CA2286699A1 - Latch-up free power mos-bipolar transistor - Google Patents

Latch-up free power mos-bipolar transistor Download PDF

Info

Publication number
CA2286699A1
CA2286699A1 CA002286699A CA2286699A CA2286699A1 CA 2286699 A1 CA2286699 A1 CA 2286699A1 CA 002286699 A CA002286699 A CA 002286699A CA 2286699 A CA2286699 A CA 2286699A CA 2286699 A1 CA2286699 A1 CA 2286699A1
Authority
CA
Canada
Prior art keywords
bipolar transistor
nmosfet
npn bipolar
silicon carbide
base layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002286699A
Other languages
French (fr)
Other versions
CA2286699C (en
Inventor
Ranbir Singh
John W. Palmour
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wolfspeed Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/891,221 external-priority patent/US5969378A/en
Application filed by Individual filed Critical Individual
Publication of CA2286699A1 publication Critical patent/CA2286699A1/en
Application granted granted Critical
Publication of CA2286699C publication Critical patent/CA2286699C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
    • H01L29/1608—Silicon carbide
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H01L29/7302—Bipolar junction transistors structurally associated with other devices

Abstract

A MOS bipolar transistor is provided which includes a silicon carbide npn bipolar transistor formed on a bulk single crystal n-type silicon carbide substrate and having an n-type drift layer and a p-type base layer. Preferably the base layer is formed by epitaxial growth and formed as a mesa. A silicon carbide nMOSFET is formed adjacent the npn bipolar transistor such that a voltage applied to the gate of the nMOSFET causes the npn bipolar transistor to enter a conductive state. The nMOSFET has a source and a drain formed so as to provide base current to the npn bipolar transistor when the bipolar transistor is in a conductive state. Also included are means for converting electron current flowing between the source and the drain into whole current for injection into the p-type base layer. Means for reducing field crowding associated with an insulating layer of said nMOSFET may also be provided.
CA002286699A 1997-06-12 1998-06-10 Latch-up free power mos-bipolar transistor Expired - Fee Related CA2286699C (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US4942397P 1997-06-12 1997-06-12
US60/049,423 1997-06-12
US08/891,221 US5969378A (en) 1997-06-12 1997-07-10 Latch-up free power UMOS-bipolar transistor
US08/891,221 1997-07-10
US09/082,554 1998-05-21
US09/082,554 US6121633A (en) 1997-06-12 1998-05-21 Latch-up free power MOS-bipolar transistor
PCT/US1998/012007 WO1998057378A1 (en) 1997-06-12 1998-06-10 Latch-up free power mos-bipolar transistor

Publications (2)

Publication Number Publication Date
CA2286699A1 true CA2286699A1 (en) 1998-12-17
CA2286699C CA2286699C (en) 2006-04-04

Family

ID=27367535

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002286699A Expired - Fee Related CA2286699C (en) 1997-06-12 1998-06-10 Latch-up free power mos-bipolar transistor

Country Status (9)

