanism
US4800526A (en) * 1987-05-08 1989-01-24 Gaf Corporation Memory element for information storage and retrieval system and associated process
US4891330A (en) 1987-07-27 1990-01-02 Energy Conversion Devices, Inc. Method of fabricating n-type and p-type microcrystalline semiconductor alloy material including band gap widening elements
US4775425A (en) 1987-07-27 1988-10-04 Energy Conversion Devices, Inc. P and n-type microcrystalline semiconductor alloy material including band gap widening elements, devices utilizing same
US5272359A (en) * 1988-04-07 1993-12-21 California Institute Of Technology Reversible non-volatile switch based on a TCNQ charge transfer complex
JP2721909B2 (ja) * 1989-01-18 1998-03-04 三菱電機株式会社 半導体記憶装置
GB8910854D0 (en) * 1989-05-11 1989-06-28 British Petroleum Co Plc Semiconductor device
US5159661A (en) 1990-10-05 1992-10-27 Energy Conversion Devices, Inc. Vertically interconnected parallel distributed processor
US5314772A (en) * 1990-10-09 1994-05-24 Arizona Board Of Regents High resolution, multi-layer resist for microlithography and method therefor
JPH0770731B2 (ja) * 1990-11-22 1995-07-31 松下電器産業株式会社 電気可塑性素子
US5305268A (en) * 1990-12-13 1994-04-19 Sgs-Thomson Microelectronics, Inc. Semiconductor memory with column equilibrate on change of data during a write cycle
US5166758A (en) 1991-01-18 1992-11-24 Energy Conversion Devices, Inc. Electrically erasable phase change memory
US5341328A (en) 1991-01-18 1994-08-23 Energy Conversion Devices, Inc. Electrically erasable memory elements having reduced switching current requirements and increased write/erase cycle life
US5596522A (en) 1991-01-18 1997-01-21 Energy Conversion Devices, Inc. Homogeneous compositions of microcrystalline semiconductor material, semiconductor devices and directly overwritable memory elements fabricated therefrom, and arrays fabricated from the memory elements
US5414271A (en) 1991-01-18 1995-05-09 Energy Conversion Devices, Inc. Electrically erasable memory elements having improved set resistance stability
US5335219A (en) 1991-01-18 1994-08-02 Ovshinsky Stanford R Homogeneous composition of microcrystalline semiconductor material, semiconductor devices and directly overwritable memory elements fabricated therefrom, and arrays fabricated from the memory elements
US5534711A (en) 1991-01-18 1996-07-09 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
US5534712A (en) 1991-01-18 1996-07-09 Energy Conversion Devices, Inc. Electrically erasable memory elements characterized by reduced current and improved thermal stability
US5406509A (en) 1991-01-18 1995-04-11 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
US5296716A (en) 1991-01-18 1994-03-22 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
US5536947A (en) 1991-01-18 1996-07-16 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory element and arrays fabricated therefrom
US5128099A (en) 1991-02-15 1992-07-07 Energy Conversion Devices, Inc. Congruent state changeable optical memory material and device
US5219788A (en) * 1991-02-25 1993-06-15 Ibm Corporation Bilayer metallization cap for photolithography
US5177567A (en) * 1991-07-19 1993-01-05 Energy Conversion Devices, Inc. Thin-film structure for chalcogenide electrical switching devices and process therefor
US5359205A (en) 1991-11-07 1994-10-25 Energy Conversion Devices, Inc. Electrically erasable memory elements characterized by reduced current and improved thermal stability
US5238862A (en) * 1992-03-18 1993-08-24 Micron Technology, Inc. Method of forming a stacked capacitor with striated electrode
KR940004732A (ko) * 1992-08-07 1994-03-15 가나이 쯔또무 패턴 형성 방법 및 패턴 형성에 사용하는 박막 형성 방법
US5350484A (en) * 1992-09-08 1994-09-27 Intel Corporation Method for the anisotropic etching of metal films in the fabrication of interconnects
US5818749A (en) * 1993-08-20 1998-10-06 Micron Technology, Inc. Integrated circuit memory device
BE1007902A3 (nl) * 1993-12-23 1995-11-14 Philips Electronics Nv Schakelelement met geheugen voorzien van schottky tunnelbarriere.
