CN100470723C - Exposure apparatus and method for manufacturing device - Google Patents

Abstract

An exposure apparatus (EX) is disclosed wherein a pattern image is projected onto a substrate (W) via a projection optical system (PL) and a liquid (LQ). The projection optical system (PL) comprises an optical member (G12) which is in contact with the liquid (LQ) and a group of optical elements (MPL) arranged between the optical member (G12) and a reticle (R). A holding mechanism (HG) for the optical member (G12) and the group of optical elements (MPL) holds the optical member (G12) in such a manner that the optical member (G12) is movable relative to the group of optical elements (MPL). By having such a structure, the exposure apparatus enables to suppress deterioration of the pattern image when exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.

Description

Exposure device and device making method

The application will be willing to 2003-272614 number (application on July 9th, 2003) and special hope 2004-044801 number (application on February 20th, 2004) as the spy of the patent application of applying for to the Japan Patent Room as the basis, and quote its content.

Technical field

The present invention relates under the state that fills up with liquid between projection optical system and the substrate exposure device with the substrate exposure, and the device making method that uses this exposure device.

Background technology

Semiconductor device and liquid crystal display device are with being formed on graph transfer printing on mask or the reticle mask (below, be called " reticle mask ") to the substrates such as wafer or glass plate, so-called photolithographic method manufacturing.The exposure device that in this photoetching process operation, uses, be to have the reticle mask objective table of support reticle mask and the substrate objective table of support substrates, and one side mobile one by one reticle mask objective table and substrate objective table, one side is transferred to device on the substrate with the figure of reticle mask via projection optical system.In recent years, in order to tackle the further highly integrated of component graphics, require the further high-resolutionization of projection optical system.The exploring degree of projection optical system, the exposure wavelength that is to use is short more, and the numerical aperture of projection optical system is big more in addition, and is just high more.Therefore, the exposure wavelength that uses in exposure device is short wavelengthization from year to year, and the numerical aperture of projection optical system also increases.And now the exposure wavelength of main flow is the 248nm of KrF excimer laser, and the 193nm of the ArF excimer laser that wavelength is shorter is practicability more and more also.In addition, when exposing, with the exploring degree similarly, depth of focus (DOF) also becomes important.Exploring degree Re and depth of focus δ use following formulate respectively.

Re＝k ₁·λ/NA ...(1)

δ＝±k ₂·λ/NA ² ...(2)

At this, λ is an exposure wavelength, and NA is the numerical aperture of projection optical system, k ₁, k ₂It is technological coefficient.By (1) formula, (2) formula, as can be known when shortening exposure wavelength lambda in order to improve exploring degree Re, and when increasing numerical aperture NA, depth of focus δ narrows down.

If it is narrow that depth of focus δ becomes, then be difficult to make substrate surface to coincide with respect to the image planes of projection optical system, and the focusing nargin deficiency might exposure actions the time.So, as in fact shortening exposure wavelength, and enlarge the method for depth of focus, for example international disclosed immersion method of brochure that discloses No. 99/49504 has been proposed.This immersion method, be that liquid such as water or organic solvent fill up between the following and substrate surface of projection optical system, and the exposure light wavelength of utilization in liquid is that (n is a liquid refractive index to airborne 1/n, normally about 1.2～1.6) situation improves the exploring degree, simultaneously depth of focus is enlarged about n times method.

; when between the end face of the optics of close substrate side of projection optical system and substrate surface, having filled up under the state of liquid; because of the vibration that the mobile grade of the substrate objective table that keeps substrate produces is given the optics of this terminal via liquid transfer, might deterioration via the figure picture that projection optical system and liquid project on the substrate.

And then, in above-mentioned conventional art, for the liquid that forms liquid soaks the zone, the jet element that use has liquid supply port and liquids recovery mouth carries out the supply and the recovery of liquid, but when the gap between liquid immersion jet element and the projection optical system, might on the lens barrel of the optics that keeps the formation projection optical system, get rusty, undesirable conditions such as optics dissolving perhaps occur.

And then, consider that also liquid immerses the situation of lens barrel inside, in this case, also above-mentioned undesirable condition might occur.

In addition because the influence of the liquid that immerses, in the projection optical system for example the optical element of the most close image planes side be out of shape a little or vibrate, the undesirable condition of exposure accuracy, instrumentation precision deterioration just might appear.

Summary of the invention

The present invention is developed in view of such problem, its purpose is to provide to be suppressed at fills up liquid between projection optical system and the substrate and the exposure device of the deterioration of figure picture when carrying out exposure-processed, and the device making method that uses this exposure device.

In order to solve the above problems, the present invention has adopted the corresponding following formation with Fig. 1～Figure 10 shown in the example.

Exposure device of the present invention (EX), it is to possess to comprise the optics (G12) that contacts with liquid (LQ) and be configured in optics group (G1～G11 between this optics (G12) and the figure, MPL) projection optical system (PL), by the picture of figure being projected in the expose exposure device of substrate (W) of mode on the substrate (W) via projection optical system (PL) and liquid (LQ), it is characterized in that, possess maintenance optics (G12) and optics group (G1～G11, MPL) maintaining body (HG), maintaining body (HG) is with respect to optics group (G1～G11, MPL) movable mode keeps optics (G12).

According to the present invention, because with the optics (so-called front lens) that contacts with liquid in the projection optical system, keeping with respect to the movable mode of optics group that is configured between this optics and the figure, the vibration that therefore is delivered to optics is absorbed by the mode that this optics moves.Thereby the transfer of vibration that can prevent optics is to the optics group.

In addition, can prevent that liquid from immersing the exposure device that can keep higher exposure accuracy and instrumentation precision in the projection optical system thereby the present invention also aims to provide, and the device making method that uses this exposure device.

In order to solve the above problems, the present invention has adopted the corresponding following formation with Figure 10～Figure 16 shown in the example.

Exposure device of the present invention (EX), it is to soak zone (AR2) at the liquid that the image planes side of projection optical system (PL) forms liquid (LQ), and via projection optical system (PL) and liquid (LQ) with the exposure device of graph exposure on substrate (W), it is characterized in that, possess with a plurality of opticses of surround constituting projection optical system (PL) (side (302T) of the optics (302F) that contacts with liquid (LQ) among the 2A～2F), or keep the mode of side of the holding member (PK) of this optics (302F) to be provided with, and endless member (370), and stop liquid (LQ) to immerse optics (302F) or the side (302T) of holding member (PK) and the 1st seal member (330) between the endless member (370) with at least any one party in liquid supply port (313) and the liquids recovery mouth (323).

According to the present invention,, can prevent that therefore liquid from immersing between optics or holding member and the endless member owing to be provided with the 1st seal member.Thereby, can prevent from holding member, to get rusty, or undesirable condition such as optics dissolving.In addition, because liquid that can not immerses between optics or holding member and the endless member, therefore can also prevent the generation of the distortion of the optics that causes by the liquid that immerses and vibration etc.Thereby, can carry out accurately handling via the exposure-processed and the instrumentation of liquid.

Exposure device of the present invention (EX), it is to soak zone (AR2) at the liquid that the image planes side of projection optical system (PL) forms liquid (LQ), and via projection optical system (PL) and liquid (LQ) with the exposure device of graph exposure on substrate (W), it is characterized in that, possess a plurality of opticses of keep constituting projection optical system (PL) (holding member (PK) of the optics (2F) that contact with liquid (LQ) among the 2A～2F), and the seal member (340) of the circulation of the gas between prevention optics (2F) and the holding member (PK).

According to the present invention, owing to be provided with seal member, therefore can prevent to keep to constitute the inner space of holding member of a plurality of opticses of projection optical system and the circulation of the gas between the outside.Thereby, even if with the gas formation of filling up the inner space of holding member of regulation, also can prevent with respect to the gas of the outside of its inner space or the immersion of liquid, and the inner space can be maintained the environment that needs.

Device making method of the present invention is characterized in that using above-mentioned described exposure device (EX).According to the present invention,, therefore can provide the device that to bring into play required performance owing to can keep higher exposure accuracy and instrumentation precision.

Description of drawings

Fig. 1 is a summary pie graph of showing an example of exposure device of the present invention.

Fig. 2 is near the enlarged drawing of leading section of projection optical system.

Fig. 3 is the figure that shows the position relation of the view field of projection optical system and fluid Supplying apparatus and liquid withdrawal system.

Fig. 4 is a pie graph of showing an example of projection optical system of the present invention.

Fig. 5 is near the amplification profile the 1st holding member and the bindiny mechanism.

Fig. 6 is the stereogram that constitutes the bool of bindiny mechanism.

Fig. 7 is the front view that constitutes the bool of bindiny mechanism.

Fig. 8 is the control block diagram of picture adjusting mechanism.

Fig. 9 is other the pie graph of example of showing projection optical system of the present invention.

Figure 10 is a summary pie graph of showing an example of exposure device of the present invention.

Figure 11 is the plane graph that the position of the view field of displaying liquid supply port and liquids recovery mouth and projection optical system concerns.

Figure 12 is that optical element and stream form near the amplification profile of parts.

Figure 13 is near show that the 1st seal member is a amplification profile.

Figure 14 is near show that the 2nd seal member is a amplification profile.

Figure 15 is a profile of showing other example of the 1st seal member.

Figure 16 is the flow chart of an example of showing the manufacturing process of semiconductor device.

Embodiment

Below, with reference to description of drawings exposure device of the present invention and device making method.

The 1st embodiment

Fig. 1 is a summary pie graph of showing an example of exposure device of the present invention.

In Fig. 1, exposure device EX, possesses the reticle mask objective table RST that supports reticle mask R, the substrate objective table WST of support substrates W, be supported on the lamp optical system IL of the reticle mask R on the reticle mask objective table RST with exposure light EL illumination, will with the figure of the reticle mask R of exposure light EL illumination as the projection optical system PL of projection exposure on the substrate W that is supported on the substrate objective table WST and the control device CONT of the action of unified control exposure device EX integral body.

At this, in this example, with as exposure device EX, use one side with reticle mask R and substrate W to the same moved further of scanning direction different directions from each other (in the other direction), the situation that one side will be formed on the scanning exposure apparatus (so-called scanning stepping exposure device) of graph exposure on substrate W on the reticle mask R is that example illustrates.In the following description, to be made as Z-direction with the corresponding to direction of optical axis AX of projection optical system PL, synchronous moving direction (scanning direction) with reticle mask R and substrate W in perpendicular to the plane of Z-direction is made as X-direction, will be made as Y direction perpendicular to the direction (non-scanning direction) of Z-direction and X-direction.In addition, will be made as θ X, θ Y and θ Z direction respectively around rotation (inclination) direction of X-axis, Y-axis and Z axle.Moreover said here " substrate " is included in the parts that applied resist on semiconductor wafer, the chip glass.

The exposure device EX of this example, be to improve the exploring degree in order in fact to shorten exposure wavelength, simultaneously in fact enlarge depth of focus and be suitable for the liquid immersion exposure apparatus of immersion method, possess to substrate W and go up the fluid Supplying apparatus 1 of feed fluid LQ and the liquid withdrawal system 2 of the liquid LQ on the recovery substrate W.Exposure device EX, at least the figure with reticle mask R look like to be transferred on the substrate W during in, by the liquid LQ that supplies with from fluid Supplying apparatus 1, on the part AR1 of view field that comprises projection optical system PL, on the substrate W, form liquid and soak regional AR2.Specifically, exposure device EX, adopt the local liquid that fills up between the surface of optics (optical element) G12 of the terminal part of projection optical system PL and substrate W with liquid LQ to soak formation (Local Liquid Filling), by the figure of reticle mask R being looked like to be projected in mode on the substrate W, substrate W is exposed via the liquid LQ between this projection optical system PL and the substrate W and projection optical system PL.

Lamp optical system IL, be the parts that are supported on the reticle mask R on the reticle mask objective table RST with exposure light EL illumination, has exposure light source, the light integrator of the illumination homogenizing of the light beam that will penetrate from exposure light source, collector lens, the relay lens system that will come from the exposure light EL optically focused of light integrator will be set at the variable field of view diaphragm of slit-shaped etc. by the field of illumination on the reticle mask R of exposure light EL generation.The field of illumination of the regulation on the reticle mask R is by the exposure light EL illumination of lamp optical system IL with uniform Illumination Distribution.As the exposure light EL that penetrates from lamp optical system IL, for example adopt from bright line (g line, h line, i line) and KrF excimer laser light extreme ultraviolet light (DUV light), ArF excimer laser light (wavelength 193nm) and the F such as (wavelength 248nm) in the ultraviolet territory that mercury vapor lamp penetrates ₂Laser optical (wavelength 157nm) equal vacuum ultraviolet light (VUV light) etc.In this example, adopt ArF excimer laser light.

At this, in this example, on liquid LQ, adopt pure water.Pure water not only can see through ArF excimer laser light, for example can also see through bright line (g line, h line, i line) and KrF excimer laser light extreme ultraviolet lights (DUV light) such as (wavelength 248nm) from the ultraviolet territory that mercury vapor lamp penetrates.

Reticle mask objective table RST, be the parts that support the reticle mask R that has formed the circuitous pattern that becomes former figure via reticle mask support RH, in plane, promptly in the XY plane, can carry out two dimension and move and can carry out small rotation along θ Z direction perpendicular to the optical axis AX of projection optical system PL.Reticle mask objective table RST is driven by reticle mask objective table drive unit RSTD such as linear motors.

Reticle mask objective table drive unit RSTD is controlled by control device CONT.Be provided with moving lens 50 at (perhaps on the reticle mask objective table RST) on the reticle mask support RH.In addition, on the position relative, be provided with laser interferometer 51 with moving lens 50.The anglec of rotation of the position of the two-dimensional directional of the reticle mask R on the reticle mask objective table RST and θ Z direction (the small anglec of rotation that according to circumstances also has θ X, θ Y direction) is passed through the real-time instrumentation of laser interferometer 51, and the instrumentation result is outputed to control device CONT.Control device CONT drives the mode of reticle mask objective table drive unit RSTD by the instrumentation result according to laser interferometer 51, is supported on the location of the reticle mask R on the reticle mask objective table RST.In addition, between reticle mask support RH that keeps reticle mask R and reticle mask objective table RST, be provided with a plurality of drivers 150 (150A～150C).By the driving of driver 150, keep the reticle mask support RH of reticle mask R, can and comprise that just the incline direction of θ X, θ Y direction moves along Z-direction.

Projection optical system PL is with graphic projection exposure the parts on substrate W of the projection multiplying power β that stipulates with reticle mask R.In this example, projection optical system PL is that projection multiplying power β for example is 1/4 or 1/5 reduction system.Moreover projection optical system PL also can be any one of times system such as grade and amplification system.

Projection optical system PL possesses the optics G12 that is configured in its end side (substrate W side), joins with liquid LQ, and comprises the optics group MPL of a plurality of optical element G1～G11 between the reticle mask R that is configured in optics G12 and has figure.Moreover in this example, optics G12 is 1 plano-convex lens element, and a plurality of optical element G1～G12 that constitutes projection optical system PL keeps with maintaining body HG.Maintaining body HG possesses lens barrel (the 2nd holding member) PLB that keeps optics group MPL and the lens maintaining part MLM that keeps lens element G12.Lens maintaining part MLM possesses lens kit (the 1st holding member) LS12 that keeps lens element G12, with the bindiny mechanism 100 that lens kit LS12 mildly is connected with respect to lens barrel PLB.Bindiny mechanism 100 possesses the bool as elastomeric element described later (100A～100C).The lens element G12 that remains in the lens kit LS12 passes through bindiny mechanism 100, can move with respect to the optics group MPL that remains in the lens barrel PLB.

