CA2162905A1 - Carbon compositions and processes for preparing a non-conductive substrate for electroplating - Google Patents

Carbon compositions and processes for preparing a non-conductive substrate for electroplating

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Publication number
CA2162905A1
CA2162905A1 CA002162905A CA2162905A CA2162905A1 CA 2162905 A1 CA2162905 A1 CA 2162905A1 CA 002162905 A CA002162905 A CA 002162905A CA 2162905 A CA2162905 A CA 2162905A CA 2162905 A1 CA2162905 A1 CA 2162905A1
Authority
CA
Canada
Prior art keywords
carbon
conductive
hole
graphite
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002162905A
Other languages
French (fr)
Inventor
Charles Edwin Thorn
Frank Polakovic
Charles A. Mosolf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Element Solutions Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/062,943 external-priority patent/US5389270A/en
Application filed by Individual filed Critical Individual
Publication of CA2162905A1 publication Critical patent/CA2162905A1/en
Abandoned legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/423Plated through-holes or plated via connections characterised by electroplating method
    • H05K3/424Plated through-holes or plated via connections characterised by electroplating method by direct electroplating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/032Materials
    • H05K2201/0323Carbon
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12Using specific substances
    • H05K2203/122Organic non-polymeric compounds, e.g. oil, wax, thiol
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/425Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/427Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates

Abstract

The present invention is directed to an improved composition and process for preparing a non-conductive substrate for electroplating.
The composition comprises 0.1 to 20 % by weight carbon (e.g. graphite or carbon black) having a mean particle size within the range of 0.05 to 50 microns; optionally, 0.01 to 10 % by weight of a water soluble or dispersible binding agent for binding to the carbon particles;
optionally, an effective amount of a anionic despersing agent for dispersing the bound carbon particles; optionally, an amount of a surfactant that is effective for wetting the through hole; a pH within the range of 4-14; and an aqueous dispersing medium. Improved methods of applying the composition to a through hole, a printed wiring board having a through hole treated with the composition and a method of fixing a carbon coating deposited on a through hole using an acid solution are also disclosed.

Description

W094/26958 2 16 2 ~ 0~ PCT~S94/05267 ~'RQN COMP08ITION8 AND p~OÇRR~ FOR PREPA~T~G
A NO~-CONI~u~,lv~ ~B8TRAT~ FOR ELECTROPLATING

Cross-ref6r6nc- to Relat6d Applications This is a continuation-in-part of United States Application Serial No. 08/062,943, filed May 17, 1993, now pending. The entire specification and all the claims of that application are hereby incorpor-ated by reference herein to provide continuity,ofdisclosure.

, 9--hn i C~ll Fi--ld The present invention is directed to electrically conductive coatings containing carbon and processes for preparing electrically nonconduct-ive surfaces for being electroplated. More particu-larly, one aspect of the invention relates to pre-paring the non-conductive surfaces in the through holes of a multi-layer or double-sided printed wiring board for electroplating.

B~lck~.~u~ Art Printed circuit boards are formed from a layer of conductive material (commonly, copper or copper plated with solder or gold) carried on a substrate o~ insulating material (commonly glass-fiber-rein-forced epoxy resin). A printed circuit board having two conductive surfaces positioned on opposite sides of a single insulating layer is known as a "double-sided circuit board." To accommodate even more circuits on a single board, several copper layers are sandwiched between boards or other layers of W094/26958 ~6~9 Q~ PCT~S94/05267 insulating material to produce a multi-layer circuit board.
To make electrical connections between the circuits on opposite sides of a double-sided circuit board, a hole is first drilled through the two conducting sheets and the insulator board. These holes are known in the art as "through holes."
Through holes are typically from about 0.05 mm to about 5 mm in diameter and from about 0.025 mm to about 6 mm. long. The through hole initially has a nonconductive cylindrical bore communicating between the two conductive surfaces on opposite sides of the board. A conductive material or element is positioned in the through hole and electrically connected with the conducting sheets on either side of the through hole.
Like double-sided circuit boards, multi-layer circuit boards also use holes in an intervening insulating layer to complete circuits between the circuit patterns on opposite side of the insulating layer. Unless the context indicates otherwise, references in this specification to "through holes"
refer to these holes in multilayer boards as well, even if they do not literally go through the entire circuit board.
Various conductive elements have been devised over the years for forming a conductive pathway via the through hole. Initially, conductive solid parts (e.g., rivets or eyelets) were inserted through the through holes and mec~A~ically secured in place.
However, these parts were labor intensive to install and ~ovad unreliable with age. Jumper wires running around the edge of or through the board and the leads of conductive elements soldered to the board have also been used.
More recently, conductive material -- typi-cally, a layer of copper -- has been coated on the nonconductive through hole bore to provide a
- 2 -WOg4/26958 ~ 0~ PCT~S94/05267 cylindrical bridge between the conducting sheets which lie at the opposite ends of the through hole.
Electroplating is a desirable method of depositing copper and other conductive metals on a surface, but electroplating cannot be used to coat a nonconduct-ive surface, such as an untreated through hole. It has thus been necessary to treat the through hole with a conductive material to make it amenable to electroplating.
One process for making the through hole bores electrically conductive, to enable electroplating, is to physically coat them with a conductive film.
The coated through holes are conductive enough to electroplate, but typically are not conductive and sturdy enough to form the permanent electrical connection between the conductive layers at either end of the through hole. The coated through holes are then electroplated to provide a permanent c,onnection. Electroplating lowers the resistance of t:he through hole bore to a negligible level which will not consume an appreciable amount of power or alter circuit characteristics.
Conductive through hole coating compositions cont~ining nonmetallic, electrically conductive particles have long been sought to avoid the eyp~nce alnd disposal problems associated with metal deposition. The only common nonmetallic conductors a~re graphite and carbon black. Of these two, graphite is far more conductive, so the art has long sought to make a graphite dispersion which is suitable for coating a through hole with a onductive layer of graphite. Graphite dispersions, however, have been found unsuitable for preparing through holes for electroplating.
U.S. Patent 3,163,588 (Shortt), which issued on December 29, 1964, briefly suggests that a through hole surface may be rendered conductive prior to W094/26958 ~ PCT~S94/05267 electroplating by applying a paint or ink containing a substance such as graphite. Col. 3, ln. 57-58.
U.S. Patent 3,099,605 (Radovsky), which issued on July 30, 1963, states, however, that the prior use of graphite to form a conductive base coating on the exposed areas of a through hole suffered from many "defects." Col. 1, ln. 66. These defects were said to include the "lack of control of the graphite application with the resultant poor deposit of the electroplated metal and non-uniform through hole diameters." Col. 1, ln. 66-70.
U.S. Patent 4,619,741 (Minten) teaches that "when graphite particles are used . . . loss of adhesion of the copper to the non-conducting material after the subsequent electroplating was noted." Col. 7, ln. 11-16. In comparison 1 of the '741 patent, through holes that were electroplated after application of the first substitute graphite formulation (2.5~ by weight graphite) had only a few visible voids, "but failed the solder shock test."
Col. 20, ln. 5-7. According to the '741 patent, "tt]he plated on copper in the holes pulled away from the epoxy/glass fiber layer." Col. 20, ln.
7-8. The results were even worse with the second substitute graphite formulation (0.5% by weight graphite). After electroplating, the boards that were treated with the second substitute formulation had voided holes. See: col. 20, ln. 14. According to the '741 patent, "tt]he s~n~rd shock test could not be run on boards that were prepared with this latter graphite formulation because of the lack of unvoided holes." Col. 20, ln. 14-16.
U.S. Patent 5,139,642 (Randolph), which issued on August 18, 1992, contains comparative examples 3A
and 3B in which a graphite dispersion was coated in a single pass on a through hole and dried to form a graphite layer directly on the nonconductive substrate. The substrate was then subjected to a WOg4/26g58 PCT~S94/05267 g'~5 through hole electroplating process. The test was a failure: the patent states that "tt]his board (C-3B) ~as not evaluated for adhesion since significant voids were observed even after 55 mins. of plating."
A competing process for plating through holes llas been to use electroless copper -- a solution which plates metal through chemical action, requiring no electricity, and which thus will deposit conductive metal on a nonconductive substrate. Electroless copper can plate copper directly on the through hole to make it conductive.
Then, typically, electroplating is used to build up 1:he coating, providing a permanent conductive path.
U.S. Patent 4,619,741 (Minten), which issued on November 11, 1986, teaches that, since about 1961, t:he industry had relied upon electroless copper deposition to prepare the walls of a through hole for electroplating. Col. 1, ln. 25-28. Although electroless depoæition provided superior results to t:he prior art methods for preparing a through hole surface, electroless deposition has several c:o~mmercial disadvantages. As pointed out by Minten, t:hese disadvantages include a six step process prior t:o electroplating; a long process time; multiple treatment baths; a "complex chemistry which may require constant monitoring and individual ingredients which may require separate reple~;chment;" a "palladium/tin activator [which]
also may require extensive waste treatment;" and a "multiplicity of rinse baths [which] may require large amounts of water." Col. 1, ln. 66, to col. 2, ln. 7.
Radovsky, cited previously, nonetheless states that the electroless plating method "has advantages over the graphite methods. H Col. 2, ln. 10-12.
"tThe] advantages are essentially better control over the base layer of catalyst metal deposition and W094l26958~ PCT~S94/05267 a resultant improved ele_L~o~lating process with more uniform hole diameters." Col. 2, ln. 12-15.
To overcome the disadvantages associated with the electroless and graphite deposition methods, U.S. Patent 4,619,741 (Minten), cited above, teaches coating the non-conductive surface of a through hole wall of a printed circuit board with carbon black particles prior to electroplating. The '741 patent expressly teaches that "graphite particles" are not capable of substituting for the carbon black particles. According to the '741 patent, "both graphite formulations were far inferior for electroplating preparation as compared to the above carbon black formulations." Col. 20, ln. 17-19.
The following U.S. patents also teach that graphite is not a substitute for carbon black in carbon black formulations that conductively coat through holes prior to electroplating: 4,622,108 (Polakovic: one of the present inventors) at col. 8, ln. 1-5; 4,631,117 (Minten) at col. 7, ln. 24-28 ("when graphite particles are used as a replacement for the carbon black particles of this invention, the undesirable plating characteristics mentioned in U.S. Patent No. 3,099,608 would likely occur");
4,718,993 (Cupta) at col. 8, ln. 27-37; and 4,874,477 (Pendleton) at col. 7, ln. 60-68.
In addition, the following U.S. patents discuss the deficiencies associated with using graphite as a conductive coating prior to electroplating:
4,619,741 at col. 2, ln. 16-25; 4,622,108 at col. 2, ln. 12-20; 4,622,107 at col. 1, ln. 52-60; 4,631,117 at col. 2, ln. 22-30; 4,718,993 at col. 2, ln. 21-29; 4,874,477 at col. 1, ln. 54-62; 4,897,164 at col. 1, ln. 54-62; 4,964,959 at col. 1, ln. 28-36;
5,015,339 at col. 1, ln. 56-64; 5,106,537 at col. 1, ln. 34-42; and 5,110,355 at col. 1, ln. 60-68.
According to these patents, the deficiencies with the graphite process included lack of control of the W094/26958 ~1 ~2 9 ~5 PCT~S94/05267 graphite application, poor deposit of the resultant ,electroplated metal, non-uniform through hole diameters, and high electrical resistance of the graphite.
The carbon black process is commercially available under the BLACKHOLE trademark from ~acDermid Incorporated of Waterbury, Connecticut.
rt is difficult to make the BLACKHOLE process work, however, and it provides a coating with an undesirably high electrical resistance. All the current used for electroplating must flow through the carbon black coating, so, for a given voltage, the current flow through a high resistance coating :is relatively low. The rate of electroplating is proportional to the current flow, so a high resistance coating requires a long plating time to plate the desired quantity of metal over the carbon black coating. The voltage drop across the high resistance coating also consumes electricity by generating heat.
The electrical resistivity problem with the c:arbon black process has been addressed commercially in the BLACKHOLE process by depositing a second coat of carbon black over the first to further lower the resistivity of the coating. Of course, this two-pass process requires more materials, time, and equipment than a one-pass process.
The Randolph patent cited previously teaches t:hat the deficiencies of a single graphite layer or a single carbon black layer can be avoided by applying an aqueous dispersion of carbon black directly to the through hole, removing the water to leave a carbon black film, then applying an aqueous dispersion of graphite to the carbon black film, and finally removing the water to form a second, graphite film. The carbon black film acts as a primer for the graphite film to increase adhesion, while the graphite layer is more electrically W094/26958 ~ g ~ 5 PCT~S94105267 conductive and thus lowers the resistivity of the composite coating. But a two-pass process is again required.