US5500532A (en) 1994-08-18 1996-03-19 Arizona Board Of Regents Personal electronic dosimeter
JP2643870B2 (ja) * 1994-11-29 1997-08-20 日本電気株式会社 半導体記憶装置の製造方法
US5543737A (en) 1995-02-10 1996-08-06 Energy Conversion Devices, Inc. Logical operation circuit employing two-terminal chalcogenide switches
US5789758A (en) * 1995-06-07 1998-08-04 Micron Technology, Inc. Chalcogenide memory cell with a plurality of chalcogenide electrodes
US5879955A (en) * 1995-06-07 1999-03-09 Micron Technology, Inc. Method for fabricating an array of ultra-small pores for chalcogenide memory cells
US5751012A (en) 1995-06-07 1998-05-12 Micron Technology, Inc. Polysilicon pillar diode for use in a non-volatile memory cell
JP3363154B2 (ja) * 1995-06-07 2003-01-08 ミクロン テクノロジー、インコーポレイテッド 不揮発性メモリセル内のマルチステート材料と共に使用するスタック/トレンチダイオード
US5869843A (en) 1995-06-07 1999-02-09 Micron Technology, Inc. Memory array having a multi-state element and method for forming such array or cells thereof
US6420725B1 (en) 1995-06-07 2002-07-16 Micron Technology, Inc. Method and apparatus for forming an integrated circuit electrode having a reduced contact area
US5714768A (en) 1995-10-24 1998-02-03 Energy Conversion Devices, Inc. Second-layer phase change memory array on top of a logic device
US5694054A (en) 1995-11-28 1997-12-02 Energy Conversion Devices, Inc. Integrated drivers for flat panel displays employing chalcogenide logic elements
US5591501A (en) 1995-12-20 1997-01-07 Energy Conversion Devices, Inc. Optical recording medium having a plurality of discrete phase change data recording points
US6043562A (en) * 1996-01-26 2000-03-28 Micron Technology, Inc. Digit line architecture for dynamic memory
US6653733B1 (en) * 1996-02-23 2003-11-25 Micron Technology, Inc. Conductors in semiconductor devices
US5687112A (en) 1996-04-19 1997-11-11 Energy Conversion Devices, Inc. Multibit single cell memory element having tapered contact
US5852870A (en) * 1996-04-24 1998-12-29 Amkor Technology, Inc. Method of making grid array assembly
US5694366A (en) * 1996-05-01 1997-12-02 Micron Quantum Devices, Inc. OP amp circuit with variable resistance and memory system including same
US5851882A (en) 1996-05-06 1998-12-22 Micron Technology, Inc. ZPROM manufacture and design and methods for forming thin structures using spacers as an etching mask
US5761115A (en) 1996-05-30 1998-06-02 Axon Technologies Corporation Programmable metallization cell structure and method of making same
US5789277A (en) * 1996-07-22 1998-08-04 Micron Technology, Inc. Method of making chalogenide memory device
US5814527A (en) 1996-07-22 1998-09-29 Micron Technology, Inc. Method of making small pores defined by a disposable internal spacer for use in chalcogenide memories
US5998244A (en) * 1996-08-22 1999-12-07 Micron Technology, Inc. Memory cell incorporating a chalcogenide element and method of making same
US5883827A (en) * 1996-08-26 1999-03-16 Micron Technology, Inc. Method and apparatus for reading/writing data in a memory system including programmable resistors
US5699293A (en) * 1996-10-09 1997-12-16 Motorola Method of operating a random access memory device having a plurality of pairs of memory cells as the memory device
US6087674A (en) 1996-10-28 2000-07-11 Energy Conversion Devices, Inc. Memory element with memory material comprising phase-change material and dielectric material
US5825046A (en) 1996-10-28 1998-10-20 Energy Conversion Devices, Inc. Composite memory material comprising a mixture of phase-change memory material and dielectric material
US5943263A (en) * 1997-01-08 1999-08-24 Micron Technology, Inc. Apparatus and method for programming voltage protection in a non-volatile memory system