Peripheral part at lens barrel PLB is provided with flange part FLG, and projection optical system PL is supported on column (main part of the exposure device) CL via flange part FLG.

Optical element G1～G12 is with fluorite or quartzy formation, implements aspheric surface and grind on the curved surface of the optical element of a part.Particularly, if form lens element G12 with fluorite, if this fluorite is not handled, the time has been grown and will therefore have been covered with suitable film and can protect fluorite can improve compatibility again by aqueous corrosion.Thus, liquid LQ is close on roughly whole of liquid contact surface of lens element G12, and can be reliably fills up light path between lens element G12 and the substrate W with liquid LQ.Moreover lens element G12 also can be the quartz higher with the compatibility of water.In addition, when hydrophilic (lyophilys) such as implementing covering on the liquid contact surface of lens element G12 handled, thereby during the compatibility of further raising and liquid LQ, also can be formed in and soak regional AR2 from liquid and removed under the drying regime of water, the very fast special membrane structure that disappears from the liquid contact surface of lens element G12 of moisture (for example the molecule assortment changes when additional electric field, maybe the film that temperature rises when flowing through a spot of electric current etc.).

Substrate objective table WST is the parts of support substrates W, possesses via substrate support to keep the Z objective table 52 of substrate W and the XY objective table 53 of support Z objective table 52.The substrate objective table WST that comprises z objective table 52 and XY objective table 53 is supported on the objective table base 54.Substrate objective table WST is driven by substrate objective table drive unit WSTD such as linear motors.Substrate objective table drive unit WSTD is controlled by control device CONT.By driving Z objective table 52, control remains on the position of the position (focal position) of Z-direction of the substrate W on the Z objective table 52 and θ X, θ Y direction.In addition, by driving XY objective table 53, the position (position of in fact parallel direction) of the XY direction of control substrate W with the image planes of projection optical system PL.Promptly, Z objective table 52, focal position and the inclination angle of control substrate W are used automatic focusing mode and automatic leveling mode then, the surface of substrate W and the image planes of projection optical system PL are matched, and XY objective table 53 carries out the location of X-direction and the Y direction of substrate W.Moreover, Z objective table and XY objective table can certainly be provided with integratedly.

On substrate objective table WST (Z objective table 52), be provided with moving lens 55.In addition, on the position relative, be provided with laser interferometer 56 with moving lens 55.The position of the two-dimensional directional of the substrate W on the substrate objective table WST and the anglec of rotation are carried out real-time instrumentation by laser interferometer 56, and the instrumentation result is exported to control device CONT.Control device CONT drives the mode of substrate objective table drive unit WSTD by the instrumentation result according to laser interferometer 56, is supported on the location of the substrate W on the substrate objective table WST.

In addition, on substrate objective table WST (Z objective table 52), be provided with accessory plate 57 in the mode of surrounding substrate W.Accessory plate 57 has and the plane that remains on the surperficial roughly the same height of the substrate W on the substrate support.At this, though the gap about 0.1～1.0mm is arranged between the edge of substrate W and accessory plate 57, but because the surface tension of liquid LQ, liquid LQ can not flow into this gap substantially, even if under near the situation the periphery of exposure substrate W, by accessory plate 57, also liquid LQ can be remained on projection optical system PL lens element G12 below.

Exposure device EX possesses to substrate W and goes up the fluid Supplying apparatus 1 of feed fluid LQ and the liquid withdrawal system 2 of the liquid LQ on the recovery substrate W.Fluid Supplying apparatus 1, be to be used for going up feed fluid LQ to substrate W, thereby and fill up with liquid LQ between the lens element G12 of terminal part of projection optical system PL and the substrate W and form the parts that liquid soaks regional AR2, possess the temperature adjustment device of container, force (forcing) pump of accommodating liquid LQ and the temperature of adjusting the liquid LQ that supplies with etc.On fluid Supplying apparatus 1, be connected with an end of supply pipe 3, on the other end of supply pipe 3, be connected with supply nozzle 4.Fluid Supplying apparatus 1 is gone up feed fluid LQ via supply pipe 3 and supply nozzle 4 to substrate W.

Liquid withdrawal system 2, the container etc. that possesses suction pump, accommodates the liquid LQ of recovery.

On liquid withdrawal system 2, be connected with an end of recovery tube 6, on the other end of recovery tube 6, be connected with and reclaim nozzle 5.Liquid withdrawal system 2 is via reclaiming the liquid LQ that nozzle 5 and recovery tube 6 reclaim on the substrate W.When formation liquid soaks regional AR2, control device CONT drives fluid Supplying apparatus 1, supply with the liquid LQ of ormal weight in each unit interval via supply pipe 3 and supply nozzle 4, drive liquid withdrawal system 2 simultaneously, via reclaiming nozzle 5 and recovery tube 6 reclaim ormal weight in each unit interval liquid LQ.Thus, the liquid that forms liquid LQ between the lens element G12 of the terminal part of projection optical system PL and substrate W soaks regional AR2.

Fig. 2, it is the front view of bottom, fluid Supplying apparatus 1 and liquid withdrawal system 2 etc. of showing the projection optical system PL of exposure device EX, Fig. 3 is to show AR1 of view field and the supply nozzle 4 of projection optical system PL and the figure that reclaims the position relation of nozzle 5.The AR1 of view field of projection optical system PL is elongated rectangular-shaped (slit-shaped) along Y direction, clamping the mode of the AR1 of this view field along X-direction, at+3 supply nozzle 4A～4C of X side configuration, reclaims nozzle 5A, 5B in-2 of X side configurations.And supply nozzle 4A～4C is connected on the fluid Supplying apparatus 1 via supply pipe 3, reclaims nozzle 5A, 5B and is connected on the liquid withdrawal system 2 via recovery tube 4.In addition, with supply nozzle 4A～4C with reclaim nozzle 5A, 5B and roughly on the position of Rotate 180 °, dispose supply nozzle 8A～8C and reclaim nozzle 9A, 9B around the optical axis of projection optical system PL.Supply nozzle 4A～4C and recovery nozzle 9A, 9B replace assortment along Y direction, supply nozzle 8A～8C and recovery nozzle 5A, 5B replace assortment along Y direction, supply nozzle 8A～8C is connected on the fluid Supplying apparatus 1 via supply pipe 10, reclaims nozzle 9A, 9B and is connected on the liquid withdrawal system 2 via recovery tube 11.

When scan exposure, the figure of the part of reticle mask R is looked like to be projected on the AR1 of view field, and with respect to projection optical system PL, reticle mask R moves with speed V along-directions X (or+directions X), synchronous with it, substrate W moves with speed β V (β is the projection multiplying power) along+directions X (or-directions X) via XY objective table 53.Then, behind the end exposure to 1 shooting area, utilize the stepping of substrate W, next shooting area moves to the scanning starting position, below, carry out exposure-processed in turn with stepping/scan mode for each shooting area.In this example, with the moving direction of substrate W abreast, the mode that flows through liquid LQ along the direction identical with the moving direction of substrate W sets.Promptly, when making substrate W carry out scan exposure along moving with the scanning direction (directions X) of arrow Xa (with reference to Fig. 3) expression, with supply pipe 3, supply nozzle 4A～4C, recovery tube 6 and recovery nozzle 5A, 5B, carry out supply and the recovery of liquid LQ by fluid Supplying apparatus 1 and liquid withdrawal system 2.Promptly, when substrate W along-when directions X moves, via supply pipe 3 and supply nozzle 4 (4A～4C) from fluid Supplying apparatus 1 feed fluid LQ between projection optical system PL and substrate W, simultaneously via reclaiming nozzle 5 (5A, 5B) and recovery tube 6 to liquid withdrawal system 2 withdrawal liquid LQ, liquid LQ flows along-directions X in the mode of filling up between lens element G12 and the substrate W.On the other hand, when substrate W is moved and when carrying out scan exposure along the scanning direction of representing with arrow Xb (+directions X), with supply pipe 10, supply nozzle 8A～8C, recovery tube 11 and recovery nozzle 9A, 9B, carry out supply and the recovery of liquid LQ by fluid Supplying apparatus 1 and liquid withdrawal system 2.Promptly, when substrate W along+when directions X moves, via supply pipe 10 and supply nozzle 8 (8A～8C) from fluid Supplying apparatus 1 feed fluid LQ between projection optical system PL and substrate W, simultaneously via reclaiming nozzle 9 (9A, 9B) and recovery tube 11 to liquid withdrawal system 2 withdrawal liquid LQ, liquid LQ flows along+directions X in the mode of filling up between lens element G12 and the substrate W.At this moment, the liquid LQ that supplies with via supply nozzle 4 from fluid Supplying apparatus 1 flowing in the mode that is drawn between lens element G12 and the substrate W for example along with substrate W to-moving of directions X, therefore even if the energize of fluid Supplying apparatus 1 is less, also feed fluid LQ between lens element LS12 and substrate W at an easy rate.And, by switch the direction that flows through liquid LQ according to the scanning direction, no matter along+directions X or-situation of which scanning direction substrate W in the directions X under, can fill up between lens element G12 and the substrate W with liquid LQ, and can obtain the higher exploring degree and the depth of focus of broad.

Fig. 4 is a summary pie graph of showing projection optical system PL.Reticle mask R is configured in the object plane side of the projection optical system PL of the both sides heart far away that is made of a plurality of lens elements (optical element) G1～G12.Lens element G1～G12, on being configured in assigned position in the lens barrel PLB along optical axis AX, but in this example, lens element G3, G4, G6, respectively by piezoelectricity telescopic element, voice coil motor driver AC1, AC2, AC3 such as (VCM), being supported on can be in the lens kit of the ring-type of the direction fine motion of the direction of the direction of 2DOF (X translation, Y translation), 3DOF (Z translation, θ X tilt, θ Y tilts) or 5DOF (X translation, Y translation, Z translation, θ X tilt, θ Y tilts) with respect to lens barrel PLB.

These 3 can fine motion lens element G3, G4, G6, be the parts that are used to revise the various aberrations of projection optical system PL, the picture element in the time of can adjusting substrate W that circuitous pattern imaging with reticle mask R is projected in the image planes side that is configured in projection optical system PL a little and go up (magnification error, distort aberration, coma aberration, ash content, curvature of the image etc.), image planes position.Moreover the mechanism that the lens element among the mobile projector optical system PL and looking like is adjusted for example opens in the flat 11-195602 communique the spy and is disclosed.In Fig. 4, come from putting arbitrarily in the light of P1 on the reticle mask R, intersect the back at the center of the pupil plane PP of projection optical system PL with optical axis AX and arrive the chief ray LO of corresponding some P2 on the substrate W, between reticle mask R and the lens element G1 and parallel between lens element G11 and the substrate W with optical axis AX, the distance of point P1 from optical axis AX, with the ratio of a P2, be the projection multiplying power β of this projection optical system PL integral body from the distance of optical axis AX.

Be positioned at lens element (below, suitably be called " the front element ") G12 of the picture side front end of projection optical system PL, the lens maintaining part MLM that is separated in vibration by the lens barrel PLB with respect to the lens element G1～G11 that supports other supports.Lens maintaining part MLM, as above-mentioned, possesses the lens kit LS12 that keeps front element G12, with the bindiny mechanism 100 that lens kit LS12 mildly is connected with respect to lens barrel PLB, by bindiny mechanism 100, lens barrel PLB and lens kit LS12 separate in vibration, and in the mode that the vibration of lens kit LS12 does not pass to lens barrel PLB it are absorbed.

When the immersion exposure of this example, in the mode of gap 1～2mm of filling up the following of lens element G12 and substrate W from liquid supply nozzle 4 feed fluid LQ, simultaneously by liquids recovery nozzle 5 withdrawal liquid LQ, therefore the liquid liquid LQ that soaks regional AR2 becomes normal pressure to a certain degree, and the rigidity of liquid LQ might rise.In addition, in this example, exposure device EX is a scanning exposure apparatus, at this moment, substrate W along X-direction at full throttle the speed of 500mm/ about second move, in this scan exposure, also the mode that maintains in the depth of focus of projection optical system PL with the surface (plane of exposure) with substrate W is carried out automatic focusing action and the leveling action (AF/AL action) automatically of substrate W.The AF/AL action of substrate W, usually keep the substrate objective table WST (substrate support) of substrate W mobile a little by making along optical axis direction (Z-direction), or the mode that tilts is carried out, therefore when the front element G12 with projection optical system PL firmly fixes with respect to lens barrel PLB integral body, for the AF/AL action of the clearance distance (gap) that carries out keeping consistently the following of lens element G12 and substrate W surface, the vibration component that produces in substrate W side just is delivered to lens barrel PLB on the whole via the liquid LQ that liquid soaks regional AR2.In addition, as support substrates W and when the substrate objective table WST that X-axis and Y direction move for example has been to use the noncontact guide mode of air bearing, though there is not the vibration of sliding, but because the change a little in the air bearing gap that causes easily during the acceleration and deceleration of objective table, just vibrate, and also might pass to lens barrel PLB via liquid LQ.Because projection optical system PL integral body, bear from the important place via near the flange part FLG the centre that is located at lens barrel PLB and to be supported on the column CL, therefore the vibration that passes to lens barrel PLB also passes to lens barrel PLB interior each lens element and column CL, since the influence of this vibration, the quality deterioration of projection image.In addition, look like to rock because this vibration also might produce, thus can not substrate W need form figure on the position.

In the past, because the focal length of projection optical system PL is separated by ground, space, therefore there is not this vibration component that produces in substrate W side to be directly delivered to the situation of projection optical system PL side fully, but when immersion exposure, preferably the thickness (thickness of optical axis direction) with the casual regional AR2 of liquid is set at 1～2mm, if possible, preferably be set at smaller or equal to 1mm, liquid at this thickness soaks regional AR2, the front element G12 of projection optical system PL and substrate W are counted as the parts that mechanically directly link together with the rigid body with certain coefficient of elasticity or spring constant, and therefore the vibration component that produces in substrate W side just is directly delivered to projection optical system PL side (optics group MPL side).So in this example, as shown in Figure 4, at least the front element G12 that joins with liquid LQ that supports by the lens kit LS12 different that liquid soaks regional AR2 with lens barrel PLB, and lens barrel PLB and lens kit LS12 are linked together by bindiny mechanism 100, lens element G12 (lens kit LS12) sets in the mode that has Z translation fine motion, θ X inclination fine motion, these 3 degrees of freedom of θ Y inclination fine motion ideally with the degree of freedom of micron order simultaneously.Promptly, lens kit LS12 by keeping front element G12 to the major general mildly connects along Z-direction via bindiny mechanism 100 at least with respect to the lens barrel PLB of optics group MPL, and with respect to lens barrel PLB connecting along the mode that Z-direction, θ directions X, θ Y direction move, the vibration that produces in substrate W side is by its soft absorption, will act on the vibration blocking on the lens barrel PLB thus or reduces.