Disclosur~ of Inv~tio~
Accordingly, an object of the present invention is to develop a composition that is capable of depositing a controlled and uniform coating of graphite or carbon black (which are referred to in this specification either together or separately as "carbon") particles on the non-conductive surface of a through hole. As used herein, a "uniform" coating is one essentially free of excess conductive coating composition build up, particularly at the ends of the through hole, so the coating has a substantially uniform thickness at the mouth and in the interior of the hole, as viewed under a 50x magnification of a cross-section of a through hole after plating.
Another object of the present invention is to uniformly deposit a particulate carbon coating which is adequate to eliminate the need for electroless plating prior to electroplating.
An additional object .of the invention is to provide a conductive coating with good adhesion to a nonconductive substrate, for example, a coating which adheres to a through hole wall better than coatings of palladium, electroless copper, carbon black, or graphite provided by prior through hole coating process and compositions.
Still another object of the present invention is to provide an electroplated conductive through hole coating which is capable of withs~An~in~ the solder shock test.
A still further object of the invention is to provide a conductive carbon coating with a low resistivity.
Yet another object of the invention is to provide a particulate coating which can provide = --W094/26958 ~ 7~ 9 ~ PCT~S94/05267 lower resistivity in a one-pass process than has previously been possible.
Other objects of the invention will become apparent to pne skilled in the art who has the benefit of this specification and the prior art.
At least one of these alternative objects is achieved by an improved conductive carbon dispersion which is one aspect of the present invention. This composition comprises from about 0.1 to about 20% by weight carbon having a mean particle size within the range from about 0.05 to about 50 microns; from about 0.01 to about 10~ by weight of a water soluble or dispersible binding agent for binding to the carbon particles; an effective amount of an anionic dispersing agent for dispersing the bound carbon particles; a pH within the range of from about 4 to about 14; optionally, an amount of a surfactant that is effective to wet the through holes; and an aqueous dispersing medium. The carbon ingredient of the composition can be all carbon black, all graphite, or a combination of carbon black and graphite particles within the scope of the invention.
Another aspect of the invention is a com-position comprising carbon, an anionic dispersingagent effective for dispersing the bound carbon particles, at least one surfactant in an amount effective to wet the through hole of a circuit board contacted with the composition, a pH within the range of from about 4 to about 14, and an aqueous dispersing medium.
Yet another aspect of the invention is a printed wiring board comprising a conductive through hole made by depositing a coating of any of the foregoing compositions on a nonconductive through hole to form a coating and drying the coating.
Another aspect of the present invention is a process for electroplating a conductive metal layer, _ 9 _ W094/26958 PCT~S94/05267 ~6Z9~ ~
uch as copper, on the surface of a non-conductive material. A liquid dispersion is prepared comprising carbon, a water-dispersible binding agent, and an aqueous dispersing medium, each as previously defined. The composition again has a pH
within the range of from about 4 to about 14. The liquid dispersion is applied to the non-conductive surfaces of the through hole. Substantially all of the aqueous dispersing medium is separated from the carbon particles, depositing the carbon particles on the non-conductive surfaces of the through hole in a substantially continuous layer. After that, a substantially continuous metal layer is electro-plated over the carbon particles deposited on the previously non-conductive surfaces of the through hole.
Even another aspect of the invention is a method for electroplating a conductive metal layer to the non-conductive surface of a through hole, comprising the previously stated steps. However, before the aqueous dispersing medium is separated (e.g. dried) from the carbon particles, the through hole is contacted with a fixer comprising an aqueous solution of from about 0.1% to about 5~ by volume of an aqueous acid. The coating is then dried, and a substantially continuous metal layer is electro-plated over the dispersion coating.
These improved compositions and methods are capable of depositing a uniform coating of carbon on the non-conductive surfaces of a through hole of either a double-sided or a multi-layer circuit board. Through holes that are treated with the carbon dispersions and methods of the present invention prior to electroplating can be made at least substantially free, and preferably entirely free, of visible voids. ("Substantially free of visible voids" means that, following electroplating, the proportion of plated through hole area is at W094/26958 ~ 05 PCT~S94/05267 least about 90% of the entire area.) Through holes that are treated with the carbon dispersion of the present invention prior to electroplating can also have a substantially uniform diameter. This means that visible lumpiness or pullaway of the coating from the substrate is at least substantially eliminated, or is (at a minimum) better than those characteristics of prior carbon formulations. The electroplating process which follows the carbon treatment can be carried out more quickly.

~odes For Carryinq Out Th- Invention In its first aspect, the present invention is directed to each of the conductive dispersions described in the Description of the Invention ~ection above. A detailed description of the ingredients of the dispersions follows.

~arbon one component of the compositions of the present invention is carbon, in the form of carbon black, graphite, or combinations of the two.
Graphite is different from carbon black. Carbon black particles are amorphous. In contrast, graphite particles are highly crystalline.
Typically, carbon black particles are impure, frequently being associated with 1-10% volatiles.
See U.S. Patent 4,619,741 at col. 7, ln. 5-11. In contrast, graphite is relatively pure, particularly synthetic graphite.
The carbon may be present as from about 0.1 to 2bout 20% by weight, alternatively from about 0.5 to - about 10% by weight, alternatively from about 1% to a,bout 7% by weight, alternatively from greater than about 4% to about 6.5% by weight of the composition.
The carbon may have a mean particle size within t:he range from about 0.05 to about 50 microns, a~lternatively from about 0.3 to 1.0 microns, W094l26958 PCT~S94/05267 9~5 ~
alternatively from about 0.7 to about 1.0 microns.
From the perspective of performance and ease of dispersion, particles from the smaller end of the size range are preferred. However, the smaller particles, particularly graphite particles, are more costly. Graphite particles of suitable size can be prepared by the wet grinding or milling of raw graphite, having a particle size greater than 50 microns, to form a slurry of smaller particles.
Graphite particles of suitable size can also be formed by graphitizing already-small carbon-containing particles.
The inventors have found it unnecessary to obtain graphite having mean particle sizes substantially less than one micron, contrary to the conventional belief that extremely fine graphite is nec~cs:~ry .
If both carbon black and graphite are used, the carbon black may have a substantially smaller particle size (for example, a sub-micron average diameter) than the graphite (for example, an about one micron or greater number-average diameter). The ratio of graphite to carbon black may be at least about 1:100, or at least about 1:10, or at least about 1:3, or at least about 1:1, or at least about
3:1, or at least about 6:1, or at least about 10:1, or at least about 20:1, or at least about 50:1, or at least about 100:1, or at most about 1:100, or at most about 1:10, or at most about 1:3, or at most about 1:1, or at most about 3:1, or at most about 6:1, or at most about 10:1, or at most about 20:1, or at most about 50:1, or at most about 100:1, each ratio being a weight-weight ratio.
While not bound by any theory as to why the admixture of carbon black and graphite may be desirable, the inventors submit that graphite and carbon black may be synergistic in the contemplated coating compositions because graphite is more WOg4/26958 PCT~S94/05267 6 ~
c:onductive but hard to grind to sub-micron size, while carbon black is normally sub-micron-sized but less conductive. The smaller carbon black particles may lodge and form low-resistance paths in the interstices between the larger graphite particles, thus reducing the interstitial electrical resistance of the coating.
The carbon black useful herein can be substantially as described in U.S. Patent No.
~,139,642. The carbon black description of that patent is hereby incorporated herein by reference in its entirety. Several commercial carbon blacks contemplated to be useful herein include CABOT
MONARCH 1300, sold by Cabot Corporation, Boston, Massachusetts; CABOT XC-72R Conductive, from the same manufacturer; ACHESON ELECTRODAG 230, sold by Acheson Colloids Co., Port Huron, Michigan; COLUM-BIAN RAVEN 3500, made by Columbian Carbon Co., New York City, New York; and other conductive carbon blacks having similar particle sizes and dispersion characteristics.
The graphite useful herein can be substantially as described in U.S. Patent No. 5,139,642. The graphite description of that patent is hereby incorporated herein by reference in its entirety. In the compositions of the present invention, the graphite may be either synthetic or naturally occurring. Accordingly, suitable commercial graphites and graphite dispersions contemplated to be useful herein include: ULTRAFINE GRA~ , sold by Showa Denko K.K., Tokyo, Japan; AQUADAGE E; MICRO
440, sold by Asbury Graphite Mills Inc., Asbury, New - Jersey; GRAPHITE 850, also sold by Asbury; GRAFO
1204B, sold by Metal Lubricants Company, Harvey, v 35 Illinois; GRAPHOKOTE 90, sold by Dixon Products, Lakehurst, New Jersey; NIPPON AUP (0.7 micron), sold by Nippon Graphite Industries, Ltd., Ishiyama, W094/26958 ~ ~ 6 ~ ~ 5 PCT~S94/05267 Japan; and others having similar electrical and dispersion characteristics.
However, synthetic graphite is preferred.
Synthetic graphite is formed by heat treating (graphitizing) a carbon source at temperatures exc~e~i ng 2400C. The most conductive and most preferred graphite (electronic grade) is prepared at very high graphitization temperatures (-3000 Kelvin).
In the composition of the present invention, the conductivity of the carbon is important. When carbon is deposited on the non-conductive surface of a through hole, it is both the conductivity of the carbon particles and their uniform deposition which enable the carbon deposit, as a whole, to act as a cathode and to uniformly electroplate a conductive metal layer thereon.
While the inventors presently prefer graphite dispersions, many aspects of the present invention also improve the performance of carbon black dispersions.
Aqueous dispersions of carbon black, graphite, or both, are well known in the art and in related arts, such as lubricating compositions and con-ductive coatings for other ~U~o-ec. One skilled in this art is readily able to formulate and prepare such dispersions.

8~ n~ n~ Ag~nt Another component of some of the compositions of the present invention i6 a water soluble or dispersible binding agent for bi~;ng the carbon particles. The binding agent is believed to assist the dispersed carbon particles in adhering to the surface of the non-conductive (i.e., dielectric) substrate which is to be made conductive for elec-troplating. The binding agent ~ay be present as from about 0% to about 15% by weight, or from about W094/26958 21 612 9 0 5 PCT~S94/05267 ~.2 to about 10~ by weight, or from about 0.5% to about 6% by weight, or from about 1.5% to about 3%
by weight, of the composition for binding to the carbon particles.
The binding agent of the present invention is preferably any natural or synthetic polymer, poly-- merizable monomer, or other viscous or solid material (or precursor thereof) that is capable of both adhering to the carbon particles and of receiving an anionic dispersing agent (as described below). For example, the binding agent may be a water soluble or water dispersible material selected from the group consisting of mono- and polysac-c~arides (or, more broadly, carbohydrates) and anionic polymers. Typically, for purposes of this invention, a 2% by weight aqueous test solution of the binding agent will have a viscosity within the range of 25-800 cps at 25C, although other concen-tration~ of the binding agent and other viscosities of the complete through hole coating composition are also contemplated herein.
Monosaccharide binding agents contemplated for use herein include tetroses, pentoses, and hexoses.
Polysaccharide (which for the present purposes includes disaccharide and higher saccharide) binding agents contemplate for use herein include sucrose (from beets, sugarcane, or other sources), maltose, fructose, lactose, stachyose, maltopentose, dextrin, cellulose, corn starch, other starches, and poly-saccharide gums. Polysaccharide gums contemplated for use herein include agar, arabic, xanthan (for example, K~r~A~ industrial grade xanthan gum, available from the Kelco Div. of Merck & Co, Inc. of Rahway, New Jersey), pectin, alginate, tragacanath, dextran, and other gums. Derivative polysaccharides contemplated for use herein include cellulose acetates, cellulose nitrates, methylcellulose, and carboxymethylcellulose. Hemi-cellulose polysac-w094/269~ 7~ 9 ~ PCT~S94/05267 charides contemplated for use herein include d-gluco-d-mannans, d-galacto-d-gluco-d-mannans, and others. Anionic polymers contemplated herein include the alkylcelluloses or carboxyalkylcel-luloses, their low- and medium-viscosity alkali metal salts (e.g. sodium carboxymethylcellulose, or "CMC"), cellulose ethers, and nitrocellulose.
Examples of such anionic polymers include KLUCEL
hydroxypropylcellulose; AQUALON CMC 7L sodium carboxymethylcellulose, and NATROSOL hydroxyethyl-cellulose, which are all commercially available from Aqualon Company of Hopewell, VA; ethylcellulose, available from Hercules of Wilmington, Delaware;
METHOCEL cellulose ethers, available from Dow Chemical Co., Midland, Michigan; and nitrocellulose, which is also available from Hercules.
The acrylics contemplated herein for use as b;n~ ng agents include polymerizable monomers and polymers, for example, emulsion polymers commonly known as acrylic latices. The monomers include acrylamide, acrylonitrile, acrylic acid, methacrylic acid, glycidyl methacrylate, and others. The acrylic polymers include polymers of any one or more of the foregoing monomers; polyacrylamide polymers such as SEPARAN NP10, SEPARAN MGL, SEPARAN 870, and SEPARAN MG200 polymers; polyacrylic acid; acrylic ester polymers such as polymethyl acrylate, poly-ethyl acrylate, polypropyl acrylate, polyisopropyl acrylate, polybutyl acrylate, polyisobutyl acrylate, polypentyl acrylate, polyhexyl acrylate, polyheptyl acrylate, polyoctyl acrylate, and polyisobornyl acrylate; and other polyacrylates. Suitable acryl-ics available to the trade include NALCO 603, PURIFLOC C31, and ACRYSOL acrylics sold by Rohm and Haas Company of Philadelphia, Pennsylvania.
Other binding agents are also contemplated herein. The vinyl resins contemplated herein include polyvinyl acetates, polyvinyl ethers, and W094/26958 216 ~9 ff~ PCT~S94/05267 .

polyvinyl chlorides. The pyrrolidinone resins contemplated herein include poly(N-vinyl-2-pyrrolidinone). Representative trade materials of this kind are PVP K-60 resin, PVP/VA E335 resin, PVP/VA 1535 resin, and other resins sold by GAF
Corporation. The polyols contemplated herein include polyvinyl alcohols. The polyvinyl alcohols contemplated herein include ELVANOL 90-50, ELVANOL
H~, ELVANOL 85-80, and others.
Cationic resins and other materials contemplated for use herein as binding agents include polyethylenimine, methylaminoethyl resins, alkyltrimethylammonium chlorides, and others.
Esters of olefinic alcohols, aminoalkyl esters, esters of ether alcohols, cycloalkyl esters, and esters of halogenated alcohols are also contemplated for use as binding agents. Polyethylene oxides, such as materials available under the trade names N~R N-10, NSR N3000, and NSR 301 from Union Carbide Corp., are contemplated herein.
Still more binding agents contemplated herein include epoxy resins, cresol novolac resins, phenol novolac resins; epichlorohydrin resins; bisphenol resins; phenolic resins, such as DURITE AL-5801A
resin available from Borden Packaging and Industrial Products of Louisville, Kentucky; and natural resins and polymerizable materials such as damar, manila, rosin gum, rosin wood, rosin tall oil, and others.
A practical upper limit to the amount of binding agents used is contemplated to be that amount which materially interferes with the conductivity of the resulting conductive coatings by diluting the conductive solids in the composition after it is deposited as a film.