US5846889A (en) * 1997-03-14 1998-12-08 The United States Of America As Represented By The Secretary Of The Navy Infrared transparent selenide glasses
US5998066A (en) * 1997-05-16 1999-12-07 Aerial Imaging Corporation Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass
US6031287A (en) 1997-06-18 2000-02-29 Micron Technology, Inc. Contact structure and memory element incorporating the same
US5933365A (en) 1997-06-19 1999-08-03 Energy Conversion Devices, Inc. Memory element with energy control mechanism
US5995424A (en) * 1997-07-16 1999-11-30 Tanisys Technology, Inc. Synchronous memory test system
US6051511A (en) * 1997-07-31 2000-04-18 Micron Technology, Inc. Method and apparatus for reducing isolation stress in integrated circuits
TW411471B (en) * 1997-09-17 2000-11-11 Siemens Ag Memory-cell device
US5936880A (en) * 1997-11-13 1999-08-10 Vlsi Technology, Inc. Bi-layer programmable resistor memory
KR100371102B1 (ko) 1997-12-04 2003-02-06 엑손 테크놀로지스 코포레이션 프로그램형 표면하 군집 금속화 구조체 및 그 제조 방법
US6011757A (en) 1998-01-27 2000-01-04 Ovshinsky; Stanford R. Optical recording media having increased erasability
US5936882A (en) * 1998-03-31 1999-08-10 Motorola, Inc. Magnetoresistive random access memory device and method of manufacture
JP4226686B2 (ja) * 1998-05-07 2009-02-18 株式会社東芝 半導体メモリシステム及び半導体メモリのアクセス制御方法及び半導体メモリ
US5912839A (en) 1998-06-23 1999-06-15 Energy Conversion Devices, Inc. Universal memory element and method of programming same
US6297170B1 (en) * 1998-06-23 2001-10-02 Vlsi Technology, Inc. Sacrificial multilayer anti-reflective coating for mos gate formation
US6141241A (en) 1998-06-23 2000-10-31 Energy Conversion Devices, Inc. Universal memory element with systems employing same and apparatus and method for reading, writing and programming same
US6388324B2 (en) 1998-08-31 2002-05-14 Arizona Board Of Regents Self-repairing interconnections for electrical circuits
US6469364B1 (en) * 1998-08-31 2002-10-22 Arizona Board Of Regents Programmable interconnection system for electrical circuits
US6487106B1 (en) * 1999-01-12 2002-11-26 Arizona Board Of Regents Programmable microelectronic devices and method of forming and programming same
US6635914B2 (en) 2000-09-08 2003-10-21 Axon Technologies Corp. Microelectronic programmable device and methods of forming and programming the same
US6825489B2 (en) 2001-04-06 2004-11-30 Axon Technologies Corporation Microelectronic device, structure, and system, including a memory structure having a variable programmable property and method of forming the same
US6177338B1 (en) * 1999-02-08 2001-01-23 Taiwan Semiconductor Manufacturing Company Two step barrier process
KR20010110433A (ko) 1999-02-11 2001-12-13 알란 엠. 포스칸져 프로그래머블 마이크로일렉트로닉 장치 및 그 형성방법과프로그래밍 방법
US6072716A (en) * 1999-04-14 2000-06-06 Massachusetts Institute Of Technology Memory structures and methods of making same
US6191972B1 (en) * 1999-04-30 2001-02-20 Nec Corporation Magnetic random access memory circuit
US6143604A (en) * 1999-06-04 2000-11-07 Taiwan Semiconductor Manufacturing Company Method for fabricating small-size two-step contacts for word-line strapping on dynamic random access memory (DRAM)
US6350679B1 (en) * 1999-08-03 2002-02-26 Micron Technology, Inc. Methods of providing an interlevel dielectric layer intermediate different elevation conductive metal layers in the fabrication of integrated circuitry
US6423628B1 (en) * 1999-10-22 2002-07-23 Lsi Logic Corporation Method of forming integrated circuit structure having low dielectric constant material and having silicon oxynitride caps over closely spaced apart metal lines