Fig. 5 is the front element G12 of projection optical system PL and near the amplification profile the lens maintaining part MLM.Outside the lowest end of lens barrel PLB also is in the lens barrel LB3, be fixed with adjustably lens kit LS8, LS9, LS10, LS11 that (kinematic) supports the ring-type of flange F 8 on each end face that is formed on lens element G8, G9, G10, G11, F9, F10, F11.And the bottom portion of lens kit LS11 is provided with downwards highlightedly than outer lens barrel LB3, and the lens maintaining part MLM of support of lens element G12 is installed in the bottom portion that is fixed on the lens kit LS11 on this lens barrel PLB (outer lens barrel LB3).Lens maintaining part MLM, possesses the lens kit LS12 that supports the flange F 12 on the end face portion that is formed on lens element G12 adjustably, with 3 bool 100A, the 100B, the 100C that are configured for mildly being connected the bindiny mechanism of lens kit LS12 with respect to the lens kit LS11 of outer lens barrel LB3 side.Moreover, in Fig. 5,, only illustrate 2 bool 100A, 100B for the ease of understanding, but actual be with 120 degree arranged spaced with optical axis AX on 3 positions on the circumference that is the center.Each bool 100A, 100B, 100C are the characteristics that has along optical axis AX direction (Z-direction) elastic telescopic, have simultaneously with respect to lens kit LS11, lens kit LS12 also transversely (is the radiation direction of the circle at center with optical axis AX) count the elastomeric element of the characteristic of the elasticity displacement about μ m.

As the front element G12 of projection optical system PL, preferably radius of curvature of G12a is less convex surface (sphere or aspheric surface) above it, and G12b is tabular surface (radius of curvature is roughly infinitely great) below it.In addition, in this example, the bottom portion 110 of lens kit LS12 is and the tabular surface of the roughly consistent ring-type highly of the following G12b of lens element G12 that thus, the mobile of liquid LQ that liquid soaks regional AR2 becomes smooth.

In addition, though being formed with the mode of the gap RV slightly about 1mm between the circumference with the bottom portion 110 of the circumference of G12b below lens element G12 and lens kit LS12 designs, but the liquid LQ that soaks regional AR2 with liquid rises and mode on the spittle of liquid LQ or the lens element G11 that steam can be not attached thereto etc. from this gap RV, is provided with the gas supply pipe 112 of the ring-type that is communicated with gap RV and the elastic sealing element 115 of ring-type in lens kit LS12.Gas supply pipe 112 is to be connected on the force (forcing) pump via pipeline etc., and the situation in order to prevent that the liquid LQ or the spittle from entering from gap RV, and supplies with the parts of the nitrogen etc. of normal pressure to gap RV.Liquid soaks the original liquid stream of the liquid LQ of regional AR2, form by liquid supply nozzle 4 and liquids recovery nozzle 5, therefore the supply of the positive pressure gas that will be undertaken by gas supply pipe 112, be set at the pressure of the degree that can obviously not hinder this liquid stream, like this, liquid, the spittle and the steam that immerses from gap RV covered by the elastic sealing element on it 115.The side that this elastic sealing element 115 is pressed on lens element G12 is on full week, also have concurrently separate and the lens element G11 on it between the tight function in space, thus, can fill up lens barrel space that lens element G1～G11 is positioned at and to the space of the top G12a of front element G12 with nitrogen.Elastic sealing element 115 also can constitute identical with the 1st seal member 330 of the 2nd embodiment described later.

Moreover, in Fig. 5, be fixed on the cylindric lug 102A that makes progress and the downward cylindric lug 102B that is fixed on the peripheral part of lens kit LS11 of the peripheral part of lens kit LS12, the parts that to be the spittle that is used to prevent liquid LQ from the outside enter in the open space portion that bool 100A, 100B, 100C had are even if lug tilts also to keep the mode of predetermined gap to dispose with lens maintaining part MLM each other.

; when will simultaneously using 3 bool 100A as shown in Figure 5; 100B; 100C support of lens box LS12; one side absorb or reduce from substrate W side via liquid soak regional AR2 transmit come vibration the time; response frequency during the fine motion of lens maintaining part MLM must be quite high; if therefore make only with 3 bool 100A; 100B; the structure of the weight of 100C support of lens box LS12 integral body; therefore just can not get required response frequency, preferably have and be used to reduce the load of lens kit LS12 bool 100A; 100B; mechanism (load reduces mechanism) is eliminated in the deadweight of the effect of 100C.

Fig. 6 is the figure of the structure of the display band deadweight bool 100A that eliminates mechanism.Moreover bool 100B, 100C also have the formation identical with bool 100A.In Fig. 6, the Z axle of coordinate system MSZ is parallel with optical axis AX, and the S axle is perpendicular to the axle of the radiation direction of optical axis AX, and the M axle is the axle of the tangential direction vertical with this two side of Z axle with respect to the S axle.In addition, Fig. 7 is the figure that sees the bool 100A of Fig. 6 from the M direction of principal axis.Bool 100A, be metal materials such as SUS or duralumin are curved the parts of H shape and to be shaped, have on the mid portion that connects upper plate portion 120A and base plate 120B, a plurality of switch-in part 124A, 124B, 124C and circular through hole 124E, the 124F along the perforation of M direction of principal axis, the bend of 124G have been formed.And upper plate portion 120A is fixed on the bottom surface sections of the lens kit LS11 among Fig. 5 via 4 Screw holes 121, and it is facial that base plate 120B is fixed on going up of lens kit LS12 via 4 Screw holes 122.

This structure though combine at mechanical aspects upper plate portion 120A and base plate 120B, can extremely be dwindled Z-direction and the axial rigidity of S, can extremely improve the axial rigidity of M simultaneously.Its result, upper plate portion 120A and base plate 120B just can also can relatively carry out infinitesimal deflection for the S direction of principal axis simultaneously relatively along the Z-direction elastic telescopic.By 3 this bool structures being set at interval with 120 degree, lens kit LS12 is suspended on the lens kit LS11 (lens barrel PLB) under the higher state of the rigidity of XY direction on the whole, the freedom of motion that becomes lens kit LS12 is restricted to the parallel of Z-direction and moves, and the formation that supported adjustably with respect to lens barrel PLB of lens kit LS12.

And, mechanism is eliminated in deadweight, constitute by the following permanent magnet 126A that is fixed on upper plate portion 120A with via the top permanent magnet 126B that portion of Height Adjustment mechanism 127 is fixed on base plate 120B, pair of permanent magnets 126A, 126B are relative with predetermined gap.And by permanent magnet 126A, 126B magnetic attraction each other, the most substantially load that is fixed on the lens kit LS12 on the base plate 120B is raised.So, this upper plate portion 120A is connected on the lens kit LS11 (lens barrel PLB), base plate 120B is connected on the lens kit LS12, have bool 100A～100C of the permanent magnet 126A, the 126B that constitute deadweight elimination mechanism, the load support that just makes lens kit LS12 is on lens kit LS11.

Moreover, in Fig. 6,, also be provided with same permanent magnet 126A, 126B and adjusting mechanism portion 127 in an opposite side certainly though only showed pair of permanent magnets 126A, 126B in a side of bend.Adjusting mechanism portion 127 is the clearance gap that are used to adjust pair of permanent magnets 126A, 126B, thereby the load that makes lens kit LS12 does not act on the parts on the bend of mid portion of bool 100A (100B, 100C are too) as far as possible, for example is made of the simple Z translation mechanism that has used conical cam etc.This adjusting mechanism portion 127, for tackle permanent magnet 126 by the aging demagnetize that causes, when the periodic maintenance of exposure device, under the situation of the clearance gap of dwindling pair of permanent magnets 126A, 126B, also be utilized.

Eliminate mechanism by such deadweight, each bool 100A, 100B, 100C can be remained on mechanically distortion, approaching neutral state, can reduce simultaneously the rigidity of each bool monomer, therefore lens maintaining part MLM just uses extremely low rigid suspension at lens barrel PLB bottom, front element G12 should absorb or reduce the transfer of vibration that comes from substrate W side, and can copy liquid to soak the action of regional AR2 and fine motion.

Moreover, in Fig. 6, utilize the elimination of conducting oneself with dignity of the magnetic attraction of pair of permanent magnets, but, can use the combination of permanent magnet and iron plate or the combination of electromagnet and iron plate (or magnet) so long as the material that produces power in non-contacting mode gets final product.As bool, having processed and made the parts of H type as shown in Figure 6 at this in addition, also can be the parts that many pieces of thin plate spring groups lumped together in the mode that can access the same degree of freedom and rigidity.

; because by bool 100A～100C; the front element G12 of projection optical system PL just freely moves; therefore the situation that exists the matter (multiplying power, distort aberration, coma aberration, ash grade) of the projection image that accompanies with it to change, therefore driver AC1, the AC2, the AC3 that drive lens element G3, G4, G6 respectively in the control chart 4 comes shoddyization of retrieved image in real time.

Fig. 8 is the block diagram of summary of control system that is applicable to the device of Fig. 1～shown in Figure 7.In Fig. 8, reticle mask R remains on the reticle mask support RH in the mode that is approximately perpendicular to optical axis AX by vacuum suction or mechanical grip mechanism, and reticle mask support RH is located at when the scan exposure on the reticle mask tool thing platform RST of the scanning direction high-speed mobile of regulation via 3 Z driver 150A, 150B, 150C (but 150C figure does not show ).Z driver 150A, 150B, 150C are made of piezoelectric element and voice coil motor (VCM), response comes from drive signal Va, Vb, the Vc of the accurate control unit of reticle mask (as adjusting mechanism) 204, thereby when making reticle mask support RH integral body translation is moved minutely along Z-direction, make it to θ directions X and θ Y direction small skew.In scan exposure for all places error correction and distortion correction, control the fine motion of this reticle mask support RH in real time, therefore reticle mask support RH uses the high technology ceramics material of the structure that comprises the graphitic carbon material in order to seek lightweight and high rigidization on a part.

In addition, driving shown in Fig. 43 lens element G3, G4, driver AC1, the AC2 of G6, AC3, can respond the drive signal K1, the K2 that come from lens control unit (as adjusting mechanism) 202, K3 respectively and control independently of each other, but be provided with the holocoder of instrumentation driving amount or capacitance type sensor etc. in each driver AC1, AC2, AC3, the signal that comes from these measuring instruments is input to lens control unit 202 as feedback signal.

Then, near each bool 100A, 100B in lens maintaining part MLM, the 100C (but 100C figure does not show), be provided with gap sensor (the 1st detector) 130A, 130B, the 130C (but 130C figure does not show) of the top height change of the lens kit LS12 that is used for this position of instrumentation.Gap sensor 130A, 130B, 130C are installed on the lens kit LS11 of lens barrel PLB, can instrumentation with respect to the variable in distance of the lens kit LS12 of lens kit LS11.The instrumentation signal S0a, S0b, the S0c (but S0c figure does not show) that come from each transducer 130A, 130B, 130C are read in the sensor unit 200, and the lens kit LS11 that detects in real time with the lens barrel PLB side that is fixed on projection optical system PL is the posture change (tilt variation of Z change in location, θ directions X and θ Y direction) of the lens kit LS12 of benchmark, i.e. the position of lens barrel PLB and lens kit LS12 relation.At this, because lens barrel PLB keeps optics group MPL, lens kit LS12 keeps lens element G12, so sensor unit 200, can be according to the testing result of gap sensor 130A～130C, the position relation of detection optical group MPL and lens element G12 (the following G12b of lens element G12).Promptly, detect the position relation of lens barrel PLB and lens kit LS12, with the position relation of detection optical group MPL and lens element G12 is identical actually, sensor unit 200, by detect the position relation of lens barrel PLB and lens kit LS12 with gap sensor 130A, 130B, 130C, just can obtain the position relation of optics group MPL and lens element G12.Moreover, also can carry out the detection of the position relation of lens barrel PLB and lens kit LS12 optically.

And then, near the lens element G12 below lens kit LS12, be equipped with more than or equal to 3 instrumentation variable in distance to the surface (plane of exposure) of substrate W, be the liquid gap sensor (the 2nd detector) 132A, the 132B that soak the varied in thickness of regional AR2,132C ..., their instrumentation signal S2a, S2b ... also be read in the sensor unit 200, and detect the depth of parallelism (direction of opposing inclined and amount) and the variation at interval on the surface of the following G12b of lens element G12 and substrate W in real time.At this, because gap sensor 132A, 132B, 132C ... be installed on the lens kit LS12 that keeps lens element G12, so sensor unit 200, can according to gap sensor 132A, 132B, 132C ... testing result, detect the position relation on the surface of lens element G12 and substrate W.Promptly, detect the position relation on the surface of lens kit LS12 and substrate W, with the position relation on the surface of detecting lens element G12 and substrate W is identical actually, sensor unit 200, by with gap sensor 132A, 132B, 132C ... detect the position relation on the surface of lens kit LS12 and substrate W, the position that just can obtain the surface of lens element G12 and substrate W concerns.Moreover the position that also can detect the surface of lens kit LS12 and substrate W optically concerns.

With the instrumentation information CS of these sensor unit 200 instrumentations, by lens control unit 202 before flowing in real time and the accurate control unit 204 of reticle mask.Lens control unit 202, for according to this instrumentation information CS, correction is according to the variation of the position of front element G12 and posture and the error of the various aberration compositions that derive from, promptly, in order to compensate with respect to the change of the lens kit LS12 of lens barrel PLB or with respect to the change of the lens kit LS12 on the surface of substrate W, add the biasing composition to the drive signal K1, the K2 that give each driver AC1, AC2, AC3, K3 in real time, and adjust the picture that is projected in the figure on the substrate W.At this, because change with respect to the position relation of the lens kit LS12 of lens barrel PLB, with the change with respect to the position relation of the lens element G12 of optics group MPL is identical actually, so lens control unit 202, can be according to the instrumentation information CS of sensor unit 200, compensation is with respect to the change of the lens element G12 of optics group MPL.Similarly, because change with respect to the position relation of the lens kit LS12 on the surface of substrate W, with the change with respect to the position relation of the lens element G12 on the surface of substrate W is identical actually, so lens control unit 202, can be according to the instrumentation information CS of sensor unit 200, compensation is with respect to the change of the lens element G12 on the surface of substrate W.

Similarly, the accurate control unit 204 of reticle mask, in order to revise and the error of the various aberration compositions that derive from according to the variation of the position of lens element G12 and posture, can be according to instrumentation information CS, in real time to the additional composition of setovering of each Z driver 150A, drive signal Va, the Vb of 150B, 150C, the Vc of the Z position of giving control reticle mask support RH (reticle mask R) and inclination.

Moreover, at this, though carry out the posture correction of the posture correction of reticle mask R and before lens element G3, G4, G6 simultaneously, but also not necessarily must all carry out simultaneously, can be according to the kind of the motion of front element G12, promptly be the variation of simple Z position, variation or this compound variation of 2 of inclination, suitably carry out selectively.

