CA2112010A1 - (Cyclo)Aliphatic Epoxy Compounds - Google Patents

(Cyclo)Aliphatic Epoxy Compounds

Info

Publication number
CA2112010A1
CA2112010A1 CA2112010A CA2112010A CA2112010A1 CA 2112010 A1 CA2112010 A1 CA 2112010A1 CA 2112010 A CA2112010 A CA 2112010A CA 2112010 A CA2112010 A CA 2112010A CA 2112010 A1 CA2112010 A1 CA 2112010A1
Authority
CA
Canada
Prior art keywords
cyclo
epoxy compounds
aliphatic epoxy
contain
good
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2112010A
Other languages
French (fr)
Other versions
CA2112010C (en
Inventor
Bettina Steinmann
Jean-Pierre Wolf
Adrian Schulthess
Max Hunziker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2112010A1 publication Critical patent/CA2112010A1/en
Application granted granted Critical
Publication of CA2112010C publication Critical patent/CA2112010C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/38—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D303/40—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals by ester radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3218—Carbocyclic compounds

Abstract

Novel (cyclo)aliphatic epoxy compounds that contain at least one acrylate group in the molecule and at least one cycloaliphatic epoxy group can be used for the production of coating formulations, adhesives, photoresists or in stereolithography. As they contain a cohesive homogeneous network, the three-dimensional objects produced have very good green strength and very good strength properties.
CA002112010A 1992-12-23 1993-12-21 (cyclo)aliphatic epoxy compounds Expired - Fee Related CA2112010C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH394392 1992-12-23
CH3943/92-2 1992-12-23

Publications (2)

Publication Number Publication Date
CA2112010A1 true CA2112010A1 (en) 1994-06-24
CA2112010C CA2112010C (en) 2000-03-07

Family

ID=4266828

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002112010A Expired - Fee Related CA2112010C (en) 1992-12-23 1993-12-21 (cyclo)aliphatic epoxy compounds

Country Status (11)

Country Link
US (2) US5468886A (en)
EP (1) EP0604364B1 (en)
JP (1) JPH06228271A (en)
KR (1) KR100294774B1 (en)
AT (1) ATE163438T1 (en)
AU (2) AU672645B2 (en)
CA (1) CA2112010C (en)
DE (1) DE59308175D1 (en)
ES (1) ES2114601T3 (en)
HK (1) HK1005623A1 (en)
TW (1) TW259797B (en)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW259797B (en) * 1992-12-23 1995-10-11 Ciba Geigy
JP3117394B2 (en) * 1994-11-29 2000-12-11 帝人製機株式会社 Optical three-dimensional molding resin composition
US5639413A (en) * 1995-03-30 1997-06-17 Crivello; James Vincent Methods and compositions related to stereolithography
JPH08277321A (en) * 1995-04-05 1996-10-22 Daicel Chem Ind Ltd Photocurable resin composition
DE69610028T2 (en) * 1995-06-14 2001-01-11 United Technologies Corp Process for producing a strong object with permanent dimensions
ATE191090T1 (en) * 1996-07-29 2000-04-15 Ciba Sc Holding Ag LIQUID, RADIATION-CURED COMPOSITION, PARTICULARLY FOR STEREOLITHOGRAPHY
US6008266A (en) * 1996-08-14 1999-12-28 International Business Machines Corporation Photosensitive reworkable encapsulant
US7332537B2 (en) * 1996-09-04 2008-02-19 Z Corporation Three dimensional printing material system and method
JP3724893B2 (en) * 1996-09-25 2005-12-07 ナブテスコ株式会社 Optical three-dimensional molding resin composition
JP3626302B2 (en) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 Photocurable resin composition
US6124483A (en) * 1996-12-23 2000-09-26 Sartomer Technology Company Process for preparing unsaturated esters containing cyclic epoxy group
US5767150A (en) * 1997-04-10 1998-06-16 Sartomer Company Cycloaliphatic epoxide compounds
EP0887706A1 (en) * 1997-06-25 1998-12-30 Wako Pure Chemical Industries Ltd Resist composition containing specific cross-linking agent
US6235363B1 (en) 1998-05-06 2001-05-22 Avery Dennison Corporation Composite construction containing barrier layer
US6150479A (en) * 1998-11-23 2000-11-21 Loctite Corporation Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation
US6342545B1 (en) 1998-11-23 2002-01-29 Loctite Corporation Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation
US6451948B1 (en) 1999-08-19 2002-09-17 Loctite Corporation Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation
WO2001034371A2 (en) 1999-11-05 2001-05-17 Z Corporation Material systems and methods of three-dimensional printing
MXPA02006937A (en) * 2000-01-14 2004-11-12 Abb Power T & D Co Transparent epoxy structures.
US20030200835A1 (en) * 2002-04-02 2003-10-30 Snecma Services Diffusion-brazing filler powder for parts made of an alloy based on nickel, cobalt or iron
US6833231B2 (en) * 2002-07-31 2004-12-21 3D Systems, Inc. Toughened stereolithographic resin compositions
US7087109B2 (en) * 2002-09-25 2006-08-08 Z Corporation Three dimensional printing material system and method
EP2269808B1 (en) * 2003-05-21 2017-03-22 3D Systems Incorporated Thermoplastic powder material system for appearance models from 3D printing systems
CN101171280A (en) * 2005-05-04 2008-04-30 氰特表面技术有限公司 Radiation curable methacrylate polyesters
US20070241482A1 (en) * 2006-04-06 2007-10-18 Z Corporation Production of three-dimensional objects by use of electromagnetic radiation
EP2089215B1 (en) 2006-12-08 2015-02-18 3D Systems Incorporated Three dimensional printing material system
JP5129267B2 (en) 2007-01-10 2013-01-30 スリーディー システムズ インコーポレーテッド 3D printing material system with improved color, article performance and ease of use
WO2008103450A2 (en) 2007-02-22 2008-08-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
CN104086748B (en) 2014-06-27 2017-04-05 京东方科技集团股份有限公司 Modified epoxy acrylic ester, light resistance composition and preparation method thereof and transparent photoresistance
KR101853387B1 (en) * 2015-03-27 2018-04-30 동우 화인켐 주식회사 Hard coating film for flexible display
KR102622843B1 (en) * 2016-02-15 2024-01-11 삼성디스플레이 주식회사 Flexible display device, method for fabricating hard coating polymer of the same
JP6618186B2 (en) * 2016-05-12 2019-12-11 日本化薬株式会社 Resin composition and adhesive for electronic parts
CN108196428B (en) * 2018-01-29 2020-03-31 深圳市华星光电技术有限公司 Photoresist composition and color filter