US6314014B1 (en) * 1999-12-16 2001-11-06 Ovonyx, Inc. Programmable resistance memory arrays with reference cells
US6473336B2 (en) 1999-12-16 2002-10-29 Kabushiki Kaisha Toshiba Magnetic memory device
US6865117B2 (en) 2000-02-11 2005-03-08 Axon Technologies Corporation Programming circuit for a programmable microelectronic device, system including the circuit, and method of forming the same
US6927411B2 (en) 2000-02-11 2005-08-09 Axon Technologies Corporation Programmable structure, an array including the structure, and methods of forming the same
US6914802B2 (en) 2000-02-11 2005-07-05 Axon Technologies Corporation Microelectronic photonic structure and device and method of forming the same
US6191989B1 (en) * 2000-03-07 2001-02-20 International Business Machines Corporation Current sensing amplifier
KR100436671B1 (ko) * 2000-03-17 2004-07-02 가부시끼가이샤 도시바 자기 메모리 장치
US6347058B1 (en) * 2000-05-19 2002-02-12 International Business Machines Corporation Sense amplifier with overdrive and regulated bitline voltage
JP3985432B2 (ja) * 2000-06-19 2007-10-03 日本電気株式会社 磁気ランダムアクセスメモリ
US6501111B1 (en) 2000-06-30 2002-12-31 Intel Corporation Three-dimensional (3D) programmable device
US6440837B1 (en) 2000-07-14 2002-08-27 Micron Technology, Inc. Method of forming a contact structure in a semiconductor device
US6563156B2 (en) 2001-03-15 2003-05-13 Micron Technology, Inc. Memory elements and methods for making same
US6429064B1 (en) 2000-09-29 2002-08-06 Intel Corporation Reduced contact area of sidewall conductor
US6555860B2 (en) * 2000-09-29 2003-04-29 Intel Corporation Compositionally modified resistive electrode
US6563164B2 (en) * 2000-09-29 2003-05-13 Ovonyx, Inc. Compositionally modified resistive electrode
US6567293B1 (en) * 2000-09-29 2003-05-20 Ovonyx, Inc. Single level metal memory cell using chalcogenide cladding
US6339544B1 (en) 2000-09-29 2002-01-15 Intel Corporation Method to enhance performance of thermal resistor device
US6404665B1 (en) 2000-09-29 2002-06-11 Intel Corporation Compositionally modified resistive electrode
US6587370B2 (en) * 2000-11-01 2003-07-01 Canon Kabushiki Kaisha Magnetic memory and information recording and reproducing method therefor
JP3768143B2 (ja) * 2000-11-09 2006-04-19 三洋電機株式会社 磁気メモリ装置
JP4726292B2 (ja) * 2000-11-14 2011-07-20 ルネサスエレクトロニクス株式会社 薄膜磁性体記憶装置
US6653193B2 (en) 2000-12-08 2003-11-25 Micron Technology, Inc. Resistance variable device
US6649928B2 (en) 2000-12-13 2003-11-18 Intel Corporation Method to selectively remove one side of a conductive bottom electrode of a phase-change memory cell and structure obtained thereby
US6696355B2 (en) * 2000-12-14 2004-02-24 Ovonyx, Inc. Method to selectively increase the top resistance of the lower programming electrode in a phase-change memory
US6437383B1 (en) 2000-12-21 2002-08-20 Intel Corporation Dual trench isolation for a phase-change memory cell and method of making same
US6569705B2 (en) * 2000-12-21 2003-05-27 Intel Corporation Metal structure for a phase-change memory device
US6646297B2 (en) 2000-12-26 2003-11-11 Ovonyx, Inc. Lower electrode isolation in a double-wide trench
US6534781B2 (en) 2000-12-26 2003-03-18 Ovonyx, Inc. Phase-change memory bipolar array utilizing a single shallow trench isolation for creating an individual active area region for two memory array elements and one bipolar base contact
US6531373B2 (en) * 2000-12-27 2003-03-11 Ovonyx, Inc. Method of forming a phase-change memory cell using silicon on insulator low electrode in charcogenide elements
US6687427B2 (en) * 2000-12-29 2004-02-03 Intel Corporation Optic switch
US6638820B2 (en) 2001-02-08 2003-10-28 Micron Technology, Inc. Method of forming chalcogenide comprising devices, method of precluding diffusion of a metal into adjacent chalcogenide material, and chalcogenide comprising devices