Fig. 9 is other the fragmentary cross-sectional view of example of showing lens maintaining part MLM, and at this, it is the protruding dome shape of the center of curvature that the top G12a of front element G12 forms with the some Cp on the optical axis AX, below G12b form tabular surface.In addition, be formed with the flange part F12b that links to each other with following G12b in the bottom of front element G12, with be formed on the surface of substrate W and enlarged areas that the liquid between the following G12b soaks regional AR2 to than with reference to before the example of Fig. 5 explanation wide, and improve the homogenizing of the liquid stream of liquid LQ.

The flange F 12 of the upside of lens element G12 is supported on the lens kit LS12a of ring-type adjustably rigidly.In addition, in the periphery of lens kit LS12a, being formed with a Cp with annular shape is the protruding spheric seating Asa at center, and then, in the outside of lens kit LS12a, be provided with the 2nd lens kit LS12b that is formed with the ring-type of the concave spherical surface seat of the roughly the same radius of curvature of protruding spheric seating Asa.Between the concave spherical surface seat of the protruding spheric seating Asa of lens kit LS12a respect to one another and the 2nd lens kit LS12b, be formed with the air bearing of vacuum preload type or magnetic preload type.

In the periphery of the 2nd lens kit LS12b, on a plurality of positions on the circumference, be fixed with along the permanent magnet Mg1 that separates the configuration of predetermined distance ground up and down, the group of Mg3.And, be fixed on the permanent magnet Mg2 of the inboard of outer lens barrel LB3 by magnet Mg1, Mg3 with in the mode in the space of the group that is configured in this magnet Mg1, Mg3, constitute deadweight and eliminate mechanism.And, below the 2nd lens kit LS12b the end and outside between the lens barrel LB3, along with optical axis AX be the bool 100A, the 100B that are provided with the flat spring shape on a plurality of positions of circumference at center ....This flat spring sigmoid spare 100A, 100B ..., become big mode and make with the become rigidity of minimum, horizontal (XY direction) of the rigidity of Z-direction, and make the 2nd lens kit LS12b and lens kit LS12a integratedly along the Z-direction fine motion.

According to above formation and since lens kit LS12a with respect to the 2nd lens kit LS12b only by the constraint of the preload type air bearing of spheric seating, can be center and small skew freely therefore with a Cp.That is, even if front element G12 from neutral inclined position, the interval of the following concave spherical surface of the protruding sphere of G12a and lens element G11 above it (with reference to protruding 5 etc.) is also all being that constant mode is kept on the same path position on the sphere.But, have only as lens kit LS12a and the 2nd lens kit LS12b during integratedly along fine motion up and down, above the interval of following concave spherical surface of the protruding sphere of G12a and lens element G11 integrally change.Therefore, the various aberrations that derive from by the motion of front element G12, may be limited to specific kind, and have can be by reference Fig. 8 explanation lens control unit 202 and the accurate control unit 204 of reticle mask dwindle amount to the posture additional corrections of lens element G3, G4, G6 and reticle mask support RH, or make its minimizing will revise the advantage of the important document of posture.

Moreover, in above-mentioned each example, by will in projection optical system PL, not causing that with self-fulfillment ground the mode of the deterioration of projection picture element compensates, the position that perhaps makes reticle mask R is along the direction Z translation fine motion of optical axis AX or mode that tilts a little and usefulness, adjust the picture that is projected in the figure on the substrate W, have excimer laser or F but when projection exposure, use ₂Under the situation of the light supply apparatus of laser equiwavelength mechanical tuning device, the centre wavelength of the illumination light by making reticle mask R is offset a little, just can compensate the deterioration of the projection picture element on the substrate W, at this moment, the Real Time Drive that does not just need lens element G3, G4, G6 fully perhaps only only needs the Real Time Drive of the lens element of limit to some extent auxiliaryly.

Moreover in above-mentioned example, lens kit LS12 only keeps 1 lens element G12, but also can be the formation that keeps a plurality of optical elements (optics group).

In addition, in above-mentioned example, projection optical system PL is divided into optics G12, and these two crowds of optics group MPL between reticle mask R and the optics G12, but also can be separated into more than or equal to three groups.At this moment, also can detection optical parts G12 and with respect to the non-conterminous group's of this optics G12 position relation, or carry out the compensation of shift in position.

In this example, front end at projection optical system PL is equipped with lens element G12, but optical element as the front end that is installed in projection optical system PL, also can be the optical characteristics that is used for projection optical system PL, the optical sheet of the adjustment of aberration (spherical aberration, coma aberration etc.) for example.It perhaps also can be the planopaallel plate that can see through exposure light.

In above-mentioned each example, the shape of said nozzle does not limit especially, for example can be supply or the recovery of carrying out liquid LQ for the long limit of the AR1 of view field with 2 pairs of nozzles.Moreover, at this moment, for no matter from+directions X or-which direction of directions X can carry out supply and the recovery of liquid LQ, best supply nozzle and reclaim nozzle along configuration side by side up and down.

The 2nd embodiment

With further reference to description of drawings exposure device of the present invention.Figure 10 is a summary pie graph of showing an example of exposure device of the present invention.

In Figure 10, exposure device EX, possesses the mask objective table MST that supports mask M, the substrate objective table PST of support substrates W, be supported on the lamp optical system IL of the mask M on the mask objective table MST with exposure light EL illumination, will be with the figure of the mask M of exposure light EL illumination as the projection optical system PL of projection exposure on the substrate W that is supported on the substrate objective table PST and the control device CONT of the action of unified control exposure device EX integral body.

The exposure device EX of this example, be to improve the exploring degree in order in fact to shorten exposure wavelength, in fact enlarge simultaneously depth of focus, and be suitable for the liquid immersion exposure apparatus of immersion method, possess to substrate W and go up the liquid feed mechanism 310 of feed fluid LQ and the liquids recovery mechanism 320 that reclaims the liquid LQ on the substrate W.Exposure device EX, at least the figure with mask M look like to be transferred on the substrate W during in, by the liquid LQ that supplies with from liquid feed mechanism 310, on the part AR301 of view field that comprises projection optical system PL, on the substrate W, form partly that the big and liquid littler than substrate W soaks regional AR302 than view field AR1.Specifically, exposure device EX, employing is at the optical element 302F of the image planes lateral terminal portion of projection optical system PL, and be configured in the local liquid that fills up liquid LQ between the substrate W surface of this image planes side and soak mode, and by will being radiated at mode on the substrate W via the exposure light EL that has passed through mask M behind liquid LQ between this projection optical system PL and the substrate W and the projection optical system PL, with graphic projection's exposure of mask M on substrate W.

In this example, with as exposure device EX, use one side that mask M and substrate W is synchronized with each other mobile, for example different towards each other directions (in the other direction) moves, and the situation that one side will be formed on the scanning exposure apparatus (so-called scanning stepping exposure device) of graph exposure on substrate W on the mask M is that example illustrates.In the following description, to be made as Z-direction with the corresponding to direction of optical axis AX of projection optical system PL, synchronous moving direction (scanning direction) with mask M and substrate W in perpendicular to the plane of Z-direction is made as X-direction, will be made as Y direction perpendicular to the direction (non-scanning direction) of Z-direction and X-direction.In addition, the axial rotation of X-axis, Y-axis and Z (inclination) direction is made as θ X, θ Y and θ Z direction respectively.

Lamp optical system IL, be the parts that are supported on the mask M on the mask objective table MST with exposure light EL illumination, has exposure light source, the light integrator of the illumination homogenizing of the light beam that will penetrate from exposure light source, collector lens, the relay lens system that will come from the exposure light EL optically focused of light integrator will be set at the variable field of view diaphragm of slit-shaped etc. by the field of illumination on the mask M of exposure light EL generation.The field of illumination of the regulation on the mask M is by the exposure light EL illumination of lamp optical system IL with uniform Illumination Distribution.As the exposure light EL that penetrates from lamp optical system IL, for example adopt from bright line (g line, h line, i line) and KrF excimer laser light extreme ultraviolet light (DUV light), ArF excimer laser light (wavelength 193nm) and the F such as (wavelength 248nm) in the ultraviolet territory that mercury vapor lamp penetrates ₂Laser optical (wavelength 157nm) equal vacuum ultraviolet light (VUV light) etc.In this example, adopt ArF excimer laser light.

In this example, on liquid LQ, adopt pure water.Pure water not only can see through ArF excimer laser light, for example can also see through bright line (g line, h line, i line) and KrF excimer laser light extreme ultraviolet lights (DUV light) such as (wavelength 248nm) from the ultraviolet territory that mercury vapor lamp penetrates.

Mask objective table MST can keep and mobile mask M, for example uses vacuum suction (or Electrostatic Absorption) permanent mask M.Mask objective table MST, by comprising the mask objective table drive unit MSTD of linear motor etc., can be in plane perpendicular to the optical axis AX of projection optical system PL, promptly in the XY plane, carry out two dimension and move and can rotate a little along θ Z direction.And mask objective table MST can move along the sweep speed of X-direction with appointment, and the shift motion of the X-direction of the amount of the optical axis AX that the whole face with mask M at least can crosscut projection optical system PL.

On mask objective table MST, be provided with moving lens 331.In addition, on the position relative, be provided with laser interferometer 332 with moving lens 331.The anglec of rotation of the position of the two-dimensional directional of the mask M on the mask objective table MST and θ Z direction (anglec of rotation that according to circumstances also comprises θ X, θ Y direction) by the real-time instrumentation of laser interferometer 332, and is exported to control device CONT with the instrumentation result.Control device CONT by the mode that the instrumentation result according to laser interferometer 332 drives mask objective table drive unit MSTD, controls the position that is supported on the mask M on the mask objective table MST.

Projection optical system PL, be with graphic projection exposure the parts on substrate W of the projection multiplying power β that stipulates with mask M, (302A～302F) constitute, these optical elements 302A～302F is kept by lens barrel PK by a plurality of optical elements 302 that comprise optical element (optics, the lens) 302F on the leading section that is located at substrate W side.In this example, projection optical system PL is that projection multiplying power β for example is 1/4 or 1/5 reduction system.Moreover projection optical system PL also can be any one of times system such as grade and amplification system.

The optical element 302F of the leading section of the projection optical system PL of this example exposes from lens barrel PK, and the liquid LQ that soaks regional AR302 with liquid contacts.At least optical element 302F is formed by fluorite (calcirm-fluoride) in a plurality of optical element 302A～302F.Because MgF has perhaps been adhered on the fluorite surface ₂, Al ₂O ₃, SiO ₂Deng the surface and the compatibility of water higher, liquid LQ is close on roughly whole of liquid contact surface 2S of optical element 302F.Promptly, in this example, because higher liquid (water) LQ of compatibility of the liquid contact surface 302S of supply and optical element 302F, therefore the close property of the liquid contact surface 302S of optical element 302F and liquid LQ is higher, and the enough liquid LQ of energy fill up the light path between optical element 302F and the substrate W reliably.Moreover optical element 302F also can be the quartz higher with the compatibility of water.In addition, also can on the liquid contact surface 302S of optical element 302F, implement hydrophiling (lyophilyization) and handle, thus the compatibility of further raising and liquid LQ.

The inner space of the lens barrel PK of projection optical system PL is sealed slightly, is kept the gaseous environment of regulation by gas displacement device 303.Gas displacement device 303, by via pipe arrangement 303A in the gas of lens barrel PK internal feed regulation, reclaim the mode of lens barrel PK gas inside via pipe arrangement 303B, with the gaseous environment of lens barrel PK inner sustain in regulation.In this example, inert gases such as helium, argon, nitrogen are filled up in lens barrel PK inside.When exposing the only vacuum ultraviolet (VUV) light time, if in the optical path space in the space of passing through as exposure light EL, the material that exists this light such as oxygen molecule, hydrone, carbon dioxide molecule, organic substance to have stronger absorption characteristic to this wavelength region may, it is extinction material, the light EL that then exposes is absorbed by extinction material, can not arrive on the substrate W with enough luminous intensities.; by sealing the lens barrel PK inside of the optical path space that passes through as exposure light EL slightly; thereby blocking comes from the inflow of outside extinction material, fills up this lens barrel PK inside with inert gas simultaneously, just can make exposure light EL arrive substrate W with enough luminous intensities.

Moreover gas displacement device 303 except inert gas, can also be supplied with dry air.

In addition, lens barrel PK is cut apart the formation that lens barrel (supplemental cartridge) is combined with a plurality of.In addition, in a plurality of optical element 302A～302F that constitute projection optical system PL, the optical element 302F that contacts with liquid LQ also can be by keeping with lens barrel (lens barrel main body) holding member (lens kit) that PK is different of the optical element 302A～302E that keeps other.At this moment, lens barrel main body PK and lens kit also can link together with the connect mechanism of stipulating by bool 100A～100C as the 1st embodiment explanation.

Substrate objective table PST can keep and mobile substrate W, comprises XY objective table 351 and carries the Z inclination objective table 352 on XY objective table 351 and constitute.XY objective table 351, the non-contact bearing that does not show via figure is gas bearing (air bearing) is supported on objective table base SB by noncontact top top.Under the state that XY objective table 351 (substrate objective table PST) is supported by noncontact on respect to objective table base SB, by comprising the substrate objective table drive unit PSTD of linear motor etc., can be in plane perpendicular to the optical axis AX of projection optical system PL, promptly in the XY plane, carry out two dimension and move and can carry out small rotation along θ Z direction.On this XY objective table 351, be equipped with Z inclination objective table 352, for example utilize vacuum suction etc. that substrate W is remained on the Z inclination objective table 352 via the substrate support that do not show of figure.Z inclination objective table 352 is being provided with along the mode that Z-direction, θ directions X and θ Y direction move.Substrate objective table drive unit PSTD is controlled by control device CONT.

On substrate objective table PST (Z inclination objective table 352), be provided with moving lens 333.In addition, on the position relative, be provided with laser interferometer 334 with moving lens 333.The position of the two-dimensional directional of the substrate W on the substrate objective table PST and the anglec of rotation are passed through the real-time instrumentation of laser interferometer 334, and the instrumentation result is exported to control device CONT.Control device CONT is supported on the location of the substrate W on the substrate objective table PST by drive the mode of the substrate objective table drive unit PSTD that comprises linear motor etc. according to the instrumentation result of laser interferometer 334.

In addition, exposure device EX possesses the focusing and leveling detection system that the figure of the position of detecting the surface be supported on the substrate W on the substrate objective table PST does not show.Moreover, as the formation of focusing and leveling detection system 80, for example can adopt the spy to open the disclosed formation of flat 8-37149 communique.The testing result of focusing and leveling detection system is exported to control device CONT.Control device CONT can detect positional information and the θ X of substrate W and the inclination information of θ Y direction of the Z-direction on substrate W surface according to the testing result of focusing and leveling detection system.Z inclination objective table 352, focal position and the inclination angle of control substrate W, with automatic focusing mode and automatic leveling mode the surface of substrate W and the image planes of projection optical system PL are matched then, XY objective table 352 carries out the location of X-direction and the Y direction of substrate W.Moreover Z can certainly be tilted objective table and XY objective table are provided with integratedly.