Dispersing Ag-nt Another component of some of the compositions of the present invention is an anionic dispersing W094/2695~ PCT~S94/05267 agent. The anionic dispersing agent has a molecular weight less than about 1000 Daltons, so it is a substantially smaller molecule than the binding agent.
The anionic dispersing agent has a hydrophobic end and a hydrophilic (anionic) end. It functions by surrounding the bound carbon particles and causing the bound particles to disperse. It is believed that the hydrophobic end of each anionic dispersing agent is attracted to the hydrophobic region of the binding agent, thereby causing the anionic end of the anionic dispersing agent to stick out into the aqueous surrounding dispersing medium.
When each bound carbon particle has sufficient dispersing agent bound to it, the sphere of anionic charges surrolln~;ng each particle causes the particles to repel one another, and thus, to disperse.
The amount of anionic dispersing agent that is contemplated in the composition of the present invention is an amount sufficient to cause the bound carbon particles to disperse in the aqueous dispersing medium. The amount of dispersing agent that is used is dependent upon the size of the carbon particle and the amount of binding agent bound thereto. As a general rule, smaller carbon particles require lesser amounts of dispersing agent than would be required to disperse larger particles.
To determine the amount of dispersing agent that is required in any particular case, one of ordinary skill in the art can begin by adding ever increasing amounts of dispersing agent to the bound carbon particles until a sufficient amount is added to cause the particles to disperse. This amount of dispersing agent is the minimum effective amount of dispersing agent. Increasing amounts of dispersing agent could be added without adversely affecting the dispersion of the carbon particles. To ensure that W094l26958 2 1 ~ PCT~S94/05267 .

the particles remain dispersed, one could add a ten percent greater amount of dispersing agent than is needed. Thus, for purposes of the present invention, the amount of anionic dispersing agent - 5 that is used in the composition of the present invention must be an amount that is effective for - dispersing the bound carbon particles. For example, the anionic dispersing agent may be present as from about 0% to about 10% by weight, alternatively from about 0.01~ to about 5% by weight, alternatively from about 0.1% to about 2% by weight of the composition.
A practical upper limit to the amount of anionic dispersing agents used is contemplated to be that amount which materially interferes with the conductivity of the resulting conductive coatings by d~luting the conductive solids in the composition after it is deposited as a film.
Suitable anionic dispersing agents include ac:rylic latices, aqueous solutions of alkali metal polyacrylates, and similar materials. Specific dispersing agents contemplated herein include ACRYSOL I-1955 and ACRYSOL I-545 dispersing agents, both of which are commercially available from the Rohm and Haas Co., Philadelphia, Pennsylvania. The ACRYSOL dispersing agents may be used alone or together, preferably together. A preferred weight ratio of ACRYSOL I-1955 to ACRYSOL I-545 is about 1:4.

Buffers The composition and method of the present invention is capable of being run over a wide pH
range. The present composition may have a pH within the range of from about 4 to about 14. An alternative pH range is from about 9 to about 11, another is from about 9.5 to about 10.5, and still another is from about 10.7 to about 11.

wo 94,26958 2 ~ ~ 2 ~ ~ 5 PCT~S94/05267 Preferably, the pH is maintained by a pH
buffer. The buffer functions by precluding or minimizing changes in pH such as may occur during the course of a run as a large number of boards are treated with the composition of the present invention. The maintenance of a constant or nearly constant pH insures the composition is reproducible from board to board. Another advantage of using a buffer system is that the normalities of one or more buffer components can be measured and adjusted to maintain proper process control.
A pH in the preferred range can be provided by a carbonate-bicarbonate buffer. The use of other pH
buffering systems, such as phosphate, acetate, borate, barbital, and the like, are well known in the art. The anions of the buffer may be associated with any suitable cation, such as an alkali metal cation, such as sodium, potassium, or lithium; or an ammonium cation.

8urfactant~
An optional component of some of the compositions of the present invention is a surfactant. One function of the surfactant is to decrease the surface tension of the aqueous dispersing medium such that the aqueous dispersing medium cont~in;ng the dispersed carbon particles is able to freely penetrate into the through holes. A
second function of the surfactant is to wet the surfaces of the polymeric and glass substrates.
This facilitates the coating of these surfaces with the carbon dispersion. The am~unt of surfactant that is used in any particular case will vary depending upon the surfactant itself. To determine the amount of surfactant that is required in any particular case, one can begin by adding about 0.1%
by weight surfactant to the composition and increasing the amount until the desired performance W094/26958 PCT~S94/05267 .

is achieved. Although additional amounts of surfactant could be added, they might not provide any additional benefit.
The diameter of the through holes is typically within the range of 0.05 mm to 5 mm. With through hole sizes within the range of 4-5 mm, a surfactant may not be n~cescA~y. However, with through hole sizes below about 4 mm, an increasing amount of surfactant is recommended with decreasing through hole sizes. The circuit boards may vary in thickness (and thus their through holes may vary in length) from that of a double-sided circuit board to a multilayer circuit board having up to twenty-four layers. Thus, when needed, the composition of the present invention should contain sufficient surfactant to allow the aqueous dispersing medium to freely carry the dispersed carbon particles through the through holes in circuit boards having through holes of various sizes.
The composition typically contains from about 0.01% to about 10% by weight, or from about 0.02% to about 3% by weight, or from about 0.05% to about 1%
by weight of the composition, of the surfactant.
Suitable surfactants for use in the present invention include TRITON X-100, sold by Rohm and Haas Co., Philadelphia, Pennsylvania; MAPHOS 56, sold by Mazer Chemicals, Inc.; TAMOL 819L-43, 850, and 960 anionic surfactants, available from Rohm and Haas Co., Philadelphia, Pennsylvania; FLUORAD~ FC-120, FC-430, FC-431, FC-129, and FC-135 anionic fluorochemical surfactant; sold by Minnesota Mining & Manufacturing Co., St. Paul, Minnesota; DARVAN NO.
1, sold by R.T. Vanderbilt Co.; ECCOWET LF, sold by Eastern Color and Chemical; PETRO ULF, sold by Petro Chemical Co. Inc.; POLYTERGENT B-SERIES surfactant, sold by Olin Corporation; and others. Cationic and other surfactants may also be used, depending upon the pH and other characteristics of the composition.

W094/26958 2 ~ ~ ii PCT~S94/05267 Other surfactants contemplated to be suitable for use herein include DM-5, M-5, and M-10 polymeric dispersants or Colloid 211, 225, and 233 surfactants, sold by Rhone-Poulenc, Cranbury, New Jersey; SURFINOL CT-136 and CT-141 surfactants, sold by Air Products and Chemicals, Inc., Allentown, Pennsylvania; GRADOL 300 and 250 and HA and HAROL D
surfactants, sold by Graden Chemicals Co. Inc., Havertown, Pennsylvania; AEROSOL NS and OT-B
surfactants, sold by American Cyanamid Co., Wayne, New Jersey; and LIGNASOL B and BD, MARASPERSE N-22, and CBOS-3 and C-21 surfactants sold by Dashowa Chemicals Inc., Greenwich, Connecticut.

Aqu~ous Disp-rsing M-~iu~
Another component of the compositions of the present invention is an aqueous dispersing medium.
The phrase, "aqueous dispersing medium," as used herein, includes any solvent that is from 80 to 100~
water wherein the balance of the material is a water soluble organic composition. Typical water soluble organic compositions include the low molecular weight alcohols, such as methanol, ethanol, and isopropanol. Additional organic molecules also include solvents such as dimethylsulfoxide, tetra-hydrofuran, and ethylene or propylene glycol.
Preferably, the aqueous dispersing medium is 100%
water. Deionized water is preferred.
The resulting composition is a carbon dispersion that is capable of depositing a uniform, low resistivity coating of carbon particles on the non-conductive surfaces of a through hole. The composition of the present invention may be used "as is," or it may be sold in concentrate form and then diluted up to tenfold (10:1), preferably up to fourfold (4:1), at the point of use. The composition may be diluted with an aqueous dispersing medium, which may include one or more of W094/26958 ~ PCT~S94/05267 a buffer, a dispersing agent, a surfactant, or other ingredients.

Fro¢ess Of Treating Through ~ol-s The present invention is also directed to a process for electroplating a conductive metal layer, - such as copper, to the surface of a non-conductive material. In particular, the process of the present invention comprises:
(a) preparing any of the liquid dispersions of carbon, as described previously, which are capable of uniformly depositing a coating of carbon on the non-conductive surfaces of a through hole;
(b) applying the liquid dispersion to the non-conductive surfaces of a through hole to form a dispersion coating thereon;
(c) separating substantially all of the aqueous dispersing medium from the carbon particles, typically by drying the dispersion, so the carbon particles are deposited on the non-conductive surface in a substantially continuous layer; and (d) electroplating a substantially continuous metal layer over the carbon particles deposited on the non-conductive surface.
Although cleaning, conditioning, fixing, rinsing and drying steps are not included above, it is within the scope of the present invention to include rinsing steps between various reagent baths to prolong the life of the subsequent reagent baths.
It is also within the scope of the present invention to include one or more drying steps, such as before an optional etching step as described in Example 13.
~leaning and conditioning steps are also nec~ssAry and conventional.
Preferably, between steps (b) and (c) of the above process, one may employ a fixing step. The W094/26958 PCT~S94/05267 ~,~G~g~ --fixing step is important in the treatment of printed circuit boards, since it makes the carbon dispersion more workable. The fixing step comprises applying a fixing solution to the dispersion coated surfaces of Step (b). The fixing solution removes excessive carbon composition deposits, crosslinks the first monolayer of carbon which is directly attached to the substrate, and thus smooths the carbon coating on the through hole surfaces by eliminating lumps and by making the coating more uniform. When the fixing step is utilized, the composition of the present invention is preferably run at a fourfold dilution.
In the fixing step, the fixing solution may be water, aliphatic or aromatic solvents, or a dilute aqueous acid. If water is used, the water must be warm (120-140F) to effect fixing, whereas the dilute acid solution is capable of fixing the bound carbon at room temperature or warmer. ~ixing is typically accomplished by a 30-60 second exposure of the carbon coating to the fixing solution. While not wishing to be bound by any theory, it is believed that the dilute acid fixer works faster or under milder conditions, particularly when sodium carboxymethylcellulose is the binder, by neutraliz-ing or crosslinking the carboxyl groups, thereby causing the dispersed and bound carbon particles to precipitate on the through hole bore.
Typical acid fixing solutions include dilute aqueous solutions containing from 0.1 - 5% by volume of an acid. Convenient acids useful herein include mineral acids, such as hydrochloric, phosphoric, nitric, or sulfuric acid. Organic carboxylic acids, such as acetic acid, citric acid, and others, may also be used. A specifically contemplated fixing solution is a dilute aqueous solution of sulfuric acid, such as an aqueous solution containing 0.1 -2% sulfuric acid by volume. Acidic fixing solutions wo 94,26958 2 1 6 2 ~ ~ 5 ~CT~S94/05267 that contain less than 0.1~ acid may require some heat to effect fixing within the typical 30 - 60 second exposure.
An acid fixing bath contemplated for use herein contains sufficient acid to provide a pH of from about 0.01-6, alternatively from about 0.1 to about
4, alternatively about 0.7, which may be provided by using from about 0.1 to about 0.5% by volume of ~oncentrated sulfuric acid in deionized water. The normality of the acid may be from 0.07N to 0.17N, alternatively from O.OlN to l.ON, alternatively from O.OOlN to 5N. The bath may be used at room temperature (for example, about 70F or 20 C.), or alternatively at from about 125 to about 135F
(from about 52 to about 57 C).
In one embodiment of the invention, this fixing step may be used with a carbon dispersion alone, without using all the adjuvants specified in the present composition inventions.
When the carbon coating process is complete, the deposited conductive coating is resistant to pullaway (which resembles a blister in the plating) and other adhesion defects, even when the most severe thermal shock tests are performed.

Print-d ~iring Bo~rds Another aspect of the invention is a printed wiring board having conductive through holes, made by applying any of the compositions described above to a printed wiring board having one or more through holes, in accordance with any of the methods described above. The printed wiring board may have more than one coating, but preferably has a single layer, provided by a one-pass coating process, which provides the through holes with adequate conductivity for electroplating. This printed wiring board is then electroplated to provide a wo 94,26958 2 ~ ~ æ 9 Q ~ PCT~S94/0~267 printed wiring board having copper clad through holes.

R-sistance Measur~ents The resistance of a printed wiring board which has been treated to make its through holes conduc-tive is measured as an indication of the amount of time which will be required to electroplate the through holes. The lower the resistance, the more rapidly electroplating can proceed. The resistance of the through holes is conventionally measured by measuring the resistance between the two metal-clad surfaces on opposite ends of the through holes.
Thus, one through hole resistance value is obtained for an entire printed wiring board before electroplating proce~
A single printed wiring board has many through holes of varying diameters. The number of through holes depends upon the size of the circuit board and the particular circuit it will carry. For example, a typical 18 inch by 24 inch (46 cm by 61 cm) board may have 3000 holes with diameters varying from about 6 mils (1.5 mm) to about 0.25 inch (6 mm).
Also, a board may have a thi~knecs of from about 1 mil (25 microns) to about 0.25 inch (6 mm.).
Multiple through holes create parallel conduct-ive paths, so the net resistance of all the through holes on the board is less than the resistance of one through hole. The more through holes there are, the lower the resistance, other things being equal.
The diameter of the through hole determines the cross-sectional area of its conductive surface, so a larger diameter through hole has a lower resistance than a smaller diameter through hole, other things being equal. The thickness of the board determines the length of each conductive through hole. The thicker the board, the longer each through hole and the higher its resistance, other things being equal.

W094l26958 2~ 9~i PCT~S94/05267 .

Finally, "other things" are not e~ual, so even if the number and dimensions of the through holes are known, the resistance of each through hole cannot be directly calculated with any accuracy.
~ifferent through holes on the same board may have different coating thicknesses, the coating is applied on an irregular bore surface, fluid circulation in a bath to the various holes is different, and so forth.
Notwithst~n~;ng these many variations, the industry commonly draws conclusions about the conductivity of the through holes from a single resistance measurement per printed wiring board.
For example, the 18 by 24 inch (46 by 61 cm) board referred to previously, coated with the preferred graphite composition according to the present invention in one pass, commonly has a resistivity of about one ohm through its through holes, which rises to about 10 ohms after microetching. The same board coated using the commercially available two-pass 8LACKHOLE carbon black process has resistivities more than ten times as great, and sometimes 50 to 70 times as great, as those of the preferred graphite composition. Thus, where the resistance of a ~rint~d ~ring board is given in this specification or in the claims, or if a resistance is given without specifying the manner of measurement, this single measurement, made prior to electroplating, is meant. Of course, if two boards have identical numbers, patterns, and sizes of through holes, the resistances of the entire boards can be directly compared to obtain useful results.
When the present invention is used to improve the through hole conductivity of an entire printed wiring board, the board has an electrical resistiv-ity of less than about 1000 ohms, optionally less than about 600 ohms, optionally less than about 400 ohms, optionally less than about 250 ohms, optional--WO 0~ a ~ PCT~S94/05267 ly less than about 80 ohms, optionally less than about 60 ohms, optionally less than about 30 ohms, optionally less than about 10 ohms, optionally less than about 2 ohms, optionally less than about 1 ohm, each measured prior to electroplating the through hole.
One can also determine the resistance of a single through hole. This can be done in at least two ways. One way is to coat the through hole of a coupon (æample of metal-clad printed wiring board material which is not intended to be used in a circuit) or an actual printed wiring board which has only a single through hole, so the resistance of the board is the same as the resistance of that through lS hole. A second way is to isolate one through hole electrically by severing the cladding which links other through holes to the through hole which is being measured for resistivity. Thus, where the resistance of a through hole is given in this specification or in the claims, the resistance of a single through hole in electrical isolation, measured before electroplating, is meant.
When the present invention is used to improve the conductivity of an individual through hole, the treated through hole has an electrical resistivity of less than about 5000 ohms, optionally less than about 1000 ohms, optionally less than about 600 ohms, optionally less than about 400 ohms, optional-ly less than about 250 ohms, optionally less than about 80 ohms, optionally less than about 60 ohms, optionally less than about 30 ohms, optionally less than about 10 ohms, each measured prior to electro-plating the through hole.