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB788531A (en) * 1954-03-25 1958-01-02 Union Carbide Corp Diepoxides and process of producing the same
US4100141A (en) * 1976-07-02 1978-07-11 Loctite (Ireland) Limited Stabilized adhesive and curing compositions
US4565859A (en) * 1984-01-30 1986-01-21 Daicel Chemical Industries, Ltd. Polyether compounds, epoxy resins, epoxy resin compositions, and processes for production thereof
US4816496A (en) * 1984-06-26 1989-03-28 Kabushiki Kaisha Toshiba Photocurable composition
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4929402A (en) * 1984-08-08 1990-05-29 3D Systems, Inc. Method for production of three-dimensional objects by stereolithography
DE3709230A1 (en) * 1987-03-20 1988-10-06 Desitin Arzneimittel Gmbh NEW VALPROINIC ACID CALCIUM
WO1989007620A1 (en) * 1988-02-19 1989-08-24 Asahi Denka Kogyo K.K. Resin composition for optical modeling
EP0477666B1 (en) * 1990-09-24 1995-06-28 Siemens Aktiengesellschaft Cross-linked epoxy-resins with non-linear optical properties
JP2899832B2 (en) * 1990-11-14 1999-06-02 日本ペイント株式会社 New thermosetting resin composition
JP3142610B2 (en) * 1991-09-25 2001-03-07 株式会社日本触媒 Method for producing unsaturated ester compound
TW259797B (en) * 1992-12-23 1995-10-11 Ciba Geigy

Also Published As

Publication number Publication date
CA2112010C (en) 2000-03-07
HK1005623A1 (en) 1999-01-15
EP0604364A3 (en) 1995-01-04
ATE163438T1 (en) 1998-03-15
US5599651A (en) 1997-02-04
DE59308175D1 (en) 1998-04-02
KR100294774B1 (en) 2001-09-17
US5468886A (en) 1995-11-21
JPH06228271A (en) 1994-08-16
AU1009097A (en) 1997-03-06
AU5263993A (en) 1994-07-07
AU683002B2 (en) 1997-10-23
KR940014373A (en) 1994-07-18
TW259797B (en) 1995-10-11
ES2114601T3 (en) 1998-06-01
EP0604364B1 (en) 1998-02-25
EP0604364A2 (en) 1994-06-29
AU672645B2 (en) 1996-10-10

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