In addition, on substrate objective table PST (Z inclination objective table 352), the mode that remains on the substrate W on the substrate objective table PST with encirclement is provided with plate member 356.Plate member 356 is endless members, is configured in the outside of substrate W.Plate member 356 has and the surface that remains on the substrate W on the substrate objective table PST tabular surface (par) 357 of sustained height (same plane) roughly.Tabular surface 357, be configured in the outside that remains on the substrate W on the substrate objective table PST around.

Plate member 356 is for example formed by the material that polytetrafluoroethylene (Teflon (login trade mark)) etc. has a lyophobicity.Therefore, tabular surface 357 has lyophobicity.Moreover, for example can also use the formation plate member 356 such as metal of regulation, and pass through at least the tabular surface 357 of this metal plate member 356 to be implemented the lyophobies processing, make tabular surface 357 have lyophobicity.Lyophoby as plate member 356 (tabular surface 357) is handled, and for example, applies lyophobicity materials such as fluorine-type resin material, propylene resin material, silicon resinous materials such as polytetrafluoroethylene, perhaps attaches the film of being made by described lyophobicity material.In addition, being used for the surface-treated film, both can be monofilm, also can be the film that is made of multilayer.Make it have the lyophobicity material of lyophobicity as being used to, can adopt the material that has non-solubility for liquid LQ.In addition,, both can the surperficial universe of plate member 356 be applied, and also can only need the zone of the part of lyophobicity to apply for example tabular surface 357 grades as the coating zone of lyophobicity material.

Owing to around substrate W, be provided with the plate member 356 that has with the roughly conplane tabular surface 357 in substrate W surface, therefore even if with the fringe region E immersion exposure of substrate W the time, because the outside at the edge part of substrate W does not have end difference substantially, therefore liquid LQ can be remained under the projection optical system PL, and form liquid well in the image planes side of projection optical system PL and soak regional AR302.In addition, by making tabular surface 357 have lyophobicity, can suppress the substrate W outside (tabular surface 357 outsides) of liquid LQ in immersion exposure and flow out, even if in addition behind immersion exposure, also withdrawal liquid LQ successfully, thus can prevent that liquid LQ from remaining on the tabular surface 357.

Liquid feed mechanism 310, be the parts that are used for supplying with the liquid LQ of regulation to the image planes side of projection optical system PL, possess the liquid supply unit 311 that to send liquid LQ and the one end is connected supply pipe 312 (312A, 312B) on the liquid supply unit 311.Liquid supply unit 311 possesses the container of accommodating liquid LQ and force (forcing) pump etc.When formation liquid soaked regional AR302 on substrate W, liquid feed mechanism 310 was gone up feed fluid LQ to substrate W.

Liquids recovery mechanism 320 is the parts of liquid LQ that are used to reclaim the image planes side of projection optical system PL, possesses liquids recovery portion 321 that can withdrawal liquid LQ and the one end is connected recovery tube 322 (322A, 322B) in the liquids recovery portion 321.Liquids recovery portion 321 possesses vacuum pump equal vacuum system (suction device) for example, with the gas-liquid separator of the liquid LQ that reclaims and gas separations and the container etc. of accommodating the liquid LQ of recovery.Moreover, as vacuum system, can on exposure device EX, vacuum pump be set yet, and use the vacuum system of the factory of configuration exposure device.Soak regional AR302 in order to form liquid on substrate W, liquids recovery mechanism 320 quantitative recovery are by the liquid LQ on the substrate W of liquid feed mechanism 310 supplies.

In a plurality of optical element 302A～302F that constitute projection optical system PL, near the optical element 302F that contacts with liquid LQ, dispose stream and form parts 370.Stream forms parts 370, is in the top of substrate W (substrate objective table PST), the endless member that is provided with in the mode of the side 302T that surrounds optical element 302F.

Stream forms parts 370, can be formed by for example aluminium, titanium, stainless steel, duralumin and the alloy that contains them.Perhaps, stream forms parts 370, also can wait transparent component (optics) formation with photopermeability by glass (quartz).

Stream forms parts 370, is located at the top of substrate W (substrate objective table PST), possesses the liquid supply port 313 (313A, 313B) that disposes in the mode relative with this substrate W surface.In this example, stream forms parts 370 and has 2 liquid supply port 313A, 313B. Liquid supply port 313A, 313B are located at stream and form on the following 370S of parts 370.

In addition, stream forms parts 370, and portion has and the corresponding supply stream 314 of liquid supply port 313 (313A, 313B) (314A, 314B) within it.An end of supplying with stream 314A, 314B is connected on the supply unit 311 via supply pipe 312A, 312B, and the other end is connected on liquid supply port 313A, the 313B.

At supply pipe 312A, 312B midway, be respectively equipped with control 311 that send from the liquid supply unit, with respect to the flow controller 316A liquid quantity delivered, that be called as mass flow controller, the 316B of each unit interval of each liquid supply port 313A, 313B.The control of the liquid quantity delivered of being undertaken by flow controller 316 (316A, 316B) is carried out under the command signal of control device CONT.

And then stream forms parts 370, is located at the top of substrate W (substrate objective table PST), and possesses the liquids recovery mouth 323 that disposes in the mode relative with this substrate W surface.In this example, stream forms parts 370 and has 2 liquids recovery mouth 323A, 323B. Liquids recovery mouth 323A, 323B are located at stream and form on the following 370S of parts 370.

In addition, stream forms parts 370, and portion has and the corresponding recovery stream 324 of liquids recovery mouth 323 (323A, 323B) (324A, 324B) within it.One end of reclaiming stream 324A, 324B is connected in the liquids recovery portion 321 via recovery tube 322A, 322B, and the other end is connected on liquids recovery mouth 323A, the 323B.

In this example, stream forms parts 370, constitutes a liquid feed mechanism 310 and liquids recovery mechanism 320 part separately.And, constitute liquid supply port 313A, the 313B of liquid feed mechanism 310, be located on the position separately of X-direction both sides of the AR301 of view field that clamps projection optical system PL, constitute liquids recovery mouth 323A, the 323B of liquids recovery mechanism 320, be located at the liquid supply port 313A of liquid feed mechanism 310, the outside of 313B with respect to the AR301 of view field of projection optical system PL.

The action of liquid supply unit 311 and flow controller 316 is controlled by control device CONT.When feed fluid LQ on substrate W, control device CONT, send liquid LQ by liquid supply unit 311, and via supply pipe 312A, 312B and supply stream 314A, 314B, by liquid supply port 313A, the 313B feed fluid LQ on substrate W of the top that is located at substrate W.At this moment, liquid supply port 313A, 313B are configured in the both sides of the AR301 of view field that clamps projection optical system PL respectively, via this liquid supply port 313A, 313B, and can be from the both sides feed fluid LQ of the AR301 of view field.In addition, from liquid supply port 313A, 313B amount, can control individually respectively by the flow controller 316A, the 316B that are located at respectively on supply pipe 312A, the 312B to each unit interval of the liquid LQ of substrate W supply.

The liquids recovery action of liquids recovery portion 321 is controlled by control device CONT.Control device CONT can control the liquids recovery amount of each unit interval of being undertaken by liquids recovery portion 321.Liquid LQ on the substrate W that reclaims from liquids recovery mouth 323A, the 323B of the top that is located at substrate W, recovery stream 324A, the 324B and recovery tube 322A, the 322B that form parts 370 via stream are recycled in the liquids recovery portion 321.

Moreover, in this example, though supply pipe 312A, 312B are connected on 1 liquid supply unit 311, but also can be provided with and the quantity of supply pipe corresponding a plurality of (being 2 here) liquid supply unit 311, and supply pipe 312A, 312B are connected on described a plurality of liquid supply unit 311.In addition, though recovery tube 322A, 322B are connected in 1 liquids recovery portion 321, but also can be provided with and the quantity of recovery tube corresponding a plurality of (being 2 here) liquids recovery portion 321, and recovery tube 322A, 322B are connected in the described a plurality of liquids recovery portion 321.

Following (liquid contact surface) 370S that the liquid contact surface 302S of the optical element 302F of projection optical system PL and stream form parts 370 has lyophily (hydrophily).In this example, the liquid contact surface of optical element 302F and stream formation parts 370 is implemented lyophily handle, to handle by this lyophily, the liquid contact surface that optical element 302F and stream form parts 370 becomes lyophily.In other words, in the surface of the parts relative with the face that is exposed (surface) of substrate W on remaining on substrate objective table PST, liquid contact surface becomes lyophily at least.Because the liquid LQ in this example is the bigger water of polarity, therefore handle (hydrophilic treated) as lyophily, for example form film, pay this optical element 302F and stream and form the liquid contact surface of parts 370 with hydrophily by material with the bigger molecular structure of ethanol isopolarity.That is, when making water, the processing of the material with the bigger molecular structure of OH base isopolarity is set on described liquid contact surface preferably as liquid LQ.Perhaps, also can on described liquid contact surface, MgF be set ₂, Al ₂O ₃, SiO ₂Deng the lyophily material.

Moreover, following (towards the face of substrate W side) 370S of stream formation parts 370 also can be a tabular surface roughly, can also be below stream forms parts 370 among the 370S with respect on the zone of projection optical system PL than the more close outside of liquids recovery mouth 323 (323A, 323B), setting is with respect to the face of XY plane inclination, specifically with respect to the AR301 of view field (liquid soaks regional AR302) with the closer to the outside with respect to the surface of substrate W more away from the mode inclined plane that tilt, that have specific length (collection surface) of (making progress).So, even if along with the moving of substrate W, the liquid LQ between projection optical system PL and the substrate W to stream form parts 370 below the outside of 370S flow out, the face that also is collected is caught, and therefore can prevent the outflow of liquid LQ.At this; make it have lyophily by on collection surface, implementing the lyophily processing; because the lip-deep film (photosensitive material sheet such as photoresist or antireflection film or from the liquid film etc. of protection photosensitive material down) that is coated in substrate W is lyophobicity (hydrophobicity) normally, the liquid LQ that therefore flows out to the outside of liquids recovery mouth 323 just is collected face and catches.

In addition, though figure do not show, on substrate objective table PST (Z inclination objective table 352), on the assigned position in the outside of the plate member 356 around the substrate W, dispose reference component.On reference component, for example be provided with by having the spy with the position relation of regulation and open the reference mark that the disclosed substrate alignment system that constitutes of flat 4-65603 communique detects and for example to open the reference mark that the disclosed mask alignment that constitutes of flat 7-176468 communique detects by having the spy.The top of reference component roughly is tabular surface, and is located at and the surface (tabular surface) 357 of substrate W surface, plate member 56 sustained height (same plane) roughly.The substrate alignment system be located at substrate objective table PST near, also detect the registration mark on the substrate W.In addition, the mask alignment system be located at mask objective table MST near, detect reference mark on the substrate objective table PST (Z inclination objective table 352) via mask M and projection optical system PL.

In addition, on Z inclination objective table 352 (substrate objective table PST), on the assigned position in the outside of plate member 356, for example disposing as optical pickocff, the spy opens the disclosed illumination unevenness sensor of clear 57-117238 communique.The illumination unevenness sensor possesses the plane and sees rectangular upper plate.The top of upper plate roughly is tabular surface, and is located at and the surface (tabular surface) 357 of substrate W surface, plate member 356 sustained height (same plane) roughly.On upper plate, being provided with can be by the pin-and-hole portion of light.In the above, except pin-and-hole portion covers with light-proofness materials such as external application chromium.

In addition, on Z inclination objective table 352 (substrate objective table PST), on the assigned position in the outside of plate member 356, for example being provided with as optical pickocff, the spy opens the disclosed aerial image measurement sensor of 2002-14005 communique.The aerial image measurement sensor possesses the plane and sees rectangular upper plate.The top tabular surface that roughly is of upper plate, the datum level that also can be used as the focusing and leveling detection system uses.And, be located at above the upper plate and the surface (tabular surface) 357 of substrate W surface, plate member 356 sustained height (same plane) roughly.On upper plate, being provided with can be by the pin-and-hole portion of light.Above among, except pin-and-hole portion covers with light-proofness materials such as external application chromium.

In addition, on Z inclination objective table 352 (substrate objective table PST), for example be provided with also that the spy drives the disclosed exposure transducer of flat 11-16816 communique (illuminance transducer), be located at above the upper plate of this exposure transducer and the surface (tabular surface) 357 of substrate W surface and plate member 356 sustained height (same plane) roughly.

The exposure device EX of this example, be that one side moves mask M and substrate W along X-direction (scanning direction), one side with the figure of mask M as the device of projection exposure on substrate W, when scan exposure, soaking the liquid LQ of regional AR2 and projection optical system PL via liquid looks like the figure of the part of mask M to be projected on the AR1 of view field, mask M moves with speed V along-directions X (or+directions X), synchronous with it, substrate W moves with speed β V (β is the projection multiplying power) along+directions X (or-directions X) with respect to the AR1 of view field.And, on substrate W, set a plurality of shooting areas, behind end exposure to 1 shooting area, utilize the stepping of substrate W to move, next shooting area moves to the scanning starting position, below, one side moves substrate W with stepping/scan mode, and one side carries out the scan exposure of each shooting area is handled in turn.

Figure 11 is a plane graph of showing the position relation of liquid supply port 313 and liquids recovery mouth 323 and the AR301 of view field.As shown in figure 11, the AR1 of view field of projection optical system PL, being set at the Y direction is long side direction, is that rectangle is seen on the plane of short side direction with the X-direction.

Liquid supply port 313A, 313B for X-direction (scanning direction), are located at the both sides of the AR301 of view field that clamps projection optical system PL respectively.Specifically, liquid supply port 313A among the 370S, is located at scanning direction one side's side (X side) with respect to the AR301 of view field below stream forms parts 370, and liquid supply port 313B is located at the opposing party's side (+X side).Be liquid supply port 313A, 313B be located at the AR301 of view field near, be located at its both sides about scanning direction (X-direction) in the mode of clamping the AR1 of view field. Liquid supply port 313A, 313B form respectively along the plane that Y direction is extended and see the roughly slit-shaped of コ word shape (circular-arc).And, the length of the Y direction of liquid supply port 313A, 313B, the length than the Y direction of view field AR301 is long at least. Liquid supply port 313A, 313B are provided with in the mode of surrounding the AR301 of view field at least.Liquid feed mechanism 310 can be via liquid supply port 313A, 313B simultaneously at the both sides of the AR1 of view field feed fluid LQ.

Liquids recovery mouth 323A, 323B, be located at the more close outside of the AR301 of view field with respect to projection optical system PL than liquid supply port 313A, the 313B of liquid feed mechanism 310, for X-direction (scanning direction), be located at the both sides of the AR301 of view field that clamps projection optical system PL respectively.Specifically, liquids recovery mouth 323A among the 370S, is located at scanning direction one side's side (X side) with respect to the AR301 of view field below stream forms parts 370, and liquids recovery mouth 323B is located at the opposing party's side (+X side). Liquids recovery mouth 323A, 323B form respectively along the plane that Y direction is extended and see the roughly slit-shaped of コ word shape (circular-arc). Liquids recovery mouth 323A, 323B are provided with the AR301 of view field of encirclement projection optical system PL and the mode of liquid supply port 313A, 313B.