Coating Unifor~ity D-t-raination A thin, uniform coating of the carbon composi-tion on the through holes is necessary so the plat-ing which is deposited on the coating will not W094/26958 ~ ~2g ~ PCT~S94/05267 suffer from pullaway, particularly when subjected to the thermal shock of soldering.
The inventors contemplate that the coating ideally will be nearly as thin as the diameters of t:he dispersed particles of carbon, so it will form a monolayer of carbon particles. For example, a - composition containing one-micron mean diameter particles would provide a film on the order of one Dlicron thick. More particularly, the inventors contemplate a coating of from about one to about t.hree microns thick. Thinner coatings are acceptable until the coating becomes so thin that complete coverage is not obtainable.
The inventors contemplate that coatings more t:han about 3 microns thick will start to present problems. Pullaway (a place where the plating delaminates) becomes more probable in this thickness range. A region of the coating as thick as about 7 microns is contemplated to be less desirable, while a coating of about 12 microns is contemplated to be still less desirable. When part of the coating becomes as thick as roughly 7 microns, it becomes visible when a 200 power (200X magnification) microscope is used to examine the plated through hole. Thus, another definition of the appropriate coating thickness is a coating which is too thin to ~ee in a plated through hole cross-section under a 200 power microscope.
The degree of uniformity of the coating is sometimes expressed qualitatively by reporting that t:he coating in question exhibits, or is free of, lumpiness or localized areas having a thick coating of the carbon coating. Lumpiness (if present) typically is found at the entrance or exit of a through hole (i.e. at the corners of a rectangular cross-section of a cylindrical hole), and is manifested as visible (under a 50X microscope) non-uniform areas of plating projecting inwardly from -W094l26958 PCT~S94/05267 21&29~
the plane defined by the wall of the through hole bore. Expressed another way, a plated through hole bore is free of lumpiness if the plating appears to be a straight line down each side of the through hole connecting the conductive cladding at each end of the hole, when viewed in cross-section at 50x magnification.
The following examples are provided to describe specific embodiments of the invention and to demonstrate how it works. By providing those specific examples, the inventors do not limit the scope of the invention. The full scope of the invention is all the subject matter defined by the claims concluding this specification, and equiva-lents thereof.

ESAXPLE 1r ~-p~rat~on of Cl-a~-r/Conditioner C~n~ntrate 1. To a beaker capable of containing a 1 liter volume, were added approximately 400 g of distilled or deionized water (hereinafter collectively "DI water") and 60 g of TERGITOL 15-S-9 secondary alcohol polyethylene glycol ether surfactant (sold by Union Carbide Corp., New York City, New York), and the mixture was stirred for about ten minutes. Thereafter, 100 g of monoethanolamine (Union Carbide) was added and the mixture was again stirred for about ten minutes. To the mixture was then added 300 g of the cationic water soluble polymer ~T~AY 6818 (Exxon Chemical Company, Columbus, Georgia) and the mixture again was allowed to stir for approximately ten minutes.
Thereafter, to the mixture was added 50 g of the cationic polyamidoamine SANDOLEC~ CF (Sandoz Chemicals), and the mixture was allowed to stir for approximately ten minutes. To the mixture was then added 7 g of ethylene glycol and the mixture was allowed to stir for approximately ten minutes.

W094/269~8 2 1 6 2 9 ~ ~ PCT~S94/05267 Thereafter, 10 g of tetrasodiumethylenediamine-tetraacetic acid (Na4EDTA, sold as VERSENE 100 by Dow ~Chemical Company, Midland, MI), was added to the mixture, and the mixture was stirred for approximately ten minutes. Sufficient DI water was then added to bring the volume to 1 liter, and the - mixture was stirred for about 10 minutes. The resulting cleaner/conditioner concentrate was considered acceptable if it exhibited a pH of 10 +
0.4 and the specific gravity at 20/4C of 1.034 +
0.007.

ESANP~B 2 r.~vp~ration of th- ~or~ing Cl-an-r/Conditioner The working cleaner/conditioner was prepared by combining one volume of the cleaner/conditioner concentrate from Example 1 with 9 volumes of DI
¢deionized) water.

~ANP~ 3 Cl--n~ n7 and Conditioning Circuit Boards Circuit boards having through holes were immersed for 4 to 6 minutes in a tank containing the working cleaner/conditioner solution at a t:emperature within the range of 140-160F (60-71C), a normality of 0.15 to 0.20, and a pH within the range of 9.5 to 11.8. The tank for the cleaner/conditioner solution was stainless steel, and it had a stainless steel heater element.
Alternatively, a polypropylene tank could also be used.

~SAMP~ 4 r.~ ation Of A ~orking 8O1ution Of Th- Carbon Di~per~ion Colloidal graphite (19.9 wt. %) having a particle size of about 1 micron, was combined with 2.14 wt. % CMC 7L carboxymethylcellulose, 0.1% wt.

W094/26958 PCT~S94/05267 ~6 TRMOL 819 surfactant, and water, forming a dispersion. The pH of the dispersion was 8.82, the viscosity (at 2060 rpm, 77F) was 145 cps, and the film resistivity of a 1 mil (25 micron) dried coating of the dispersion was 11.8 ohms per square.
200 g of the colloidal graphite dispersion and 790 g of DI water were mixed, and the mixture was stirred for approximately 20 minutes. To the mixture was then added 6 g of potassium carbonate (powder) and the mixture was stirred for approxi-mately 15 minutes. Thereafter, 1 g of potassium bicarbonate crystals were added to the reaction mixture and it was mixed for about 15 minutes. The pH of the mixture was then measured to determine if it fell within the range of 10.7 to 11Ø For solutions having a pH above 11.0, additional potassium bicarbonate was added. For solutions having a pH below 10.7, additional potassium carbonate was added to bring it within the desired pH range of 10.7-11Ø When the solution was in the desired pH range, to it was added 0.2 g of the acrylic emulsion polymer ACRYSOL0 I-1955 and 0.8 g of the acrylic emulsion polymer ACRYSOL0 I-545 (Rohm and Haas), and the mixture was stirred for approxi-mately 10 minutes. Thereafter, 1.2 g of the anionic fluorochemical surfactant FLUORAD~ FC-120 was added to the mixture and the mixture was stirred for ap-proximately 40 minutes.
The resulting solution was considered accept-able for use if the following criteria were met:
percent solids fell within the range of 4.8 to 5.3%;
the normality fell within the range of 0.11 to 0.17;
and the pH fell within the range of 10.7 to 11Ø

W094/26g58 PCT~S94/05267 ~6'~90S

Coating Th- Through ~01~8 Of A Circuit Board ~ith Graphito Disp~rsion The preferred equipment for the working dispersion bath comprises a polyethylene, ]polypropylene, or a stainless steel 316 tank. Such a tank is outfitted with a circulating centrifugal pump that is capable of turning over the tank volume three to six times per hour.
A circuit board having through holes was ¢leaned and conditioned by immersion for about 4-6 minutes in a bath at 130F - 140F (about 54 to about 60C) cont~in;ng the working cleaner/-conditioner solution of Example 3. Thereafter, the board was rinsed for about one minute in deionized water at ambient room temperature (65F - 95F; 18C
- 35C). The rinsed board was immersed from four to six minutes in a bath containing the working graphite dispersion of Example 4 at ambient room temperature.

FYANPLB C
Comparison Of Th- R-sistanc- Of Id-~tical Pa~ols ~aving 8ynth-tic Or ~atural Graphite Unifor~ly D~po~it-d Th-r-on 1. Th- Circuit Board Panels Fourteen identical circuit board panels ("panels") were used in this comparison. Each panel was a 3 inch (76mm.) by 3 inch (76mm.) square, and each had the same number and pattern of through holes.

2. The Graphite Dispersions The graphite dispersions were prepared by dispersing the following coating-forming ingredients in a suitable amount of deionized water. The average particle sizes of the respective natural and W094/269~8 PCT~S94/05267 ~6~S
synthetic graphite dispersions were measured and found to be comparable, though not the same as the average particle sizes reported by the vendors of the materials.

~y3th-tic ~atural 11.00 g Graphite 11.00 g Graphite 8502 (Micro 440)~
0.44 g CMC 7M 0.55 g CMC 7M
0.60 g TAMOL 819 0.10 g TAMOL 819 2.00 g K2CO3 2.00 g K2CO3 1.00 g KHC03 1. 00 g KHC03 1.00 g ACRYSOL 1.00 g ACRYSOL

pH 10.66 ~H 10.5 ~ Asbury Graphite Mills Inc., Asbury, N.J.; Size reported by vendor: 0.44-0.55 microns.
2 Asbury Graphite Mills Inc., Asbury, N.J.; Size reported by vendor: 3.74 microns (mean); 2-5 micron (range).

3. Th- Procoss Both sample panels were run through the following steps:
I. Cleaner 5 min. 140F
II. Rinse 1 min. Room Temp.
III. Conditioner 5 min. Room Temp.
IV. Rinse 1 min. Room Temp.
V. Graphite Disp.5 min. Room Temp.
VI. Dry 20 min. 190F
VII. Micro Etch 50 micro Room Temp.
inches removed VIII. Rinse 1 min. Room Temp.
IX. Dry 10 min. 190F (88C) ~. R-si~tance ~-a~ur-m-nts 35The resistivity of several comparable coupons coated with each composition was measured after W094/26958 21 6 2 9 0 5 PCT~S94/05267 drying step IX. Each panel was 3 inches (76 mm.) square, with the same pattern of through holes on each .
8~theti¢ ~raDhite Natural GraPhite Micro 440 (Asbury) Graphite 850 (Asbury) (1)109 ohms (9) 3000 ohms (~)85 ohms (10) 1000 ohms (3)180 ohms (11) 1100 ohms (4)210 ohms (12) 1500 ohms Average: 146 ohms Average: 1650 ohms 8yntho~ic Graph~t- Natural Graphite #GraphoKote90 (Dixon Graphite 450 Products, Lakehurst, (Asbury) (vendor's 15 N J.) (Vendor's reported size reported size 80% >1 3.5-5.5 microns) micron)
(5) 3.7 kilohms (13) 20 kilohms
(6) 0.8 kilohms (14) 19 kilohms
(7) 4.3 kilohms (15) 59 kilohms (a) 3.9 kilohms (16) 26 kilohms Average: 3.2 kilohms Average: 31 kilohms The data in this Example demonstrates that a uniform deposit of synthetic graphite was many times more conductive than a comparable deposit of natural graphite.
E~ANPLE 7 Compari~on Of Th- Circuit Board R-si~tivity Aft-r Tr-atment By Th- Graph$t- Composition A~d n-thod Of Th- r~ nt Inv-ntion, And Aft-r Tr-atm-nt By Th-C--ho~ Blac~ CompoJition An~
n-thod Of the '7~1 Pat-nt 1. The Circuit Board Panels In Example 7, identical circuit board panels ("panels") were compared. The compared panels were of the multilayer type and of the double-sided type.
Each panel was 3 inches (76 mm.) square. Each type -o 5 PCT~S94/05267 , of panel had the same number and pattern of through holes. The through hole diameters of each type of panel were 0.15 - 1.0 mm. Each multilayer panel had four layers of copper film.

2. Th- C~rbon Black r~c~
The carbon black composition and process that was used in this comparison is commercially available under the trade name BLACKHOLE from MacDermid Incorporated, Waterbury, Connecticut.
According to the manufacturer, the BLACKHOLE carbon black process requires a double pass through the process to obtain good results. The cleaners and conditions that were used in the carbon black process were those recommended by the manufacturer, i.e., BLACK HOLE CLEANER II and BLACK HOLE CONDI-TIONER.
Three variations of the carbon black technology are presented as Runs 1, 2, and 3 below. In the process of Run 1, duplicate multilayer and double-sided panels were subjected to the following sequence of steps:

Carbon Bla~k ~roc-ss a) Cleaner/Conditioner 5 minutes 135F
(2.5% v/v) (57C) b) Rinse 1 minute Room Temp.
c) Conditioner (2.5%) 5 minutes Room Temp.
d) Rinse 1 minute Room Temp.
e) Carbon Black 5 minutes Room Temp.
Dispersion (BLACKHOLE) f) oven Dry 20 minutes 190F
(88C) g) Carbon Black 5 minutes Room Temp.
Dispersion (BLACKHOLE) h) Oven Dry 5 minutes 190F
(88C) wo 94,26958 ~ g 0 5 PCT~S94/05267 .

The resistances of the first set of panels were measured between comparable points after Step (f) of the process of Run 1, representing a single pass.

Resi~tanc- (Run 1) After 8t-p (f) of Run 1 Panel R-si~tance (1) Multilayer 3.6 kilohms (2) Multilayer 3.7 kilohms (3) Multilayer 1.2 kilohms (4) Multilayer 1.3 kilohms (S) Double-sided 1.9 kilohms (6) Double-sided 2.1 kilohms (7) Double-sided 1.2 kilohms
(8) Double-sided 1.4 kilohms The resistances of a second set of panels were measured after Steps (f) (representing a single pass) and (h) (representing a double pass) of Run 1.
These resistivities after the single pass and double pass stages of Run 1 are compared below.

Comparativ- R-sistanc- Of Run 1 R-~i~tanc~ Re~i~tance After 8ingl- Pa~s After Double Pass ~ultilayer Pan-ls:
(1) 5 kilohms (1) 2.4 kilohms (2) 6 kilohms (2) 2.2 kilohms Doubl--sid-d P~18:
(3) 7 kilohms (3) 2.0 kilohms (4) 6 kilohms (4) 1.9 kilohms Run 2 is identical to Run 1 except that a conditioning step (Step (g)) and a rinse step (Step (h)) were added below before the second application of the carbon black dispersion. The process of Run 2 was as follows:

a) Cleaner/Conditioner 5 minutes 135F
(2.5%) (57C) b) Rinse 1 minute Room Temp.