US6727192B2 (en) 2001-03-01 2004-04-27 Micron Technology, Inc. Methods of metal doping a chalcogenide material
US6348365B1 (en) 2001-03-02 2002-02-19 Micron Technology, Inc. PCRAM cell manufacturing
JP4712204B2 (ja) * 2001-03-05 2011-06-29 ルネサスエレクトロニクス株式会社 記憶装置
US6818481B2 (en) 2001-03-07 2004-11-16 Micron Technology, Inc. Method to manufacture a buried electrode PCRAM cell
US6734455B2 (en) * 2001-03-15 2004-05-11 Micron Technology, Inc. Agglomeration elimination for metal sputter deposition of chalcogenides
US6473332B1 (en) * 2001-04-04 2002-10-29 The University Of Houston System Electrically variable multi-state resistance computing
DE60220912T2 (de) 2001-05-07 2008-02-28 Advanced Micro Devices, Inc., Sunnyvale Speichervorrichtung mit einem sich selbst einbauenden polymer und verfahren zur herstellung derselben
US7102150B2 (en) 2001-05-11 2006-09-05 Harshfield Steven T PCRAM memory cell and method of making same
US6480438B1 (en) 2001-06-12 2002-11-12 Ovonyx, Inc. Providing equal cell programming conditions across a large and high density array of phase-change memory cells
US6589714B2 (en) 2001-06-26 2003-07-08 Ovonyx, Inc. Method for making programmable resistance memory element using silylated photoresist
US6613604B2 (en) 2001-08-02 2003-09-02 Ovonyx, Inc. Method for making small pore for use in programmable resistance memory element
US6462984B1 (en) 2001-06-29 2002-10-08 Intel Corporation Biasing scheme of floating unselected wordlines and bitlines of a diode-based memory array
US6570784B2 (en) * 2001-06-29 2003-05-27 Ovonyx, Inc. Programming a phase-change material memory
US6487113B1 (en) 2001-06-29 2002-11-26 Ovonyx, Inc. Programming a phase-change memory with slow quench time
US6642102B2 (en) 2001-06-30 2003-11-04 Intel Corporation Barrier material encapsulation of programmable material
US6605527B2 (en) 2001-06-30 2003-08-12 Intel Corporation Reduced area intersection between electrode and programming element
US6511862B2 (en) * 2001-06-30 2003-01-28 Ovonyx, Inc. Modified contact for programmable devices
US6514805B2 (en) * 2001-06-30 2003-02-04 Intel Corporation Trench sidewall profile for device isolation
US6511867B2 (en) * 2001-06-30 2003-01-28 Ovonyx, Inc. Utilizing atomic layer deposition for programmable device
US6673700B2 (en) * 2001-06-30 2004-01-06 Ovonyx, Inc. Reduced area intersection between electrode and programming element
US6951805B2 (en) 2001-08-01 2005-10-04 Micron Technology, Inc. Method of forming integrated circuitry, method of forming memory circuitry, and method of forming random access memory circuitry
US6590807B2 (en) 2001-08-02 2003-07-08 Intel Corporation Method for reading a structural phase-change memory
US6737312B2 (en) 2001-08-27 2004-05-18 Micron Technology, Inc. Method of fabricating dual PCRAM cells sharing a common electrode
US6577525B2 (en) * 2001-08-28 2003-06-10 Micron Technology, Inc. Sensing method and apparatus for resistance memory device
US6784018B2 (en) 2001-08-29 2004-08-31 Micron Technology, Inc. Method of forming chalcogenide comprising devices and method of forming a programmable memory cell of memory circuitry
US6881623B2 (en) 2001-08-29 2005-04-19 Micron Technology, Inc. Method of forming chalcogenide comprising devices, method of forming a programmable memory cell of memory circuitry, and a chalcogenide comprising device
US6955940B2 (en) 2001-08-29 2005-10-18 Micron Technology, Inc. Method of forming chalcogenide comprising devices
US6709958B2 (en) 2001-08-30 2004-03-23 Micron Technology, Inc. Integrated circuit device and fabrication using metal-doped chalcogenide materials