And the liquid that fills up liquid LQ soaks regional AR302, is formed on partly in fact in the zone that surrounds with 2 liquids recovery mouth 323A, 323B in the mode that comprises the AR301 of view field, and also is on the part on the substrate W.Moreover liquid soaks regional AR302 as long as cover the AR301 of view field at least, and not necessarily the regional integration that surrounds with 2 liquids recovery mouth 323A, 323B all is that liquid soaks the zone.

Moreover, though be that liquid supply port 313 respectively is provided with 1 formation in the both sides of the AR301 of view field, also can be divided into a plurality ofly, its quantity is arbitrarily.Similarly, liquids recovery mouth 323 also can be divided into a plurality of.In addition, forming roughly the same each other size (length) separately though be located at the liquid supply port 313 of the both sides of the AR301 of view field, also can be the size that differs from one another.Similarly, the liquids recovery mouth 323 that is located at the both sides of the AR301 of view field respectively also can be the size that differs from one another.In addition, the slit width of supply port 313 both can be identical with the slit width that reclaims mouth 323, also can make the slit width of the slit width of recovery mouth 323, also can make the slit width of the slit width of recovery mouth 323 on the contrary less than supply port 313 greater than supply port 313.

Figure 12 is near the amplification profile the stream formation parts 370.As shown in figure 12, between the medial surface 370T that side 302T and the stream of the optical element 302F of projection optical system PL forms parts 370, be provided with clearance G 301.Clearance G 301 is provided with for the optical element 302F with projection optical system PL separates quiveringly with stream formation parts 370.Clearance G 301 for example is set at about 3～10mm.In addition, comprise that stream forms liquid feed mechanism 310 and the liquids recovery mechanism 320 and the projection optical system PL of parts 370, is supported by different supporting mechanisms respectively, and is separated quiveringly.Thus, prevent the vibration of generation in liquid feed mechanism 310 that comprises stream formation parts 370 and liquids recovery mechanism 320, be delivered to projection optical system PL side.

In addition, be formed with flange part 302G,, be formed with the supporting surface PF relative with flange part 302G in the bottom of lens barrel PK on the top of optical element 302F.And, on the supporting surface PF of lens barrel PK, be provided with the support portion 360 of supporting optical component 302F adjustably.Below the flange part 302G of the optical element 302F that supports by support portion 360, and between the supporting surface PF of lens barrel PK, be provided with clearance G 302.

And, exposure device EX, possess and stop liquid LQ to immerse among a plurality of optical element 302A～302F that constitute projection optical system PL, soak the side 302T of the optical element 302F that the liquid LQ of regional AR302 contacts and the 1st seal member 330 between the stream formation parts 370 with liquid on being formed on substrate W.

And then exposure device EX possesses the 2nd seal member 340 of the circulation of the gas between the lens barrel PK that stops optical element 302F and keep this optical element 302F.The 1st seal member 330 is installed in the stream that forms ring-type in the mode that can change and forms on the medial surface 370T of parts 370.The 2nd seal member 340 is installed on the lens barrel PK in the mode that can change.

Figure 13 is near the amplification profile displaying the 1st seal member 330.As shown in figure 13, the 1st seal member 330, the side 302T and the stream that are located at optical element 302F form between the medial surface 370T of parts 370, side 302T and stream with respect to optical element 302F form between the medial surface 370T of parts 370, and the liquid LQ that stops the liquid that is formed on the substrate W to soak regional AR302 immerses.The 1st seal member 330 forms ring-type in the mode of surrounding optical element 302F.

The 1st seal member 330 has pliability.In addition, the 1st seal member 330 has lyophobicity.In this example, the 1st seal member 330 is made of Viton.Viton is when having pliability and lyophobicity, and exhaust is less, and is deliquescent with respect to liquid LQ right and wrong, and the influence that causes to exposure-processed is less, therefore more satisfactory.Moreover, as the 1st seal member 330, also can on the surface of the endless member that forms with material, apply the lyophobicity material with flexual regulation.

Form the 1st seal member 330 of ring-type in the mode of surrounding optical element 302F, possess the main part 331 that is installed on the medial surface 370T that stream forms parts 370, and be connected on the main part 331 via hinge 332 and the contact site 333 that contacts with the side 302T of optical element 302F.Contact site 333 is roughly circular (coniform) parts.

Form at stream near the bottom of medial surface 370T of parts 370, be formed with the recess 371 of the main part 331 that can keep the 1st seal member 330.Recess 371 forms the plane in the mode that forms the medial surface 370T of parts 370 along stream and sees roughly circular.By main part 331, this main part 331 is installed near the bottom of medial surface 370T that stream forms parts 370 with respect to recess 371 chimeric the 1st seal members 330.And, being installed under the state of medial surface 370T (recess 371) that stream forms parts 370 at main part 331 the 1st seal member 330, contact site 333 contacts are near the bottom of the side of optical element 302F 302T.Contact site 333 is thinner than main part 331 walls, is contacting under the state on the 302T of the side of optical element 302F just deflection significantly.

Hinge 332 is the parts that connect main part 331 and contact site 333, in Figure 13, and can be to the direction strain shown in the arrow y301.And under the main part 331 with the 1st seal member 330 was installed in state on the medial surface 370T that stream forms parts 370, contact site 333 was gone up generation power in the direction (reference arrow y302) of the side 302T of pushing optical element 302F.Thus, the side 302T of contact site 333 and optical element 302F is close to.Thus, the liquid LQ that can stop liquid to soak regional AR302 immerses the side 302T of optical element 302F and the clearance G 301 between the stream formation parts 370.

In addition, because contact site 333 has pliability, produce vibration on the parts 370 even if therefore form at stream, by contact site 333 deflections, perhaps hinge 332 strains also can absorb.Thereby, can prevent to form the optical element 302F of the transfer of vibration of generation on the parts 370 to projection optical system PL at stream.In addition, by contact site 333 deflections, perhaps hinge 332 strains can reduce the power that the 1st seal member 330 (contact site 333) gives optical element 302F.Thereby, can prevent optical element 302F and distort or undesirable condition such as offset occurs.

At this, though the power to arrow y302 direction of contact site 333 (loading force) by the strain generation of hinge 332, also can be soaked the pressure generation of the liquid LQ of regional AR302 by liquid.That is, when liquid soaks the pressure normal pressure of liquid LQ of regional AR302, than the pressure of the space G301a of the 1st seal member 330 more close downsides, become in the clearance G 301 than the pressure height of the space G301b of upside.And, as shown in figure 13, be connected on the main part 331 via hinge 332, and under the side 302T state of contact of its bottom and optical element 302F, contact site 333 is close on the side 302T of optical element 302F in upper end with contact site 333.

Moreover, the form of the 1st seal member 330 shown in Figure 13 is examples, also can be to utilize the pressure differential of space G301a and space G301b to be close to mode on the side 302T of optical element 302 with contact site 333, posture when contact site 333 (the 1st seal member 330) is set perhaps needs only the position of setting the most rightly with respect to the contact site 333 of main part 331.

Moreover, at this, though the main part 331 of the 1st seal member 330 is installed on the stream formation parts 370, and contact site 333 contacts with optical element 302F, but also the main part 331 of the 1st seal member 330 can be installed on the side 302T of optical element 302F, and contact site 333 contacts are formed on the medial surface 370T of parts 370 at stream.

In addition, form the side 302T of optical element 302F of clearance G 301 and stream and form in the parts 370 side 302T opposed inside face 370T with optical element 302F, have lyophobicity respectively.Specifically, medial surface 370T and side 302T have lyophobicity by implementing the lyophoby processing respectively.Handle as lyophoby, apply lyophobicity materials such as fluorine-type resin material, propylene resin material, silicon resinous materials, perhaps attach the film of making by described lyophobicity material.In addition, being used for the surface-treated film, both can be monofilm, also can be the film that is made of multilayer.On the other hand, as above-mentioned, following (liquid contact surface) 370S that the liquid contact surface 302S of the optical element 302F of projection optical system PL and stream form parts 370 has lyophily (hydrophily).

Because forming the medial surface 370T of parts 370, the side 302T of the 1st seal member 330, optical element 302F and stream have lyophobicity respectively, even if therefore making liquid LQ immerse under the situation of clearance G 301 because of capillarity, the liquid LQ of this immersion also is ostracised and can not be trapped in the clearance G 301.Thereby, because liquid LQ can not stagnate in the clearance G 301, therefore can prevent to make the liquid LQ of cleannes decline sneak into the generation that liquid between optical element 302F and the substrate W soaks this undesirable condition among the liquid LQ of regional AR302 because of silting up.

Figure 14 is near the amplification profile displaying the 2nd seal member 340.On the supporting surface PF of the bottom that is formed on lens barrel PK, be provided with the support portion 360 of supporting optical component 302F adjustably via flange part 302G, optical element 302F is supported on the supporting surface PF of lens barrel PK adjustably via support portion 360.Support portion 360 is located at respectively on 3 place's assigned positions on the supporting surface PF.Moreover in Figure 14, support portion 360C is not shown among 3 support portion 360A～360C.

Support portion 360 for example is located on the supporting surface PF of lens barrel PK, possesses the V channel parts 361 with V shape inner face and has the pellet part 362 of the sphere that the V shape inner face with V channel parts 361 joins.At this, be formed with the dome shape recess 363 that can dispose described pellet part 362 on below the flange part 302G of optical element 302F, the inner face of the dome shape recess 363 of the flange part 302G of optical element 302F and the sphere of pellet part 362 join.And, because these faces can slide each other, therefore for example when lens barrel PK is out of shape a little, slide over each other by these faces, can suppress the influence of the distortion of lens barrel PK to optical element 302F.

(between the supporting surface PF of 360A～360C) flange part 302G of 3 point-supported optical element 302F, and lens barrel PK, be provided with clearance G 302 by support portion 360.And the 2nd seal member 340 of the circulation of the gas between prevention optical element 302F and the lens barrel PK (supporting surface PF) is located near the support portion 360.The 2nd seal member 340 forms ring-type in the mode of surrounding optical element 302F.

Moreover support portion 360 is not limited to possess the formation of V channel parts 361 and pellet part 362.For example, as the formation of support component 360, also can be to possess 3 seats of the bottom that is located at lens barrel PK and be located at formation with these 3 corresponding locational 3 optical element push part of seat.In the formation of this support component, the side's of the flange part 2G of optical element 302F face is positioned on 3 seats, and 3 supporting optical component 302F.Then, on the opposing party's of the flange part 302G by above-mentioned push part being located at optical element 302F the face, thereby clamp flange part 302G simultaneously, just optical element 302F can be remained on the bottom of lens barrel PK with 3 seats.

The 2nd seal member 340 is located between the supporting surface PF of the flange part 302G of optical element 302F and lens barrel PK, stops the inner space of lens barrel PK and the circulation of the gas between the outside.Thus, lens barrel PK inside becomes closed state slightly, as above-mentioned, just can fill up lens barrel PK inside by using gases displacement apparatus 3 usefulness inert gases.

The 2nd seal member 340 is formations roughly the same with the 1st seal member 330, is for example formed by Viton, has pliability and lyophobicity.In addition, as described above, because the Viton exhaust is less, and the influence that causes to exposure-processed is less, therefore more satisfactory.

And, form the 2nd seal member 340 of ring-type in the mode of surrounding optical element 302F, possess the main part 341 on the supporting surface PF that is installed in lens barrel PK, be connected via hinge 342 on the main part 341 and with the contact site that contacts below 343 of the flange part 302G of optical element 302F.

On the bottom of lens barrel PK, be formed with the peristome PM that can dispose optical element 302F, near the supporting surface PF of the lens barrel PK split shed PM of portion, be formed with the recess 372 of the main part 341 that can keep the 2nd seal member 340.Recess 372 forms ring-type in the mode along peristome PM.By main part 341, this main part 341 is installed on the supporting surface PF of lens barrel PK with respect to recess 372 chimeric the 2nd seal members 340.In this example, the 2nd seal member 340 is configured on supporting surface PF than support portion 360 more close optical element 302F sides.

And, being installed at main part 341 under the state on the supporting surface PF (recess 372) of lens barrel PK the 2nd seal member 340, contact site 343 contacted with the following of flange part 302G of optical element 302F.Contact site 343 is thinner than main part 341 walls, is contacting deflection significantly under state with the flange part 302G of optical element 302F.

Hinge 342 is the parts that connect main part 341 and contact site 343, can strain.And, be installed under the state on the supporting surface PF of lens barrel PK contact site 343, generation power on the direction of the flange part 302G of pushing optical element 302F at main part 341 with the 2nd seal member 340.Thus, the flange part 302G of contact site 343 and optical element 302F below be close to.Thus, can stop the circulation of the gas between the supporting surface PF of the flange part 302G of optical element 302F and lens barrel PK.

In addition, because contact site 343 has pliability, even if therefore produce vibration on optical element 302F, by contact site 343 deflections, perhaps hinge 342 strains also can absorb.Thereby the transfer of vibration that can prevent to produce on optical element 302F is to lens barrel PK.In addition, by contact site 343 deflections, perhaps hinge 342 strains can reduce the power that the 2nd seal member 340 (contact site 343) gives optical element 302F.Thereby, can prevent optical element 302F and distort, or undesirable condition such as offset occur.

In addition, though producing to the power (loading force) of the direction of the pushing flange part 302G strain by hinge 342 of contact site 343 also can be produced by lens barrel PK inner space and outside pressure differential.Thereby, posture when preferably utilizing mode on the inner space of lens barrel PK and the flange part 302G that outside pressure differential is close to optical element 302F that contact site 343 (the 2nd seal member 340) is set with contact site 343 is perhaps set the position with respect to the contact site 343 of main part 341.

Moreover, at this, though the main part 341 of the 2nd seal member 340 is installed on the lens barrel PK, and contact site 343 contacts with optical element 302F, but also the main part 341 of the 2nd seal member 340 can be installed on the flange part 302G of optical element 302F, and contact site 343 is contacted with the supporting surface PF of lens barrel PK.

In addition, also can make the optical element 302F that forms clearance G 2 flange part 302G below, have lyophobicity respectively with supporting surface PF relative among the lens barrel PK with the flange part 302G of optical element 302F.

Secondly, the method for figure picture exposure on substrate W with mask M with the exposure device EX with above-mentioned formation is described.

When mask M being loaded on the mask objective table MST, after being loaded in substrate W on the substrate objective table PST, when the scan exposure that carries out substrate W was handled, control device CONT drove liquid feed mechanism 310, and beginning is supplied with action for the liquid on the substrate W.In order to form that liquid soaks regional AR302 and from the liquid LQ that the liquid supply unit 311 of liquid feed mechanism 310 is supplied with, flow through supply pipe 312A, 312B after, supply on the substrate W by liquid supply port 313A, 313B via supplying with stream 314A, 314B.

By the liquid LQ that supplies on the substrate W, between projection optical system PL and substrate W, form liquid and soak regional AR302.At this, flow through the Width diffusion of the liquid LQ of supply pipe 312A, 312B along the supply stream 314A, the 314B that form slit-shaped and liquid supply port 313A, 313B, supply to the scope that substrate W goes up broad.Supply to liquid LQ on the substrate W from liquid supply port 313A, 313B, be supplied in the mode of between the lower surface of the leading section (optical element 302) of projection optical system PL and substrate W, soaking diffusion, and on a part that comprises on the substrate W of the AR301 of view field, form partly less than substrate W and greater than the liquid of the AR301 of view field and soak regional AR302.At this moment, control device CONT by being configured in liquid supply port 313A, the 313B of X-direction (scanning direction) both sides in the liquid feed mechanism 310, carries out the supply of the liquid LQ on substrate W respectively simultaneously from the both sides of the AR301 of view field.