W094/26958 PCT~S94/05267 ~162~
c) Conditioner (2.5%) 5 minutes Room Temp.
d) Rinse 1 minute Room Temp.
e) Carbon Black 5 minutes Room Temp.
Dispersion (BLACKHOLE) f) Oven 20 minutes 190F
(88C) g) Conditioner (2.5%) 5 minutes Room Temp.
h) Rinse 1 minute Room Temp.
i) Carbon Black 5 minutes Room Temp.
Dispersion (BLACKHOLE) j) Oven 20 minutes 190F
(88C) Comparativo R~istancQ Aftar Single Pass ~nd Doubl~ P~ss of Run 2 Panel R-sistance After 8~ngle After Doubl-P~s P~s Multilayer (1) 5.5 kilohms (1) 3.3 kilohms Multilayer (2) 6.4 kilohms (2) 3.9 kilohms Double-sided (3) 6.9 kilohms (3) 1.5 kilohms Double-sided (4) 4.5 kilohms (4) 1.8 kilohms Run 3 employed Steps (a) through (f) of Run 1 and added a conventional microetching step (Step (g)). The micro-etching step removed 50 micro inches (1.27 microns) of copper. Thereafter, Steps (a) through (h) of Run 1 were repeated as Steps (h) through (m) of Run 3. The process of Run 3 was as follows:

a) Cleaner/Conditioner 5 minutes 135F
(2.5%) (57C) b) Rinse 1 minute Room Temp.
c) Conditioner (2.5%) 5 minutes Room Temp.
d) Rinse 1 minute Room Temp.
e) BLACKHOLE 5 minutes Room Temp.
f) Oven 20 minutes 190F (88C) g) Microetch W094/269~8 21 B 2 9 P~ PCT~S94/05267 After microetch, the boards were processed through the same line again:
h) Cleaner/Conditioner 5 minutes 135F
(2.5%) (57C) i) Rinse 1 minute Room Temp.
j) Conditioner (2.5%) 5 minutes Room Temp.
k) Rinse 1 minute Room Temp.
1) BLACKHOLE 5 minutes Room Temp.
m) Oven 20 minutes 190F (88C) Comparative Resistanc- Aft-r 8t-ps (f) ~single pa88), (g) (microetch), and (~) (double pas8) of Run 3 Panel Resistance After After ~$ngl- Double ~ass Pass (1) Multilayer 5.5 Kn 3.2 Kn (2) Multilayer 6.4 Kn 3.9 Kn (3) Double-sided 6.9 Kn 1 . 1 Kn (4) Double-sided 4.5 Kn 1 . 7 Kn 3. The Graphite Disp~rsion Of The Present Invention In each of Runs 4-7, panels of identical size and configuration, as used above, were subject to the same preparative steps (Steps (a)-(d)) described above. However, instead of them being immersed in a carbon black dispersion, the four panels of each of Runs 4-7 were immersed in the graphite dispersion of Example 8.
The process of Runs 4-7 comprised the following steps:
a) Cleaner/Conditioner 5 minutes 140F
(2.5%) (60 C) b) Rinse1 minute Room Temp.
c) Conditioner (2.5%) 5 minutes Room Temp.
d) Rinse1 minutes Room Temp.
e) Graphite Dispersion 5 minutes Room Temp.

~ 5 PCT~S94/05267 f) Oven Dry 20 minutes 190F
(88C) Resist~nce Xea8urod Aft-r 8ingl- P~ss Pa~l Re~istance RUN 4 (1) Multilayer 60 ohms (2) Multilayer 80 ohms (3) Double-sided 27 ohms (4) Double-sided 42 ohms RUN 5 (1) Multilayer 52 ohms (2) Multilayer 73 ohms (3) Double-sided 53 ohms (4) Double-sided 93 ohms RUN 6 (1) Double-sided 60 ohms (2) Double-sided 172 ohms (3) Double-sided 71 ohms (4) Double-sided 126 ohms RUN 7 (1) ~ultilayer 89 ohms (2) Double-sided 95 ohms (3) Multilayer 89 ohms (4) Double-sided 23 ohms Doubl- Pass (GraphitQ) To test the effect of a double pass through the graphite dispersion, a pair of multilayer panels were subjected to the process of Steps (a) through5 (f) and their respective resistances measured:
R-8i8t~nc- Aft~r Th- Fir8t Pass (1) Multilayer 24 ohms (2) Multilayer 30 ohms Thereafter, multilayer panels were again immersed in the graphite dispersion (Step (e)) and then dried (Step (f)) and their respective resistances were again measured:
R-si8tancQ Aft-r Th- ~ Pa8s (1) Multilayer 8 ohms (2) Multilayer 8 ohms wo 94~26gs8 ~ I G ~ g 0 5 PCT~S94/05~67 In another series of runs, a second pair of multilayer panels were subjected to two passes through the process of Steps (a) through (f) and their resistance were measured after Step (f) of each pass:
Resistance After First Pa~s (3) Multilayer 32 ohms (4) Multilayer 34 ohms R~sist~nc~ Aft-r 8~cond P~ss (3) Multilayer 13 ohms (4) Multilayer 11 ohms The data in this Example establishes that the graphite compositions of the present invention, when used in the process of the present invention, produced through hole deposits of graphite that had substantially higher conductivities (lower resistivities) than the through hole deposits of carbon black produced by the composition and methods of the '741 patent. Examination of cross-sections of these through holes also revealed that the graphite composition provided no pullaway and improved adhesion compared to carbon black compositions.

For use in Examples 9-11 herein, the following cleaner/conditioner, graphite composition, and fixer solutions were prepared.

~orkinq Cleaner/Con~it~on~r A working cleaner/conditioner solution was prepared by diluting one volume of the cleaner/conditioner concentrate sold commercially as SHADOW cleaner/conditioner 1 by Electrochemicals, Inc., Youngstown, Ohio with nine volumes of DI
water. In practice, the working cleaner/conditioner W094/26958 PCT~S94/05267 2~.~2~Q~ ~
was maintained within the range of 140 - 160F (60 -71C).

Gr~phite Composition:
Using the method of Example 4, the following components were mixed together and the pH adjusted to 10.5:
2 63 g graphite 5829 ml DI water 36 g potassium carbonate 28 g sodium carboxymethylcellulose 6 g potassium bicarbonate 1.2 g ACRYSOL I-1955 4.8 g ACRYSOL I--545 7. 4 g FLUORAD FC-120 1.85 g TAMOL 819 Fixer Bath:
Sixteen ml. of concentrated sulfuric acid were added to a sufficient volume of DI water to avoid splattering and then diluted to 4 liters. In practice, the diluted sulfuric acid solution is placed in a fixer bath and heated between 120 F
140F (49 - 60C). The graphite composition of the present invention was fixed by immersing the graphite coated circuit board or dielectric in the 25 bath for a time between thirty seconds and one minute.

E~AMPL~ 9 A desmeared 3 inch (76 mm.) square four layer circuit board (Sample 1) and a 2 inch (51 mm.) square four layer circuit board (Sample 2) were treated with the working cleaner and conditioner of Example 8, rinsed with DI water for about 15-20 seconds, and then treated with the graphite composition of Example 8. The resistivity of the dried boards was as follows:

wo 94,26958 ~ PCT~S94/0~267 Sample 1: 10 ohms Sample 1 (after etching) 38.1 ohms Sample 2 19 ohms ESANP~E 10 Effect Of Dilution On The - Composition And Method Of the Present Invention A composition with the following ingredients is prepared according to the method of Example 4:

10Parts By Weiqht Component 263 graphite 1029 water 36 potassium carbonate 28 sodium carboxymethylcellulose 6 potassium bicarbonate 1.2 ACRYSOL I-1955 4.8 ACRYSOL I-545 7.4 FLUORAD FC-120 In this Example, three concentrations of the ~raphite composition are tested on both 2" x 2"
double-sided ("DS") and multi-layer ("ML") coupons.
The concentrations tested are "as is," at a two-to-one (2:1) dilution by volume and at an eight-to-one (8:1) dilution by volume.

LINE ~A~E~P FOR GRAr~.~ ppOÇRRR
1) Working Cleaner/Conditioner from Example 8, 5 minutes, at 149F (65C).
2) Rinse -- DI water, 15-20 seconds.
3) Graphite composition ("as is," 2:1, or 8:1), 5 minutes, at 75F (24C).
4) Fixer as per Example 8, when used below.
5) Dry a) blow dry 1 - 2 minutes.

W094/26958 ~ PCT~S94/05267 b) oven dry 15 minutes, at 180F (82OC).

RES~L~S
Measurea Re~ist- Typic~l result~
ivity (predicted and Coupon (ohms1 observed) "As is" ML, with 1.1 Small holes clogged, fixer surface l~mps; poor result "As is" DS, with 1.2 Small holes clogged, fixer surface lumps; poor result 2:1 ML, with fixer6.5 100% surface coverage; excellent result 8:1 ML, with fixer336 90% surface coverage;
good result 8:1 DS, with fixer49 90% surface coverage;
good result "As is" ML, no 1.1 Small and large holes fixer clogged, no surface lumps; poor result "As is" DS, no 0.8 Small and large holes fixer clogged, no surface lumps; poor result 8.1 ML, no fixer 7.1 100% surface coverage, but non-uniform coating; poor result 8.1 DS, no fixer 7.5 100% surface coverage, but non-uniform coating; poor result The date for Examples 10 and 11 shows that the "as-is" composition used here is apparently too concentrated and forms an undesirably thick coating, with or without a fixer. The 2:1 dilution with a fixer provides excellent results -- the resistance is low, and 100% surface coverage is obtained (typically providing an excellent, uniform coating of desirable thickness). The 8:1 dilution was found (under the conditions of this test) to provide undesirably low surface coverage (90%) and high SUBSTITUTE SHEET (RULE 26) W094/26958 21 6 2 9 ~ 5 PCT~S94/05267 resistivity if a fixer was used. The 8:1 dilution without a fixer would typically provide an undesirably non-uniform coating.

Effect Of Dilution Of ~he Graphite Composition And Etch on Resistivity Pre Etch ResistivityPost Etch Coupon ~From Example 10)Resistivity '~As is" ML, 1.1 ohms 508 ohms fixer '~As is" ML, 1.1 ohms 223 ohms no fixer 2:1 ML, 6.5 ohms156 ohms fixer 8:1 ML, 336 ohms>4,600 ohms fixer 8:1 ML, 7.1 ohms417 ohms no fixer Effect of Dilution on Coverage ~s Determined by Bac~ Light Testing The composition of Example 10 was further diluted and tested as in Example 10 for surface coverage. No fixer was used in this experiment.
The resulting data is shown in the table below.

Coupon % Coverage 8:1 ML, no fixer 90-95%
14:1 ML, no fixer60-70%
30:1 ML, no fixer40-60%
70:1 ML, no fixer0-20%
150:1 ML, no fixer0.5%

Sl lBsTl~uTE SHEEr (Rll~E 26) W094/26958 PCT~S94/05267 2~ G~
This data shows that coverage is reduced as the graphite composition is diluted. A 30:1 or less qilution was shown to be usable, while a 150:1 dilution was shown to be unusable for a single pass process, in this instance. It is contemplated that all the tested dilutions could be made to provide acceptable results by using a multiple pass process.

~Sf f ct Of pII Of Th- Graphite Disp-rsion's Ability To Act As A
Conductiv- 8urf ~ce For El-ctroplating A stock bath of the graphite dispersion of the present invention was prepared as described herein and its pH was found to be 10.47. This sample was run as the control. Two aliquots of the dispersion had their pH's adjusted to 5.18 and 13.3 respectively. Three identical panels, namely panel #1 (pH 10.47), panel #2 (pH 5.18), and panel #3 (pH
13.3), were subjected to the following process which differed for each panel only in the indicated pH of the dispersion.
1) Cleaner/Conditioner 162F (72C), 5 minutes 2) Water rinse Room Temp.(RT), 2 minutes 25 3) Graphite Dispersion RT, 5 minutes Bath 4) Fixer 120F (49C), 45 seconds 5) Dry Blow Dry 6) Etch 30 micro inches (0.76 microns) of copper removed 7) Preplate Clean Circlean S, 120F
(49C), 30 seconds 8) Rinse 30 seconds
9) Etch sodium 1 min. 15-20 micro persulfate inches (0.38 to 0.5 microns) removed
10) Rinse 1 minute
11) Electroplate 5 minutes, 15 amp/3 panels W094/26958 ~ 6 ~ g O ~ PCT~S94/05267 All three panels initiated at an equal time (1 minute). After five minutes, the coverage was the same on all panels and no voids, blisters or lumps were observed under an 8X eye loupe.
The resistivities of the three panels were measured at various stages during the process of Example 13. The three panels based upon the pH of the graphite dispersion, are identified as #1 (control, pH 10.47), panel #2 (pH 5.18), and panel #3 (pH 13.3):
R~sistivity B~for- Et¢h ~8t-p 6) 1. 21 ohms 2. 36 ohms 3. 35.6 ohms Resistivity Aft-r Etch ~8t-p 6) 1. 76 ohms 2. 66 ohms 3. 110 ohms Resistivity Aft-r Ch-m Cl-an ~8tep 7) 1. 218 ohms 2. 113 ohms 3. 182 ohms ESA~PLE~ 14-23 Additional Formulation~ Of Graphit- Dispersion The graphite dispersions having the ingredients set forth in the Example 14-23 Tables are prepared.
In the tables, all weights are weights of solids, and carbon composition weights are weights of dry carbon. Each dispersion is prepared and used in the same manner as the previously described formulations for making the walls of through holes conductive.
In each case, the walls are made more conductive, 1:hereby enabling the walls to be electroplated.

W094/26958 PCT~S94/05267 ~ 9 ESANP~E 24 Preparation of Carbon Black Dispersion Colloidal carbon black having an average particle diameter of about 1 micron was combined with deionized water and an organic dispersing agent, forming a dispersion having a viscosity of about 800 cps, a pH of 9.6, and a solids content of 25%. 100 ml of the colloidal graphite dispersion and 400 ml. of DI water were stirred to make a working bath.

BSAMPL~ 25 ~ sp-ration of Carbon Blac~ Dispersion To 500 ml. of the dispersion of Example 24 were added 3 g potassium carbonate, 1 g potassium bicarbonate, 0.1 g. ACRYSOL I-1955 binding agent, 0.4 g. of ACRYSOL I-545 binding agent, and 0.2 g. of FLUORAD FC-120 surfactant.

~SAMP~E 26 r sp~-ation of Carbon Black Dispersion To 500 ml. of the dispersion of Example 24 were added 3 g potassium carbonate, 1 g potassium bicarbonate, 0.2 g. ACRYSOL I-1955 binding agent, 0.8 g. of ACRYSOL I-545 binding agent, and 0.2 g. of FLUORAD FC-120 surfactant.