Country Link
US (1) US6121633A (en)
EP (1) EP0990268B1 (en)
JP (1) JP4143134B2 (en)
CN (1) CN1126180C (en)
AT (1) ATE257977T1 (en)
AU (1) AU8064698A (en)
CA (1) CA2286699C (en)
DE (1) DE69821105T2 (en)
WO (1) WO1998057378A1 (en)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU747260B2 (en) 1997-07-25 2002-05-09 Nichia Chemical Industries, Ltd. Nitride semiconductor device
DE19833214C1 (en) * 1998-07-23 1999-08-12 Siemens Ag Vertical J-FET semiconductor device
JP3770014B2 (en) 1999-02-09 2006-04-26 日亜化学工業株式会社 Nitride semiconductor device
EP1168539B1 (en) 1999-03-04 2009-12-16 Nichia Corporation Nitride semiconductor laser device
EP1090428B1 (en) * 1999-04-08 2006-08-16 Philips Electronics N.V. Punch-through diode and method of manufacturing the same
US6686616B1 (en) * 2000-05-10 2004-02-03 Cree, Inc. Silicon carbide metal-semiconductor field effect transistors
US6649975B2 (en) * 2000-11-16 2003-11-18 Silicon Semiconductor Corporation Vertical power devices having trench-based electrodes therein
WO2002080281A1 (en) * 2001-04-02 2002-10-10 The Regent Of The University Of California Horizontal current bipolar transistor
JP4865166B2 (en) * 2001-08-30 2012-02-01 新電元工業株式会社 Transistor manufacturing method, diode manufacturing method
US6906350B2 (en) 2001-10-24 2005-06-14 Cree, Inc. Delta doped silicon carbide metal-semiconductor field effect transistors having a gate disposed in a double recess structure
US6764907B2 (en) * 2002-02-19 2004-07-20 Bart J. Van Zeghbroeck Method of fabricating self-aligned silicon carbide semiconductor devices
US6982440B2 (en) * 2002-02-19 2006-01-03 Powersicel, Inc. Silicon carbide semiconductor devices with a regrown contact layer
JP4110875B2 (en) * 2002-08-09 2008-07-02 株式会社デンソー Silicon carbide semiconductor device
US6956239B2 (en) * 2002-11-26 2005-10-18 Cree, Inc. Transistors having buried p-type layers beneath the source region
JP2005167035A (en) * 2003-12-03 2005-06-23 Kansai Electric Power Co Inc:The Silicon carbide semiconductor device and manufacturing method thereof
US7275357B2 (en) * 2004-03-30 2007-10-02 Cnh America Llc Cotton module program control using yield monitor signal
US7345309B2 (en) * 2004-08-31 2008-03-18 Lockheed Martin Corporation SiC metal semiconductor field-effect transistor
US7238224B2 (en) * 2004-10-29 2007-07-03 Hewlett-Packard Development Company, L.P. Fluid-gas separator
US20060091606A1 (en) * 2004-10-28 2006-05-04 Gary Paugh Magnetic building game
US7265399B2 (en) * 2004-10-29 2007-09-04 Cree, Inc. Asymetric layout structures for transistors and methods of fabricating the same
US7348612B2 (en) * 2004-10-29 2008-03-25 Cree, Inc. Metal-semiconductor field effect transistors (MESFETs) having drains coupled to the substrate and methods of fabricating the same
US7326962B2 (en) * 2004-12-15 2008-02-05 Cree, Inc. Transistors having buried N-type and P-type regions beneath the source region and methods of fabricating the same
US7476594B2 (en) * 2005-03-30 2009-01-13 Cree, Inc. Methods of fabricating silicon nitride regions in silicon carbide and resulting structures
JP2006313773A (en) * 2005-05-06 2006-11-16 Sumitomo Electric Ind Ltd Semiconductor device and manufacturing method thereof
US7414268B2 (en) 2005-05-18 2008-08-19 Cree, Inc. High voltage silicon carbide MOS-bipolar devices having bi-directional blocking capabilities
US8203185B2 (en) * 2005-06-21 2012-06-19 Cree, Inc. Semiconductor devices having varying electrode widths to provide non-uniform gate pitches and related methods
JP5011493B2 (en) * 2005-09-14 2012-08-29 関西電力株式会社 Method for manufacturing silicon carbide semiconductor element
US7402844B2 (en) * 2005-11-29 2008-07-22 Cree, Inc. Metal semiconductor field effect transistors (MESFETS) having channels of varying thicknesses and related methods
US7728402B2 (en) 2006-08-01 2010-06-01 Cree, Inc. Semiconductor devices including schottky diodes with controlled breakdown
US8432012B2 (en) 2006-08-01 2013-04-30 Cree, Inc. Semiconductor devices including schottky diodes having overlapping doped regions and methods of fabricating same
WO2008020911A2 (en) 2006-08-17 2008-02-21 Cree, Inc. High power insulated gate bipolar transistors
US7646043B2 (en) * 2006-09-28 2010-01-12 Cree, Inc. Transistors having buried p-type layers coupled to the gate
US8835987B2 (en) 2007-02-27 2014-09-16 Cree, Inc. Insulated gate bipolar transistors including current suppressing layers
US7687825B2 (en) * 2007-09-18 2010-03-30 Cree, Inc. Insulated gate bipolar conduction transistors (IBCTS) and related methods of fabrication