In addition, control device CONT synchronously drives the liquids recovery portion 321 of liquids recovery mechanism 320 with the driving of liquid feed mechanism 310, carries out the recovery of the liquid LQ on the substrate W.Then, control device CONT, the driving of controlling liquid feed mechanism 310 and liquids recovery mechanism 320 forms liquid and soaks regional AR2.

Control device CONT, the recovery of liquid LQ on the substrate W that one side synchronously carries out being undertaken by liquids recovery mechanism 320 with the supply of being undertaken by liquid feed mechanism 310 to the liquid LQ on the substrate W, one side moves the substrate objective table PST of support substrates W along X-direction (scanning direction), and simultaneously with the figure picture of mask M via the liquid LQ between projection optical system PL and the substrate W and projection optical system projection exposure on substrate W.At this moment, because liquid feed mechanism 310 simultaneously carries out the supply of liquid LQ from the both sides of the AR301 of view field via liquid supply port 313A, 313B about the scanning direction, therefore evenly and well forming liquid soaks regional AR302.

In this example, when from the both sides, scanning direction of the AR301 of view field during to substrate W feed fluid LQ, control device CONT, with the flow controller 316A of liquid feed mechanism 310, the liquid quantity delivered that 316B adjusts each unit interval, in the scan exposure of 1 shooting area on substrate W, with make the amount of liquid of supplying with from side's side of the AR301 of view field (the liquid quantity delivered of each unit interval) in the scanning direction, different with the amount of liquid of supplying with from the opposing party's side.Specifically, control device CONT will be set at more than the liquid quantity delivered of supplying with in an opposite side about the liquid quantity delivered of scanning direction from each unit interval that the last side of the body of the AR301 of view field is supplied with.

For example, when one side with substrate W when+directions X moves one side and carries out exposure-processed, control device CONT, make with respect to the AR301 of view field and come from-amount of liquid of X side (being liquid supply port 313A), more than coming from+amount of liquid of X side (being liquid supply port 313B), on the other hand, when one side with substrate W along-directions X moves one side when carrying out exposure-processed, make with respect to the AR301 of view field to come from+amount of liquid of X side, more than coming from-amount of liquid of X side.Like this, control device CONT according to the moving direction of substrate W, changes the liquid quantity delivered of each unit interval that comes from liquid supply port 313A, 313B respectively.

And even if in substrate W immersion exposure, the liquid LQ that liquid soaks regional AR302 immerses in the clearance G 301, also stops its immersion by the 1st seal member 330.

When liquid LQ immerses clearance G 301, apply power by the liquid LQ that immerses this clearance G 301 to the side of optical element 302F 302T, optical element 302F distortion undesirable conditions such as (distortions) might appear., owing to be provided with the 1st seal member 330, therefore can prevent that the side 302T of optical element 302F is subjected to the undesirable condition of power from liquid LQ.

In addition, owing to utilize the 1st seal member 330 to stop liquid LQ to immerse in the clearance G 301, therefore can not produce the pressure oscillation that causes with respect to the inflow of clearance G 301 and outflow by liquid LQ.Thereby, can prevent the undesirable condition that optical element 302F vibrates because of this pressure oscillation.

In addition, when liquid LQ had immersed clearance G 301, the liquid LQ of immersion might be trapped in the clearance G 301.If liquid LQ is trapped in the clearance G 301 for a long time, this liquid LQ contamination of heavy uprises, in case the liquid LQ of this contaminated clearance G 301 for example flows between projection optical system PL and the substrate W, might cause the deterioration of exposure accuracy in the immersion exposure of substrate W., make liquid LQ can not immerse clearance G 301, can prevent that liquid LQ is trapped in the undesirable condition in the clearance G 301 by utilizing the 1st seal member 330.

In addition, utilize the 1st seal member 330 to prevent that side 302T and the stream of the spittle intrusion optical element 302F of liquid LQ or liquid LQ from forming between the parts 370, thereby can prevent that stream from forming the side 370T of parts 370 and lens barrel PK gets rusty or the unfavorable conditions such as side 302T dissolving of optical element 302F

In addition, owing to be provided with the 2nd seal member 340, even if the therefore formation of filling up the inner space of lens barrel PK with inert gas also can prevent the immersion of outside gas with respect to its inner space.

Thereby, can keep the environment of the inner space of lens barrel PK.In addition, the liquid LQ that liquid on the substrate W soaks regional AR302 might vaporize, and should immerse lens barrel PK inside via clearance G 301 and clearance G 302 by change wet gas in vaporization back, at this moment, might appear on the internal face of lens barrel PK and get rusty, or make the undesirable condition of the dissolvings such as optical element 302A～302E of lens barrel PK inside., owing to can prevent that by the 1st seal member 330 and the 2nd seal member 340 this wet gas from immersing lens barrel PK inside, therefore can avoid taking place above-mentioned undesirable condition.

Moreover, in above-mentioned example, though be that optical element 302F exposes from lens barrel PK, and the side 302T of optical element 302F and stream form the relative form of medial surface 370T of parts 370, but also can be with the part (leading section) of lens barrel PK or use the side 302T of holding member (lens kit) the maintenance optical element 302 different with lens barrel PK.At this moment, just to form the medial surface 370T of parts 370 relative with stream in the side of the side of described lens barrel PK or lens kit.At this moment, the 1st seal member 330 is to stop liquid LQ to immerse the side of the lens kit (or lens barrel) that keeps optical element 302F and mode that stream forms between the parts 370 is installed.

Moreover, in above-mentioned example, though liquids recovery mouth 323A, the 323B of liquid supply port 313A, the 313B of feed fluid LQ and withdrawal liquid LQ, be formed on the following 370S of 1 stream formation parts 370, but for example, also can as the formation that illustrates among the 1st embodiment, the stream formation parts (recovery part) that the stream with liquid supply port 313A, 313B forms parts (supply part) and has liquids recovery mouth 323A, 323B be set respectively.

Moreover, in above-mentioned example, be illustrated though the liquid that forms liquid LQ on substrate W is soaked the situation of regional AR302, the above-mentioned situation that the liquid of formation liquid LQ soaks regional AR302 above the reference component on being located at substrate objective table PST is like that also arranged.And, also have liquid LQ to carry out the situation that various instrumentations are handled via the casual regional AR302 of the liquid above it.In this case, prevent that by utilizing the 1st seal member 330 liquid LQ from immersing clearance G 301, utilize the 2nd seal member 340 to stop the circulation of the gas of clearance G 302 simultaneously, also can carry out instrumentation well and handle.Similarly, when on the upper plate of illumination unevenness sensor or the upper plate of aerial image measurement sensor above etc. the liquid of formation liquid LQ soak regional AR302, carry out then also can carrying out instrumentation well and handling under the situation that instrumentation handles.And then, also consider and on Z inclination objective table 352 (substrate objective table PST), form the formation that liquid soaks regional AR302, in this case, also can utilize the 1st seal member 330 to prevent that liquid LQ from immersing clearance G 301, utilize the 2nd seal member 340 to stop the circulation of the gas of clearance G 302 simultaneously.

Moreover, in above-mentioned example, also can and be connected the supply stream 314 on them and reclaim on the stream 324 etc. the porous plastid that configuration is made of spongy parts or porous ceramic etc. at liquid supply port 313 and liquids recovery mouth 323.

Moreover, as the 1st seal member (perhaps the 2nd seal member), also can adopt sheet component 335 as shown in Figure 15.Sheet component 335 forms the plane and sees circular (coniform), in the sheet component 335, outer edge 335A is installed on the medial surface 370T of stream formation parts 370, and inner edge portion 335B contacts with the side 302T of optical element 302F.Outer edge 335A for example uses adhesive securement with respect to the medial surface 370T that stream forms parts 370T.

And the inner edge portion 335B of sheet component 335 utilizes the pressure differential of the space G301b of the space G301a of downside of sheet component 335 in the clearance G 301 and upside, is close on the side 302T of optical element 302F.Thus, the side 302T and the stream that can stop liquid LQ to immerse optical element 302F forms between the parts 370.

At this, as sheet component 335, by adopting the gas barrier sheet (gas shield sheet) of the circulation that limits gas, the liquid on being formed on substrate W soaks the liquid LQ of regional AR302, can also further prevent to immerse clearance G 301 from the wet gas of this liquid LQ vaporization.

As the gas barrier sheet, can use self-adhering film, bond layer, metal film, isolated film is stacked in order and material that constitute.Isolated film is that the covering property (gas barrier) for gas is fabulous, the few material of degasification simultaneously, and for example, as this material, the most handy ethene vinyl alcohol resin (EVOH resin) forms.As this EVOH resin, for example can use " EVAL " (trade name) of the Kuraray of Co., Ltd..As other material, can use カ プ ト Application (kapton: trade name) (Du group corporate system), polyester film (Du group corporate system), ミ Network ト ロ Application (Microtron trade name) (East レ (Toray) corporate system), ベ Network ス (Bekusuta: trade name) (Kuraray corporate system), Le ミ ラ-(Lumilar: trade name) (East レ (Toray) corporate system) etc.

Moreover, also the inner edge portion 335B of sheet component 335 can be fixed on the side 302T of optical element 302F, and outer edge 335A is contacted with the medial surface 370T that stream forms parts 370.

, as above-mentioned, best the 1st seal member 330 and the 2nd seal member 340 have lyophobicity respectively.On the other hand, owing to shone exposure light EL, the lyophobicity of the 1st seal member 330 and the 2nd seal member 340 might deterioration.Particularly, when for example adopting fluorine-type resin as the 1st, the 2nd seal member 330,340, when adopting ultraviolet light as exposure light EL, the easy deterioration of lyophobicity of sealing parts 330,340 (lyophilyization easily).Thereby, by irradiation time or accumulative total exposure, change the 1st, the 2nd seal member 330,340 according to exposure light EL, the 1st, the 2nd seal member 330,340 with required lyophobicity can be set.

As above-mentioned, the liquid LQ of the 1st embodiment and the 2nd embodiment is made of pure water.Pure water has at semiconductor fabrication factory etc. and is easy to obtain in a large number, simultaneously not to the advantage of the bad influence of photoresist on the substrate W and optical element (lens) etc.In addition, also not to the bad influence of environment, the amount of impurity is extremely low simultaneously for pure water, the therefore effect on the surface of the optical element on the front end face that can also obtain cleaning the surface of substrate W and being located at projection optical system PL.Moreover, under the lower situation of the purity of the pure water of supplying with by factory, ultra-pure water also can be installed on exposure device make device.

And, it is said that pure water (water) is that the refractive index n of the exposure light EL about 193nm is about 1.44 for wavelength, when the light source as exposure light EL uses ArF excimer laser light (wavelength 193nm), on substrate W, obtain by the short wavelengthization to 1/n, i.e. the high-resolution of about 134nm.And then, because depth of focus has enlarged about n doubly, promptly about 1.44 times than in air, therefore as long as under the situation that the depth of focus that can guarantee when using in air with degree gets final product, can further increase the numerical aperture of projection optical system PL, in this, the exploring degree also improves.

Moreover under the situation of using immersion method as described above, the numerical aperture NA that projection optical system is also arranged is 0.9～1.3 situation.Under the big situation of the numerical aperture NA of such projection optical system change, if,, so preferably adopt polarized illumination because of the situation of imaging performance deterioration appears in the polarised light effect with the random polarization that uses as exposure light all the time.At this moment, preferably carry out the rectilinearly polarized light that vertically matches illumination with the line-spectra of the line of mask (reticle mask) and space diagram, figure from mask (reticle mask), a large amount of S polarized light components (TE polarized light component) that penetrate are promptly along the diffraction light of the composition of direction of polarized light longitudinally of line-spectra.When filling up projection optical system PL with liquid and be coated between the lip-deep resist of substrate W, compare with the situation of filling up projection optical system PL with air (gas) and be coated between the lip-deep resist of substrate W, the uprising of diffraction light that helps the S polarized light component (TE polarized light component) of the raising of contrast in the lip-deep transmitance of resist, therefore even if surpass under 1.0 such situations at the numerical aperture NA of projection optical system, also can obtain higher imaging performance.In addition, if combine phase shifts mask (PhaseShift Mask) and the special disclosed oblique incidence illumination that vertically matches (particularly dipole (dipole) illumination) with line-spectra of flat 6-188169 communique etc. opened more effective.

In addition, for example work as the ArF excimer laser as exposure light, the projection optical system PL of the reduction magnification of employing about 1/4, with fine line and space diagram (for example line about 25～50nm and space) when on substrate W, exposing, structure (for example fine degree of figure and the thickness of chromium) according to mask M, utilize waveguiding effect, mask M works as polarization plates, the diffraction light of the S polarized light component (TE polarized light component) that penetrates from mask M is more than the diffraction light of the P polarized light component (TM polarized light component) that makes the contrast reduction, therefore preferably use above-mentioned rectilinearly polarized light illumination, but with random polarization optical illumination mask M, even if at the numerical aperture NA of projection optical system PL is under 0.9～1.3 so bigger situation, also can access higher exploring performance.In addition, when with the exposure of the atomic thin line on the mask M and space diagram on substrate W the time, because wiregrating effect, it is bigger than S polarized light component (TE polarized light component) that P polarized light component (TM polarized light component) might become, but for example with the ArF excimer laser as the exposure light, the projection optical system PL of the reduction magnification of use about 1/4, will be when the line of 25nm and space diagram exposure be on substrate W, the diffraction light of the S polarized light component (TE polarized light component) that penetrates from mask M is more than the diffraction light of P polarized light component (TM polarized light component), even if be under 0.9～1.3 so bigger situation therefore, also can obtain higher exploring performance at the numerical aperture NA of projection optical system PL.

And then, just with the rectilinearly polarized light that vertically the matches illumination (S polarized illumination) of the line-spectra of mask (reticle mask), as the spy open flat 6-53120 communique disclosed, along being that the polarized illumination method of tangent line (week) direction straight line polarization of the circle at center and the combination of oblique incidence illumination also are effective with the optical axis.Particularly, be not the line-spectra of the figure of mask (reticle mask) along a direction extension of regulation, under the situation that the line-spectra that extends along a plurality of different directions mixes, equally as the spy open flat 6-53120 communique disclosed, by will along with the optical axis be the center circle the polarized illumination method of tangential direction straight line polarization and ring illumination method and use, even if under the bigger situation of the numerical aperture NA of projection optical system, also can obtain higher imaging performance.

In this example, at the front end of projection optical system PL optical element is installed, by these lens, can carry out the optical characteristics of projection optical system PL, for example the adjustment of aberration (spherical aberration, coma aberration etc.).Moreover, as the optical element of the front end that is installed in projection optical system PL, also can be the optical sheet of adjustment that is used for the optical characteristics of projection optical system PL.It perhaps also can be the planopaallel plate that can see through exposure light EL.

