CA2045944A1 - Field compensated lens - Google Patents

Field compensated lens

Info

Publication number
CA2045944A1
CA2045944A1 CA2045944A CA2045944A CA2045944A1 CA 2045944 A1 CA2045944 A1 CA 2045944A1 CA 2045944 A CA2045944 A CA 2045944A CA 2045944 A CA2045944 A CA 2045944A CA 2045944 A1 CA2045944 A1 CA 2045944A1
Authority
CA
Canada
Prior art keywords
optical
intermediate image
optical system
subsystem
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2045944A
Other languages
French (fr)
Other versions
CA2045944C (en
Inventor
Rama N. Singh
Janusz S. Wilczynski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of CA2045944A1 publication Critical patent/CA2045944A1/en
Application granted granted Critical
Publication of CA2045944C publication Critical patent/CA2045944C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Abstract

An optical system having a substantially flat image field is disclosed. The optical system is formed from optical subsystems wherein an input optical subsystem forms an intermediate image which is the object of an output optical system. The intermediate image has a curvature which compensates that from the remaining optical components of the system to result in a substantially flat image for the optical system.
Preferably, the optical elements preceding the intermediate image and the optical elements succeeding the intermediate image are separately corrected for odd aberrations. The optical elements preceding the intermediate image and the optical elements succeeding the intermediate image compensate for each other and result in a substantially aberration free flat image for the optical system. The optical system preferably contains an input optical subsystem and an output optical subsystem wherein the input optical subsystem is a catadioptric system and wherein the output optical system is a dioptric system. Most preferably the input optical system is a 1X catadioptric system and the output optical system is an NX dioptric system. The optical systems of the present invention are used for subquarter micron photolithography tools for microelectronic fabrication, such as scanners and steppers.
CA002045944A 1990-08-28 1991-06-28 Field compensated lens Expired - Fee Related CA2045944C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/575,043 US5052763A (en) 1990-08-28 1990-08-28 Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
US07/575,043 1990-08-28

Publications (2)

Publication Number Publication Date
CA2045944A1 true CA2045944A1 (en) 1992-03-01
CA2045944C CA2045944C (en) 1995-06-13

Family

ID=24298700

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002045944A Expired - Fee Related CA2045944C (en) 1990-08-28 1991-06-28 Field compensated lens

Country Status (5)

Country Link
US (1) US5052763A (en)
EP (1) EP0475020B1 (en)
JP (1) JPH07111512B2 (en)
CA (1) CA2045944C (en)
DE (1) DE69125328T2 (en)

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JPH08203812A (en) * 1995-01-30 1996-08-09 Nikon Corp Reflection-refraction reduction projection optical system and aligner
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JP3750123B2 (en) † 1996-04-25 2006-03-01 株式会社ニコン Projection optical system
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EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp Projection exposure apparatus and method, and reflection refraction optical system
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JP3985346B2 (en) 1998-06-12 2007-10-03 株式会社ニコン Projection exposure apparatus, projection exposure apparatus adjustment method, and projection exposure method
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
EP1102100A3 (en) 1999-11-12 2003-12-10 Carl Zeiss Catadioptric objective with beamsplitter
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
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JP2001228401A (en) * 2000-02-16 2001-08-24 Canon Inc Projection optical system, projection aligner by this projection optical system and method for manufacturing device
US6842298B1 (en) 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
JP2004514943A (en) * 2000-11-28 2004-05-20 カール・ツアイス・エスエムテイ・アーゲー Catadioptric projection system for 157nm lithography
DE10104177A1 (en) 2001-01-24 2002-08-01 Zeiss Carl Catadioptric reduction lens
RU2192028C1 (en) * 2001-04-04 2002-10-27 Общество С Ограниченной Ответственностью "Инсмат Технология" Catadioptric system
DE10117481A1 (en) 2001-04-07 2002-10-10 Zeiss Carl Catadioptric projection objective for microlithography system, has beam splitter arranged near object plane or plane conjugated to object plane
DE10127227A1 (en) 2001-05-22 2002-12-05 Zeiss Carl Catadioptric reduction lens
US7136220B2 (en) * 2001-08-21 2006-11-14 Carl Zeiss Smt Ag Catadioptric reduction lens
TW575904B (en) * 2001-08-21 2004-02-11 Asml Us Inc Optical projection for microlithography
US20040075894A1 (en) * 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
US7180658B2 (en) * 2003-02-21 2007-02-20 Kla-Tencor Technologies Corporation High performance catadioptric imaging system
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20050185269A1 (en) * 2003-12-19 2005-08-25 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170028451A (en) 2004-05-17 2017-03-13 칼 짜이스 에스엠티 게엠베하 Catadioptric projection objective with intermediate images
US8212988B2 (en) * 2004-08-06 2012-07-03 Carl Zeiss GmbH Projection objective for microlithography
US7511890B2 (en) * 2005-02-04 2009-03-31 Carl Zeiss Smt Ag Refractive optical imaging system, in particular projection objective for microlithography
US20060198018A1 (en) * 2005-02-04 2006-09-07 Carl Zeiss Smt Ag Imaging system
US7218453B2 (en) * 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
DE102005024678B3 (en) * 2005-05-30 2006-08-31 Schott Ag Method for specification of optical material with reduced inclination to irreversible radiation damage involving the use of laser and fluorescent energy
EP1959289A1 (en) * 2007-02-13 2008-08-20 Carl Zeiss SMT AG Unit magnification projection objective
US7929115B2 (en) * 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
US20130169707A1 (en) * 2011-12-30 2013-07-04 Lin Li Advanced Ultra-Compact High Performance Projector System and Imaging Lens Arrangement for Use Therein
CN103399390B (en) * 2013-05-10 2015-12-02 无锡国盛生物工程有限公司 Biochip scanner phosphor collection object lens
CN103278913B (en) * 2013-05-15 2015-07-01 中国科学院光电技术研究所 Aspheric photoetching coupling object lens

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Also Published As

Publication number Publication date
JPH04234722A (en) 1992-08-24
EP0475020A2 (en) 1992-03-18
CA2045944C (en) 1995-06-13
EP0475020A3 (en) 1992-05-06
DE69125328T2 (en) 1997-09-25
DE69125328D1 (en) 1997-04-30
EP0475020B1 (en) 1997-03-26
JPH07111512B2 (en) 1995-11-29
US5052763A (en) 1991-10-01

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