JP2009182271A (en) * 2008-01-31 2009-08-13 Toshiba Corp Silicon carbide semiconductor device
US8221546B2 (en) * 2008-03-26 2012-07-17 Ss Sc Ip, Llc Epitaxial growth on low degree off-axis SiC substrates and semiconductor devices made thereby
TWI362769B (en) 2008-05-09 2012-04-21 Univ Nat Chiao Tung Light emitting device and fabrication method therefor
US8232558B2 (en) 2008-05-21 2012-07-31 Cree, Inc. Junction barrier Schottky diodes with current surge capability
US7800196B2 (en) * 2008-09-30 2010-09-21 Northrop Grumman Systems Corporation Semiconductor structure with an electric field stop layer for improved edge termination capability
US8294507B2 (en) 2009-05-08 2012-10-23 Cree, Inc. Wide bandgap bipolar turn-off thyristor having non-negative temperature coefficient and related control circuits
US8193848B2 (en) * 2009-06-02 2012-06-05 Cree, Inc. Power switching devices having controllable surge current capabilities
US8629509B2 (en) 2009-06-02 2014-01-14 Cree, Inc. High voltage insulated gate bipolar transistors with minority carrier diverter
US8541787B2 (en) 2009-07-15 2013-09-24 Cree, Inc. High breakdown voltage wide band-gap MOS-gated bipolar junction transistors with avalanche capability
US8354690B2 (en) 2009-08-31 2013-01-15 Cree, Inc. Solid-state pinch off thyristor circuits
US8563986B2 (en) * 2009-11-03 2013-10-22 Cree, Inc. Power semiconductor devices having selectively doped JFET regions and related methods of forming such devices
US9117739B2 (en) 2010-03-08 2015-08-25 Cree, Inc. Semiconductor devices with heterojunction barrier regions and methods of fabricating same
US8415671B2 (en) 2010-04-16 2013-04-09 Cree, Inc. Wide band-gap MOSFETs having a heterojunction under gate trenches thereof and related methods of forming such devices
JPWO2012056536A1 (en) 2010-10-27 2014-03-20 富士電機株式会社 Semiconductor device and manufacturing method of semiconductor device
SE535380C2 (en) * 2011-01-31 2012-07-17 Fairchild Semiconductor Silicon carbide bipolar transistor with overgrown emitter
US9029945B2 (en) 2011-05-06 2015-05-12 Cree, Inc. Field effect transistor devices with low source resistance
US9142662B2 (en) 2011-05-06 2015-09-22 Cree, Inc. Field effect transistor devices with low source resistance
US9112048B2 (en) * 2011-08-17 2015-08-18 Ramgoss Inc. Vertical field effect transistor on oxide semiconductor substrate
US8618582B2 (en) 2011-09-11 2013-12-31 Cree, Inc. Edge termination structure employing recesses for edge termination elements
WO2013036370A1 (en) 2011-09-11 2013-03-14 Cree, Inc. High current density power module comprising transistors with improved layout
US8680587B2 (en) 2011-09-11 2014-03-25 Cree, Inc. Schottky diode
US9373617B2 (en) 2011-09-11 2016-06-21 Cree, Inc. High current, low switching loss SiC power module
US9640617B2 (en) 2011-09-11 2017-05-02 Cree, Inc. High performance power module
US8664665B2 (en) 2011-09-11 2014-03-04 Cree, Inc. Schottky diode employing recesses for elements of junction barrier array
CN102507704A (en) * 2011-10-18 2012-06-20 重庆邮电大学 Schottky barrier diode oxygen sensor based on silicon carbide and manufacturing method thereof
JP2013145770A (en) * 2012-01-13 2013-07-25 Sumitomo Electric Ind Ltd Semiconductor device and manufacturing method of the same
JP5790573B2 (en) * 2012-04-03 2015-10-07 株式会社デンソー Silicon carbide semiconductor device and manufacturing method thereof
JP6070526B2 (en) * 2013-12-11 2017-02-01 豊田合成株式会社 Manufacturing method of semiconductor device
US9917180B2 (en) 2014-02-10 2018-03-13 United Silicon Carbide, Inc. Trenched and implanted bipolar junction transistor
DE112016004981T5 (en) * 2015-10-30 2018-07-19 Mitsubishi Electric Corporation SILICON CARBIDE SEMICONDUCTOR DEVICE
CN106684132B (en) * 2016-12-29 2019-10-01 西安电子科技大学 Silicon carbide bipolar transistor npn npn and preparation method thereof based on active area groove structure
DE102017220913A1 (en) * 2017-11-23 2019-05-23 Robert Bosch Gmbh Vertical power transistor with heterojunction
US10276667B1 (en) * 2018-05-31 2019-04-30 Silanna Asia Pte Ltd High voltage breakdown tapered vertical conduction junction transistor
DE102018113573B4 (en) * 2018-06-07 2022-11-03 Semikron Elektronik Gmbh & Co. Kg Patentabteilung Diode with a semiconductor body
CN112601664A (en) 2018-07-17 2021-04-02 惠普发展公司，有限责任合伙企业 Printed matter output adjustment
CN111199972B (en) * 2018-11-16 2023-05-16 比亚迪半导体股份有限公司 Integrated cascade device and preparation method thereof