US6646902B2 (en) 2001-08-30 2003-11-11 Micron Technology, Inc. Method of retaining memory state in a programmable conductor RAM
US20030047765A1 (en) 2001-08-30 2003-03-13 Campbell Kristy A. Stoichiometry for chalcogenide glasses useful for memory devices and method of formation
US6507061B1 (en) * 2001-08-31 2003-01-14 Intel Corporation Multiple layer phase-change memory
EP2112659A1 (en) * 2001-09-01 2009-10-28 Energy Convertion Devices, Inc. Increased data storage in optical data storage and retrieval systems using blue lasers and/or plasmon lenses
US6545287B2 (en) * 2001-09-07 2003-04-08 Intel Corporation Using selective deposition to form phase-change memory cells
US6586761B2 (en) 2001-09-07 2003-07-01 Intel Corporation Phase change material memory device
WO2003028098A2 (en) 2001-09-26 2003-04-03 Axon Technologies Corporation Programmable chip-to-substrate interconnect structure and device and method of forming same
US6690026B2 (en) * 2001-09-28 2004-02-10 Intel Corporation Method of fabricating a three-dimensional array of active media
US6757784B2 (en) * 2001-09-28 2004-06-29 Intel Corporation Hiding refresh of memory and refresh-hidden memory
AU2002362662A1 (en) 2001-10-09 2003-04-22 Axon Technologies Corporation Programmable microelectronic device, structure, and system, and method of forming the same
US6566700B2 (en) * 2001-10-11 2003-05-20 Ovonyx, Inc. Carbon-containing interfacial layer for phase-change memory
CA2465277A1 (en) 2001-10-26 2003-05-01 Arizona Board Of Regents Programmable surface control devices and method of making same
US6545907B1 (en) * 2001-10-30 2003-04-08 Ovonyx, Inc. Technique and apparatus for performing write operations to a phase change material memory device
US6456524B1 (en) * 2001-10-31 2002-09-24 Hewlett-Packard Company Hybrid resistive cross point memory cell arrays and methods of making the same
US6576921B2 (en) 2001-11-08 2003-06-10 Intel Corporation Isolating phase change material memory cells
US6815818B2 (en) 2001-11-19 2004-11-09 Micron Technology, Inc. Electrode structure for use in an integrated circuit
US6791859B2 (en) * 2001-11-20 2004-09-14 Micron Technology, Inc. Complementary bit PCRAM sense amplifier and method of operation
US6873538B2 (en) 2001-12-20 2005-03-29 Micron Technology, Inc. Programmable conductor random access memory and a method for writing thereto
US6667900B2 (en) 2001-12-28 2003-12-23 Ovonyx, Inc. Method and apparatus to operate a memory cell
US6625054B2 (en) 2001-12-28 2003-09-23 Intel Corporation Method and apparatus to program a phase change memory
US6512241B1 (en) * 2001-12-31 2003-01-28 Intel Corporation Phase change material memory device
US6909656B2 (en) 2002-01-04 2005-06-21 Micron Technology, Inc. PCRAM rewrite prevention
US20030143782A1 (en) 2002-01-31 2003-07-31 Gilton Terry L. Methods of forming germanium selenide comprising devices and methods of forming silver selenide comprising structures
US6867064B2 (en) 2002-02-15 2005-03-15 Micron Technology, Inc. Method to alter chalcogenide glass for improved switching characteristics
US6791885B2 (en) 2002-02-19 2004-09-14 Micron Technology, Inc. Programmable conductor random access memory and method for sensing same
US7151273B2 (en) 2002-02-20 2006-12-19 Micron Technology, Inc. Silver-selenide/chalcogenide glass stack for resistance variable memory
US6671710B2 (en) 2002-05-10 2003-12-30 Energy Conversion Devices, Inc. Methods of computing with digital multistate phase change materials
US6918382B2 (en) * 2002-08-26 2005-07-19 Energy Conversion Devices, Inc. Hydrogen powered scooter

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