Moreover, in this example, even if, for example under the outer casing shell that will be made of planopaallel plate is installed in the lip-deep state of W, fill up constituting of liquid LQ even if also can be though be to fill up formation between projection optical system PL and the W surface with liquid LQ.

Moreover, though the liquid LQ in this example is a water, also can be the liquid beyond the water, for example, when the light source of exposure light EL is F ₂During laser, because this F ₂Laser optical is permeate water not, therefore as liquid LQ, can be to see through F ₂For example the mistake fluorinated polyether (PFPE) or the fluorine class wet goods fluorine class fluid of laser optical.At this moment, with part that liquid LQ contacts on, by the film forming mode of material, carry out the lyophily processing with the less molecular structure of the polarity that for example contains fluorine.In addition, as liquid LQ, in addition, can also adopt the permeability that has exposure light EL, and refractive index is high as far as possible, with respect to projection optical system PL and the stable material (for example cedar oil) of photoresist that is coated on the substrate P substrate W.At this moment also carry out surface treatment according to the polarity of the liquid LQ that uses.

Moreover in the present invention, the formation of being put down in writing with the 2nd embodiment that importantly also the 1st embodiment can be put down in writing is suitably replaced or is made up.

Moreover; substrate W as above-mentioned each example; the semiconductor wafer of semiconductor device manufacturing usefulness just, the glass substrate of can also the suitable displays device using, the ceramic wafers that film magnetic head is used or the egative film (synthetic quartz, silicon wafer) of mask that on exposure device, uses or reticle mask etc.

In addition, in above-mentioned example, though adopted with liquid and filled up exposure device between projection optical system PL and the substrate W partly, but also the present invention can be applicable to as the spy and open the disclosed liquid immersion exposure apparatus that maintenance is moved in liquid bath as the objective table of the substrate of exposure object of flat 6-124873 communique, perhaps specially open the disclosed liquid tank that on objective table, forms prescribed depth of flat 10-303114 communique and substrate is remained on wherein liquid immersion exposure apparatus.

As exposure device EX, except with moved further reticle mask R and substrate W then the scanning exposure apparatus of the stepping/scan mode of the figure of scan exposure reticle mask R (scanning stepping exposure device), can also be applicable to that under the state that reticle mask R and substrate W is static figure with reticle mask R exposes together and makes substrate W the stepping stepping of moving and (step and repeat system) projection aligner (stepping exposure device) of repetitive mode in turn.In addition, the present invention can also be applicable on substrate W the stepping of the overlapping back transfer printing to 2 visuals ground of major general and the exposure device of continuation mode (step and switch system) automatically.

In addition, the present invention, can also be applicable to and open flat 10-163099 communique, spy as the spy to open flat 10-214783 communique, special table 2000-505958 communique etc. disclosed like that to possess processed substrates such as to distinguish the mounting wafer and along the XY direction exposure device of two loading bench-types of 2 mobile objective tables independently.

Kind as exposure device EX; be not limited to exposure device with the semiconductor element manufacturing usefulness of semiconductor element graph exposure on substrate W, can also be widely applicable for the liquid crystal display cells manufacturing with or the exposure device of display manufacturing usefulness or be used to make the exposure device etc. of film magnetic head, imaging apparatus (CCD) or reticle mask or mask etc.

When on substrate objective table WST and reticle mask objective table RST, use linear motor (with reference to USP5,623,853 or USP5,528,118) time, as the mode that these objective tables have been hanged with respect to platform, preferably adopt the air used air bearing to hang type and used Lorentz force or the magnetcisuspension of reactance power plays a certain in the type.In addition, each objective table WST, RST both can be the types that moves along track, also can be the no rail types that track is not set.

As the driving mechanism of each objective table WST, RST, disposed the magnet unit of magnet with also can using Quadratic Finite Element, with Quadratic Finite Element to have disposed the armature unit of coil relative and utilize electromagnetic force to drive the planar motor of each objective table WST, RST.At this moment, as long as any one party of magnet unit and armature unit is connected on objective table WST, the RST, the all-moving surface side that the opposing party of magnet unit and armature unit is located at objective table WST, RST gets final product.

Can also open flat 8-166475 communique (USP5,528,118) puts down in writing as the spy, will mechanically not be put on the ground (the earth) with frame parts because of the mode that the reaction force that produces passes to projection optical system PL that moves of substrate objective table WST.Can also open flat 8-330224 communique (US S/N 08/416,558) puts down in writing as the spy, will mechanically not be put on the ground (the earth) with frame parts because of the mode that the reaction force that produces passes to projection optical system PL that moves of reticle mask objective table RST.

The exposure device EX of this example by the mode with the mechanical precision that keeps regulation, electric precision, optical accuracy, will comprise that the various groups of subsystems of each composed component that the scope of the application's claim is cited are fitted together and make.In order to ensure these various precision, in the front and back of this assembling, the adjustment that various optical systems are used to reach optical accuracy is to the adjustment that various mechanical systems are used to reach mechanical precision, the adjustment that various electrical systems is used to reach electric precision.

From the assembling procedure of various subsystems, comprise the distribution connection of the mutual mechanical connection of various subsystems, electric circuit, the pipe arrangement connection of pneumatic circuit etc. to exposure device.In that various subsystems had various subsystems assembling procedure separately certainly before the assembling procedure of exposure device from this.After the operation end that various groups of subsystems is installed on the exposure device, comprehensively adjust, guarantee various precision as exposure device integral body.Moreover the manufacturing of exposure device is preferably in the clean room that has managed temperature and cleannes and carries out.

Microdevices such as semiconductor device, as shown in figure 16, through the following steps manufacturings, promptly carry out the functional performance design of microdevice step 201, make step 202, make step 203 as the substrate of the basis material of device based on the reticle mask (mask) of this design procedure, the exposure device EX by above-mentioned example is substrate processing step 204 on substrate of the graph exposure of reticle mask, device number of assembling steps (comprising scribing operation, bond sequence, packaging process) 205, inspection step 206 etc.

Moreover, in the step 204 in the Figure 10 that uses exposure device EX, also use application development (C/D) device that is connected in series with exposure device EX.Make in the line at common semiconductor, by robotic arm or travelling arm, the prealignment portion of the wafer that will apply resist in from the finish department automatic transport to exposure device EX with the finish department of C/D device.Prealignment portion in the exposure device EX is with after the otch of wafer and the unification of leading mark direction of rotation are on the prescribed direction, with this wafer transport to objective table WST.Just before the conveying of this unexposed wafer action, by unload arm etc. objective table WST is gone up the wafer that exposure finishes and transport from objective table WST, automatic transport is to the development section of C/D device then.At this moment, be the atmosphere release condition because of the recovery of the liquid that keeps, might finish on the surface of wafer and the back side remaining water droplet etc. in exposure though liquid soaks regional AR2.So, preferably, implement antidrip or water-proofing treatment in advance at least carrying exposure to finish on the robotic arm of wafer or the travelling arm etc. to C/D device (development section) from objective table WST.Particularly, be preferably in the vacuum suction portion that is formed on for the back side that keeps wafer on the arm, even if to immerse mode also out of question attached to the water droplet on the chip back surface or moisture, to be set as in advance the vacuum exhaust road that is provided with liquid collection unit (only retaining the less depressed part of liquid or sponge etc.) simultaneously.

The possibility of the utilization on the industry

Pass to the feelings of optics group owing to the vibration of the optics that can prevent from contacting with liquid Therefore condition can be made the deterioration that prevents the figure picture, and have the device of higher pattern precision.

In addition, according to the present invention, immerse projection optics owing to can simultaneously prevent liquids and gases The image planes side of system, one side carries out exposure-processed with high accuracy and instrumentation is processed, therefore can Substrate well exposes.

Claims (43)

1. exposure device, possesses the projection optical system that comprises the optics that contacts with liquid and be configured in the optics group between this optics and the figure, make described substrate exposure on the substrate by the picture of described figure being projected in, it is characterized in that via described projection optical system and described liquid:

Possess the maintaining body that keeps described optics and described optics group,

Described maintaining body so that described optics be subjected to via described liquid transfer vibration, keep with respect to described optics group mode of displacement on optical axis direction.

2. exposure device as claimed in claim 1 is characterized in that, described maintaining body has:

First holding member of the optics that maintenance contacts with described liquid;

Second holding member that keeps described optics group; And

With the bindiny mechanism of described first holding member with respect to the ground connection of the described second holding member variable bit.

3. exposure device as claimed in claim 2 is characterized in that: described bindiny mechanism separates with described second holding member described first holding member in vibration.

4. exposure device as claimed in claim 3 is characterized in that: described bindiny mechanism absorbs the vibration of described first holding member, and it is delivered on described second holding member.

5. exposure device as claimed in claim 4, it is characterized in that: described first holding member, keep having the lens element of the optical axis of regulation as the optics that contact with described liquid, and with respect to described second holding member along the optical axis direction of described regulation or around with the light shaft positive cross of described regulation spool direction of rotation movably mode be connected.

6. exposure device as claimed in claim 5 is characterized in that: described first holding member, and to connect with respect to the tiltable mode of described second holding member.

7. exposure device as claimed in claim 6 is characterized in that: described first holding member is with supported with respect to the adjustable mode of described second holding member.

8. exposure device as claimed in claim 7 is characterized in that: described bindiny mechanism comprises elastomeric element.

9. exposure device as claimed in claim 8 is characterized in that: possess the load that is used to reduce described first holding member load of the effect of described bindiny mechanism is reduced mechanism.

10. exposure device as claimed in claim 9 is characterized in that: described load reduces mechanism, makes described second holding member support the load of described first holding member in the noncontact mode.

11., it is characterized in that: possess the picture adjusting mechanism of adjusting the picture that is projected in the figure on the described substrate as each described exposure device in the claim 1～10.

12. exposure device as claimed in claim 11 is characterized in that: described picture adjusting mechanism, compensation is along with respect to the displacement of the described optics of described optics group and the picture element of issuable projecting figure changes.

13. exposure device as claimed in claim 12 is characterized in that: possess first detector of the position relation that detects described optics group and described optics, describedly look like adjustment according to the testing result of described first detector as adjusting mechanism.

14. exposure device as claimed in claim 12 is characterized in that: described picture adjusting mechanism compensates the change of position relation of the plane of exposure of described optics and described substrate.

15. exposure device as claimed in claim 14 is characterized in that: possess second detector of the position relation of the plane of exposure that detects described optics and described substrate, described picture adjusting mechanism look like adjustment according to the testing result of described second detector.

16. exposure device as claimed in claim 2 is characterized in that, described bindiny mechanism has:

The bool that connects described first holding member and described second holding member.

17. exposure device as claimed in claim 16 is characterized in that, described bool absorbs the vibration of transmitting via described liquid.

18. exposure device as claimed in claim 16 is characterized in that, described bindiny mechanism absorbs described vibration by making described optics displacement.

19. exposure device as claimed in claim 18 is characterized in that, has first detector of the displacement that detects described optics.

20. exposure device as claimed in claim 19 is characterized in that, possesses the picture adjusting mechanism of adjusting the picture that projects to the figure on the described substrate,

Described picture adjusting mechanism is adjusted the picture of described figure according to the testing result of described first detector.

21. a device making method is characterized in that, uses each the described exposure device in the claim 1～15.

22. an exposure device exposes substrate via liquid, has:

First holding member of the optics that maintenance contacts with liquid,

Keep a plurality of opticses second holding member and

Described first holding member is connected to the bindiny mechanism of described second holding member, this bindiny mechanism is subjected to making the displacement on the optical axis direction of described optics of described first holding member via the vibration of described liquid transfer to described optics with respect to described second holding member.

23. exposure device as claimed in claim 22 is characterized in that, described bindiny mechanism has elastomeric element.

24. exposure device as claimed in claim 23 is characterized in that, described elastomeric element has bool.

25. exposure device as claimed in claim 22 is characterized in that, described bindiny mechanism keeps the described optics that contacts with liquid in the mode that has the degree of freedom at least on 3 directions.

26. exposure device as claimed in claim 25 is characterized in that, described optics is the lens element with optical axis, and described 3 directions comprise described optical axis direction and the direction of rotating around two axles with described light shaft positive cross.

27. exposure device as claimed in claim 22 is characterized in that, described bindiny mechanism is to keep described first holding member with respect to the adjustable mode of described second holding member.

28., it is characterized in that described bindiny mechanism has the deadweight of the deadweight that reduces described first holding member and eliminates mechanism as each described exposure device in the claim 22～27.

29., it is characterized in that having first detector of the position relation that detects described first holding member and described second holding member as each described exposure device in the claim 22～27.

30. exposure device as claimed in claim 29 is characterized in that, has the picture adjusting mechanism of adjusting the picture that projects to the figure on the described substrate,

Described picture adjusting mechanism is adjusted the picture of described figure based on the testing result of described first detector.

31., it is characterized in that having as each described exposure device in the claim 22～27:

Detect second detector of position relation of the plane of exposure of described optics and described substrate,

Adjust the picture adjusting mechanism of the picture of described figure based on the testing result of described second detector.

32. exposure device as claimed in claim 22 is characterized in that, has first detector of the displacement that detects described optics.

33. exposure device as claimed in claim 32 is characterized in that, possesses the picture adjusting mechanism of adjusting the picture that projects to the figure on the described substrate,

Described picture adjusting mechanism is adjusted the picture of described figure according to the testing result of described first detector.

34. a projection optical system is used for having via the exposure device of liquid with the substrate exposure:

First holding member of the optics that maintenance contacts with liquid,

Keep a plurality of opticses second holding member and

Described first holding member is connected to the bindiny mechanism of described second holding member, this bindiny mechanism is subjected to making the displacement on the optical axis direction of described optics of described first holding member via the vibration of described liquid transfer to described optics with respect to described second holding member.

35. projection optical system as claimed in claim 34 is characterized in that, described bindiny mechanism has elastomeric element.

36. projection optical system as claimed in claim 35 is characterized in that, described elastomeric element has bool.

37. projection optical system as claimed in claim 34 is characterized in that, described bindiny mechanism keeps the described optics that contacts with liquid in the mode that has the degree of freedom at least on 3 directions.

38. projection optical system as claimed in claim 37 is characterized in that, described optics is the lens element with optical axis, and described 3 directions comprise described optical axis direction and the direction of rotating around two axles with described light shaft positive cross.

39. projection optical system as claimed in claim 34 is characterized in that, described bindiny mechanism is to keep described first holding member with respect to the adjustable mode of described second holding member.

40. projection optical system as claimed in claim 34 is characterized in that, described bindiny mechanism has the deadweight of the deadweight that reduces described first holding member and eliminates mechanism.

41., it is characterized in that having first detector of the position relation that detects described first holding member and described second holding member as each described projection optical system in the claim 34～40.

42. projection optical system as claimed in claim 41 is characterized in that, has the picture adjusting mechanism of adjusting the picture that projects to the figure on the described substrate, described picture adjusting mechanism is adjusted the picture of described figure based on the testing result of described first detector.

43., it is characterized in that having as each described projection optical system in the claim 34～40: detect second detector of position relation of the plane of exposure of described optics and described substrate,

Adjust the picture adjusting mechanism of the picture of described figure based on the testing result of described second detector.

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