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4048649A (en) * 1976-02-06 1977-09-13 Transitron Electronic Corporation Superintegrated v-groove isolated bipolar and vmos transistors
US4329705A (en) * 1979-05-21 1982-05-11 Exxon Research & Engineering Co. VMOS/Bipolar power switching device
US5014102A (en) * 1982-04-01 1991-05-07 General Electric Company MOSFET-gated bipolar transistors and thyristors with both turn-on and turn-off capability having single-polarity gate input signal
EP0159663A3 (en) * 1984-04-26 1987-09-23 General Electric Company High-density v-groove mos-controlled thyristors, insulated-gate transistors, and mosfets, and methods for fabrication
JPS61104667A (en) * 1984-10-29 1986-05-22 Oki Electric Ind Co Ltd Manufacture of semiconductor device
US4725562A (en) * 1986-03-27 1988-02-16 International Business Machines Corporation Method of making a contact to a trench isolated device
JPS6347983A (en) * 1986-08-18 1988-02-29 Sharp Corp Silicon carbide field effect transistor
US4799095A (en) * 1987-07-06 1989-01-17 General Electric Company Metal oxide semiconductor gated turn off thyristor
US5087576A (en) * 1987-10-26 1992-02-11 North Carolina State University Implantation and electrical activation of dopants into monocrystalline silicon carbide
CA1313571C (en) * 1987-10-26 1993-02-09 John W. Palmour Metal oxide semiconductor field-effect transistor formed in silicon carbide
US4945394A (en) * 1987-10-26 1990-07-31 North Carolina State University Bipolar junction transistor on silicon carbide
US4981551A (en) * 1987-11-03 1991-01-01 North Carolina State University Dry etching of silicon carbide
US5202750A (en) * 1990-04-09 1993-04-13 U.S. Philips Corp. MOS-gated thyristor
JP2542448B2 (en) * 1990-05-24 1996-10-09 シャープ株式会社 Field effect transistor and method of manufacturing the same
JP2504862B2 (en) * 1990-10-08 1996-06-05 三菱電機株式会社 Semiconductor device and manufacturing method thereof
US5168331A (en) * 1991-01-31 1992-12-01 Siliconix Incorporated Power metal-oxide-semiconductor field effect transistor
US5264713A (en) * 1991-06-14 1993-11-23 Cree Research, Inc. Junction field-effect transistor formed in silicon carbide
US5270554A (en) * 1991-06-14 1993-12-14 Cree Research, Inc. High power high frequency metal-semiconductor field-effect transistor formed in silicon carbide
JPH0582792A (en) * 1991-09-25 1993-04-02 Toshiba Corp Manufacture of semiconductor device
JPH05121425A (en) * 1991-10-30 1993-05-18 Fuji Electric Co Ltd Bipolar electrostatic-induction transistor
US5640034A (en) * 1992-05-18 1997-06-17 Texas Instruments Incorporated Top-drain trench based resurf DMOS transistor structure
US5459107A (en) * 1992-06-05 1995-10-17 Cree Research, Inc. Method of obtaining high quality silicon dioxide passivation on silicon carbide and resulting passivated structures
US5233215A (en) * 1992-06-08 1993-08-03 North Carolina State University At Raleigh Silicon carbide power MOSFET with floating field ring and floating field plate
US5506421A (en) * 1992-11-24 1996-04-09 Cree Research, Inc. Power MOSFET in silicon carbide
GB9313843D0 (en) * 1993-07-05 1993-08-18 Philips Electronics Uk Ltd A semiconductor device comprising an insulated gate field effect transistor
US5539217A (en) * 1993-08-09 1996-07-23 Cree Research, Inc. Silicon carbide thyristor
US5323040A (en) * 1993-09-27 1994-06-21 North Carolina State University At Raleigh Silicon carbide field effect device
US5396085A (en) * 1993-12-28 1995-03-07 North Carolina State University Silicon carbide switching device with rectifying-gate
US5488236A (en) * 1994-05-26 1996-01-30 North Carolina State University Latch-up resistant bipolar transistor with trench IGFET and buried collector
JP3158973B2 (en) * 1995-07-20 2001-04-23 富士電機株式会社 Silicon carbide vertical FET
US5679966A (en) * 1995-10-05 1997-10-21 North Carolina State University Depleted base transistor with high forward voltage blocking capability
US5719409A (en) * 1996-06-06 1998-02-17 Cree Research, Inc. Silicon carbide metal-insulator semiconductor field effect transistor
US5917203A (en) * 1996-07-29 1999-06-29 Motorola, Inc. Lateral gate vertical drift region transistor
US5969378A (en) * 1997-06-12 1999-10-19 Cree Research, Inc. Latch-up free power UMOS-bipolar transistor