E~ANPL~ 27 r~ atiOn of Car~on Bl~ck D~spersion Colloidal carbon black having an average particle diameter of about 1 micron was combined with deionized water and an organic dispersing agent, forming 100 ml. of a dispersion having a viscosity of about 800 cps, a pH of 9.6, and a solids content of 25~. Separately, 2 g of sodium carboxymethylcellulose and 400 ml. of DI water were mixed using high speed mixing. The carbon black and WOg4/26958 21 6 2 9 0 5 PCT~S94/05267 carboxymethylcellulose dispersions were mixed to make a working bath.

r~p~r~tion of Carbon Blac~ Disp-r~ion To 500 ml. of the dispersion of Example 27 were aldded 3g. of potassium czrbonate and lg. of potassium bicarbonate, resulting in a pH of 10.9.

Preparation of Carbon Blac~ Dispersion To 500 ml of the dispersion of Example 28 were added 0.2g ACRYSOL I-1955 and 0.8g. ACRYSOL I-545 binding agents.

r.-p~ration of Carbon Black Disp-rsion To 500 ml of the dispersion of Example 28 were added 0.4 g. ACRYSOL 8-1955 and 1.6 g. of ACRYSOL I-545 binding agents.

E~ANPLB 31 P.~;- ation of Carbon Black Di~p-r~ion 1.5 % by volume COLUMBIAN RAVEN 350 carbon black, 1.0% by volume MAPHOS 56 surfactant, and 0.6%
by volume potassium hydroxide were added in that order to enough DI water to make up 1 liter, with high speed mixing. The pH of the composition was 13.7.

~reparation of Carbon Black Di~p-rsion To one liter of the dispersion of Example 31 were added 2.5 g. of sodium carboxymethylcellulose.

W094l26958 PCT~S94/05267 2~62~E~AMPL2 33 Preparation of Carkon 81ac~ DispQr~ion To one liter of the dispersion of Example 32 were added 0.1 g. ACRYSOL I-1955 binding agent and 50.4 g. of ACRYSOL I-545 binding agent.

~YANP~ 34 r.~~rat~on of Carbon Black Disp-rsion To one liter of the dispersion of Example 31 were added 0.4 g. ACRYSOL I-1955 binding agent and 100.4 g. of ACRYSOL I-545 binding agent.

Prep~ration of Carbon Blac~ Dispersion A commercially available BLACKHOLE carbon black dispersion is diluted with DI water to 2.5% solids.

15E~AMPL~ 36 Preparation of C~rbon Blac~ Dispersions To 500 ml of a commercially available BLACKHOLE
carbon black dispersion are added 0.1 g. ACRYSOL I-1955 binding agent, 0.4 g. of ACRYSOL I-545 binding 20agent, and enough DI water to dilute the dispersion to 2.5% solids, forming a first dispersion.
Second, third, and fourth dispersions are made, each having the same active ingredients as the first, but respectively prepared with less water to 25provide 5% solids, 7.5% solids, and 10% solids.
Additional dispersions are made like the first four, but additionally containing 1.25 g of sodium carboxymethylcellulose per 500 ml. of BLACKHOLE
dispersion.
30Additional dispersions are made by combining 1.25 g. of sodium carboxymethylcellulose with 500 ml. of BLACKHOLE dispersion and diluting the same to 2.5%, 5%, 7.5%, and 10% solids in separate trials.
These BLACKHOLE dispersions with additives 35provide conductive through hole coatings with-W094/269~8 PCT~S94/05267 2i62~05 improved adhesion and/or lower resistivity than BLACKHOLE dispersions as sold commercially.

EYAMP~E 37 ~F r~tion of ~28O4 FiYer A solution of 4 ml concentrated sulfuric acid per liter of DI water was prepared.

Preparation of Cl-an-r/Conditioner 10 g of monoethanolamine, 15 g. of NEODOL 91-8 surfactant, 2 g. of SANDOLEC CF cationic poly-amidoamine, and 1 g. of ethylene glycol were mixed with enough DI water to make up one liter. This formulation is a combination of the cleaning and c:onditioning lngredients disclosed in U.S. Patent No. 5,139,642, col. 6, ln. 52-63 and col. 16, ln.
~4-28.

E~AHPLE 39 r.~ ration of Condit~oner 10 g of monoethanolamine and 5 g. of SANDOLEC
CF cationic polyamidoamine were mixed with enough DI
water to make up one liter. This formulation is a c:ombination of the ingredients of the conditioner clisclosed at col. 16, ln. 23-28 of U.S. Patent No.
5,139,642.

First Line M-~u~ For Carbon Black Process The carbon black compositions of Examples 24, 25, and 27-30 were used in a dip process in the following order, under the indicated conditions, to improve the conductivity of through holes on double-5 ided coupons.

WOg4/26958 PCT~S94/05267 1) SHADOW cleaner/conditioner 1, available from Electrochemicals, Inc., Youngstown, Ohio, 5 minutes, at 140F (60 C).
2) Rinse -- water, 1 minute at room temperature.
3) Carbon black composition, 5 minutes, at room temperature.
4) Drip time, 1 minute at room temperature.
5) Fixer (if any), 45 seconds at 135F
(57C).
6) Dry (ominates at 190F (88C).
7) sodium persulfate microetch (10% in water, 80F., 27C), 30 seconds.
8) Rinse, 20 seconds at room temperature.
g) Dry.

~SA~PLE 41 8 ~ Xakeup For Carbon Bl-c~ Proce~s ~he compositions of Examples 31, 32, and 34 were used in a dip process in the following order, under the indicated conditions, to improve the conductivity of through holes on double-sided coupons.
1) Working Cleaner/Conditioner from Example 38, 5 minutes, at 130F (54C).
2) Rinse -- DI water, 2 minutes at room temperature.
3) Conditioner from Example 39, 4 minutes, at room temperature.
4) Rinse -- same as step 2.
5) Carbon black composition, 4 minutes at room temperature.
6) Fixer (if used).
6) Dry.
7) sodium persulfate microetch, (10% in water, 80F, 27C.) 30 seconds.
8) Rinse, 20 seconds at room temperature.

W094/26958 PCT~S94/05267 ~1 62~ ~5 Third Lin- ~akeup For Carbon Blac~ Proce~ ~Double P~s8) The compositions of Examples 31, 32, 33, and 34 were used in a dip process in the following order, under the indicated conditions, to improve the c:onductivity of through holes on double-sided coupons.
1) Working Cleaner/Conditioner from Example 38, 5 minutes, at 130F (54C).
2) Rinse, water, 2 minutes at room temperature.
3) Conditioner from Example 39, 4 minutes, at room temperature.
4) Rinse -- same as step 2.
S) Carbon black composition, 4 minutes at room temperature.
6) Dry.
7) Carbon black composition, 4 minutes at room temperature.
8) Dry.

EYANPLB ~3 First Lin- ~ ~y For El-ctroplating In Examples 45-60, coupons were electroplated conventionally by sequentially dipping them in the baths and under the conditions described below.
1) Acid cleaner.
2) Rinse.
3) Microetch, sodium persulfate.
4) Rinse.
5) 10% concentrated sulfuric acid (aqueous).
6) copper bath (45 minutes, 30 amperes per square foot, 2.8 amperes per square meter current, plating to 1 mil (25 micron) thickness.
7) Rinse, DI water.
8) Dry in air.

W094/26958 PCT~S94/05267 9) Expose to Thermal shock.
10) cross-section for testing.

The necess~y chemicals and more details about plating conditions and test methods suitable for plating copper on a circuit board are commercially available from Electrochemicals, Inc., Youngstown, Ohio.

E~ANPLE8 44-59 Through ~ol- Coating and El-ctroplating Processes The carbon black compositions, process chemi-cals, and protocols of Examples 24-43 were used to coat 2 inch (51 mm. x 2 inch (51 mm.) double-sided ("DS") coupons including 20 mil (0.5mm) diameter, 0.6 inch (15 mm.) through holes, using a dip pro-cess. The resistivities of the coatings were mea-sured before and after microetching. Where indicat-ed, the coupons were then conventionally electro-plated as printed wiring boards would be processed, the through holes were sectioned by cutting the boards, and the plated through holes were evaluated for lumpiness, pullaway, and voids under microscopic examination.
The compositions, details of the coating process, resistivities, and plating results are summarized in the table for Examples 44-59 below.
Several results are indicated by this experimental work.
First, the carbon black dispersion modified with MAPHOS 56 surfactant and potassium hydroxide, used in Examples 50-56 and prepared in Examples 31-33, provided high resistivity (exc~e~;ng 1 kilohm) to the treated through holes, even before microetching. Without additional ingredients tas tested in Examples 50, 51, and 56), the use of the carbon black/MAPHOS 56/KOH formulation of Example 31 resulted in pullaway, lumpiness, or voids. With W094/26958 2 ~ 6 2 ~ 0~ PCT~S94/05267 additives according to the present invention, as in Example 55 (using the formulation of Example 33), this carbon black/MAPHOS 56/KOH formulation can provide very good plating results, however.
Second, compositions which do not contain sodium carboxymethylcellulose can provide good performance, too. The carbon black/carbonates/ACRY-SOL/FLUORAD system of Example 45 gave the best results in these tests.
Third, if an H2SO4 fixer was used, the carbon black dispersion of Example 24 alone gave very good results and low resistivity (Example 44). Nonethe-less, the carbon black dispersion performance (in particular, adhesion, resistivity, or both) can be further improved by adding the carbonate, ACRYSOL, and FLUORAD ingredients (Example 47) or sodium carboxymethylcellulose (Examples 46-47).

EXAMP~B 60 Carbon Black/Graphite Mi~Lu~el The graphite experiments of Examples 4-23 are repeated, substituting an equal weight of the carbon black of Example 24 for 10~ by weight of the graphite of the respective examples 4-23. The results demonstrate the utility of each composition for coating through holes to lower their resistivity, enabling them to be electroplated.

ESAMP~E C1 Carbon Black/Graphit- ~ixtur~s The carbon black experiments of Examples 24-59 are repeated, substituting an equal weight of the graphite of Example 8 for 90% by weight of the carbon black of the respective examples 24-59. The results demonstrate the utility of each composition for coating through holes to lower their resistivity, enabling them to be electroplated. The W~ S PCT~S94/05267 electroplated through holes pass a solder shock test.

WO 94/26958 2 1 ~ ~ 9 ~ 5 PCT/US94/05267 Example (By Weight) Inqredient 14 15 16 17 SHOWA DENKO
ULTRAFINE 5.00 5.50 - -5.45 AQUADAGE E - - 4.50 Na Carboxymeth-ylcellulose 0.20 0.39 0.25 K2CO3 1.007 1.00 KHCO3 0.57 0.50 TRITON X-100 -- -- 0.38 MAPHOS 56 0.40 0.25 fumed silica - - - 0.57 2-ethylhexanol - - - 0.03 ANTIFOAM A trace Deionized water92.90 92.31 93.80 94.52 Example (B~r Weiqht) Inqredient 18 19 20 AQUADAGE E 2 . 00 GRAPHITE 850 -- 3.00 GRAFO 1204B - -- 4.40 GRAPHOKOTE 90 - -- 1.25 ACRYSOL I--545 - -- 0.03 ACRYSOL I-1955 - 0.50 0.01 Na Carboxymethylcellulose - 0.20 0.39 K2CO3 1.00 1.00 1.00 KHCO3 0.50 1.00 1.00 FLUORAD FC-120 - 0.40 0.25 - 2-ethylhexanol 0.03 ANTIFOAM A trace Deionized water 96.47 93.90 91.67 W094/26958 PCT~S94/05267 X~29~ ~

Example (By Wei~ht) In~redient 21 22 23 GRAFO 1204B 4.25 - -GRAPHOKOTE 90 - 2.00 GRAPHITE 450 - - 2.75 ACRYSOL I-545 0.08 - .04 ACRYSOL I-1955 0.01 Na Carboxymethylcellulose 0.5 K2CO3 0.6 KHCO3 0.1 TRITON X-100 - 0.38 0.38 MAPHOS 56 0.25 FLUORAD FC-120 0.1 fumed silica - 0.57 0.01 Al Silicate - - 0.56 2-ethylhexanol - 0.03 .02 Deionized water 94.0797.02 96.24 W094/26958 PCT~S94/05267 2~9-Q~

Additions Details Resistivity Qualita-to Carbon of Before/After tive Black Coating Microetch Plating Ex. DisPersion Process rOhms) Results.
44 None (Ex. Dip; 18 ohms Very Good 24) Single before Pass 68 ohms (Ex. after 4o);

Fixer (Ex. 37) 45 K2C03 Dip; 30 ohms Very Good KHCO3 Single before (better ACRYSOL Pass 43 ohms adhesion FLUORAD (Ex. after than (Ex. 25) 40); Ex. 44) Fixer (Ex. 37) 46 CMC Dip; 16 ohms Slight (Ex. 27) Single before Pullaway Pass 52 ohms (Ex. after 4o);

Fixer (Ex. 37) 47 CMC Dip; 23 ohms Good; No K2Co3 Single before Pullaway KHC03 Pass 60 ohms (Ex. 28) (Ex. after 4o);

Fixer (Ex. 37) 48 CMC Dip; 19 ohms Good; No K2CO3 Single before Pullaway KHCO3 Pass 72 ohms ACRYSOL (Ex. after (Ex. 29) 40);

Fixer (Ex. 37) SUBSTITUTE SHEET (RULE 26) W094/26958 PCT~S94/05267 2 ~ 6 Additions Details Resistivity Qualita-to Carbon of Before/After tive Black Coating Microetch Plating Ex. Dis~ersion Process (Ohms) Results 49 CMC Dip; 32 ohms Good; No K2CO3 Single before Pullaway KHCO3 Pass 93 ohms ACRYSOL (Ex. after (Ex. 30) 40);

Fixer (Ex. 37) 50 MAPHOS 56 Dip; 7000 ohms Voids KOH Single before (Ex. 31) Pass 20,000 ohms ---(Ex. after 41);

Fixer (Ex. 37) 51 MAPHOS 56 Dip 1600 ohms Good KOH Single before Plating;
(Ex. 31) Pass 2500 ohms Pullaway (Ex. after 41); No Fixer 52 MAPHOS 56 Dip; 1800 ohms Good KOH Single before Plating;
CMC Pass 2500 ohms Pullaway (Ex. 32) (Ex. after 41);

Fixer (Ex. 37) 53 MAPHOS 56 Dip 2200 ohms Good KOH Single before Plating;
CMC Pass 7300 ohms Slight (Ex. 32) (Ex. after Pullaway 41); No Fixer 54 MAPHOS 56 Dip; 1200 ohms Slight KOH Double before Pullaway CMC Pass 3000 ohms (Ex. 32) (Ex. after 42); No Fixer SUBSTITUTE SHEET (RULE 26) W094/26958 216 2 9 0 5 PCT~S94/05267 Additions Details Resistivity Qualita-to Carbon of Before/After tive Black Coating Microetch Plating Ex. Dis~ersion Process (Ohms) Results 55 MAPHOS 56 Dip; 3000 ohms Very Good KOH Double before Plating;
CMC Pass 4300 ohms No Pullaway ACRYSOL (Ex. after (Ex. 33) 42); No Fixer 56 MAPHOS 56 Dip; 1800 ohms Good KOH Double befote Plating;
(Ex. 31) Pass 5400 ohms Pullaway;
(Ex. after Lumpiness 42); No Fixer 57 ACRYSOL Dip: 2600 ohms Voids;
(Ex. 34) Single before Pullaway Pass 500,000 ohms (Ex. after 41);

Fixer (Ex. 37) 58 ACRYSOL Dip; 5000 ohms Pullaway;
(Ex. 34) Single before Voids Pass 90,000 ohms (Ex. after 41); No Fixer 59 ACRYSOL Dip; 1700 ohms Good (Ex. 34) Double before Plating;
Pass 300,000 ohms Slight (Ex. after Pullaway;
42); No No Voids Fixer SUBSTITUTE SHEET (RULE 26)

Claims

What is claimed is:
1. A composition comprising:
A. from about 0.1 to about 20% by weight electrically conductive carbon having a mean particle size within the range from about 0.05 to about 50 microns;
B. from about 0.01 to about 10% by weight of a water dispersible binding agent for binding to said carbon particles;
C. an amount of an anionic acrylic emulsion polymer dispersing agent effective for dispersing said bound carbon particles; and D. an aqueous dispersing medium.