Also Published As

Publication number Publication date
EP0990268A1 (en) 2000-04-05
JP2002514355A (en) 2002-05-14
CN1260068A (en) 2000-07-12
WO1998057378A9 (en) 1999-07-22
EP0990268B1 (en) 2004-01-14
US6121633A (en) 2000-09-19
DE69821105T2 (en) 2004-07-22
DE69821105D1 (en) 2004-02-19
ATE257977T1 (en) 2004-01-15
CA2286699C (en) 2006-04-04
WO1998057378A1 (en) 1998-12-17
JP4143134B2 (en) 2008-09-03
AU8064698A (en) 1998-12-30
CN1126180C (en) 2003-10-29

Similar Documents

Publication Publication Date Title
CA2286699A1 (en) Latch-up free power mos-bipolar transistor
US5031009A (en) Conductivity modulation semiconductor with no negative resistance characteristics
US3470390A (en) Integrated back-to-back diodes to prevent breakdown of mis gate dielectric
TW335513B (en) Semiconductor component for high voltage
WO1999031731A3 (en) Silicon oxide insulator (soi) semiconductor having selectively linked body
US20100065885A1 (en) Soi device with more immunity from stubstrate voltage
JPH0732249B2 (en) High Speed Switching Horizontal Insulated Gate Transistor
EP0746029A3 (en) Voltage-clamped power accumulation-mode MOSFET
CN106684073B (en) The combination of FET- bipolar transistor
TW200419798A (en) Bipolar transistor having a majority-carrier accumulation layer as subcollector
KR20010020486A (en) Power devices in wide bandgap semiconductor
US4942440A (en) High voltage semiconductor devices with reduced on-resistance
US5276339A (en) Semiconductor with a conductivity modulating-type MISFET
JPS6410658A (en) Semiconductor device
JPS648674A (en) Vertical mos-fet
JP3199857B2 (en) Conductivity modulation type MOSFET
EP0108945B1 (en) High voltage semiconductor devices with reduced on-resistance
JPS6484733A (en) Semiconductor device
JPS6050062B2 (en) Semiconductor integrated circuit device
JPS5648167A (en) Semiconductor device
JP2536013B2 (en) Semiconductor device
MacIver et al. Characteristics of trench j-MOS power transistors
JPS6431452A (en) Semiconductor integrated circuit containing current mirror
JPS56165356A (en) Mos semiconductor device
JPS6432666A (en) Surge protective integrated circuit

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed

Effective date: 20140610