2. A composition comprising:
A. from about 0.1 to about 20% by weight electrically conductive carbon having a mean particle size within the range from about 0.05 to about 50 microns;
B. an amount of an anionic dispersing agent effective for dispersing said bound carbon particles;
C. at least one surfactant in an amount effective to wet the through hole of a circuit board contacted with said composition; and D. an aqueous dispersing medium.

3. A printed wiring board having a conductive through hole made by depositing a coating on a nonconductive through hole and drying said coating, said coating defined by a composition comprising from about 0.1 to about 20% by weight electrically conductive carbon having a mean particle size within the range from about 0.05 to about 50 microns; from about 0.01 to about 10% by weight of a water dispersible binding agent for binding to said carbon particles; and an aqueous dispersing medium.

4. A method for electroplating a conductive metal layer onto a substrate including a conductive metallic surface and at least one non-conductive through hole surface, said method comprising the steps of:
A. providing a liquid dispersion of electrically conductive carbon comprising from about 0.1 to about 20% by weight carbon having a mean particle size within the range from about 0.05 to about 50 microns; from about 0.01 to about 10% by weight of a water dispersible binding agent for binding to said carbon particles; and an aqueous dispersing medium;
B. applying said liquid dispersion to the conductive metallic surface and to the non-conductive through hole surface, forming a coating thereon;
C. separating substantially all of the aqueous dispersing medium from the carbon of said coating, whereby said carbon is deposited on the non-conductive through hole surface in a substantially continuous layer, and said carbon is also deposited on the conductive metallic surface;
D. after said separating step, microetching the conductive metallic surface and the non-conductive through hole surface, thereby removing substantially all of said carbon from the conductive metallic surface while leaving a substantially continuous layer of said carbon on the non-conductive through hole surface; and E. electroplating a substantially continuous metal layer over said carbon deposited on said non-conductive through hole surface.

5. A method for electroplating a conductive metal layer to the non-conductive surface of a through hole, comprising the steps of:
A. providing a liquid dispersion of electrically conductive carbon comprising from about 0.1 to about 20% by weight carbon having a mean particle size within the range from about 0.05 to about 50 microns in an aqueous dispersing medium;
B. applying said liquid dispersion to the non-conductive surfaces of said through hole, whereby said carbon particles are deposited on said non-conductive surfaces of said through hole in a substantially continuous layer to form a dispersion coating thereon;
C. after said applying step, without an intervening drying step, contacting said dispersion coating with an aqueous acid solution having a pH from about 0.01 to about 6;
D. after said contacting step, drying said dispersion coating; and E. electroplating a substantially continuous metal layer over said dispersion coating.

6. The invention of claim 5, wherein said acid is sulfuric acid.

7-13 [cancelled]

14. A composition comprising:
A. from about 0.1 to about 20% by weight electrically conductive carbon having a means particle size within the range from about 0.05 to about 50 microns;
B. from about 0.01 to about 10% by weight of a water dispersible binding agent for binding to said carbon particles;
C. an amount of an anionic dispersing agent effective for dispersing said bound carbon particles;
D. a buffer in an amount effective to provide a pH within the range of about 9-11; and E. an aqueous dispersing medium.

15. A composition consisting essentially of:
about 0.1 to about 20% by weight graphite having a mean particle size within the range from about 0.05 to about 50 microns;
about 0.01 to 10% by weight of a water soluble or dispersable binding agent for binding to the graphite particles;
an amount of an anionic dispersing agent effective for dispersing the bound graphite particles;
a pH within the range of about 9-11, wherein the pH is provided by a carbonate/bicarbonate buffer;
optionally, an amount of a surfactant effective to wet a through hole; and an aqueous dispersing medium.

16. A composition comprising:
A. from about 0.1 to about 20% by weight electrically conductive carbon having a mean particle size within the range from about 0.05 to about 50 microns;
B. from about 0.01 to about 10% by weight of a water dispersible binding agent for binding to said carbon particles;

C. an amount of an anionic fluorochemical surfactant effective to wet a through hole; and D. an aqueous dispersing medium.

17. The invention of claim 1, 3, 4, 14, 15, or 16, wherein said water dispersible binding agent is an organic binding agent.

18. The invention of claim 1, 3, 4, 14, 15, or 16, wherein said water dispersible binding agent comprises an alkali metal carboxymethylcellulose.

19. The invention of any of claims 1-14, 16, 17, or 18, wherein said carbon comprises carbon black.

20. The invention of any of claims 1-18, wherein said carbon comprises graphite.
21. The invention of any preceding claim, wherein said carbon comprises a mixture of carbon black and graphite.

22. A printed wiring board comprising at least one conductive through hole made by depositing a coating of the carbon composition of any preceding claim on at least one nonconductive through hole and drying said coating.

23. The invention of claim 22, having a resistivity of less than about 80 ohms, prior to electroplating.

24. The invention of claim 22, having a resistivity of less than about 30 ohms, prior to electroplating.
CA002162905A 1993-05-17 1994-05-12 Carbon compositions and processes for preparing a non-conductive substrate for electroplating Abandoned CA2162905A1 (en)

Applications Claiming Priority (5)

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US08/062,943 1993-05-17
US08/062,943 US5389270A (en) 1993-05-17 1993-05-17 Composition and process for preparing a non-conductive substrate for electroplating
US08/232,574 US5476580A (en) 1993-05-17 1994-05-03 Processes for preparing a non-conductive substrate for electroplating
US08/232,574 1994-05-03
PCT/US1994/005267 WO1994026958A1 (en) 1993-05-17 1994-05-12 Carbon compositions and processes for preparing a non-conductive substrate for electroplating

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111647901A (en) * 2020-05-15 2020-09-11 湖北省哈福生物化学有限公司 Black hole liquid and preparation method and use method thereof

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7168084B1 (en) 1992-12-09 2007-01-23 Sedna Patent Services, Llc Method and apparatus for targeting virtual objects
TW222313B (en) * 1993-01-29 1994-04-11 Mekku Kk Electroplating method
US6171468B1 (en) * 1993-05-17 2001-01-09 Electrochemicals Inc. Direct metallization process
US6710259B2 (en) 1993-05-17 2004-03-23 Electrochemicals, Inc. Printed wiring boards and methods for making them
US5690805A (en) 1993-05-17 1997-11-25 Electrochemicals Inc. Direct metallization process
US6303181B1 (en) 1993-05-17 2001-10-16 Electrochemicals Inc. Direct metallization process employing a cationic conditioner and a binder
JPH07268682A (en) * 1994-03-28 1995-10-17 Mec Kk Method for electroplating surface of electric nonconductor
US5536386A (en) * 1995-02-10 1996-07-16 Macdermid, Incorporated Process for preparing a non-conductive substrate for electroplating
US5611905A (en) * 1995-06-09 1997-03-18 Shipley Company, L.L.C. Electroplating process
US5618400A (en) * 1995-09-19 1997-04-08 Shipley Company, L.L.C. Electroplating process
US6231619B1 (en) * 1995-12-11 2001-05-15 Shipley Company, L.L.C. Electroplating process
DE69732521T2 (en) * 1996-01-29 2006-01-12 Electrochemicals Inc., Maple Plain ULTRASONIC USE FOR MIXING TREATMENT COMPOSITIONS FOR CONTINUOUS HOLES
US5800739A (en) * 1996-04-11 1998-09-01 Shipley Company, L.L.C. Stabilized dispersions of graphite particles
DE19731186C2 (en) * 1997-07-10 2000-08-03 Atotech Deutschland Gmbh Solids-free pretreatment solution for electrically non-conductive surfaces as well as processes for the preparation of the solution and its use
US6440331B1 (en) 1999-06-03 2002-08-27 Electrochemicals Inc. Aqueous carbon composition and method for coating a non conductive substrate
US6524758B2 (en) 1999-12-20 2003-02-25 Electrox Corporation Method of manufacture of printed wiring boards and flexible circuitry
US6375731B1 (en) 2000-01-06 2002-04-23 Electrochemicals Inc. Conditioning of through holes and glass
US6623787B2 (en) 2001-07-26 2003-09-23 Electrochemicals Inc. Method to improve the stability of dispersions of carbon
US20040001993A1 (en) * 2002-06-28 2004-01-01 Kinkelaar Mark R. Gas diffusion layer for fuel cells
KR100487860B1 (en) * 2002-08-09 2005-05-03 (주)호설암물산 Plating method
US7029529B2 (en) 2002-09-19 2006-04-18 Applied Materials, Inc. Method and apparatus for metallization of large area substrates
AU2003297783A1 (en) * 2002-12-27 2004-07-29 Foamex L.P. Gas diffusion layer containing inherently conductive polymer for fuel cells
DE10315186A1 (en) * 2003-04-03 2004-10-21 Degussa Ag Process for the anodic alkoxylation of organic compounds
EP1627444A2 (en) * 2003-05-09 2006-02-22 Foamex L.P. Gas diffusion layer having carbon particle mixture
JP4253280B2 (en) * 2003-12-05 2009-04-08 三井金属鉱業株式会社 Method for manufacturing printed wiring board
US7211204B2 (en) * 2003-12-12 2007-05-01 Electrochemicals, Inc. Additives to stop copper attack by alkaline etching agents such as ammonia and monoethanol amine (MEA)
FR2866329B1 (en) 2004-02-12 2006-06-02 Saint Gobain Vetrotex GLASS WIRES CONDUCTING ELECTRICITY AND STRUCTURES COMPRISING SUCH WIRES.
US7128820B2 (en) * 2004-03-11 2006-10-31 Hyunjung Lee Process for preparing a non-conductive substrate for electroplating
EP1577372A1 (en) * 2004-03-19 2005-09-21 Sika Technology AG Stable aqueous dispersion of particles , its use and its process of production
DE102005043542A1 (en) * 2005-09-13 2007-03-15 Graphit Kropfmühl AG Stable aqueous graphite dispersion with high solids content
CN101394712B (en) * 2007-09-21 2010-08-25 清华大学 Hole blackening solution and preparation thereof
JP5575669B2 (en) * 2008-03-13 2014-08-20 ビーエーエスエフ ソシエタス・ヨーロピア Method and dispersion for forming a metal layer on a substrate, and metallizable thermoplastic molding compound
EP2256087A1 (en) 2009-05-26 2010-12-01 Belenos Clean Power Holding AG Stable dispersions of single and multiple graphene layers in solution
US8974869B2 (en) * 2010-01-26 2015-03-10 Robert Hamilton Method for improving plating on non-conductive substrates
EP2785896B1 (en) 2011-12-02 2015-09-23 Altana AG Method for producing electrically conductive structures on non-conductive substrates and structures made in this manner
WO2015183304A1 (en) 2014-05-30 2015-12-03 Uab Rekin International Chrome-free adhesion pre-treatment for plastics
SE545567C2 (en) * 2018-04-19 2023-10-24 Provexa Ab Method for surface treatment
US10986738B2 (en) * 2018-05-08 2021-04-20 Macdermid Enthone Inc. Carbon-based direct plating process
CN111382487A (en) * 2018-12-28 2020-07-07 健鼎(湖北)电子有限公司 Method for improving thickness accuracy of circuit board coating
CN112105173B (en) * 2020-09-21 2022-01-18 广东硕成科技有限公司 Carbon nano composition for soft board hole metallization and preparation method thereof

Family Cites Families (109)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US409096A (en) * 1889-08-13 Water-proof and fire-proof material for roofing
US1037469A (en) * 1911-08-02 1912-09-03 Hyman Eli Goldberg Process of metallizing electrotype-molds.
GB493485A (en) * 1937-01-13 1938-10-10 Langbein Pfanhauser Werke Ag Process for the electrolytic production of metal coatings on objects with a non-conducting surface
US2176879A (en) * 1937-11-20 1939-10-24 Acheson Colloids Corp Method of disintegrating, dispersing and stabilizing graphite and product
US2692857A (en) * 1951-01-19 1954-10-26 Josef M Michel Noncorrosive graphite emulsions
US2833736A (en) * 1953-07-20 1958-05-06 Western Union Telegraph Co Aqueous graphite-polyvinyl alcohol ink composition
US2897409A (en) * 1954-10-06 1959-07-28 Sprague Electric Co Plating process
US3163588A (en) * 1955-02-14 1964-12-29 Technograph Printed Electronic Method of interconnecting pathway patterns of printed circuit products
US2983220A (en) * 1955-03-16 1961-05-09 Timefax Corp Electro-sensitive planographic printing plate
US2978428A (en) * 1957-08-01 1961-04-04 Surface Chemical Dev Corp Aqueous suspensions of colloidal graphite and their preparation
US3099608A (en) * 1959-12-30 1963-07-30 Ibm Method of electroplating on a dielectric base
US3152996A (en) * 1960-07-13 1964-10-13 Ashland Oil Inc Preparation of carbon black slurries
US3249559A (en) * 1963-08-26 1966-05-03 Gallas William Conductive coating
NL145095B (en) * 1965-06-15 1975-02-17 Acheson Ind Inc PROCESS FOR PREPARING A PREPARATION FOR FORMING AN ELECTRICAL CONDUCTIVE COATING LAYER, AND A PROCESS FOR FORMING THIS ELECTRICAL CONDUCTIVE COATING LAYER ON SUPPORT SURFACES AND SURFACE SURFACE WITH A SURFACE SURFACE.
US3509088A (en) * 1965-10-22 1970-04-28 Harold R Dalton Carbon black dispersions,their preparation and film products therewith
US3506482A (en) * 1967-04-25 1970-04-14 Matsushita Electric Ind Co Ltd Method of making printed circuits
US3495962A (en) * 1967-06-14 1970-02-17 Exxon Research Engineering Co Method of utilizing graphite-containing oil-in-water lubricants for glass molding
DE1704766C3 (en) * 1967-09-04 1975-02-06 Hoechst Ag, 6000 Frankfurt High strength polyester film with low electrical surface resistance
US3578577A (en) * 1967-10-11 1971-05-11 Scm Corp Surfacer treating process for blemished electrocoat substrates
US3515201A (en) * 1967-11-14 1970-06-02 Amsted Ind Inc Method of casting
BE734845A (en) * 1968-06-22 1969-12-01
FR95881E (en) 1968-07-10 1971-11-12 Acheson Ind Inc Process for the production of electrically conductive coatings, new compositions and new products thus obtained.
US3565658A (en) * 1968-07-19 1971-02-23 Phillips Petroleum Co Carbon black dispersing agent
US3639121A (en) * 1969-03-03 1972-02-01 Eastman Kodak Co Novel conducting lacquers for electrophotographic elements
GB1296855A (en) * 1969-04-18 1972-11-22
US4035265A (en) * 1969-04-18 1977-07-12 The Research Association Of British, Paint, Colour & Varnish Manufacturers Paint compositions
US3655530A (en) * 1970-06-15 1972-04-11 Mead Corp Fabrication of orifices
US3764280A (en) * 1970-11-02 1973-10-09 Gen Electric Electroconductive coatings on non conductive substrates
US3725214A (en) * 1971-02-19 1973-04-03 Du Pont Chromium plating medium for a portable plating device
US3852131A (en) * 1972-05-17 1974-12-03 Gen Electric Method of manufacturing x-ray image intensifier input phosphor screen
US3843529A (en) * 1972-08-10 1974-10-22 Dow Corning Metal working lubricant compositions
US3818412A (en) * 1973-01-10 1974-06-18 Owens Corning Fiberglass Corp Electric conductor and method
US3870987A (en) * 1973-05-29 1975-03-11 Acheson Ind Inc Ignition cable
US3865699A (en) * 1973-10-23 1975-02-11 Int Nickel Co Electrodeposition on non-conductive surfaces
US3874862A (en) * 1973-12-13 1975-04-01 Ball Brothers Res Corp Mold release composition for molten glass and method of application
US3991397A (en) * 1974-02-06 1976-11-09 Owens-Corning Fiberglas Corporation Ignition cable
GB1506464A (en) 1974-05-29 1978-04-05 Degussa Aqueous carbon black preparation
US3966581A (en) * 1974-10-16 1976-06-29 Auric Corporation Selective plating apparatus
CS182408B1 (en) 1974-12-09 1978-04-28 Bedrich Cihak Conductive sealing agents and paints
US3983042A (en) * 1975-10-24 1976-09-28 Wyman-Gordon Company Water-based forging lubricant
US4104178A (en) * 1975-10-24 1978-08-01 Wyman-Gordon Company Water-based forging lubricant
SU571435A2 (en) 1976-04-23 1977-09-05 Предприятие П/Я Р-6579 Method of preparing colloidal graphite
SU674981A1 (en) 1977-02-09 1979-07-25 Предприятие П/Я А-1837 Method of obtaining colloid-graphite preparation for coatings
US4090984A (en) * 1977-02-28 1978-05-23 Owens-Corning Fiberglas Corporation Semi-conductive coating for glass fibers
US4213870A (en) * 1977-07-29 1980-07-22 Loran T J Cleaning and lubricating compositions and method of using the same
JPS5469768A (en) * 1977-11-14 1979-06-05 Nitto Electric Ind Co Printing circuit substrate with resistance
SU745964A1 (en) 1977-12-07 1980-07-07 Ленинградский Ордена Трудового Красного Знамени Технологический Институт Им. Ленсовета Suspension for electrophoretic deposition of graphite-containing coatings
US4321295A (en) * 1977-12-23 1982-03-23 Ramu International Modified graphite and process for using same
SU768793A1 (en) 1978-02-14 1980-10-07 Всесоюзный Научно-Исследовательский Институт Технического Углерода Method of preparing aqueous carbon black dispersion
US4239794A (en) * 1978-08-04 1980-12-16 Ludlow Corporation Process of dispersing electro-conductive carbon black and web product made thereby
US4187334A (en) * 1978-11-01 1980-02-05 Labate Michael D Process and material for treating steel walls and fans in electrical precipitation installations with micron colloidal graphite particles
US4239818A (en) * 1978-11-01 1980-12-16 Labate Michael D Process and material for treating steel walls and fans in electrical precipitation installations with micron colloidal graphite particles
US4254180A (en) * 1979-01-02 1981-03-03 Medical Evaluation Devices & Instruments Corp. Thrombo-resistant non-thrombogenic objects formed from resin-graphite mixtures
SU943333A1 (en) 1979-03-19 1982-07-15 1-Й Ленинградский Ордена Трудового Красного Знамени Медицинский Институт Им.Академика И.П.Павлова Method for producing polymeric coating
US4205974A (en) * 1979-05-09 1980-06-03 Ppg Industries, Inc. Glass welding using aqueous colloidal graphite with improved wetting properties
US4316831A (en) * 1979-06-18 1982-02-23 Labate M D Material for treating coke oven doors and jambs to prevent the build up of tar thereon
US4278511A (en) * 1980-02-28 1981-07-14 General Dynamics, Pomona Division Plug plating
JPS58500408A (en) * 1981-03-03 1983-03-17 アロス・ハイドラウリフ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツンク Pasty damping media Methods of manufacturing and using the same
US4424930A (en) * 1981-06-29 1984-01-10 Cooper Industries, Inc. Carbon-based soldering and de-soldering tip and method of manufacturing same
JPS5932915B2 (en) * 1981-07-25 1984-08-11 「弐」夫 甲斐 Method for manufacturing wiring board with through holes
US4401579A (en) * 1981-09-03 1983-08-30 Acheson Industries, Inc. Water-based metal forming lubricant composition and process
JPS58132058A (en) * 1982-01-30 1983-08-06 Daikin Ind Ltd Electrically conductive paint composition
US4430166A (en) * 1982-09-27 1984-02-07 Inland Steel Company Method and apparatus for electro-treating a metal strip
FR2535344A1 (en) * 1982-10-29 1984-05-04 Thomson Csf METHOD FOR SELECTIVE DEPOSITION OF A REFRACTORY METAL LAYER ON A GRAPHITE PIECE
US4465565A (en) * 1983-03-28 1984-08-14 Ford Aerospace & Communications Corporation CdTe passivation of HgCdTe by electrochemical deposition
US4683036A (en) * 1983-06-10 1987-07-28 Kollmorgen Technologies Corporation Method for electroplating non-metallic surfaces
US4617579A (en) * 1984-04-05 1986-10-14 International Business Machines Corporation Hydrophilic protective coatings for electroerosion printing
US4581301A (en) * 1984-04-10 1986-04-08 Michaelson Henry W Additive adhesive based process for the manufacture of printed circuit boards
DE3507927A1 (en) * 1985-03-06 1986-09-11 Dr.Ing.H.C. F. Porsche Ag, 7000 Stuttgart METHOD AND HAND DEVICE FOR SEMI-MECHANICAL GALVANIZING OF SHEET SURFACES
US4619741A (en) * 1985-04-11 1986-10-28 Olin Hunt Specialty Products Inc. Process for preparing a non-conductive substrate for electroplating
US4911796A (en) * 1985-04-16 1990-03-27 Protocad, Inc. Plated through-holes in a printed circuit board
US4964948A (en) * 1985-04-16 1990-10-23 Protocad, Inc. Printed circuit board through hole technique
US4631117A (en) * 1985-05-06 1986-12-23 Olin Hunt Specialty Products Inc. Electroless plating process
US4629537A (en) * 1985-05-17 1986-12-16 Hsu Michael S Compact, light-weight, solid-oxide electrochemical converter
US4895673A (en) 1985-07-12 1990-01-23 Westinghouse Electric Corp. Emulsions for electrodepositing polymeric alloys and copolymers
US4818438A (en) * 1985-07-19 1989-04-04 Acheson Industries, Inc. Conductive coating for elongated conductors
US4818437A (en) * 1985-07-19 1989-04-04 Acheson Industries, Inc. Conductive coatings and foams for anti-static protection, energy absorption, and electromagnetic compatability
US4889750A (en) * 1985-07-19 1989-12-26 Acheson Industries, Inc. Conductive coatings and foams for anti-static protection, energy absorption, and electromagnetic compatibility
CH665847A5 (en) * 1985-10-02 1988-06-15 Lonza Ag METHOD FOR SUSPENDING SOLID LUBRICANTS.
US4724005A (en) * 1985-11-29 1988-02-09 Olin Hunt Specialty Products Inc. Liquid carbon black dispersion
US4684560A (en) * 1985-11-29 1987-08-04 Olin Hunt Specialty Products, Inc. Printed wiring board having carbon black-coated through holes
US4691091A (en) * 1985-12-31 1987-09-01 At&T Technologies Direct writing of conductive patterns
US4735676A (en) * 1986-01-14 1988-04-05 Asahi Chemical Research Laboratory Co., Ltd. Method for forming electric circuits on a base board
JPH06101616B2 (en) * 1986-02-21 1994-12-12 名幸電子工業株式会社 Method for manufacturing conductor circuit board
CH669129A5 (en) * 1986-04-04 1989-02-28 Lonza Ag LUBRICANT SYSTEM FOR SHEET AND PROFILE ROLLING MILLS.
US4622107A (en) * 1986-05-05 1986-11-11 Olin Hunt Specialty Products Inc. Process for preparing the through hole walls of a printed wiring board for electroplating
US4622108A (en) * 1986-05-05 1986-11-11 Olin Hunt Specialty Products, Inc. Process for preparing the through hole walls of a printed wiring board for electroplating
US4718993A (en) * 1987-05-29 1988-01-12 Olin Hunt Specialty Products Inc. Process for preparing the through hole walls of a printed wiring board for electroplating
US4758358A (en) * 1987-06-08 1988-07-19 Van Straaten Corporation Environmentally acceptable forging lubricants
US4921777A (en) * 1987-08-03 1990-05-01 Allied-Signal Inc. Method for manufacture of multilayer printed circuit boards
US4935109A (en) * 1988-05-23 1990-06-19 General Dynamics Corp., Pomona Div. Double-cell electroplating apparatus and method
JPH064482B2 (en) 1988-06-08 1994-01-19 三井鉱山株式会社 Flake graphite powder and method for producing the same
US5032235A (en) * 1988-07-27 1991-07-16 The Boeing Company Method and apparatus for plating through holes in graphite composites
CA1329802C (en) * 1988-08-30 1994-05-24 Nippon Kokan Kabushiki Kaisha Lubricant for the production of seamless steel pipes
US5041242A (en) * 1989-01-12 1991-08-20 Cappar Limited Conductive coating composition
US5024735A (en) * 1989-02-15 1991-06-18 Kadija Igor V Method and apparatus for manufacturing interconnects with fine lines and spacing
US5108553A (en) * 1989-04-04 1992-04-28 Olin Corporation G-tab manufacturing process and the product produced thereby
US4874477A (en) * 1989-04-21 1989-10-17 Olin Hunt Specialty Products Inc. Process for preparing the through hole walls of a printed wiring board for electroplating
US4897164A (en) * 1989-04-24 1990-01-30 Olin Hunt Specialty Products Inc. Process for preparing the through hole walls of a printed wiring board for electroplating
US4969979A (en) * 1989-05-08 1990-11-13 International Business Machines Corporation Direct electroplating of through holes
US4980202A (en) * 1989-07-03 1990-12-25 United Technologies Corporation CVD SiC matrix composites containing carbon coated fibers
US5110355A (en) * 1990-03-26 1992-05-05 Olin Hunt Sub Iii Corp. Process for preparing nonconductive substrates
US5015339A (en) * 1990-03-26 1991-05-14 Olin Hunt Sub Iii Corp. Process for preparing nonconductive substrates
US4964959A (en) * 1990-04-12 1990-10-23 Olin Hunt Specialty Products Inc. Process for preparing a nonconductive substrate for electroplating
US5106537A (en) * 1990-04-12 1992-04-21 Olin Hunt Sub Iii Corp. Liquid dispersion for enhancing the electroplating of a non-conductive surface
US4994153A (en) * 1990-06-28 1991-02-19 Olin Corporation Process for preparing nonconductive substrates
WO1992019092A1 (en) * 1991-04-22 1992-10-29 Atotech Deutschland Gmbh Method for selectively coating non-conductors with carbon particles and use of copper containing solutions therein
US5139642A (en) * 1991-05-01 1992-08-18 Olin Corporation Process for preparing a nonconductive substrate for electroplating
JPH05218618A (en) * 1992-01-30 1993-08-27 Cmk Corp Manufacture of printed wiring board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111647901A (en) * 2020-05-15 2020-09-11 湖北省哈福生物化学有限公司 Black hole liquid and preparation method and use method thereof
CN111647901B (en) * 2020-05-15 2023-08-25 湖北省哈福生物化学有限公司 Black hole liquid and preparation method and application method thereof

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EP0698132A4 (en) 1996-01-15
FI955542A0 (en) 1995-11-16
EP0698132B1 (en) 1999-11-17
JPH09500419A (en) 1997-01-14
HK1005414A1 (en) 1999-01-08
JP3335176B2 (en) 2002-10-15
WO1994026958A1 (en) 1994-11-24
EP0698132A1 (en) 1996-02-28
AU6831794A (en) 1994-12-12
DE69421699D1 (en) 1999-12-23
DE69421699T2 (en) 2000-07-06
US5476580A (en) 1995-12-19
NO954637L (en) 1996-01-16
PL311705A1 (en) 1996-03-04
NO954637D0 (en) 1995-11-16
FI955542A (en) 1996-01-16

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